JPS6270347A - 4,4'-bis(3-aminophenoxy)biphenyl - Google Patents
4,4'-bis(3-aminophenoxy)biphenylInfo
- Publication number
- JPS6270347A JPS6270347A JP21026685A JP21026685A JPS6270347A JP S6270347 A JPS6270347 A JP S6270347A JP 21026685 A JP21026685 A JP 21026685A JP 21026685 A JP21026685 A JP 21026685A JP S6270347 A JPS6270347 A JP S6270347A
- Authority
- JP
- Japan
- Prior art keywords
- biphenyl
- bis
- reaction
- aminophenoxy
- polyimide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、新規な芳香族エーテルジアミンであ7+4.
4’−ビス(3−アミノフェノキシ)ビフェニルに関す
る。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention is a novel aromatic ether diamine.
It relates to 4'-bis(3-aminophenoxy)biphenyl.
(従来技術)
従来、テトラカルボン酸二無水物とジアミンの反応によ
り得られるポリイミドは種々の優れた物性、特に耐熱性
が良好なことが知られ、今後更に耐熱性が要求される分
野に広く利用されることが期待されている。(Prior art) Polyimide obtained by the reaction of tetracarboxylic dianhydride and diamine has been known to have various excellent physical properties, especially good heat resistance, and will be widely used in fields where even higher heat resistance is required in the future. It is expected that
しかしながら、従来公知のポリイミド樹脂は。However, conventionally known polyimide resins.
優れた耐熱性を有するものは加工性に乏しく、また加工
性の向上を目的として開発されたものは逆に耐熱性、耐
溶剤性に劣る等1種々の問題点を有している。例えば式
(2)
で表わされる基本骨格からなるポリイミド樹脂(Dup
ont社製、商品名Kapton、 Vespel )
は明確なガラス転移温度を有しておらず、耐熱性は優れ
ているものの加工性に劣り、成形材料として用いる場合
、焼結成形等の手法を用いなければ加工できない。また
、近年、その耐熱性および絶縁性のために、ポリイミド
樹脂が電気電子部品の基材として用いられているが1式
(2)で表わされるポリイミド樹脂は吸水性が高く、電
気電子部品の材料として用いる際重要な因子となる寸法
安定性、絶縁性、ハンダ耐熱性に悪影響を及ぼすという
欠点を有している。また、式(3)
で表わされる基本骨格を有するポリエーテルイミド系樹
脂(GE社製、商品名U L T E M )は加工性
に優れているものの、ガラス転移湯度が217℃と低く
、耐熱性に劣り、しかもメチレンクロライド等のハロゲ
ン化炭化水素系の溶媒に可溶であるという欠点を有して
いる。Those with excellent heat resistance have poor processability, and those developed for the purpose of improving processability have various problems such as poor heat resistance and solvent resistance. For example, polyimide resin (Dup
(manufactured by ont, product name Kapton, Vespel)
does not have a clear glass transition temperature, and although it has excellent heat resistance, it has poor processability, and when used as a molding material, it cannot be processed without using methods such as sintering. In addition, in recent years, polyimide resins have been used as base materials for electrical and electronic components due to their heat resistance and insulating properties. It has the disadvantage that it has a negative effect on dimensional stability, insulation properties, and soldering heat resistance, which are important factors when used as a material. In addition, polyetherimide resin (manufactured by GE, trade name: ULTEM) having a basic skeleton represented by formula (3) has excellent processability, but has a low glass transition temperature of 217°C. It has the disadvantage of poor heat resistance and is soluble in halogenated hydrocarbon solvents such as methylene chloride.
(発明が解決しようとする問題点)
本発明の課題は、ポリイミド樹脂が本来有する優れた耐
熱性に加え、優れた加工性および耐熱接着性を有し、吸
水率が低く、透明性が良好な多目的用途に使用可能なポ
リイミド樹脂の原料となる新規な化合物、すなわち、芳
香族エーテルジアミンを提供することである。(Problems to be Solved by the Invention) An object of the present invention is to create a polyimide resin that has excellent processability and heat-resistant adhesion, low water absorption, and good transparency in addition to the excellent heat resistance that polyimide resin inherently has. The object of the present invention is to provide a novel compound, namely, aromatic ether diamine, which can be used as a raw material for polyimide resin that can be used for multiple purposes.
(問題点を解決するための手段)
本発明者らは、上記のような課題達成のため種種のジア
ミンを合成し、それらを原料としポリイミド樹脂を製造
し、その性能の評価を行ってきた。(Means for Solving the Problems) In order to achieve the above-mentioned problems, the present inventors have synthesized various diamines, manufactured polyimide resins using them as raw materials, and evaluated the performance thereof.
