JPS6283091A - Chlorine injection apparatus - Google Patents

Chlorine injection apparatus

Info

Publication number
JPS6283091A
JPS6283091A JP22264685A JP22264685A JPS6283091A JP S6283091 A JPS6283091 A JP S6283091A JP 22264685 A JP22264685 A JP 22264685A JP 22264685 A JP22264685 A JP 22264685A JP S6283091 A JPS6283091 A JP S6283091A
Authority
JP
Japan
Prior art keywords
chlorine
injection
chlorine gas
water
diluted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22264685A
Other languages
Japanese (ja)
Other versions
JPH0545319B2 (en
Inventor
Shioko Kurihara
潮子 栗原
Ryosuke Miura
良輔 三浦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP22264685A priority Critical patent/JPS6283091A/en
Publication of JPS6283091A publication Critical patent/JPS6283091A/en
Publication of JPH0545319B2 publication Critical patent/JPH0545319B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE:To keep a predetermined chlorine injection state, by mounting a chlorine gas change-over means, an operation means for calculating the injection ratio of chlorine gas and an operation means for calculating a corrected injection ratio. CONSTITUTION:Specimen water is sampled in the vicinity of the outlet of a mixing basin 2 by a specimen water pump 3 and guided to a residual chlorine meter 4. The signal Rc of the residual chlorine meter 4 is inputted to a first operation means 5 to calculate a chlorine injection ratio objective value. The change-over state signal of a chlorine gas change-over means 10 is inputted to a second operation means 13 and, on the basis of the state signal from the chlorine gas change-over means 10, it is automatically judged whether gaseous chlorine diluted by air is injected. When it is judged that the injection of gaseous chlorine diluted by air is performed, the chlorine injection ratio objective value outputted from the first operation means 5 is corrected. By this method, the control of chlorine injection is well performed.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は、塩素を酸化剤または消毒剤に用いる水処理プ
ラントの塩素注入制御装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a chlorine injection control device for a water treatment plant that uses chlorine as an oxidizing agent or disinfectant.

〔発明の技術的背景とその問題点〕[Technical background of the invention and its problems]

水処理プラントに君ける塩素注入割判は、原水の酸化や
消毒のほかに水処理プロセスである沈でん池やろ過性の
保護、塩素の過剰注入による処理水の品質の低下や薬品
費の浪費の防止な″どのために、水処理プラントに、ば
ける重要な運転操作である。
In addition to oxidizing and disinfecting raw water, chlorine injection at water treatment plants is important for protecting sedimentation tanks and filtration during the water treatment process, as well as reducing the quality of treated water and wasting chemical costs due to excessive chlorine injection. This is an important operation for water treatment plants to prevent water leakage.

第4図に従来法の実施例を示す。図示しない取水源から
1■水された原水は着水井ll:流入し、その後、他の
図示しない注入器からの凝集剤、によび中相剤とともに
塩素が注入され、混和池2で混合され、フロック形成池
8に至る1、混和池出口附近で検水ポンプ3によって検
出を取水し、その検水の残留塩素濃度を残留塩素計4で
測定する。この測定(t4号は第1のび算十段5に入力
され、PID制御力式によって塩素注入率を演算してい
た、従来の液体塩素に対する塩素注入制御では、液体塩
素を塩素気化器6によって純粋な塩素ガスにし、被処理
水に注入する場合に適用されるものであった。ところが
最近では、塩素を節約するために、液体塩素を液体塩素
タンク7に受は入れる場合に液体塩素タンク上部に必ず
生じる空気で希釈された塩素ガスを被処理水に注入する
ことがある。
FIG. 4 shows an example of the conventional method. The raw water taken from a water intake source (not shown) flows into the landing well (11), and then chlorine is injected together with a flocculant and a medium phase agent from other injectors (not shown), and mixed in the mixing pond (2). Water is detected by a water test pump 3 near the outlet of the mixing tank 1 leading to the floc formation pond 8, and the residual chlorine concentration of the test water is measured by a residual chlorine meter 4. In the conventional chlorine injection control for liquid chlorine, in which this measurement (t4 is input to the first multiplication stage 5 and the chlorine injection rate is calculated by a PID control force formula), the liquid chlorine is purified by the chlorine vaporizer 6. This was applied when the liquid chlorine gas was converted into chlorine gas and injected into the water to be treated.However, recently, in order to save chlorine, when receiving liquid chlorine into the liquid chlorine tank 7, a tank 7 is used to store liquid chlorine in the upper part of the liquid chlorine tank. Chlorine gas diluted with the air that is inevitably generated may be injected into the water to be treated.

