JPS6292344A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS6292344A
JPS6292344A JP23121385A JP23121385A JPS6292344A JP S6292344 A JPS6292344 A JP S6292344A JP 23121385 A JP23121385 A JP 23121385A JP 23121385 A JP23121385 A JP 23121385A JP S6292344 A JPS6292344 A JP S6292344A
Authority
JP
Japan
Prior art keywords
resin
filler
semiconductor element
region
hollow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23121385A
Other languages
Japanese (ja)
Inventor
Noritoshi Kotsuji
小辻 宣俊
Mitsuo Takahashi
高橋 光雄
Toshiki Kurosu
黒須 俊樹
Yoichi Nakajima
中島 羊一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP23121385A priority Critical patent/JPS6292344A/en
Publication of JPS6292344A publication Critical patent/JPS6292344A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/16Fillings or auxiliary members in containers or encapsulations, e.g. centering rings
    • H01L23/18Fillings characterised by the material, its physical or chemical properties, or its arrangement within the complete device
    • H01L23/24Fillings characterised by the material, its physical or chemical properties, or its arrangement within the complete device solid or gel at the normal operating temperature of the device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • H01L23/3135Double encapsulation or coating and encapsulation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched

Abstract

PURPOSE:To prevent the cracking of a semiconductor element by making solid body fillers contain near the semiconductor element and hollow body fillers contain into a region separate from the semiconductor element in large quantities respectively. CONSTITUTION:A semiconductor element 1 is placed onto a radiator plate 2, and the periphery is sealed with an insulating resin. In this case, a section in the vicinity of the element 1 is formed by a region 8 containing a large quantity of solid body fillers, and a region separate from the element 1 is shaped by a region 9 including a large quantity of hollow body fillers. The region 8 and the region 9 are formed by the difference of the specific gravity of the hollow body fillers and the solid body fillers. Accordingly, the cracking of the element 1 is prevented.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は半導体装置に係り、特に、樹脂による半導体素
子の封止構造に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a semiconductor device, and more particularly to a sealing structure for a semiconductor element using resin.

〔発明の背景〕[Background of the invention]

従来の樹脂封止型の半導体装置においては、特開昭58
−184745号公報に示されるように、樹脂中にシリ
カ等の中実体フィラーを添加して、樹脂の熱膨張係数を
下げて、半導体素子(以下半導体チップと略記)に、熱
膨張の違いによる熱応力ができるだけかからない様にし
て半導体チップの破壊を防いでいた。
In conventional resin-sealed semiconductor devices, Japanese Patent Application Laid-open No. 58
As shown in Japanese Patent No. 184745, a solid filler such as silica is added to a resin to lower the coefficient of thermal expansion of the resin, and a semiconductor element (hereinafter abbreviated as a semiconductor chip) is heated by the difference in thermal expansion. The semiconductor chip was prevented from being destroyed by applying as little stress as possible.

しかし、中実体フィラーの添加量を増やす程、樹脂の熱
膨張係数は下げられる反面、封止硬化前の樹脂の粘度が
高くなり、樹脂封止作業が困難になるに加え、樹脂の弾
性係数が、中実体フィラーを含んだことで増加し、熱応
力を十分低下することができなかった。
However, as the amount of solid filler added increases, the thermal expansion coefficient of the resin decreases, but on the other hand, the viscosity of the resin before sealing and curing increases, making the resin sealing work difficult, and the elastic modulus of the resin decreases. , which increased due to the inclusion of solid filler, making it impossible to reduce thermal stress sufficiently.

〔発明の目的〕[Purpose of the invention]

本発明の目的は、樹脂の熱応力の低減により、半導体チ
ップの割れが発生せず、しかも、製造の容易な樹脂封止
型の半導体装置を提供することにある。
An object of the present invention is to provide a resin-sealed semiconductor device that does not cause cracking of the semiconductor chip by reducing the thermal stress of the resin and is easy to manufacture.

〔発明の概要〕[Summary of the invention]

上記目的を達成する本発明の特徴とするところは、封止
樹脂に中空体フィラーを添加し、中空体フィラーの浮上
効果を利用して、中空体フィラーの占有領域のうちの上
部へ中空体フィラーを集中させることにある。
The present invention is characterized in that a hollow filler is added to the sealing resin, and by utilizing the floating effect of the hollow filler, the hollow filler is moved to the upper part of the area occupied by the hollow filler. The goal is to focus on

〔発明の実施例〕[Embodiments of the invention]

以下、本発明の一実施例を図を用いて説明する。 An embodiment of the present invention will be described below with reference to the drawings.