その結果、前記式(1)で表わされる4 、 4’−ビ
ス(3−アミノフェノキシ)ビフェニルを初めて製造し
。As a result, 4,4'-bis(3-aminophenoxy)biphenyl represented by the formula (1) was produced for the first time.
この化合物がテトラカルボン酸二無水物との重合体にお
いて優れた耐熱性、加工性、透明性および低吸水性を有
し、この新規な芳香族エーテルジアミンが耐熱性樹脂原
料として好ましいものであることを見出した。This compound has excellent heat resistance, processability, transparency, and low water absorption in a polymer with tetracarboxylic dianhydride, and this new aromatic ether diamine is preferable as a raw material for heat-resistant resin. I found out.
即ち1本発明は、新規な芳香族エーテルジアミ7である
4、4’−ビス(3−アミノフェノキシ)ビフェニルで
ある。That is, one aspect of the present invention is 4,4'-bis(3-aminophenoxy)biphenyl, which is a novel aromatic ether diamide 7.
従来、芳香族ニトロ化合物において、〇−又はp−位の
電子吸引性基により活性化されている化合物のニトロ基
をフェノール類で置換する反応に関しては多数の例が知
られている。しかしながら、m−ジニトロベンゼンのよ
うに活性化されてぃないニトロ基の反応に関しては、大
環状ポリエーテルの存在下、極性有機溶媒中1m−ジニ
トロベンゼンとアルカリ金属のフェノキシトとを反応さ
せて3−ニトロジフェニルエーテルを製造する方法が知
られているにすぎない(特開昭54−39030)。Conventionally, in aromatic nitro compounds, many examples are known regarding the reaction of substituting a nitro group of a compound activated by an electron-withdrawing group at the 0- or p-position with a phenol. However, for the reaction of unactivated nitro groups such as m-dinitrobenzene, 1m-dinitrobenzene and an alkali metal phenoxide are reacted in a polar organic solvent in the presence of a macrocyclic polyether. - Only a method for producing nitrodiphenyl ether is known (JP-A-54-39030).
まして、2個の水酸基を有する4、4・−ジヒドロキシ
ビフェニルと2分子のm−ジニトロベンゼンとを縮合さ
せることによって、4.4・−ビス(3−アミノフェノ
キシ)ビフェニルのような芳香族エーテルジアミンを製
造しようとする方法は知れておらず、勿論化合物自体も
従来全(知られていない。Moreover, by condensing 4,4-dihydroxybiphenyl having two hydroxyl groups with two molecules of m-dinitrobenzene, aromatic ether diamines such as 4,4-bis(3-aminophenoxy)biphenyl can be produced. There is no known method for producing it, and of course the compound itself is not known at all.
本発明者らは、耐熱性樹脂の合成検討の中で。The present inventors investigated the synthesis of heat-resistant resin.
4.4I−ジヒドロキシビフェニルとm−ジニトロベン
ゼンとを塩基の存在下、非プロトン性極性溶媒中で反応
させると4.4′−ビス(3−ニトロフェノキシ)ビフ
ェニルが好収率で製造でき、更にこれを還元することに
より4.4′−ビス(3−アミノフェノキシ)ビフェニ
ルを合成することに成功した。ついで、この化合物を原
料どして重合体を製造し、この重合体が極めて優れた性
能を有することを確認した。すなわち、この化合物が、
高度の有用性を有するものであることを確認し1本発明
の課題を達成することができた。When 4.4I-dihydroxybiphenyl and m-dinitrobenzene are reacted in an aprotic polar solvent in the presence of a base, 4.4'-bis(3-nitrophenoxy)biphenyl can be produced in good yield; By reducing this, 4,4'-bis(3-aminophenoxy)biphenyl was successfully synthesized. Next, a polymer was produced using this compound as a raw material, and it was confirmed that this polymer had extremely excellent performance. That is, this compound is
It was confirmed that the present invention has a high degree of usefulness, and the object of the present invention was achieved.
本発明の化合物の製造に用いられる原料は、4゜4′−
ジヒドロキシビフェニルおよびm−ジニトロベンゼンで
あり、その使用量は特に限定的なものではないが、通常
1m−ジニトロベンゼンが4゜4′−ジヒドロキシビフ
ェニルに対して1.5〜3倍モルである。The raw materials used in the production of the compounds of the present invention are 4°4'-
They are dihydroxybiphenyl and m-dinitrobenzene, and the amount used is not particularly limited, but usually the molar amount of 1m-dinitrobenzene is 1.5 to 3 times that of 4°4'-dihydroxybiphenyl.
4.4’−ジヒドロキシビフェニルとm−ジニ]・ロベ
ンゼンとの縮合反応は塩基の存在下、非プロトン性極性
溶媒中で縮合を実施する。The condensation reaction between 4.4'-dihydroxybiphenyl and m-dini].lobenzene is carried out in an aprotic polar solvent in the presence of a base.
