JPS6277473A - Photo-cvd device - Google Patents

Abstract

PURPOSE:To prevent the formation of films on the surface of glazed window by segmenting a vacuum chamber to an inert gas introducing chamber and film forming chamber by a partition part juxtaposed with plural glass sheets spaced from each other to a plane shape and allowing an inert gas to flow out of the inert gas introducing chamber into the film forming chamber. CONSTITUTION:The vacuum chamber 11 is segmented to the inert gas introducing chamber 27 and the film forming chamber 29 by the partition section 25. The partition part 25 juxtaposed with plural sheets of the rectangular quartz glass plates 41 to the plane shape so as to form spaces 43 is installed as said partition part. The inside of the chamber 11 is vacuum evacuated by a vacuum evacuating means 35 and a gaseous material is introduced by a supply means 37 into the film forming chamber 29. while a substrate 17 attached to a holder 31 is heated by a heater 33, light is irradiated from a mercury lamp 15 to the gaseous material through the glazed window 13 and the glass plates 41 to form the film on the surface of the substrate 17. He is introduced into the chamber 27 from a supply means 39 and is filled into the chamber 27; thereafter, the He is admitted through the spaces 43 into the chamber 29. The formation of the film on the surface of the glazed window 13 and the glass plates 41 is thus prevented.

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention decomposes a material gas by light irradiation, deposits the decomposition products and reaction products on the substrate surface,
The present invention relates to a photo-CVD apparatus for forming a thin film on the surface of a substrate, and the present invention is used, for example, when forming a semiconductor silicon film, an insulating film, or a metal wiring film.

[Conventional technology]

Generally, C is a method of forming a thin film on a substrate from a gaseous material.
It is called VD (Chemical Vapor Deposition) method, but this CVD method has traditionally been plasma CVD.
method, thermal CVD method, etc. have been used. By the way, in recent years
With the increasing density of electronic devices, light sources such as low-pressure mercury lamps and lasers are being used because of the advantages of not being damaged by charged particle impact (ion damage), as well as the selectivity of the reaction process and the low temperature of the processing process. The photo-CVD method, in which a gaseous material is irradiated with light to excite the material's molecules to cause decomposition and reaction, has attracted a lot of interest and is making rapid progress.

In this optical CVD method, as shown in the schematic configuration of the apparatus in FIG. A material gas is introduced, and the material gas is irradiated with light from outside the vacuum chamber 11 through the glass window 13 using a mercury lamp 15 . Then, a film of solid product is formed on the substrate 17 by utilizing the photoexcitation reaction that occurs at this time.

By the way, in the photoexcitation reaction process, not only the surface of the substrate 17 but also the material gas comes into contact with it. A similar film is also formed on the inner surface of the glass 3t13.

When a film is formed on the surface of the glass window 13, the mercury lamp 1
The amount of light transmitted from the vacuum chamber 11 decreases, and as a result, the energy for excitation that should be given to the material gas in the vacuum chamber 11 decreases. Therefore, in order to prevent film formation on the inner surface of the glass window 13, conventionally, as shown in FIG. Its outlet 19
Helium gas or the like was blown onto the inner surface of the glass window 13 to prevent the material gas from approaching the surface of the glass window 13.

[Problem that the invention seeks to solve]

However, it is difficult to completely prevent the material gas from approaching the surface of the glass window 15 using the conventional method described above, especially when the area of the glass window 15 is large. As a result, the glass window 13 as described above
There were problems in that film formation still occurred and the light energy that should be applied to the material gas decreased over time.

The present invention has been made to solve one or more problems.

(Means for Solving the Problems) The present invention divides the internal space of a vacuum chamber into two rooms between a glass window forming a part of the wall surface of the vacuum chamber and a substrate holder disposed within the vacuum chamber. One was used as an inert gas introduction chamber, and the other was used as a film formation chamber.
A plurality of glass plates are arranged in parallel in a plane with gaps in the partition, and the inert gas introduction chamber and the film forming chamber are communicated through the gaps. The above-mentioned problems were solved by configuring the optical CvD apparatus as described above in which a gas supply means was connected to supply an inert gas.

[For production]

In the optical CVD apparatus according to the present invention, the inside of the vacuum chamber is divided into an inert gas introduction chamber and a film forming chamber, and the glass window portion forms a part of the wall surface of the inert gas introduction chamber. During the film formation process, if inert gas is constantly supplied to the inert gas introduction chamber, the inert gas will fill the inert gas introduction chamber and flow between the glass plates arranged in parallel in the partition. It flows into the film forming chamber side. For this reason.

The material gas supplied into the film forming chamber does not flow into the inert gas introduction chamber, and the material gas is prevented from coming into contact with the surface of the glass window, causing the film to form on the inner surface of the glass window. formation is completely prevented.

〔Example〕

Hereinafter, preferred embodiments of the present invention will be described with reference to FIGS. 1 and 2.

