JPS6285809A - Lighting device for pattern recognition - Google Patents

Lighting device for pattern recognition

Info

Publication number
JPS6285809A
JPS6285809A JP22718985A JP22718985A JPS6285809A JP S6285809 A JPS6285809 A JP S6285809A JP 22718985 A JP22718985 A JP 22718985A JP 22718985 A JP22718985 A JP 22718985A JP S6285809 A JPS6285809 A JP S6285809A
Authority
JP
Japan
Prior art keywords
light
field light
chip
visual field
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22718985A
Other languages
Japanese (ja)
Other versions
JPH0418246B2 (en
Inventor
Kazunori Morinaga
和慶 森永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP22718985A priority Critical patent/JPS6285809A/en
Publication of JPS6285809A publication Critical patent/JPS6285809A/en
Publication of JPH0418246B2 publication Critical patent/JPH0418246B2/ja
Granted legal-status Critical Current

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  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To obtain uniform brightness even from the surface of an object such as a chip which differ in uneven surface state by providing a light shield body for adjusting the ratio of a light visual field light component and a dark visual field light component on a diffuse transmission plate such as a ground glass plate. CONSTITUTION:Light emitted by a lamp 3 strikes on the ground glass plate 4 and is diffuse-transmitted. This light travels to the chip 15 and there is no light traveling from the position where a ring-shaped light shield film 13 is stuck to the chip, so that the dark visual field light 11 is reduced correspondingly. Further, the light visual field light 9 is reduced by a light semishield film 14. In this case, the external diameter of the light shield film 13 or the light transmissivity of the light semishield film 14 is varied to vary the component ratio of the light visual field light 9 and dark visual field light 11. Consequently, the brightness of an image of the chip 15 of different quality which is picked up by a camera device 6 is made uniform.

Description

【発明の詳細な説明】 [産業上の利用分野] この発明は、表面に凹凸パターンを有する、組み立て工
程中の半導体集積回路素子等の・対象物表面を、撮影の
ために照明するパターン認識照明装置に関する。
Detailed Description of the Invention [Industrial Field of Application] The present invention relates to pattern recognition illumination for illuminating the surface of an object such as a semiconductor integrated circuit device during an assembly process, which has an uneven pattern on the surface, for photographing. Regarding equipment.

[従来の技術] 第3図11従来から使用されているパターン認識照明装
置を示す縦断面図で1図において(1)は対象物である
半導体集積回路素子チップ、(2)はこのチップ(1)
の中心の垂線、(3)はこの垂線より15°傾けて配設
された光源用ランプ、(4)はチップ(1)とランプ(
3)間に配設された拡散透過板であるすりガラス板、(
5)は、このすりガラス板(4)を保持、固定しランプ
(3)を囲むランプハウス、(6)は垂線(2)に対し
ランプ(3)と対称に15″傾けて配設されたカメラ装
c、 (7)はチップ(1)に当てられ反射しカメラ装
置(6)に向かう反射光、(8)は主にこの反射光(7
)が通過する反射光域、(9)はチップ(1)の表面で
正反射された光が反射光(7)の成分となる明視野光、
(10)は主にこの明視野光(9)が通過する明視野光
域、(11)はチップ(1)の表面で乱反射された光の
一部が反射光(7)の成分となる暗視野光、(12)は
主にその暗視野光(11)が通過する暗視野光域である
[Prior Art] Fig. 3 is a vertical cross-sectional view showing a conventionally used pattern recognition illumination device. )
A perpendicular line at the center of
3) A ground glass plate, which is a diffuser-transmitting plate, placed between (
5) is a lamp house that holds and fixes this frosted glass plate (4) and surrounds the lamp (3), and (6) is a camera that is tilted 15 inches symmetrically with the lamp (3) with respect to the perpendicular line (2). (7) is the reflected light that is reflected by the chip (1) and heads toward the camera device (6), and (8) is mainly the reflected light (7).
) is the reflected light area that passes through, (9) is the bright field light where the light specularly reflected on the surface of the chip (1) becomes a component of the reflected light (7),
(10) is the bright field light region through which this bright field light (9) mainly passes, and (11) is the dark region where part of the light diffusely reflected on the surface of the chip (1) becomes a component of the reflected light (7). The field light (12) is the dark field light region through which the dark field light (11) mainly passes.