この縮合反応により4.4′−ビス(3−ニトロフェノ
キシ)ビフェニルが得られ、ついでこれを還元して4,
4′−ビス(3−アミノフェノキシ)ビフェニルが得ら
れる。This condensation reaction yields 4,4'-bis(3-nitrophenoxy)biphenyl, which is then reduced to 4,
4'-bis(3-aminophenoxy)biphenyl is obtained.
縮合反応では塩基を使用する。例えばアルカリ金属の酸
化物、水酸化物、炭酸塩、炭酸水素塩、水素化物および
アルコキシド類が使用されるが1通−6=
常、炭酸カリウム、炭酸ナトリウム、炭酸水素カリウム
、炭酸水素ナトリウムなどが多使用される。A base is used in the condensation reaction. For example, alkali metal oxides, hydroxides, carbonates, hydrogen carbonates, hydrides, and alkoxides are used, but potassium carbonate, sodium carbonate, potassium hydrogen carbonate, sodium hydrogen carbonate, etc. are usually used. Used a lot.
塩基の量は通常、原料の4.4−−ジヒドロキシビフェ
ニルに対して1〜5倍モル、好ましくは1.5〜3倍モ
ルである。The amount of the base is usually 1 to 5 times the mole, preferably 1.5 to 3 times the mole of 4,4-dihydroxybiphenyl as the raw material.
この反応の際に4級アンモニウノ・塩、4級リン塩、ク
ラウンエーテルのような大環状ポリエーテル、クリプテ
ートのような含窒素大環状ポリエーテル、含窒素鎖状ポ
リエーテル、ポリエチレングリコール及びそのアルキル
エーテルのような相間移動触媒、銅粉および銅塩などを
反応促進剤として加えてもよい。During this reaction, quaternary ammonium salts, quaternary phosphorus salts, macrocyclic polyethers such as crown ether, nitrogen-containing macrocyclic polyethers such as cryptate, nitrogen-containing chain polyethers, polyethylene glycols and their alkyl ethers A phase transfer catalyst such as, copper powder, copper salt, etc. may be added as a reaction accelerator.
反応溶媒としては、非プロトン性極性溶媒が使用される
。例えばN、N−ジメチルホルムアミド。As the reaction solvent, an aprotic polar solvent is used. For example N,N-dimethylformamide.
N、N−ジメチルア士ドアミド、ジメチルスルホキシド
、1−メチル−2−ピロリジノンまたは1゜3−ジメチ
ル−2−イミダゾリジノンのよ5 ナモのが使用される
。これらの溶媒は通常、原料に対して1〜10重量倍で
使用される。N,N-dimethylamide, dimethylsulfoxide, 1-methyl-2-pyrrolidinone or 1.3-dimethyl-2-imidazolidinone are used. These solvents are usually used in an amount of 1 to 10 times the weight of the raw materials.
反応の手順は、通常1m−ジニトロベンゼンを含むすべ
ての原料を最初から装入して、そのまま反応させる方法
で実施される。The reaction procedure is usually carried out by charging all the raw materials containing 1m-dinitrobenzene from the beginning and allowing the reaction to proceed as they are.
反応温度は、100〜240℃、好ましくは120〜1
80℃の範囲であり1反応時間は5〜30時間の範囲で
ある。反応終了後、溶媒を留去した後、あるいは反応液
をそのまま水中に排出すると目的物の粗製品が得られる
。この粗製品は再結晶などにより精製することができる
が1通常は。The reaction temperature is 100-240°C, preferably 120-1
The temperature is in the range of 80°C and the time for one reaction is in the range of 5 to 30 hours. After the reaction is complete, the desired crude product can be obtained by distilling off the solvent or by directly discharging the reaction solution into water. This crude product can be purified by recrystallization etc., but usually.
そのまま還元反応を行なう。還元反応は特に制限はなく
1通常二1・口塞をアミノ基に還元する方法(例えば、
新実験化学講座、15巻、酸化と還元〔■〕、丸善(1
977))を適用できるが、工業的には接触還元または
ヒドラジン還元が好ましい。Continue the reduction reaction. There are no particular restrictions on the reduction reaction, and 1. Usually, 2.1.
New Experimental Chemistry Course, Volume 15, Oxidation and Reduction [■], Maruzen (1
977)) can be applied, but catalytic reduction or hydrazine reduction is preferred industrially.
接触還元の例をあげれば、ニッケル、パラジウム。Examples of catalytic reduction are nickel and palladium.