従来は、このような塩素ガスは中和設備で処分されてい
た1、シかし、上述のように液体塩素タンク7に混入し
た空気で希釈された塩素ガスを塩素気化器6を経ずに被
処理水に直接注入する場合、塩素ガス濃度が純粋の塩素
ガス濃度に比べ低いため、混和池2の残留塩素一度力飄
舎、変し、制御不可能となる欠点があった。
Conventionally, such chlorine gas was disposed of in a neutralization facility1, but as mentioned above, the chlorine gas diluted with air mixed in the liquid chlorine tank 7 was disposed of without passing through the chlorine vaporizer 6. When injecting directly into the water to be treated, since the concentration of chlorine gas is lower than that of pure chlorine gas, the residual chlorine in the mixing pond 2 has the disadvantage that it becomes unstable and cannot be controlled.

〔発明の目的〕[Purpose of the invention]

本発明の目的は、純粋な液体塩素を気化して注入する場
合から、空気で希釈された気体塩素を注入する場合にき
りかえが行われても、この外乱に対応可能で、所定の塩
素注入状態を維持できる塩素注入装置を提供することに
ある、 〔発明の概要〕 本発明は、塩素ガスを所定の注入率にて被処理水内に注
入する水処理プラントの塩素注入装置に、随いて、液体
塩素を気化器にてガス化した純粋の塩素ガスと成体塩素
、タンク内にて空気により希釈された気体塩素とを被処
理水に対し通釈的に供給させる塩素ガス切換手段と、塩
素ガス注入点より下流に設けた残留塩素計の測定値と予
定の設定値との差を基にhす記純粋な塩素ガスの注入率
を求める第Iの演算手段と、前記塩素ガス切換手段によ
る切換状態を入力し空気で希釈された気体塩素供給側に
切換られている場合は第Iの演算手段にて求められた注
入率を基に予定の補正率にて修正した注入率を求める第
2の演算手段とを備えており、純粋な塩素dスがら空気
で希釈された気体塩素への切換時に、純粋な1索ガスの
注入率として求められた値を基に予定の補正率で修正を
加えた注入率を求め、これにより空気で希釈されたヌ(
体塩素を注入することによりa相性等に、はける残留塩
素一度の、曽、変を防止したものである。
The object of the present invention is to be able to cope with this disturbance even if the injection is changed from vaporized pure liquid chlorine to injection of gaseous chlorine diluted with air, and to maintain the prescribed chlorine injection rate. [Summary of the Invention] The present invention provides a chlorine injection device for a water treatment plant that injects chlorine gas into water to be treated at a predetermined injection rate. , a chlorine gas switching means for simultaneously supplying pure chlorine gas obtained by gasifying liquid chlorine in a vaporizer, adult chlorine, and gaseous chlorine diluted with air in a tank to the water to be treated; a calculation means for determining the injection rate of pure chlorine gas based on the difference between the measured value of a residual chlorine meter installed downstream of the gas injection point and the scheduled setting value; and the chlorine gas switching means. If the switching state is input and the switching is made to the gaseous chlorine supply side diluted with air, the second step calculates the injection rate corrected by the planned correction factor based on the injection rate obtained by the first calculating means. When switching from pure chlorine d gas to gaseous chlorine diluted with air, it is equipped with a calculation means that corrects it using a planned correction factor based on the value determined as the injection rate of pure 1-line gas. Determine the added injection rate and use this to calculate the amount of air diluted (
By injecting body chlorine, it is possible to prevent the residual chlorine from changing due to the A phase.

〔発明の実弛例〕[Example of actual invention]

以下、本発明を浄水場の前塩素注入制御に適用した一実
施例を第13に示す1゜ 第I図にeいて、図示しない取水源から取水された原水
は1着水井lを祷て混、FOO20流下する。
Hereinafter, an embodiment in which the present invention is applied to pre-chlorine injection control at a water treatment plant is shown in Fig. , FOO20 flows downstream.

