JPS6275070U - - Google Patents

Info

Publication number
JPS6275070U
JPS6275070U JP16860985U JP16860985U JPS6275070U JP S6275070 U JPS6275070 U JP S6275070U JP 16860985 U JP16860985 U JP 16860985U JP 16860985 U JP16860985 U JP 16860985U JP S6275070 U JPS6275070 U JP S6275070U
Authority
JP
Japan
Prior art keywords
opening
shroud
molecular beam
beam epitaxy
epitaxy apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16860985U
Other languages
Japanese (ja)
Other versions
JPH057250Y2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP16860985U priority Critical patent/JPH057250Y2/ja
Publication of JPS6275070U publication Critical patent/JPS6275070U/ja
Application granted granted Critical
Publication of JPH057250Y2 publication Critical patent/JPH057250Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの考案の一実施例による分子線エピ
タキシ装置を示す断面図、第2図はこの考案の他
の実施例を示すストツパの斜視図、第3図は従来
の分子線エピタキシ装置を示す断面図である。 1……ルツボ、2……ヒーター線、3……支持
棒、4……シヤツタ、5a,5b……シユラウド
、6a,6b……ストツパ、7……ストツパ、7
a……鍔部。なお、図中、同一符号は同一または
相当部分を示す。
Fig. 1 is a sectional view showing a molecular beam epitaxy apparatus according to one embodiment of this invention, Fig. 2 is a perspective view of a stopper showing another embodiment of this invention, and Fig. 3 is a conventional molecular beam epitaxy apparatus. FIG. 1... Crucible, 2... Heater wire, 3... Support rod, 4... Shutter, 5a, 5b... Shroud, 6a, 6b... Stopper, 7... Stopper, 7
a... Tsuba. In addition, in the figures, the same reference numerals indicate the same or corresponding parts.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 冷却シユラウドの開口部内に蒸着源ルツボを配
設し、該シユラウド開口部周辺に突起状のストツ
パを設けたことを特徴とする分子線エピタキシ装
置。
A molecular beam epitaxy apparatus characterized in that a deposition source crucible is disposed within an opening of a cooling shroud, and a protruding stopper is provided around the shroud opening.
JP16860985U 1985-10-30 1985-10-30 Expired - Lifetime JPH057250Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16860985U JPH057250Y2 (en) 1985-10-30 1985-10-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16860985U JPH057250Y2 (en) 1985-10-30 1985-10-30

Publications (2)

Publication Number Publication Date
JPS6275070U true JPS6275070U (en) 1987-05-14
JPH057250Y2 JPH057250Y2 (en) 1993-02-24

Family

ID=31101643

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16860985U Expired - Lifetime JPH057250Y2 (en) 1985-10-30 1985-10-30

Country Status (1)

Country Link
JP (1) JPH057250Y2 (en)

Also Published As

Publication number Publication date
JPH057250Y2 (en) 1993-02-24

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