白金等の金属触媒や担持触媒またはニッケルや銅などの
ラネー触媒等の還元触媒を原料の4 、4’ −ビス(
3−ニトロフェノキシ)ビフェニルに対して、金属とし
て0.01〜10重量%、したがって、金属の状態で使
用する場合は2〜8重量%、担体に担持させた場合では
0.1〜5重量%の範囲で用いて還元反応を行なう。4,4'-bis(
Based on 3-nitrophenoxy)biphenyl, 0.01 to 10% by weight as metal, therefore 2 to 8% by weight when used in the metal state, and 0.1 to 5% by weight when supported on a carrier. The reduction reaction is carried out using a range of .
還元反応に使用する溶媒としては1反応に不活性なメタ
ノール、エタノール、イングロビルアルコール、メチル
セロソルブのようなものが使用できる。As the solvent used in the reduction reaction, inert solvents such as methanol, ethanol, inglobil alcohol, and methyl cellosolve can be used.
反応温度は、特に限定はない。一般的には20〜200
℃の範囲、特に20〜ioO’cが好ましい。また1反
応圧力は、通常、常圧〜50kg/d−6程度である。The reaction temperature is not particularly limited. Generally 20-200
A range of 0.degree. C., particularly 20 to ioO'c, is preferred. Moreover, one reaction pressure is usually about normal pressure to 50 kg/d-6.
一方、ヒドラジン還元の例をあげれば、ヒドラジンを1
通常、理論量の1.2〜2倍箭用いて還元反応を実施す
る。On the other hand, to give an example of hydrazine reduction, hydrazine is reduced to 1
Usually, the reduction reaction is carried out using 1.2 to 2 times the theoretical amount.
触媒としては、一般に接触還元に用いられている金属触
媒を使用することができる。とくにパラジウム/カーボ
ン、白金/カーボンまたは塩化第2鉄を活性炭に吸着さ
せた触媒が好ましい。その使用量は通常、原料の4.4
′−ビス(3−ニトロフェノキシ)ビフェニルに対して
、金属として0.01〜30重量%の範囲である。As the catalyst, metal catalysts commonly used for catalytic reduction can be used. Particularly preferred are catalysts in which palladium/carbon, platinum/carbon or ferric chloride is adsorbed on activated carbon. The amount used is usually 4.4 of the raw material.
The metal content is in the range of 0.01 to 30% by weight based on '-bis(3-nitrophenoxy)biphenyl.
反応溶媒としては、接触還元の場合と同様の溶媒を用い
ることができる。反応温度は特に限定はなく、一般的に
は20〜150℃の範囲、特に40〜100℃が好まし
い。As the reaction solvent, the same solvent as in the case of catalytic reduction can be used. The reaction temperature is not particularly limited, and is generally in the range of 20 to 150°C, particularly preferably 40 to 100°C.
反応終了後、反応液を熱沖過して触媒を除去した後、必
要に応じて溶媒を留去すると目的とする4゜4′−ビス
(3−アミノンエノキシ)ビフェニルの粗製品が得られ
る。この粗製品は再結晶または塩酸塩として単離するこ
とにより精製することができる。After the reaction is completed, the reaction solution is heated to remove the catalyst, and if necessary, the solvent is distilled off to obtain the desired crude product of 4゜4'-bis(3-aminoneenoxy)biphenyl. . This crude product can be purified by recrystallization or isolation as a hydrochloride salt.
以上の方法により本発明の新規の芳香族エーテルジアミ
ンを得ることができる。The novel aromatic ether diamine of the present invention can be obtained by the above method.
本発明の芳香族エーテルジアミンは一種以上のテトラカ
ルボン酸二無水物と重合させてポリアミド酸、更にこれ
を環化脱水してポリイミドを得ることができる。The aromatic ether diamine of the present invention can be polymerized with one or more tetracarboxylic dianhydrides to obtain a polyamic acid, and this can be further cyclized and dehydrated to obtain a polyimide.
得られる重合体は、極めて優れた加工性および耐熱接着
性を有するものである。The resulting polymer has extremely excellent processability and heat-resistant adhesive properties.
このような性能は1本発明の化合物とはジアミンの置換
位置の異なる4、4”(4−アミノフェノキシ)ビフェ
ニルとビロメリント酸二無水物とから成る重合体が明確
なガラス転移温度を持たず、はとんど接着力も示さない
のにくらべると、顕著な効果の差異を有するものである
。Such performance is due to the fact that the polymer consisting of 4,4'' (4-aminophenoxy)biphenyl and biromelinate dianhydride, which has a different diamine substitution position from that of the compound of the present invention, does not have a clear glass transition temperature; It has a remarkable difference in effectiveness compared to the case where it exhibits no adhesive strength at all.
