JPS629220B2 - - Google Patents

Info

Publication number
JPS629220B2
JPS629220B2 JP57167678A JP16767882A JPS629220B2 JP S629220 B2 JPS629220 B2 JP S629220B2 JP 57167678 A JP57167678 A JP 57167678A JP 16767882 A JP16767882 A JP 16767882A JP S629220 B2 JPS629220 B2 JP S629220B2
Authority
JP
Japan
Prior art keywords
wafer
belt
wafers
basket
conveyor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57167678A
Other languages
Japanese (ja)
Other versions
JPS5957447A (en
Inventor
Masayuki Takiguchi
Kunio Sato
Yutaka Hojo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP16767882A priority Critical patent/JPS5957447A/en
Publication of JPS5957447A publication Critical patent/JPS5957447A/en
Publication of JPS629220B2 publication Critical patent/JPS629220B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67715Changing the direction of the conveying path

Description

【発明の詳細な説明】 本発明は半導体製造ラインに設置され1つの処
理装置によつてウエハにある種の処理が施された
後、次の処理装置にウエハを移送する搬送ベルト
装置の改良に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement in a conveyor belt device that is installed in a semiconductor manufacturing line and transfers the wafer to the next processing device after the wafer has been subjected to a certain type of processing by one processing device. It is something.

半導体ウエハに施こされる各種の処理、例えば
フオトリソ工程に於けるレジスト塗布及び露光は
処理装置が異るため、レジスト塗布の終了したウ
エハは搬送ベルトに乗せられて露光装置に移送さ
れる。この搬送ベルト方式によるウエハの移送
は、ウエハの移動を自動化出来ることから極めて
有益である。しかしながら搬送ベルトの前段に設
置される処理装置の処理能力が後段に設置される
処理装置の処理能力(いずれも単位時間当りの処
理能力)に比べ大きな差、例えば2:1の関係に
あるとすると、後段に投入されるウエハは過乗投
入される不都合が生じる。
Various processes performed on a semiconductor wafer, such as resist coating and exposure in a photolithography process, are performed using different processing apparatuses, so the wafer after resist coating is placed on a conveyor belt and transferred to an exposure apparatus. Transferring wafers using this conveyor belt method is extremely useful because the movement of wafers can be automated. However, if there is a large difference in the processing capacity of the processing device installed at the front stage of the conveyor belt compared to the processing capacity of the processing device installed at the rear stage (both processing capacities per unit time), for example, there is a 2:1 relationship. However, there is a problem in that wafers that are loaded at a later stage are overloaded.

そこで従来この様な所に第1図,に示すよ
うな調整装置が用いられる。つまり、従来のウエ
ハ搬送時間調整装置の平面模式図を第1図、第
1図に示す。図中において1はウエハ、2は第
2図に斜視図として示すインラインバスケツトを
示す。矢印はウエハ1の搬送方向の流れを示す。
まず第1図は矢印の様にウエハ1が搬送されて
来た時に、ウエハ1がインラインバスケツト2に
1枚ずつ収納される様子を示している。インライ
ン・バスケツト2は図示しないエレベーシヨン機
構により所定のピツチずつ上方へ動く。逆にウエ
ハ1を搬出する時は下方へ所定のピツチで動く。
この例は、後段の処理装置が多数(ウエハ25枚/
1ロツトとする)のウエハを一枚づつ一定時間で
連続して処理する場合で且つこのバスケツト2の
前部(図中左側)に設置された半導体製造装置が
バツチ処理による半導体製造装置である場合、両
者の処理時間の差異のため一旦、1つのウエハロ
ツトをバスケツト2に搬入しそれから一定時間で
搬出する。これはバスケツト2で搬入、搬出が同
時に行えない為でもある。また、第1図に示し
たように直列に2基のバスケツト2a,2bを設
置しても、1つのウエハロツトをインラインバス
ケツト2bに全て搬入した後、このバスケツト2
bからそのロツトを搬出している間にバスケツト
2aに次のロツトを搬入することは出来るが、バ
スケツト2aからバスケツト2bにウエハ1を搬
出している間にバスケツト2aにウエハを搬入す
ることは不可能である。以上のようなことから従
来の装置は待ち時間が多く大量のウエハ処理に不
適当であつた。
Therefore, an adjusting device as shown in FIG. 1 has conventionally been used in such places. That is, a schematic plan view of a conventional wafer transfer time adjustment device is shown in FIGS. In the figure, reference numeral 1 indicates a wafer, and reference numeral 2 indicates an in-line basket shown in a perspective view in FIG. Arrows indicate the flow of the wafer 1 in the transport direction.
First, FIG. 1 shows how the wafers 1 are stored one by one in an in-line basket 2 when they are transferred as indicated by the arrows. The inline basket 2 is moved upward by a predetermined pitch by an elevator mechanism (not shown). Conversely, when carrying out the wafer 1, it moves downward at a predetermined pitch.
In this example, there are many downstream processing devices (25 wafers/
When wafers (one lot) are processed one by one over a fixed period of time, and the semiconductor manufacturing equipment installed at the front of the basket 2 (on the left side in the figure) is a batch processing semiconductor manufacturing equipment. Because of the difference in processing time between the two, one wafer lot is first loaded into the basket 2 and then taken out after a certain period of time. This is also because basket 2 cannot carry in and out at the same time. Furthermore, even if two baskets 2a and 2b are installed in series as shown in FIG.
Although it is possible to load the next lot into basket 2a while the lot is being transferred from basket 2b, it is not allowed to transfer wafers into basket 2a while wafer 1 is being transferred from basket 2a to basket 2b. It is possible. For the above reasons, the conventional apparatus has a long waiting time and is unsuitable for processing a large number of wafers.