この途中で塩素が注入器12にて注入され、他の図示し
ない注入器からの凝集剤ビよび中和剤とともに混和池2
で混合される1、混和池2を流出した被処理水はさらに
フロック形成池8へ流下する。混和池2の出口附近で検
水ポンプ3によって検水を取水し、残留塩素一度を測定
する残塩計4に専<、。
During this process, chlorine is injected with an injector 12, and is added to the mixing pond 2 along with a flocculant and a neutralizing agent from other injectors (not shown).
The water to be treated that flows out of the mixing basin 2 and the mixing basin 2 further flows down to the floc forming basin 8. Test water is taken by a water test pump 3 near the outlet of the mixing basin 2, and a residual salt meter 4 is used to measure residual chlorine.

残塩計4の信号rtcは第1の演算手段5に人力される
。第1の演算手段5は、残留塩素一度の制御11標設定
値SVを設定する設定器9を有し、下式の基づいて塩素
注入率のフィードバック修正置w S Y計算し、この
値から液体塩素を気化させた純粋な塩素ガスを注入する
場合の塩素注入率目標値S、f計4する、。
The signal rtc from the residual salt meter 4 is input manually to the first calculation means 5. The first calculation means 5 has a setting device 9 for setting the standard set value SV of the control 11 for residual chlorine, calculates the feedback correction position w S Y of the chlorine injection rate based on the following formula, and from this value When injecting pure chlorine gas obtained by vaporizing chlorine, the target value of chlorine injection rate S, f is 4 in total.

FiN=SV −几。   ・・ ・・・・・  tl
)ムS=に、(gN−gN’)+に、−EN  曲・聞
(2)ここでBNは今回の制御周期の入力偏差、EN’
は前回の制御周期の入力偏差、K、は比例ゲイン、K、
は積分ゲインである。
FiN=SV-几.・・・ ・・・・・・ tl
)MuS=, (gN-gN')+, -EN Song/listening (2) Here, BN is the input deviation of the current control cycle, EN'
is the input deviation of the previous control cycle, K is the proportional gain, K,
is the integral gain.

今回の制御周期の純粋な塩素ガスを注入する場合の塩素
注入率目標値S。を次式に基づいて計算する。
Chlorine injection rate target value S when injecting pure chlorine gas for the current control cycle. is calculated based on the following formula.

8 m =8 m −s + /ΔS ・・・・・・・
・・(3)ここでS、−1は前回の制御周期の純粋な塩
素ガスをε人する場合の塩素注入率目標値である。
8 m = 8 m −s + /ΔS ・・・・・・・・・
(3) Here, S, -1 is the target value of the chlorine injection rate when pure chlorine gas in the previous control cycle is injected by ε.

一方塩素は液体塩素タンク7から、塩素ガス切換手段l
Oを経て供席されるが、これが端子(a)側になってい
る場合には、塩素気化器6を経て純粋な塩素ガスとなり
、塩素ガス溜11へ専かれる。これに対し塩素ガス切換
子JilOが端子(b)になっている場合には、液体塩
素タンク内にて至気で希釈された気体塩素が直接塩素ガ
ス溜11へ尋人される。そしてこれらは塩素注入器I2
から被処理水へ注入される。塩素ガス切換手段lOの切
換状態信号は、第2の演算手段13へ入力される。
On the other hand, chlorine is supplied from the liquid chlorine tank 7 to the chlorine gas switching means l.
If this is on the terminal (a) side, it passes through the chlorine vaporizer 6 and becomes pure chlorine gas, which is then sent to the chlorine gas reservoir 11. On the other hand, when the chlorine gas switch JILO is set to terminal (b), gaseous chlorine diluted with air in the liquid chlorine tank is directly supplied to the chlorine gas reservoir 11. And these are chlorinator I2
is injected into the water to be treated. The switching state signal of the chlorine gas switching means lO is input to the second calculation means 13.