4.4′−ビス(4−アミノフェノキシ)ビフェニルで
はベンゾフェノンテトラカルボン酸二無水物との重合体
であっても同様に明確なガラス転移温度を持たず、接着
力に乏しく、加工性に劣る。Similarly, 4'-bis(4-aminophenoxy)biphenyl does not have a clear glass transition temperature even if it is a polymer with benzophenone tetracarboxylic dianhydride, has poor adhesive strength, and is poor in processability.
本発明の化合物を原料として、前記式(2)の繰り返し
単位を有する重合体で、特にポリイミドは従来のポリイ
ミド特有の耐熱性を有していながら。A polymer having the repeating unit of the formula (2) using the compound of the present invention as a raw material, particularly polyimide, has heat resistance peculiar to conventional polyimide.
熱可塑性であるため、加工性および耐熱接着性に優れて
おり、その中のあるものは高耐熱性で溶融成形可能なポ
リイミド樹脂である。更に、低吸水性であり、前記の優
れた加工性とを考えあわせると、宇宙・航空機用基材、
電気電子部品用基材、更には耐熱性接着剤としての広く
その有用性が発揮される。Because they are thermoplastic, they have excellent processability and heat-resistant adhesive properties, and some of them are polyimide resins that have high heat resistance and can be melt-molded. Furthermore, it has low water absorption, and when considered with the above-mentioned excellent processability, it can be used as a base material for space and aircraft.
Its usefulness is demonstrated widely as a base material for electrical and electronic parts, and furthermore as a heat-resistant adhesive.
(作用および効果)
本発明の新規な芳香族エーテルジアミンである4、4′
−ビス(3−アミノフェノキシ)ビフェニルは、4.4
’−ジヒドロキシビフェニルとm−ジニトロベンゼンと
の縮合、還元反応により工業的に容易に製造できる。ま
た、この化合物をテトラカルボン酸二無水物と重合させ
ると、新規な重合体が得られ、この重合体は、優れた耐
熱性、加工性、透明性、低吸水性および接着能を有して
いる。(Actions and Effects) 4,4' which is a novel aromatic ether diamine of the present invention
-bis(3-aminophenoxy)biphenyl is 4.4
It can be easily produced industrially by condensation and reduction reaction of '-dihydroxybiphenyl and m-dinitrobenzene. Additionally, when this compound is polymerized with tetracarboxylic dianhydride, a new polymer is obtained, which has excellent heat resistance, processability, transparency, low water absorption, and adhesive ability. There is.
すなわち1本発明の化合物は今後更に耐熱性が要求され
る分野の樹脂原料として広く利用されうるものである。That is, the compound of the present invention can be widely used as a resin raw material in fields where further heat resistance is required in the future.
(実施例) 以下1本発明の方法を実施例で更に具体的に説明する。(Example) Hereinafter, the method of the present invention will be explained in more detail with reference to Examples.
実施例1
3t!ガラス製反応容器に4.4′−ジヒドロキシビフ
ェニル186f(1,0モル)、m−ジニトロベンゼン
438g(2,6モル)、炭酸カリウム363gおよび
N、N−ジメチルホルムアミド2000m1を装入し1
45〜150℃で16時間反応する。反応終了後、冷却
、濾過してKNO2を除去し1次にP液の溶剤を減圧蒸
留により留去したのち65℃に冷却しメタノール200
0−を装入し1時間攪拌する。結晶をp別、水洗、メタ
ノール洗浄、乾燥して4,4′−ビス(3−ニトロフェ
ノキシ)ビフェニルの茶褐色結晶を得た。収量426f
(収率99.5%)
ついで、II!ガラス製反応容器に粗4.4’−ヒス(
3−ニトロフェノキシ)ビフェニル100f(0,23
モル)、活性炭10f、塩化第2鉄・6℃でヒドラジン
水和物469(0,92モル)を3時間かけて滴下する
。滴下終了後、70〜80℃で5時間攪拌すると、反応
は終了した。冷却後。Example 1 3t! A glass reaction vessel was charged with 186 f (1.0 mol) of 4,4'-dihydroxybiphenyl, 438 g (2.6 mol) of m-dinitrobenzene, 363 g of potassium carbonate, and 2000 ml of N,N-dimethylformamide.
React at 45-150°C for 16 hours. After the reaction was completed, the KNO2 was removed by cooling and filtration, and the solvent of the P solution was distilled off under reduced pressure.
0- and stirred for 1 hour. The crystals were separated, washed with water, washed with methanol, and dried to obtain brown crystals of 4,4'-bis(3-nitrophenoxy)biphenyl. Yield 426f
(Yield 99.5%) Then, II! Crude 4.4'-His (
3-nitrophenoxy)biphenyl 100f(0,23
469 (0.92 mol) of hydrazine hydrate was added dropwise over 3 hours at 6° C. and 10 f of activated carbon. After the dropwise addition was completed, the reaction was completed by stirring at 70 to 80°C for 5 hours. After cooling.