次にその動作について説明する。ランプ(3)から発せ
られた光はすりガラス板(4)に当たり拡散される。こ
の拡散された光の一部はチップ(1)の表面へ明視野光
(9)と暗視野光(11)として向かう。
Next, its operation will be explained. The light emitted from the lamp (3) hits the frosted glass plate (4) and is diffused. A part of this diffused light travels to the surface of the chip (1) as bright field light (9) and dark field light (11).

チップ(1)の表面は第4図で示すように微細な凹凸面
を有しているので、その平坦な部分に対しては明視野光
(9)の正反射された光が、傾斜のある部分に対しては
暗視野光(11)の乱反射された光がカメラ装置(6)
に向かう。これら2種類の光によってチップ(り表面の
明るさはカメラ装置(6)側から見た時均−になり、カ
メラ装置(6)には均一の明るさのチップ(1)の画像
が得られる。
As the surface of the chip (1) has a finely uneven surface as shown in Fig. 4, the specularly reflected light of the bright field light (9) is directed against the flat part. For the part, the diffusely reflected light of the dark field light (11) is reflected by the camera device (6).
Head to. With these two types of light, the brightness of the surface of the chip (as seen from the camera device (6)) becomes time-averaged, and the camera device (6) obtains an image of the chip (1) with uniform brightness. .

[発明が解決しようとする問題点コ 従来の装置は以上の様に構成されているので、明視野光
域(10)中の光量と暗視野光域中の光量との割合、即
ち明視野光・暗視野光成分比が一定であるため、表面の
凹凸状態の異なるチップ(1)に対してはカメラ装置f
! (6)に向かう反射光(7)の均一度が異なってく
る。即ち所定の凹凸面をもったチップに対し、均一の明
るさのチップ画像が得られても、それと異なった凹凸面
をもったチップ表面からは均一な明るさの画像が得られ
ず1例えばカメラ装置(6)からの画像信号を2値化処
理した場合、チップ画像の一部が欠ける等の問題点を有
していた。
[Problems to be Solved by the Invention] Since the conventional device is configured as described above, the ratio of the amount of light in the bright-field light region (10) to the amount of light in the dark-field light region, that is, the bright-field light・Since the dark field light component ratio is constant, the camera device f
! The degree of uniformity of the reflected light (7) toward (6) differs. In other words, even if a chip image with uniform brightness is obtained for a chip with a predetermined uneven surface, an image with uniform brightness cannot be obtained from a chip surface with a different uneven surface. When the image signal from the device (6) was subjected to binarization processing, there were problems such as part of the chip image being missing.

この発明は上記のような問題点を解消するためになされ
たもので1表面の凹凸状態の異なるチップ等の対象物の
表面からも均一な明るさを得ることができるパターン認
識用照明装置を得ることを目的とする。
This invention was made in order to solve the above-mentioned problems, and provides a pattern recognition illumination device that can obtain uniform brightness even from the surface of an object such as a chip whose surface has different unevenness. The purpose is to

[問題点を解決するための手段] この発明にかかるパターン認識用照明装置は、すりガラ
ス板等の拡散透過板上に明視野光成分と暗視野光成分と
の比を調整するための遮光体を設けたものである。
[Means for Solving the Problems] The illumination device for pattern recognition according to the present invention includes a light shielding body for adjusting the ratio of the bright field light component and the dark field light component on the diffuse transmission plate such as a frosted glass plate. It was established.

[作 用] この発明においては、拡散透過板上に設けた遮光膜、半
遮光膜等の遮光体により、例えば暗視野光の一部を遮光
、明視野光を減光するなどして。
[Function] In the present invention, a light shielding body such as a light shielding film or a semi-shading film provided on the diffuse transmission plate blocks, for example, a part of the dark field light and attenuates the bright field light.

対象物の表面状態が異なっても均一な反射光が得られる
よう調整される。
Adjustments are made so that uniform reflected light can be obtained even if the surface condition of the object is different.

[実施例] 以下この発明の実施例を図について説明する。[Example] Embodiments of the present invention will be described below with reference to the drawings.

第1図はこの発明の一実施例を示す縦断面図、第2図は
それの拡散透過板部を示す下面図である。
FIG. 1 is a longitudinal sectional view showing an embodiment of the present invention, and FIG. 2 is a bottom view showing a diffuser-transmitting plate portion thereof.