本発明は前述した欠点を一挙に解決する事を目
的として為されたもので、搬送ベルトに分岐装置
を加設して各種処理装置間の処理能力のアンバラ
ンスを補正し、常にその処理装置の処理能力に見
合うウエハの投入あるいは排出を安定に行うウエ
ハ搬送装置を提供するものである。以下本発明の
好ましい幾つかの実施例を図面を参照させながら
詳説する。
The present invention was made with the aim of solving the above-mentioned drawbacks all at once, and by adding a branching device to the conveyor belt, it corrects the unbalance of processing capacity between various processing devices, so that the processing power of each processing device is constantly The object of the present invention is to provide a wafer transfer device that can stably load or unload wafers commensurate with processing capacity. Hereinafter, some preferred embodiments of the present invention will be explained in detail with reference to the drawings.

第3図は本発明の第1の実施例装置の平面概略
図であり、第4図は本発明装置の第2の実施例平
面概略図であり、更に第5図は第4図の一部拡大
斜視図を示す。これらの各図面に附された符号は
同一部分は同一符号をもつて表してある。10は
ウエハを、11〜20は搬送ベルト(以下単にベ
ルトと称すこともある)を、21及び22は本発
明の第2の実施例装置に用いられる第2図に示し
た構造を有するインラインバスケツト(以下単に
バスケツトと称すこともある)を、23及び24
は内側ガイドを、25〜29はウエハ到来検出用
のセンサを、30〜33は外側ガイドを、34及
び35はストツパをそれぞれ表わす。また、第3
図及び第4図に於ける矢印は、ウエハ10の進入
方向を示す。なお前記搬送ベルト11〜20はそ
れぞれ単独にあるいはある部分のベルトと連動し
て、正又は逆の回転をすることにより、ウエハ1
0をこのゴム製ベルト上に搭載して移送するもの
である。そしてこれらは好ましくは全てほぼ同一
の高さに設置する。さらに内側ガイド23及び2
4と外側ガイド30,31,32及び33はウエ
ハの移送路用案内であるから前記搬送ベルト11
〜20の高さにウエハの厚みを加えた高さより高
くなる壁を形成している。また、本発明で説明す
る正回転は明細書全体を通して右回転とする。
3 is a schematic plan view of the first embodiment of the device of the present invention, FIG. 4 is a schematic plan view of the second embodiment of the device of the present invention, and FIG. 5 is a part of FIG. An enlarged perspective view is shown. Identical parts are denoted by the same reference numerals in each of these drawings. 10 is a wafer, 11 to 20 are conveyor belts (hereinafter sometimes simply referred to as belts), and 21 and 22 are inline baskets having the structure shown in FIG. 2, which are used in the second embodiment of the present invention. (hereinafter simply referred to as basket), 23 and 24
25 to 29 are sensors for detecting the arrival of a wafer, 30 to 33 are outer guides, and 34 and 35 are stoppers. Also, the third
The arrows in the figures and FIG. 4 indicate the direction in which the wafer 10 enters. The conveyor belts 11 to 20 are rotated in the forward or reverse direction individually or in conjunction with a certain portion of the belt, thereby transferring the wafer 1.
0 is mounted on this rubber belt and transported. And these are preferably all installed at approximately the same height. Furthermore, the inner guides 23 and 2
4 and outer guides 30, 31, 32, and 33 are guides for the wafer transfer path, so the transfer belt 11
The wall is formed to be higher than the height of ~20 mm plus the thickness of the wafer. Further, the forward rotation described in the present invention is assumed to be right rotation throughout the specification.