濾過して触媒を除去し、これを水500−に排出し、結
晶を濾過する。これに35%塩酸48gと(3−アミノ
フェノキシ)ビフェニルの塩酸塩が析出した。これを濾
過後、50%IPA/水54〇−を加えて加熱溶解し、
活性炭5fを加えて濾過後、アンモニア水により中和し
、結晶を涙過、水洗、乾燥して4.4′−ビス(3−ア
ミノフェノキシ)ビフェニルを得た。収量72.0g(
収率85%)無色結晶 mp、144〜b
純度 99.6%(高速液体クロマトグラフィーによる
)CHN
元素分析 計算値(%)*)78.26 5.43
7.61分析値(%) 78.56 5.21
7.66* ) C24I(20N202として
MS:368(M”)、340,184IR(KBr、
cm−”): 3400と3310 (NH2基)、
1240(エーテル結合)
実施例2
11のガラス製密閉容器に実施例1で得られた粗4.4
’−ヒス(3−ニトロフェノキシ)ビフェニル100g
(0,23モル)を5%pd/c(日本エンゲルハルト
社製)1g、メチルセロソルブ350−とともに装入し
た。60〜65℃で激しく攪拌しながら水素を導入する
と8時間でそれ以上吸収しなくなり、反応が完了した。Filter to remove the catalyst, drain it into 500ml of water and filter the crystals. 48 g of 35% hydrochloric acid and (3-aminophenoxy)biphenyl hydrochloride were precipitated. After filtering this, 50% IPA/water 540- was added and dissolved by heating.
After adding 5 f of activated carbon and filtering, the mixture was neutralized with aqueous ammonia, and the crystals were filtered, washed with water, and dried to obtain 4,4'-bis(3-aminophenoxy)biphenyl. Yield 72.0g (
Yield 85%) Colorless crystals mp, 144-b Purity 99.6% (by high performance liquid chromatography) CHN Elemental analysis Calculated value (%) *) 78.26 5.43
7.61 Analysis value (%) 78.56 5.21
7.66*) C24I (MS as 20N202: 368 (M”), 340,184IR (KBr,
cm-”): 3400 and 3310 (NH2 group),
1240 (ether bond) Example 2 The crude 4.4 obtained in Example 1 was placed in a sealed glass container of 11.
'-His(3-nitrophenoxy)biphenyl 100g
(0.23 mol) was charged together with 1 g of 5% PD/C (manufactured by Nippon Engelhard) and methyl cellosolve 350-. Hydrogen was introduced at 60-65° C. with vigorous stirring, and no further absorption occurred in 8 hours, completing the reaction.
実施例1と同様の方法で後処理および精製を行ない、4
.4’−ビス(3−アミノフェノギシ)ビフェニルを得
た。収!70.3g(収率83%)無色結晶 mp、
144〜146℃純度 99.3%(高速液体クロ
マトグラフィーによる)参考例−1
かきまぜ機、還流冷却器および窒素導入管を備えた容器
に、4.4’−ビス(3−アミ!フエノギシ)ビフェニ
ル36.8f(0,1モル)と、N、N−ジメチルアセ
トアミド175.8gを装入し、室温で窒素雰囲気下に
、ピロメリット酸二無水物21.89 (0,1モル)
を溶液温度のI−昇に注意しながら分割して加え室温で
約20時間かきまぜた。Post-treatment and purification were carried out in the same manner as in Example 1, and 4
.. 4'-bis(3-aminophenogysi)biphenyl was obtained. Revenue! 70.3g (yield 83%) colorless crystals mp,
144-146°C Purity 99.3% (by high performance liquid chromatography) Reference example-1 4.4'-bis(3-ami!phenogisi)biphenyl was placed in a container equipped with a stirrer, a reflux condenser, and a nitrogen introduction tube. 36.8f (0.1 mol) and 175.8 g of N,N-dimethylacetamide were charged, and 21.89 (0.1 mol) of pyromellitic dianhydride was added at room temperature under a nitrogen atmosphere.
was added in portions, paying attention to the rise in solution temperature, and the mixture was stirred at room temperature for about 20 hours.