第2の演算手段13では、塩素ガス切換子1210から
の状態信号に基づいて、空気で希釈された気体塩素注入
をどこなっているか、または純粋な塩素ガス圧入をぶこ
なっているかどうかを自動的に判断する1、空気で希釈
された気体塩素注入7行っていると判断した場合には、
第1の演算手段5から出力された塩素注入率目標値Sユ
を次式によって修正する。。
The second calculation means 13 automatically determines whether gaseous chlorine diluted with air is being injected or whether pure chlorine gas is being injected, based on the status signal from the chlorine gas switch 1210. 1. If it is determined that gaseous chlorine diluted with air is injected 7.
The chlorine injection rate target value S outputted from the first calculation means 5 is corrected using the following equation. .

s、; =8. ・f(t)  = (4)ここでB、
lは修正後の塩素注入率目標値である。
s; =8.・f(t) = (4) Here, B,
l is the corrected chlorine injection rate target value.

f(t)は、希釈された気体塩素注入開始時を出発点と
した、時間の開戦からなる補正率である( f(t)≧
1)。fatnま1本実施例では。
f(t) is a correction factor consisting of the onset of time, starting from the start of diluted gaseous chlorine injection ( f(t) ≧
1). In this embodiment.

f(t)=に+入S和αt+B焦βt ・・・・・・・
・・(5)と第2の演算手段13にぶいて定義されてい
る。ここで、K、  A、B、α、βはプラント特有の
定数で、プラントの運転データを解析することによって
容易に決められる。
f(t) = + input S sum αt + B sum βt ・・・・・・・・・
...(5) and is defined for the second calculation means 13. Here, K, A, B, α, and β are constants unique to the plant, and can be easily determined by analyzing plant operation data.

上記第2の演算手段13によって、塩素注入率目標値B
BIを演算する過程を第2図に示す。
The second calculation means 13 calculates the chlorine injection rate target value B.
FIG. 2 shows the process of calculating BI.

な茗、第2の演算手段13には、プラント特有の定数に
、 A、 B、α、βを手動設定できる設定器14を有
し、オペレータの判断にもとづいてその値を修正するこ
とも可能である。
The second calculation means 13 has a setting device 14 that can manually set A, B, α, and β as plant-specific constants, and it is also possible to modify the values based on the operator's judgment. It is.

上述のごとく修正された塩素注入制御装置S、、′は、
塩素注入器12へ駆送され、被処理水の塩素注入が行わ
れる、 第3図に、時間t = 0にぶいて、純粋な液体塩素を
気化して注入する場合から、空気で希釈された気体塩素
を注入する場合に切りかえたときの、塩留塩素の変化?
示す。同U (a)の従来方法の場合では、空気で希釈
された気体塩素注入に切りかわると、混和池の残留塩素
濃度が低下し、しかも制御目標値へ!A達するまでに時
間がかかりすぎるため、制御不可能である。l これに対し、同図(b)の本発明による方法では、混和
池の残留塩素濃度が低下することはなく、良好に塩素注
入制御が、ぢこなわれている。
The chlorine injection control device S,,′ modified as described above is
The water to be treated is transported to the chlorine injector 12, and chlorine is injected into the water to be treated. In FIG. What is the change in salt distilled chlorine when switching to injecting chlorine?
show. In the case of the conventional method in U (a), when the injection is switched to gaseous chlorine diluted with air, the residual chlorine concentration in the mixing pond decreases and even reaches the control target value! Since it takes too long to reach A, it is impossible to control. On the other hand, in the method according to the present invention shown in FIG. 6(b), the residual chlorine concentration in the mixing pond does not decrease, and chlorine injection control is performed well.