まず本発明の第1の実施例を第3図を用いて詳
説すると、矢印で示される様に、ウエハ10が処
理装置Aから搬送ベルト11の正回転により搬送
されて来ると、センサ25がウエハ10の到来を
検出し、分岐部で後段の装置B又はCのいずれか
に供給するかを図示しないベルト回転制御装置で
ベルトの回転方向を決定する。例えば後段の処理
装置Bはウエハ10を投入する場合には、センサ
25の検出信号により作動するベルト回転制御装
置は、ベルト12及び13を正回転にし、ベルト
17を逆回転させる。するとウエハ10はベルト
11からベルト12及びベルト13上を移動し装
置Bに投入(搬入)される。ウエハ10がベルト
11上をある間隔をもつて連続して搬送される
と、順次到来するウエハ10をセンサ25で検出
すると共にセンサ26でのウエハ10の到来信号
をベルト回転制御装置に送出し、次のウエハ10
を装置Cに投入するべく、ベルト17及び18を
正回転にベルト12を逆回転に回転させる。もし
ベルト11上に搬送されるウエハ10の間隔が、
センサ25を通過して後段の処理装置B又はCに
投入されるに充分な時間をもつていればセンサ2
6や28は必ずしも必要ではない。つまりセンサ
25の通過信号によりベルト12と17とを交互
に正から逆へ、逆から正へと回転させれば良い。
但し搬送ベルト12及び17は常に逆の関係で回
転させる必要があることに注意しなければならな
い。つまりベルト11からベルト12またはベル
ト17にウエハ10を転送する際、ウエハ10が
分岐部で澱みしばしばベルト12又は17に転送
されないことが起るからである。ベルト12又は
17のいずれか一方が搬送方向と反対の回転をす
るのは、後段の装置B又はCのいずれか一方、例
えば装置Bへ搬入する時は装置Cへの侵入を逆回
転により阻止し且つ装置B方向へウエハ10を搬
送するべく搬送ベルト12へ送り込むためであ
る。
First, the first embodiment of the present invention will be explained in detail using FIG. 10 is detected, and a belt rotation control device (not shown) determines the rotation direction of the belt at the branching point to determine whether to supply it to either the subsequent device B or C. For example, when the processing apparatus B at the subsequent stage inputs the wafer 10, the belt rotation control device activated by the detection signal of the sensor 25 rotates the belts 12 and 13 in the forward direction and rotates the belt 17 in the reverse direction. Then, the wafer 10 moves from the belt 11 onto the belts 12 and 13, and is loaded (loaded) into the apparatus B. When the wafers 10 are continuously conveyed on the belt 11 at a certain interval, the sensor 25 detects the successively arriving wafers 10, and the sensor 26 sends an arrival signal of the wafer 10 to the belt rotation control device. Next wafer 10
In order to input the sample into the device C, the belts 17 and 18 are rotated in the forward direction and the belt 12 is rotated in the reverse direction. If the interval between the wafers 10 conveyed on the belt 11 is
If it has enough time to pass through the sensor 25 and be input to the subsequent processing device B or C, the sensor 2
6 and 28 are not necessarily necessary. In other words, the belts 12 and 17 may be rotated alternately from normal to reverse and vice versa based on the passing signal from sensor 25.
However, it must be noted that the conveyor belts 12 and 17 must always be rotated in an opposite relationship. That is, when transferring the wafer 10 from the belt 11 to the belt 12 or 17, the wafer 10 often stagnates at the branching point and is not transferred to the belt 12 or 17. The reason why either one of the belts 12 or 17 rotates in the opposite direction to the conveying direction is to prevent the belt from entering device C by rotating it in the opposite direction when carrying the belt to either device B or C in the subsequent stage, for example, device B. This is to feed the wafer 10 onto the conveyor belt 12 in order to convey it in the direction of the apparatus B.