かくして得られたポリアミド酸の対数粘度は2.47r
tt、 / 9であった。このポリアミド酸溶液の一部
を取り、ガラス板上にキャストした後、100℃、20
0℃、300℃で各々1時間加熱して淡黄色透明、フィ
ルム厚35 /Iのポリイミドフィルムを得た。このポ
リイミドフィル!、の引張強さは14.8kg / w
d、引張り伸び率は70%であった。(測定方法は、と
もにAS TM 1)−882に拠る。以ト“同様。)
またこのポリイミドフィルムのガラス転移温度は27
1℃(TMA針人法で測定。以下間(子。)、空気中で
の5%重重量減湯温は545℃(、DTA−TGで測定
。以F同様。)であった。さらにこのポリイミドフィル
ムを130℃に予備加熱した冷間圧延鋼板(J T S
G3141.5pcc/Sl)。The logarithmic viscosity of the polyamic acid thus obtained was 2.47r.
tt, /9. A portion of this polyamic acid solution was taken and cast onto a glass plate, and then heated at 100°C and 20°C.
The mixture was heated at 0° C. and 300° C. for 1 hour each to obtain a pale yellow transparent polyimide film with a film thickness of 35/I. This polyimide fill! The tensile strength of , is 14.8kg/w
d. The tensile elongation rate was 70%. (Both measurement methods are based on ASTM 1)-882. (Same as above.)
In addition, the glass transition temperature of this polyimide film is 27
1℃ (Measured by TMA needleman method.Hereafter, the temperature of 5% weight loss in air was 545℃ (Measured by DTA-TG.The same applies hereafter.) A cold-rolled steel plate (JTS) with a polyimide film preheated to 130°C
G3141.5pcc/Sl).
25X100XI、6趨。以下同様。)間に挿入し、3
40’C,20kg/ciで5分間加圧圧着させた。こ
のものの室温での引張せん断接着強さは310kg/c
Jであり、これをさらに240℃の高温下で測定したと
ころ205 kg / dであった。(測定方法はJ
I S −K 6848および6850に拠る1つ以ド
同様。)またこのフィルムを23.5℃下において24
時間水に浸漬した際の吸水率は0.52%であった。(
測定方法ばASTM I)−570−63に拠る。)
また−1−記ボリアミド酸溶液をトリクロロエチレン
洗浄した冷間圧延鋼板上に塗布し、100℃で1時間。25X100XI, 6 directions. Same below. ), insert between 3
Pressure bonding was carried out at 40'C and 20 kg/ci for 5 minutes. The tensile shear adhesive strength of this product at room temperature is 310 kg/c
J, and when this was further measured at a high temperature of 240°C, it was 205 kg/d. (Measurement method is J
One or more according to IS-K 6848 and 6850. ) Also, this film was heated at 23.5℃ for 24 hours.
The water absorption rate when immersed in water for an hour was 0.52%. (
The measurement method is based on ASTM I)-570-63. )
Further, the polyamic acid solution described in -1- was applied onto a cold rolled steel plate that had been washed with trichlorethylene, and the solution was heated at 100°C for 1 hour.
220℃で1時間加熱乾燥した後、冷間圧延鋼板を重ね
て300℃で20 kg/cdに5分間加圧圧着した。After heating and drying at 220°C for 1 hour, cold rolled steel plates were stacked and pressed at 300°C for 5 minutes at 20 kg/cd.
このものの引張せん断接着強さは室温で280kg/c
jであった。The tensile shear adhesive strength of this product is 280 kg/c at room temperature.
It was j.
さらに上記ポリアミド酸溶液を電解銅箔上にキャストし
た後、100℃、200℃、350℃で各々1時間加熱
してフレキシブル銅張回路基板を得た3、コーテイング
膜の膜厚は約35μであった。この銅張回路基板の銅箔
引き剥し強さは90°ビ一ル強度試験で2.8 ka
/ c+Iであった。また300℃で180秒はんだ浴
に浸漬しても膨れなどは全く生じなかった。Furthermore, the above polyamic acid solution was cast onto an electrolytic copper foil and heated at 100°C, 200°C, and 350°C for 1 hour each to obtain a flexible copper-clad circuit board.3 The thickness of the coating film was approximately 35μ. Ta. The copper foil peeling strength of this copper-clad circuit board is 2.8 ka in a 90° building strength test.
/c+I. Further, even when immersed in a solder bath at 300° C. for 180 seconds, no blistering occurred.
また上記ポリアミド酸溶液150yに、 N、N−ジメ
チルアセトアミド337.59を加え、かきまぜながら
窒素雰囲気下に、70℃まで加熱した後26.1g(0
,26モル)の無水酢酸および9.05f(0,09モ
ル)のトリエチルアミンを滴下したところ1滴下終了後
約10分間で黄色のポリイミド粉が析出しはじめるが、
さらに加熱下で2時間かきまぜた後熱ろ過してポリイミ
ド粉を得た。このポリイミド粉をメタノールで洗浄した
後150℃で5時間減圧乾燥して34..59C収率9
8%)のポリイミド粉を得た。このポリイミド粉のX線
分析を行なったところ21%の結晶化度を有していた。Further, 337.59 y of N,N-dimethylacetamide was added to 150 y of the above polyamic acid solution, and after heating to 70°C under a nitrogen atmosphere while stirring, 26.1 g (0.