第1図は、トライアックとして動作する半導体チップの
保護及び封止樹脂の低弾性化、低膨張率化をはかり、中
実体フィラーと中空体フィラーを添加(樹脂に対し、中
実体フィラー16シoQ%、中空体フィラー36voQ
γ、)シた封止樹脂を使用した放熱板絶縁型半導体装置
を示す。
Figure 1 shows that solid filler and hollow filler are added to protect the semiconductor chip that operates as a triac, and to lower the elasticity and expansion rate of the sealing resin. , hollow body filler 36voQ
γ,) shows a heat sink insulated semiconductor device using a sealed sealing resin.

半導体チップ1は、FeもしくはCuの放熱板2にセラ
ミック板3を介して、搭載されている。
A semiconductor chip 1 is mounted on a heat sink 2 made of Fe or Cu with a ceramic plate 3 interposed therebetween.

半導体チップ1は、内部リード4で外部リード5と接続
されている。樹脂ケース6は、放熱板2に接着して固定
し、ケース上面には、樹脂注入ロアがある。この注入ロ
アから、中空体フィラーと中実体フィラーを添加したエ
ポキシ等の樹脂を注入し、加熱硬化させると、中空体フ
ィラーと中実体フィラーの比重の違いにより、第1図に
示すように、中実体フィラーを多く含む領域8と中空体
フィラーを多く含む領域9に分かれる。
The semiconductor chip 1 is connected to external leads 5 through internal leads 4. The resin case 6 is bonded and fixed to the heat sink 2, and a resin injection lower is provided on the upper surface of the case. When a resin such as epoxy containing a hollow filler and a solid filler is injected from this injection lower and cured by heating, due to the difference in specific gravity between the hollow filler and the solid filler, as shown in Figure 1, It is divided into a region 8 containing a large amount of solid filler and a region 9 containing a large amount of hollow filler.

樹脂の縦弾性係数をER1樹脂と樹脂内部の部品材料の
線膨張係数差をΔαRとすると、樹脂の0く。
If the longitudinal elastic modulus of the resin is ER1 and the linear expansion coefficient difference between the resin and the component material inside the resin is ΔαR, then the resin is 0.

内部熱応力PはPgΔαR−ERで表わされる。The internal thermal stress P is expressed as PgΔαR−ER.

、図に示すように樹脂の厚みをhとすると、樹脂内部の
部品には、樹脂の熱的収縮による応力M=P×hの曲げ
モーメントが働く。つまり、中空体フィラーを使用し、
樹脂の線膨張係数を仰げても、樹脂の厚みの効果により
、充分に内部応力の低減をはかることができないことが
わかった。したがって、樹脂の厚みhを小さくすれば、
内部応力は、低減できるが、反面、耐湿性に於いて、半
導体チップ1と、外界の湿気を遮断するに充分な樹脂量
を確保できず劣化しやすい欠点が生じた。
As shown in the figure, when the thickness of the resin is h, a bending moment of stress M=P×h due to thermal contraction of the resin acts on the parts inside the resin. In other words, using a hollow body filler,
It has been found that even if the coefficient of linear expansion of the resin can be increased, it is not possible to sufficiently reduce the internal stress due to the effect of the thickness of the resin. Therefore, if the resin thickness h is reduced,
The internal stress can be reduced, but on the other hand, in terms of moisture resistance, it is not possible to secure a sufficient amount of resin to block the semiconductor chip 1 from moisture from the outside world, resulting in easy deterioration.

本発明は、以上のようなことから、樹脂の厚みhによる
応力効果を、低減する様に改善した樹脂構造に関するも
ので、中空体フィラーの浮上効果を利用し、領域9では
中空体フィラーを多く含ませてここの縦弾性係数ERを
下げて1曲げモーメントを低減した。
In view of the above, the present invention relates to a resin structure that is improved to reduce the stress effect due to the resin thickness h, and utilizes the floating effect of the hollow filler to increase the amount of hollow filler in region 9. By including this, the longitudinal elastic modulus ER was lowered and the bending moment was reduced by 1.

更に、縦弾性係数ERを下げるために、中空体フィラー
の多く含む領域9のうち、上部を9a。
Furthermore, in order to lower the longitudinal elastic modulus ER, the upper part 9a of the region 9 containing a large amount of hollow filler.