また、この第3図実施例装置に於て全ての搬送
ベルト11,12,13,17及び18を逆回転
することにより装置B及びCから搬出されるウエ
ハ10を装置B及びCの二基の装置の合計処理能
力と等しい処理能力を有する装置Aに対する安定
な供給を確保できるから、このような場合にも本
発明装置は利用することができる。この場合はベ
ルト12及び17は言うまでもなく同一方向の回
転を与えねばならない。そして、装置B及びCか
ら搬出されるウエハ10が合流部(前述の例では
分岐部)でぶつかり合わないようにセンサ27及
び29で検出される信号によりウエハ10の搬送
をベルト13及び18の回転により制御すれば良
い。
In addition, in the apparatus according to the embodiment shown in FIG. The device of the present invention can be used in such cases as well, since stable supply can be ensured for the device A, which has a processing capacity equal to the total processing capacity of the devices. In this case, it goes without saying that belts 12 and 17 must be rotated in the same direction. The conveyance of the wafers 10 is controlled by the rotation of the belts 13 and 18 based on the signals detected by the sensors 27 and 29 so that the wafers 10 carried out from the apparatuses B and C do not collide with each other at the merging part (the branching part in the above example). It can be controlled by

次に第4図及び第5図を用いて本発明の第二の
実施例装置を説明する。この第2の実施例装置は
前段の装置Aと後段の装置Bは時間当りの処理能
力はバランスしているが装置Aがバツチ処理をす
る装置で、装置Bがウエハ一枚毎に処理する装置
である様な場合に装置Aから搬出されるウエハ1
0が装置Bに過乗投入されないように時間調整を
必要とする場合に好適な例である。この実施例の
装置に採用されるインライン・バスケツト21及
び22は第2図で詳細に図示されているように、
ウエハ10を一旦収納(搬入)して、搬出するた
め通過形のバスケツトとなつている。このバスケ
ツト21及び22は25枚のウエハ10を整列して
収納し得るように多数の溝36を有し、さらにこ
のバスケツトにウエハを収納したまま運搬できる
ようにシヤツタ37と、このシヤツタ37をはめ
込む溝38を有している。このバスケツト21及
び22はその下部に設けられた図示しないエレベ
ーシヨン機構により前段に設置された装置Aから
搬出されるウエハ10を溝36毎に一枚づつ収納
するように一段毎に(溝36毎に)上方又は下方
に移動しうるように設置されている。
Next, a second embodiment of the present invention will be described with reference to FIGS. 4 and 5. In this second embodiment of the apparatus, the processing capacity per unit time of the former apparatus A and the latter apparatus B is balanced, but apparatus A is a device that performs batch processing, and apparatus B is an apparatus that processes wafers one by one. Wafer 1 carried out from apparatus A in such a case
This is a suitable example when time adjustment is required so that 0 is not overloaded into device B. The in-line baskets 21 and 22 employed in the apparatus of this embodiment are shown in detail in FIG.
It is a pass-through type basket in which wafers 10 are temporarily stored (carried in) and then carried out. The baskets 21 and 22 have a large number of grooves 36 so that 25 wafers 10 can be arranged and stored therein, and a shutter 37 is fitted into the basket so that the wafers can be transported with the wafers stored in the baskets. It has a groove 38. The baskets 21 and 22 are arranged at the bottom of the baskets 21 and 22 by an elevator mechanism (not shown) so that each groove 36 receives one wafer 10 from the apparatus A installed in the previous stage. ) installed so that it can be moved upward or downward.