図において(2)〜(12)は従来装置と同様のもので
あり、(13)は、拡散透過板であるすりガラス板(4
)に貼り付けたリング状遮光膜、(14)はこのリング
状遮光膜(13)の内側のすりガラス板(4)に貼りつ
けた半遮光膜、(15)は、対象物である従来装置にお
いて均一な反射光を得たチップ(1)とは異なった凹凸
状態の表面をもつ品種の異なるチップである。
In the figure, (2) to (12) are similar to the conventional device, and (13) is a ground glass plate (4) which is a diffuse transmission plate.
), (14) is a semi-light-shielding film attached to the frosted glass plate (4) inside this ring-shaped light-shielding film (13), and (15) is the conventional device that is the object. This chip is of a different type and has a surface with a different unevenness from the chip (1) that obtained uniform reflected light.

次にその動作を説明する。ランプ(3)から発せられた
光はすりガラス板(4)に当たり拡散透過する。この光
がチップ(15)に向かうが、その内リング状遮光膜(
13)の貼布された個所からチップ(15)に向かう光
はなく、その分晴視野光(11)は減少する。又、半遮
光膜(14)によって明視野光(9)が減少する。この
ことはリング状遮光膜(13)の外径又は半遮光膜(1
4)の光透過度を変えることによって明視野光(9)と
暗視野光(11)の成分比が変わることを示している。
Next, its operation will be explained. The light emitted from the lamp (3) hits the frosted glass plate (4) and is diffusely transmitted. This light heads towards the chip (15), inside of which there is a ring-shaped light-shielding film (
There is no light directed toward the chip (15) from the location where the mask 13) is pasted, and the field light (11) decreases. Also, the bright field light (9) is reduced by the semi-shading film (14). This means that the outer diameter of the ring-shaped light-shielding film (13) or the semi-light-shielding film (1
It is shown that by changing the light transmittance of 4), the component ratio of bright field light (9) and dark field light (11) changes.

従ってカメラ装置(6)でとらえた品種の異なるチップ
(15)の画像を均一とし、カメラ装置(6)でとらえ
た品種の異なるチップ(15)の画像を均一の明るさと
することができる。
Therefore, images of chips (15) of different types captured by the camera device (6) can be made uniform, and images of chips (15) of different types captured by the camera device (6) can be made to have uniform brightness.

なお上記実施例ではすりガラス板(4)にリング状遮光
膜とそれの内側に半遮光膜を貼り付けたものを示したが
、被対象物の表面凹凸状態によっては、リング状遮光膜
とそれの外側に半遮光膜を貼り付けるようにしてもよい
In the above embodiment, a ring-shaped light-shielding film and a semi-light-shielding film were pasted on the frosted glass plate (4), but depending on the unevenness of the surface of the object, the ring-shaped light-shielding film and its A semi-light-shielding film may be pasted on the outside.

[発明の効果コ 以上のように、この発明によれば拡散透過板上に調整用
遮光体を設けるようにしたため、対象物の表面状態に応
じて明視野光と暗視野光との成分比を変えることにより
1品種の異なる対象物からも均一な明るさの反射光を得
ることが、単に遮光膜を貼付する等の極めて簡単かつ安
価な手段によって可能となるパターン認識用照明装置が
得られる効果がある。
[Effects of the Invention] As described above, according to the present invention, since the adjusting light shielding body is provided on the diffuse transmission plate, the component ratio of bright field light and dark field light can be adjusted depending on the surface condition of the object. By changing the lighting device for pattern recognition, it is possible to obtain reflected light of uniform brightness even from objects of different types by extremely simple and inexpensive means such as simply pasting a light-shielding film. There is.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明の一実施例を示す縦断面図、第2図は
それの拡散透過板部を示す下面図、第3図は従来のパタ
ーン認識用照明装置を示す縦断面図、第4図は対象物で
ある集積回路素子チップの表面凹凸状態を示す断面図で
ある。 図において(1)は集積回路素子チップ(対象物)、(
3)は光源用ランプ、(4)はすりガラス板(拡散透過
板)、(6)はカメラ装置、(7)は反射光、(8)は
反射光域、(9)は明視野光、 (10)は明視野光域
、(11)は暗視野光、(12)は暗視野光域、(13
)はリング状遮光膜(遮光体)、(14)は半遮光膜(
遮光体)、(15)はチップ(])とは異なる品種のチ
ップ(対象物)である。 図中同一符号は同−或は相当部分を示す。
FIG. 1 is a vertical cross-sectional view showing an embodiment of the present invention, FIG. 2 is a bottom view showing the diffuser-transmitting plate portion thereof, FIG. 3 is a vertical cross-sectional view showing a conventional illumination device for pattern recognition, and FIG. The figure is a cross-sectional view showing the unevenness of the surface of an integrated circuit element chip, which is a target object. In the figure, (1) is an integrated circuit element chip (object), (
3) is the light source lamp, (4) is the frosted glass plate (diffuse transmission plate), (6) is the camera device, (7) is the reflected light, (8) is the reflected light area, (9) is the bright field light, ( 10) is bright field light area, (11) is dark field light area, (12) is dark field light area, (13)
) is a ring-shaped light-shielding film (light-shielding body), (14) is a semi-light-shielding film (
Light shielding body) and (15) are chips (objects) of a different type from the chip (]). The same reference numerals in the drawings indicate the same or corresponding parts.

