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Priority to JP19600786UpriorityCriticalpatent/JPS63100733U/ja
Publication of JPS63100733UpublicationCriticalpatent/JPS63100733U/ja
Processo para o tratamento de camadas fotossensiveis,contendo compostos diazoicos,que trabalham positivamente,expostas a luz e reveladas,durante a producao de moldes de impressao"offset"