次に動作を第6図を加えて説明すると、第4図
で矢印によつて示されるように、ウエハ10がこ
の第2の実施例装置の前段に設置された装置Aか
ら搬送ベルト11の正回転により搬送されて来る
と、ウエハ到来検出用センサ25(以下単にセン
サと称す)がウエハ10の到来を検出し、バスケ
ツト21又は22のいずれか一方へ、このウエハ
10を収納するべく図示しないベルト回転制御装
置でベルトの回転とその方向を決定する。例えば
バスケツト22が空状態であるため、このバスケ
ツト22の最大収納量(例えば25枚)を収納する
ように前記搬送ベルト回転制御装置から信号が発
せられると、ベルト11,12及び13は正回転
となり、一方ベルト17は逆回転となり、ベルト
11上のウエハ10はベルト12及び13上を経
由してインラインバスケツト22へ次々と搬送さ
れ収納される。ところでこのバスケツト22にウ
エハ10を収納する際、搬送ベルト17を逆回転
させる訳は第1の実施例の説明の際記述したので
割愛する。この搬送ベルト12及び17の回転は
常に逆の関係でしかも同期して回転するため、二
つの駆動源例えばモータを2基設置してこれを同
期させて回転させても良くまた、第6図に示すよ
うに1基のモータ39と、プーリ40及びチエー
ン41の組合せで構成しても良い。なお第6図に
於ける矢印は回転方向を表わす。
Next, the operation will be explained with reference to FIG. 6. As shown by the arrow in FIG. When the wafer 10 is transported by rotation, the wafer arrival detection sensor 25 (hereinafter simply referred to as a sensor) detects the arrival of the wafer 10, and a belt (not shown) is moved to store the wafer 10 into either the basket 21 or 22. A rotation control device determines the rotation of the belt and its direction. For example, since the basket 22 is empty, when a signal is issued from the conveyor belt rotation control device to store the maximum amount (for example, 25 sheets) of this basket 22, the belts 11, 12, and 13 rotate in the normal direction. On the other hand, the belt 17 rotates in the opposite direction, and the wafers 10 on the belt 11 are successively conveyed to the in-line basket 22 via the belts 12 and 13 and stored therein. By the way, the reason why the conveyor belt 17 is rotated in the opposite direction when storing the wafers 10 in the basket 22 has been described in the description of the first embodiment, and will therefore be omitted. Since the rotations of the conveyor belts 12 and 17 are always reversed and synchronous, it is also possible to install two drive sources, for example, two motors, and rotate them synchronously. As shown, a combination of one motor 39, a pulley 40, and a chain 41 may be used. Note that the arrow in FIG. 6 indicates the direction of rotation.

さて、バスケツト22方向に順次搬送されるウ
エハ10は、このバスケツト22の進入口に設置
されたセンサ26によりその到来を検出され、ス
トツパーピン35を突出させると共に検出信号を
発してカウンタ装置により収納されるウエハ枚数
が管理される。バスケツト22にウエハが全て収
納されると、つまりセンサ26と接続されたカウ
ンタ装置が予定のカウント数になると、終了信号
がベルト回転制御装置に送出され、この制御装置
はベルト11,17及び18を正回転に、ベルト
12を逆回転になるように制御して、ウエハ10
をバスケツト21方向へ搬送されるようにセツト
させる。この時も分岐部のバスケツト22側のベ
ルト12は、勿論逆回転をすることに注目された
い。このようにウエハ10がセンサ25を通過し
て次々にバスケツト21に収納されている間、バ
スケツト22に収納されたウエハは、ベルト回転
制御装置の制御信号によりベルト14,15,1
6及び20を正回転に制御することによりバスケ
ツト22から一枚づつ搬出させることができる。
Now, the arrival of the wafers 10, which are sequentially transferred in the direction of the basket 22, is detected by the sensor 26 installed at the entrance of the basket 22, and the stopper pin 35 is protruded, a detection signal is emitted, and the wafers 10 are stored by the counter device. The number of wafers is managed. When all the wafers are stored in the basket 22, that is, when the counter device connected to the sensor 26 reaches a predetermined count, a termination signal is sent to the belt rotation control device, which controls the belts 11, 17, and 18. The belt 12 is controlled to rotate in the forward direction and the belt 12 to rotate in the reverse direction, and the wafer 10 is
is set so that it is conveyed in the direction of the basket 21. It should be noted that the belt 12 on the side of the basket 22 at the branching portion also rotates in the opposite direction at this time. In this way, while the wafers 10 pass through the sensor 25 and are stored in the basket 21 one after another, the wafers stored in the basket 22 are moved to the belts 14, 15, 1 by the control signal from the belt rotation control device.
By controlling the rotations 6 and 20 in the normal direction, the sheets can be taken out from the basket 22 one by one.