下部を9bとし、上部9aの縦弾性係数をER上、下部
9bの縦弾性係数をER上とすると、ER上、、、< 
E R下の関係となる様にした。以下、第2図をラスバ
ルーン等の中空体フィラーを使用し、しかも平均粒径の
異なる2種類の中空体フィラーを使用して、中空体フィ
ラーの多く含む領域9内の上部9aに、中空体フィラー
を集合させた放熱板絶縁型半導体装置である。
If the lower part is 9b, and the longitudinal elastic modulus of the upper part 9a is above ER and the longitudinal elastic modulus of the lower part 9b is above ER, then above ER,,,<
The relationship was made to be under ER. Hereinafter, using a hollow body filler such as a lath balloon and using two types of hollow body fillers having different average particle diameters, the hollow body filler in FIG. This is a heat sink insulated semiconductor device in which fillers are assembled.

中空体フィラーの平均粒径を違えることにより、平均粒
径の大きな中空体フィラーの間げきに、平均粒径の小さ
な中空体フィラーが、中空体フィシ一自身の浮上効果に
より、入り込む形となり、結果として、中空体フィラー
の多く含む領域9の上部9aに、中空体フィラーが集中
する。つまり、中空体フィラーの多く含む領域9におい
て、上部9aと下部9bとで、中空体フィラー量の差が
生じる。、(上部9aが、中空体フィラー量が多い、、
)この中空体フィラー量の違いにより、樹脂上部9aの
縦弾性係数ER上を、樹脂下部9bの縦弾性係数ER下
よりも小さくするこができ、したがって、一層縦弾性係
数ERを小さくすることとなり、曲げモーメントを、充
分、低減させることができる。
By changing the average particle size of the hollow filler, the hollow filler with a small average particle size will fit into the gaps of the hollow filler with a large average particle size due to the floating effect of the hollow body itself, resulting in As a result, the hollow filler is concentrated in the upper part 9a of the region 9 containing a large amount of the hollow filler. That is, in the region 9 containing a large amount of hollow filler, there is a difference in the amount of hollow filler between the upper part 9a and the lower part 9b. , (The upper part 9a has a large amount of hollow body filler,
) Due to this difference in the amount of hollow body filler, the upper longitudinal elastic modulus ER of the resin upper part 9a can be made smaller than the lower longitudinal elastic modulus ER of the resin lower part 9b, and therefore, the longitudinal elastic modulus ER can be made even smaller. , the bending moment can be sufficiently reduced.

天然産の、例えば、シラスバルーンを使用した場合、中
空体フィラーの粒径は、50〜300μmであるが、中
空体フィラーの粒径選別は、可能で、中空体フィラー粒
径50〜200μm品(平均粒径:125pm)と、粒
径50〜300μm品(平均粒径:175μm)に区分
けされ、市販されているので、この2種類を使用すれば
良い。
When using naturally produced shirasu balloons, for example, the particle size of the hollow filler is 50 to 300 μm, but particle size selection of the hollow filler is possible, and hollow filler particles with a particle size of 50 to 200 μm ( They are classified into products with an average particle size of 125 pm) and products with a particle size of 50 to 300 μm (average particle size: 175 μm) and are commercially available, so it is sufficient to use these two types.

また、最近では、平均粒径70μmの人工の中空体フィ
ラーも製造されており、前述の天然産の中空体フィラー
と、人工の中空体フィラーを併用しても良いし、極力N
aイオン等の影響をなくすために、平均粒径の違う、人
工の中空体フィラーを混ぜ合わせて、使用しても差し支
えない。
In addition, recently, artificial hollow body fillers with an average particle size of 70 μm have been manufactured, and the above-mentioned natural hollow body fillers and artificial hollow body fillers may be used in combination, and N
In order to eliminate the influence of a-ions, etc., artificial hollow fillers having different average particle sizes may be mixed and used.

尚、2種類の中空体フィラーの配合量については、作業
効率、樹脂の占有容積、樹脂の粘度等により任意に決ま
るものである。
The amounts of the two types of hollow fillers are arbitrarily determined depending on the working efficiency, the volume occupied by the resin, the viscosity of the resin, and the like.

以上の実施例では、いずれも、半導体チップ1、絶縁板
3は曲げモーメントにより破壊されなかった。
In all of the above examples, the semiconductor chip 1 and the insulating plate 3 were not destroyed by the bending moment.

本発明は、絶縁板を介さずに、半導体チップを直接また
は、支持板を介して放熱板へ載置した構造の半導体装置
にも適用可能である。
The present invention can also be applied to a semiconductor device having a structure in which a semiconductor chip is mounted directly on a heat sink without using an insulating plate or via a support plate.