, 26 mol) of acetic anhydride and 9.05f (0.09 mol) of triethylamine were added dropwise, and yellow polyimide powder began to precipitate approximately 10 minutes after the completion of one drop.
After further stirring under heating for 2 hours, the mixture was filtered under heat to obtain polyimide powder. 34. This polyimide powder was washed with methanol and then dried under reduced pressure at 150°C for 5 hours. .. 59C yield 9
8%) polyimide powder was obtained. X-ray analysis of this polyimide powder revealed that it had a degree of crystallinity of 21%.
またこのポリイミド粉の赤外吸収スペクトル図を第1図
に示す。このスペクトル図では、イミドの特性吸収帯で
ある1780G−’イq近と1720♂1付近、および
エーテル結合の特性吸収帯である12401’付近の吸
収が顕著に認められた。Furthermore, an infrared absorption spectrum diagram of this polyimide powder is shown in FIG. In this spectrum diagram, absorption near 1780G-'Iq and 1720♂1, which are the characteristic absorption bands of imide, and absorption near 12401', which is the characteristic absorption band of ether bonds, were clearly observed.
またこのポリイミド粉のガラス転移温度は260℃、融
点は367℃であった。(1) S c法眞より測定)
またこのポリイミド粉を400℃、300 kg/CI
l+2で30分間圧縮成形して得た圧縮成形物のノツチ
付アイゾツト強度は18kg・Cm / CHlであっ
た。(測定方法はASTM D−256に拠る。)The polyimide powder had a glass transition temperature of 260°C and a melting point of 367°C. (1) Measured from S c Hoshin)
In addition, this polyimide powder was heated at 400℃ and 300 kg/CI.
The notched Izo strength of the compression molded product obtained by compression molding at l+2 for 30 minutes was 18 kg·Cm/CHl. (The measurement method is based on ASTM D-256.)
第1図は参考例−1で得られたポリイミド粉の赤外吸収
スペクトル図である。FIG. 1 is an infrared absorption spectrum diagram of the polyimide powder obtained in Reference Example-1.
Claims (1)
ビフェニル[Claims] 1) 4,4'-bis(3-aminophenoxy) represented by formula (1) ▲There are mathematical formulas, chemical formulas, tables, etc.▼(1)
biphenyl
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60210266A JPH0637444B2 (en) | 1985-09-25 | 1985-09-25 | 4,4'-bis (3-aminophenoxy) biphenyl |
DE3650142T DE3650142T2 (en) | 1985-02-22 | 1986-02-20 | Bis (3-aminophenoxy) aromatics and process for their preparation. |
EP86301210A EP0192480B1 (en) | 1985-02-22 | 1986-02-20 | Bis(3-aminophenoxy) aromatics and method of preparing the same |
AU53785/86A AU566103B2 (en) | 1985-02-22 | 1986-02-20 | Bis(3-aminophenoxy) aromatics and method of preparing the same |
KR1019860001263A KR870001062B1 (en) | 1985-02-22 | 1986-02-21 | Process for the preparation of bis(3-aminophenoxy) derivatives |
CA000502460A CA1256451A (en) | 1985-02-22 | 1986-02-21 | Bis(3-aminophenoxy) aromatics and method of preparing the same |
US06/831,547 US5077436A (en) | 1985-02-22 | 1986-02-21 | Bis(3-aminophenoxy) aromatics and method of preparing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60210266A JPH0637444B2 (en) | 1985-09-25 | 1985-09-25 | 4,4'-bis (3-aminophenoxy) biphenyl |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6270347A true JPS6270347A (en) | 1987-03-31 |
JPH0637444B2 JPH0637444B2 (en) | 1994-05-18 |
Family
ID=16586541
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60210266A Expired - Lifetime JPH0637444B2 (en) | 1985-02-22 | 1985-09-25 | 4,4'-bis (3-aminophenoxy) biphenyl |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0637444B2 (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4477648A (en) * | 1983-04-07 | 1984-10-16 | Trw Inc. | High-temperature polyimides prepared from 2,2-bis-[(2-halo-4-aminophenoxy)-phenyl]hexafluoropropane |
-
1985
- 1985-09-25 JP JP60210266A patent/JPH0637444B2/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4477648A (en) * | 1983-04-07 | 1984-10-16 | Trw Inc. | High-temperature polyimides prepared from 2,2-bis-[(2-halo-4-aminophenoxy)-phenyl]hexafluoropropane |
Also Published As
Publication number | Publication date |
---|---|
JPH0637444B2 (en) | 1994-05-18 |
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