この搬出時にセンサ27がウエハ10の搬出を
検出し、ウエハの通過信号をエレベーシヨン制御
装置に送出することによりエレベーシヨン機構が
上方又は下方に一段づつ移送し、全てのウエハを
バスケツト22から搬出する。また前記センサ2
7からの通過信号によりその通過量をカウンタ装
置により計数して、バスケツト22内のウエハ残
量を把握できるようにすれば、全てのウエハをバ
スケツト22から搬出する途中で、バスケツト2
2に搬出した分だけのウエハ10を収納すること
もできる。これは短時間にウエハ10がベルト1
1上を数多く搬送されてくる場合、つまり一方の
バスケツトだけでは収納しきれない場合、バスケ
ツト21及び22に交互に振分けて収納すること
ができる事を意味する。
During this unloading, the sensor 27 detects the unloading of the wafer 10 and sends a wafer passage signal to the elevation control device, so that the elevator mechanism moves the wafers upward or downward one step at a time and unloads all the wafers from the basket 22. . Also, the sensor 2
If the number of wafers remaining in the basket 22 can be determined by counting the amount of wafers passed by using a counter device based on the passing signal from the wafer 7, the number of wafers in the basket 2
It is also possible to store as many wafers 10 as have been carried out. This means that wafer 10 is transferred to belt 1 in a short time.
This means that when a large number of items are transported on one basket, that is, when they cannot be stored in one basket alone, they can be stored alternately in baskets 21 and 22.

以上のように本発明装置は、半導体ウエハに各
種の処理を施す処理装置間を連絡する搬送ベルト
方式によるウエハ移送装置に於て、ウエハの搬送
路を2つに分岐するに際しウエハが分岐部で澱む
ことなくスムーズに搬送できるという第1の大き
な効果の他に、この搬送路の前段に設置される処
理装置と後段に設置される処理装置の単位時間当
りの処理能力のアンバランスあるいは、バツチ処
理(一括処理)と個別処理に伴う搬送量のむらを
補正することができる等、この種方式に採用して
際立つた効果を発揮するものである。
As described above, the apparatus of the present invention can be used in a wafer transfer apparatus using a transfer belt system that connects processing apparatuses that perform various processes on semiconductor wafers, when the wafer transfer path is divided into two. In addition to the first major effect of being able to transport smoothly without stagnation, there is also an imbalance in the processing capacity per unit time between the processing equipment installed at the front stage of this transport path and the processing equipment installed at the latter stage, or batch processing. When adopted in this type of system, it exhibits outstanding effects, such as being able to correct unevenness in conveyance amount due to (batch processing) and individual processing.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図及びは従来の搬送ベルト装置の時間
調整装置模式図、第2図は本発明装置に採用され
る通過形インラインバスケツトの斜視図、第3図
は本発明装置の第1の実施例平面概略図、第4図
は本発明装置の第2の実施例平面概略図、第5図
は第4図の一部拡大斜視図、第6図は本発明装置
の搬送ベルトを駆動する一例を示す図である。 10……ウエハ、11〜20……搬送ベルト、
21,22……インライン・バスケツト、23,
24……内側ガイド、25〜29……センサ、3
0〜33……外側ガイド、34,35……ストツ
パ、36……ウエハ収納溝、37……シヤツタ、
38……シヤツタはめ込み溝、39……モータ、
40……プーリ、41……チエーン。
FIG. 1 is a schematic diagram of a time adjustment device of a conventional conveyor belt device, FIG. 2 is a perspective view of a passing type in-line basket adopted in the device of the present invention, and FIG. 3 is a plan view of the first embodiment of the device of the present invention. 4 is a schematic plan view of a second embodiment of the device of the present invention, FIG. 5 is a partially enlarged perspective view of FIG. 4, and FIG. 6 is an example of driving the conveyor belt of the device of the present invention. It is a diagram. 10...Wafer, 11-20...Transport belt,
21, 22...inline basket, 23,
24...Inner guide, 25-29...Sensor, 3
0 to 33...outer guide, 34, 35...stopper, 36...wafer storage groove, 37...shutter,
38... Shutter fitting groove, 39... Motor,
40...Pulley, 41...Chain.