また、半導体チップはいかなる動作特性を持つものでも
よいし、複数個のものが他の回路素子などと一緒にモジ
ュール化されていてもよい。
Further, the semiconductor chips may have any operating characteristics, and a plurality of semiconductor chips may be modularized together with other circuit elements.

〔発明の効果〕〔Effect of the invention〕

以上述べたように、本発明によれば、半導体チツブを、
破壊することなく、電気的特性の良好な半導体装置を、
容易に製作することができる。
As described above, according to the present invention, semiconductor chips can be
Semiconductor devices with good electrical characteristics without being destroyed,
It can be easily manufactured.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本発明の一実施例を示しており、絶縁型トラ
イアックに、中空体フィラーと、中実体フィラーを混ぜ
た樹脂を使用した時の縦断面図、第2図は、本発明の他
の実施例になる絶縁型トライアックの縦断面図である。 1・・・半導体チップ、2・・・放熱板、3・・・絶縁
板、4・・・内部リード、5・・・外部リード、6・・
・樹脂ケース、7・・・樹脂注入口、8・・・中実体フ
ィラーの多く含む領域、9・・・中空体フィラーの多く
含む領域、9a・・・中空体フィラーの多く含む領域の
上部、9b・・・中空体フィラーの多く含む領域の下部
Fig. 1 shows an embodiment of the present invention, and Fig. 2 is a vertical cross-sectional view when a hollow filler and a resin mixed with a solid filler are used in an insulated triac. FIG. 7 is a longitudinal cross-sectional view of an insulated triac according to another embodiment. DESCRIPTION OF SYMBOLS 1... Semiconductor chip, 2... Heat sink, 3... Insulating plate, 4... Internal lead, 5... External lead, 6...
- Resin case, 7... Resin injection port, 8... Area containing a large amount of solid filler, 9... Area containing a large amount of hollow filler, 9a... Upper part of the area containing a large amount of hollow filler, 9b...Lower part of the region containing a large amount of hollow body filler.

Claims (1)

【特許請求の範囲】 1、放熱板上に少なくとも1個の半導体素子が載置され
、周囲を絶縁性樹脂で封止した半導体装置において、半
導体素子近傍の樹脂中には中実体フィラー、半導体素子
から離れた領域の樹脂中には中空体フィラーを多く含ま
せていることを特徴とする半導体装置。 2、上記特許請求の範囲第1項において、半導体素子か
ら離れた領域では、半導体素子に近い側で中空体フィラ
ーの粒径が大きく、半導体素子からより離れた側では中
空体フィラーの粒径の小さいものが多く含まれているこ
とを特徴とする半導体装置。 3、上記特許請求の範囲第1項において、半導体素子は
絶縁板を介して放熱板上に載置されていることを特徴と
する半導体装置。
[Claims] 1. In a semiconductor device in which at least one semiconductor element is mounted on a heat sink and the periphery is sealed with an insulating resin, a solid filler and a semiconductor element are contained in the resin near the semiconductor element. A semiconductor device characterized in that a resin in a region away from the semiconductor device contains a large amount of hollow filler. 2. In the above claim 1, in the region away from the semiconductor element, the particle size of the hollow filler is larger on the side closer to the semiconductor element, and the particle size of the hollow filler is smaller on the side further away from the semiconductor element. A semiconductor device characterized by containing many small components. 3. The semiconductor device according to claim 1, wherein the semiconductor element is placed on a heat sink via an insulating plate.
JP23121385A 1985-10-18 1985-10-18 Semiconductor device Pending JPS6292344A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23121385A JPS6292344A (en) 1985-10-18 1985-10-18 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23121385A JPS6292344A (en) 1985-10-18 1985-10-18 Semiconductor device

Publications (1)

Publication Number Publication Date
JPS6292344A true JPS6292344A (en) 1987-04-27

Family

ID=16920100

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23121385A Pending JPS6292344A (en) 1985-10-18 1985-10-18 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS6292344A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07317843A (en) * 1994-12-28 1995-12-08 Honda Motor Co Ltd Balancer shaft supporting device
EP0714125A3 (en) * 1994-11-24 1996-07-17 Dow Corning Toray Silicone Semiconductor device and fabrication method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0714125A3 (en) * 1994-11-24 1996-07-17 Dow Corning Toray Silicone Semiconductor device and fabrication method
JPH07317843A (en) * 1994-12-28 1995-12-08 Honda Motor Co Ltd Balancer shaft supporting device
JP2694891B2 (en) * 1994-12-28 1997-12-24 本田技研工業株式会社 Balancer shaft support device

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