Claims (3)

【特許請求の範囲】[Claims] (1)表面に凹凸パターンの有する対象物の表面に光源
から拡散透過板を介した光を照射し、それからの反射波
をカメラ装置で撮影するようにしたパターン認識用照明
装置において、上記拡散透過板上に、上記対象物の表面
から反射され上記カメラ装置に向かう反射光中、正反射
される明視野光成分と乱反射される暗視野光成分との比
を調整する遮光体を設けたことを特徴とするパターン認
識用照明装置。
(1) In a pattern recognition illumination device that irradiates light from a light source through a diffuse transmission plate to the surface of an object having an uneven pattern on the surface, and photographs reflected waves from the light with a camera device, the above-mentioned diffuse transmission A light shield is provided on the plate to adjust the ratio of the bright field light component that is specularly reflected and the dark field light component that is diffusely reflected in the reflected light that is reflected from the surface of the object and directed toward the camera device. Characteristic lighting device for pattern recognition.
(2)上記遮光体は、上記拡散透過板の外周部の暗視野
光の一部を遮光する円形リング状透光膜と、その内側中
央部の明視野光を減光させる半遮光膜とからなるもので
ある特許請求の範囲第1項記載のパターン認識用照明装
置。
(2) The light shielding body includes a circular ring-shaped light-transmitting film that blocks part of the dark-field light on the outer periphery of the diffuser-transmitting plate, and a semi-light-shielding film that attenuates the bright-field light at the inner center of the ring-shaped light-transmitting film. An illumination device for pattern recognition according to claim 1.
(3)上記遮光体は、上記拡散透過板の外周部の暗視野
光の一部を遮光する円形リング状遮光部と、その外側の
暗視野光の残部を減光させる半遮光膜とからなるもので
ある特許請求の範囲第1項記載のパターン認識用照明装
置。
(3) The light shielding body consists of a circular ring-shaped light shielding part that blocks part of the dark field light on the outer periphery of the diffuser transmitting plate, and a semi-shading film outside of the circular ring shape shielding part that attenuates the remainder of the dark field light. An illumination device for pattern recognition according to claim 1.
JP22718985A 1985-10-11 1985-10-11 Lighting device for pattern recognition Granted JPS6285809A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22718985A JPS6285809A (en) 1985-10-11 1985-10-11 Lighting device for pattern recognition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22718985A JPS6285809A (en) 1985-10-11 1985-10-11 Lighting device for pattern recognition

Publications (2)

Publication Number Publication Date
JPS6285809A true JPS6285809A (en) 1987-04-20
JPH0418246B2 JPH0418246B2 (en) 1992-03-27

Family

ID=16856883

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22718985A Granted JPS6285809A (en) 1985-10-11 1985-10-11 Lighting device for pattern recognition

Country Status (1)

Country Link
JP (1) JPS6285809A (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5735703A (en) * 1980-08-13 1982-02-26 Fujitsu Ltd Film surface inspecting method
JPS5767844A (en) * 1980-10-15 1982-04-24 Nippon Kogaku Kk <Nikon> Surface inspecting device
JPS59149006U (en) * 1983-03-24 1984-10-05 株式会社東芝 detection device
JPS59200908A (en) * 1983-04-28 1984-11-14 Hitachi Ltd Method and apparatus for lighting wafer

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5735703A (en) * 1980-08-13 1982-02-26 Fujitsu Ltd Film surface inspecting method
JPS5767844A (en) * 1980-10-15 1982-04-24 Nippon Kogaku Kk <Nikon> Surface inspecting device
JPS59149006U (en) * 1983-03-24 1984-10-05 株式会社東芝 detection device
JPS59200908A (en) * 1983-04-28 1984-11-14 Hitachi Ltd Method and apparatus for lighting wafer

Also Published As

Publication number Publication date
JPH0418246B2 (en) 1992-03-27

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