Claims (1)

【特許請求の範囲】[Claims] 1 ある種の処理が施された半導体ウエハを次の
処理を施すために搬送ベルトによつて移送するウ
エハ搬送装置に於て、前記ウエハを前記ベルト上
に載置して移送する複数の搬送ベルトと、この搬
送ベルトの両側に設置され前記搬送ベルト上に載
置されて移送される前記ウエハの搬送路壁を形成
するガイドと、前記複数の搬送ベルトに正又は逆
の回転を与える駆動装置とを含み、前記複数の搬
送ベルトは、第1、第2及び第3の搬送ベルトを
有し、これら3つの搬送ベルトでほぼY字状の分
岐搬送路を構成し、前記駆動装置は、前記第2及
び第3の搬送ベルトのいずれか一方を前記第1の
搬送ベルトの回転方向と同一方向に回転させ、他
方をこの方向と逆方向に回転させ且つ前記第2及
び第3の搬送ベルトは同期して回転させるベルト
回転制御装置を含む事を特徴とするウエハ搬送装
置。
1. In a wafer transport device that transports a semiconductor wafer that has been subjected to a certain type of processing using a transport belt to perform the next processing, a plurality of transport belts that transport the wafer by placing the wafer on the belt. a guide that is installed on both sides of the conveyor belt and forms a conveyance path wall for the wafer placed on the conveyor belt and transferred; and a drive device that rotates the plurality of conveyor belts in a forward or reverse direction. The plurality of conveyor belts include first, second, and third conveyor belts, and these three conveyor belts constitute a substantially Y-shaped branch conveyor path, and the drive device One of the second and third conveyor belts is rotated in the same direction as the rotation direction of the first conveyor belt, the other is rotated in the opposite direction, and the second and third conveyor belts are synchronized. A wafer transfer device comprising a belt rotation control device for rotating a wafer.
JP16767882A 1982-09-28 1982-09-28 Conveyor for wafer Granted JPS5957447A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16767882A JPS5957447A (en) 1982-09-28 1982-09-28 Conveyor for wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16767882A JPS5957447A (en) 1982-09-28 1982-09-28 Conveyor for wafer

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP22618286A Division JPS6290945A (en) 1986-09-26 1986-09-26 Conveying method for wafer

Publications (2)

Publication Number Publication Date
JPS5957447A JPS5957447A (en) 1984-04-03
JPS629220B2 true JPS629220B2 (en) 1987-02-27

Family

ID=15854188

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16767882A Granted JPS5957447A (en) 1982-09-28 1982-09-28 Conveyor for wafer

Country Status (1)

Country Link
JP (1) JPS5957447A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5019855B2 (en) * 2006-11-16 2012-09-05 ヤンマー株式会社 Article conveying device
CN109205284B (en) * 2018-10-29 2020-07-31 台州市广源文具有限公司 Material reversing transmission equipment for modern agricultural machinery

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52154370A (en) * 1976-06-18 1977-12-22 Hitachi Ltd Photo resist film treatment apparatus of semiconductor wafers
JPS5522832A (en) * 1978-08-03 1980-02-18 Matsushita Electric Ind Co Ltd Semiconconductor manufacturing apparatus and method of manufacturing semiconductor device by use of its apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52154370A (en) * 1976-06-18 1977-12-22 Hitachi Ltd Photo resist film treatment apparatus of semiconductor wafers
JPS5522832A (en) * 1978-08-03 1980-02-18 Matsushita Electric Ind Co Ltd Semiconconductor manufacturing apparatus and method of manufacturing semiconductor device by use of its apparatus

Also Published As

Publication number Publication date
JPS5957447A (en) 1984-04-03

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