〔発明の効果〕〔Effect of the invention〕

以上説明した本発明の塩素注入装置で塩:A注入を行え
ば、従来法では対応でさなかった。空気で希釈された気
体塩素注入時の塩素自動注入が可能となり、衛生的で安
定した良實の飲料水の供給ができる1、
If salt: A is injected using the chlorine injection device of the present invention as described above, conventional methods could not handle it. It becomes possible to automatically inject chlorine when gaseous chlorine diluted with air is injected, making it possible to supply hygienic, stable, and quality drinking water1.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本元明による塩素注入制御装置の一実施例を示
すブロック図、第2図は本発明の一実施例に、耐ける制
御表置の計算の流れを示すフローチャート、第3図は塩
素ガス切換時の変化状態を従来と比較して示す図、第4
図は従来装置を示す図である。 4・・・残留塩素計  5・・・第lの演算手段7・・
・塩素気化器  8・・・液体塩素タンク[0・・・塩
素ガス切換手段  11・・・塩素ガス溜12・・・塩
素注入器  13・・・第2の演算手段代理人 弁理士
  則 近 悪 佑 同  三俣弘文 第2図 1  2   肋間(h) (本4ビ日月1−よろ方ンf、) 第3図
Fig. 1 is a block diagram showing an embodiment of a chlorine injection control device according to Akira Motomoto, Fig. 2 is a flowchart showing the flow of calculation of a control table that can withstand an embodiment of the present invention, and Fig. 3 is a Figure 4 shows the change state when switching chlorine gas compared to the conventional one.
The figure shows a conventional device. 4... Residual chlorine meter 5... First calculation means 7...
・Chlorine vaporizer 8...Liquid chlorine tank [0...Chlorine gas switching means 11...Chlorine gas reservoir 12...Chlorine injector 13...Second calculation means agent Patent attorney Rules Near Evil Yudo Hirofumi Mitsumata Figure 2 1 2 Intercostals (h) (Hon 4 bis day 1 - Yorofon f,) Figure 3

Claims (1)

【特許請求の範囲】 塩素ガスを所定の注入率にて被処理水内に注入する水処
理プラントの塩素注入装置において、液体塩素を気化器
にてガス化した純粋の塩素ガスと液体塩素タンク内にて
空気により希釈された気体塩素とを被処理水に対し選択
的に供給させる塩素ガス切換手段と、 塩素ガス注入点より下流に設けた残留塩素計の測定値と
予定の設定値との差を基に前記純粋な塩素ガスの注入率
を求める第1の演算手段と、前記塩素ガス切換手段によ
る切換状態を入力し空気で希釈された気体塩素供給側に
切換られている場合は第1の演算手段にて求められた注
入率を基に予定の補正率にて修正した注入率を求める第
2の演算手段と、 を備えた塩素注入装置。
[Claims] In a chlorine injection device for a water treatment plant that injects chlorine gas into water to be treated at a predetermined injection rate, pure chlorine gas obtained by gasifying liquid chlorine in a vaporizer and a liquid chlorine tank are provided. chlorine gas switching means that selectively supplies gaseous chlorine diluted with air to the water to be treated, and the difference between the measured value of the residual chlorine meter installed downstream of the chlorine gas injection point and the planned setting value. a first calculating means for calculating the injection rate of the pure chlorine gas based on the input rate of the pure chlorine gas; A chlorine injection device comprising: second calculation means for determining an injection rate corrected by a predetermined correction factor based on the injection rate determined by the calculation means.
JP22264685A 1985-10-08 1985-10-08 Chlorine injection apparatus Granted JPS6283091A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22264685A JPS6283091A (en) 1985-10-08 1985-10-08 Chlorine injection apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22264685A JPS6283091A (en) 1985-10-08 1985-10-08 Chlorine injection apparatus

Publications (2)

Publication Number Publication Date
JPS6283091A true JPS6283091A (en) 1987-04-16
JPH0545319B2 JPH0545319B2 (en) 1993-07-08

Family

ID=16785710

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22264685A Granted JPS6283091A (en) 1985-10-08 1985-10-08 Chlorine injection apparatus

Country Status (1)

Country Link
JP (1) JPS6283091A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100376488C (en) * 2004-03-05 2008-03-26 刘宪武 Liquid chlorine directly charging system and apparatus
US10537353B2 (en) 2013-03-14 2020-01-21 Saphena Medical, Inc. Unitary endoscopic vessel harvesting devices
WO2020145001A1 (en) * 2019-01-11 2020-07-16 株式会社日立産機システム Crane and hoist

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100376488C (en) * 2004-03-05 2008-03-26 刘宪武 Liquid chlorine directly charging system and apparatus
US10537353B2 (en) 2013-03-14 2020-01-21 Saphena Medical, Inc. Unitary endoscopic vessel harvesting devices
WO2020145001A1 (en) * 2019-01-11 2020-07-16 株式会社日立産機システム Crane and hoist

Also Published As

Publication number Publication date
JPH0545319B2 (en) 1993-07-08

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