FIG. 1 shows one embodiment of the present invention, and is a front sectional view schematically showing the configuration of an optical CVD apparatus. In the figure, 11 is a vacuum chamber, and a glass window 13 made of quartz glass is provided on a part of the wall surface of the vacuum chamber. In the figure, 21 is a sealing member. A mercury lamp (light source) 15 is disposed on the outside of the glass window 13 facing the outer surface thereof, and a reflection plate 23 is disposed behind the mercury lamp 15. The interior space of the vacuum chamber 11 is divided by a partition 25 into two chambers: an inert gas introduction chamber 27 on the glass window 13 side and a film forming chamber 29 . A substrate holder 31 for mounting the substrate 17 is disposed within the film forming chamber 29, and a heater 33 is attached to this substrate holder 31. Further, a vacuum evacuation means 35 for evacuating the inside of the vacuum chamber 11 is connected to the film forming chamber 29 . Then, the material gas is supplied into the film forming chamber 29 from the material gas supply means 37. On the other hand, an inert gas supply means 39 is provided in the inert gas introduction chamber 27.
The passages communicate with each other, and helium gas is supplied.

As shown in FIG. 2, the partition 25 between the inert gas introduction chamber 27 and the film forming chamber 29 is provided with a plurality of rectangular quartz glass plates 41 with gaps 43 between each glass plate 41 to form a flat surface. In the figure, 45 is a spacer, 47 is a holding frame that sandwiches the glass plates 41 from both sides, and 49 is a through bolt for tightening the pair of holding frames 47, 47. An optical CV D@ configured as 6 or more is
At any time, the vacuum chamber 1 is removed by the evacuation means 35.
1 is evacuated, and the film forming chamber 2 is supplied from the material gas supply means 37.
A material gas is introduced into 9. Then, while the substrate 17 attached to the substrate holder 31 is heated by the heater 33, the glass window 13 and the glass plate 41 are heated by the mercury lamp 15.
The material gas in the film forming chamber 29 is irradiated with light through the film forming chamber 29 to cause a photoexcitation reaction and form a film on the surface of the substrate 17. Through this film forming process, when helium gas is supplied into the inert gas introduction chamber 27 from the inert gas supply means 39, the inside of the inert gas introduction chamber 27 is filled with helium gas, and further helium gas is introduced into the inert gas introduction chamber 27. From chamber 27 to film forming chamber 29
It flows through the gap 43 towards . For this reason, the film forming chamber 2
9 is prevented from flowing into the inert gas introduction chamber 27 side, the inner surface of the glass window 13 is not exposed to the material gas, and film formation on the surface of the glass window 13 does not occur. No, and since helium gas blows out from the gap 43 between the glass plates 41 toward the film forming chamber 29,
Film formation on the surface of the glass plate 41 also hardly occurs.

〔effect〕

Since the present invention has the configuration and operates as described above, the photo-CVD apparatus according to the present invention completely prevents film formation on the glass window and reduces the amount of material gas The light energy provided for excitation is reduced.

Situations like this can be avoided. In addition, film formation on the quartz glass plates used for partitions rarely occurs, and even if solid products are attached to some parts, or even if some of the quartz glass plates for some reason are Even if it is damaged, only one or several of the quartz glass plates need to be replaced, which is advantageous in terms of cost.

[Brief explanation of drawings]

1 and 2 show one embodiment of the present invention, FIG. 1 is a front sectional view schematically showing the configuration of a photo-CVD apparatus, and FIG. 2 shows an inert gas introduction chamber and a film forming chamber. FIG. 3 is a plan view of a partition from a chamber, and FIG. 3 is a schematic diagram showing a schematic configuration of a conventional device. 11...Vacuum chamber, 13...Glass window, 1
5... Mercury lamp (light source), 17... Board, 25... Partition part, 27
...Inert gas introduction chamber, 29... Film forming chamber. 31...Substrate holder, 35...Evacuation means, 37...Material gas supply means, 39...Inert gas supply means, 41...Glass plate, 43...Gap. Figure 1 Figure 2 Figure 3

Claims (1)

[Claims] A vacuum chamber having a glass window formed in a part of the wall surface, a light source disposed opposite to the outer surface of the glass window, a substrate holder disposed within the vacuum chamber, and a substrate holder connected to the vacuum chamber. In the optical CVD apparatus, the optical CVD apparatus includes a vacuum evacuation means and a material gas supply means for supplying a material gas into the vacuum chamber, wherein the glass window forms a part of a wall surface by partitioning an internal space of the vacuum chamber. The inert gas introduction chamber is divided into an inert gas introduction chamber and a film forming chamber in which the substrate holder is disposed, and a plurality of glass plates are arranged in parallel in a plane with gaps in the partition part. and the film forming chamber are communicated through the gap, and an inert gas supply means is connected to the inert gas introducing chamber.
VD device.