JPS626681Y2 - - Google Patents

Description

[Detailed Description of the Invention] This invention relates to a wafer sample processing boat that arranges and holds wafer samples when semiconductor wafer samples are processed by, for example, chemical vapor deposition.

Wafer samples are commonly processed by chemical vapor deposition (CVD).
When growing a silicon oxide film or a polysilicon film (polycrystalline silicon film) using a wafer sample processing boat, a wafer sample processing boat is used to hold the wafer sample at the center of the reaction tube.

Conventionally, the inner diameter of the reaction tube has been determined depending on the diameter of the wafer sample. Therefore,
Reaction tubes of a certain inner diameter were only used to process wafer samples of one diameter, requiring multiple types of reaction tubes and resulting in low utilization.

A conventional wafer sample processing boat is shown in front and side views in FIGS. 1 and 2. Reference numeral 1 denotes a pair of support rods on both sides, both of which are arranged horizontally in parallel and whose ends are welded together by a connecting rod 2. Reference numeral 3 designates a pair of holding members on both sides that are integrally welded to each support rod 1, and are plate-shaped in the figure.
A large number of slits 3a are arranged in the upper part in the horizontal direction, into which wafer samples 4 are fitted, and a large number of wafer samples 4 are arranged and held at regular intervals. Note that the holding member may be made of a number of rods each having a slit at the top. The support rod 1, the connecting rod 2, and the holding member 3 are made of quartz material.

The wafer sample 4 is held in the processing boat, carried into the reaction tube 5 shown by the chain line, and processed. A wafer sample held and grown on this conventional processing boat is shown in FIG. The film thickness distribution m within the wafer sample 4 is greatly disordered.

Furthermore, the wafer sample 4 is affected by the flow of reaction gas due to the support rod 1, and the silicon oxide film, polysilicon film, etc. are thinner in the region near the support rod 1. Furthermore, even when the distance between the wafer sample 4 and the reaction tube 5 is not the optimum distance, the film thickness distribution of the silicon oxide film, polysilicon film, etc. within the wafer sample 4 is disturbed due to the influence of the flow of the reaction gas. This had a negative effect on the quality of the chips.

This idea involves fixing holding members upward to a pair of support rods on both sides, providing slits into which a number of wafer samples are fitted, and holding members at a predetermined distance from the outer periphery of the wafer samples fitted into these slits. A cylindrical body is provided concentrically surrounding the wafer sample, and this cylindrical body is divided into an upper part that encloses the top and both sides of the wafer sample, and a bottom part that encloses the lower part, each of which is detachably attached to a pair of support rods. The purpose of the present invention is to provide a wafer sample processing boat in which wafer samples are not affected by support rods or reaction tubes, and extremely stable films can be obtained.

FIGS. 4 and 5 are a front view and a side view of a wafer sample processing boat according to an embodiment of this invention, and 2 to 4 and 3a are the same as the conventional apparatus described above. Reference numeral 10 denotes a pair of support rods made of quartz material, both of which are arranged horizontally in parallel and welded together by a connecting rod 2 made of quartz material. 11
are hook pieces fixed to each support rod 10. A holding member 3 is welded to each support rod 10 toward the center of the wafer sample 4 to be held. 12 is a cylindrical body made of quartz material, and the holding member 3
The wafer sample 3 is surrounded concentrically at a predetermined distance from the outer periphery of the wafer sample 3 fitted into the slit 3a. The cylindrical body 12 has an upper part 13 surrounding the upper part and both sides of the wafer sample 4, and a bottom part 14 surrounding the lower part.
Divided for easy attachment and detachment. The upper part 13 is hooked and held by the hook piece 11 of the support rod 10, and the bottom part 14 is fitted and held by the upper part of the support rod 10.

The wafer sample 4 is held and processed by the processing boat of the above embodiment as follows. First, the upper part 13 is removed, and the wafer samples 4 are fitted into each of the slits 3a of the holding member 3 and held in an array. Fit the upper part 13. Such a processing boat is carried into a reaction tube 15 shown by a chain line, and processing is carried out. Even if the inner diameter of the reaction tube 15 is not constant, the wafer sample 4 is concentrically surrounded by the cylindrical body 12 at a predetermined distance, and the reaction tube 15
An extremely stable film and distribution can be obtained without being affected by the inner diameter of the support rod 10 or the support rod 10.

FIG. 6 shows a wafer sample 4 grown using the processing boat of the above embodiment, and the film thickness distribution m within the sample is extremely good.

7 and 8 are front and side views of a processing boat according to another embodiment of this invention. A cylindrical body 16 that surrounds the held wafer sample 4 concentrically at a predetermined distance from the outer circumference has an upper part 17 and a bottom part 1.
It is divided into two parts, 9 and 9, making it easy to attach and detach. Flanges 18 and 20 are provided at both ends of the upper part 16 and the bottom part 18, respectively, and close the gap with the inner diameter of the reaction tube 15. Thereby, the growth rate of the silicon oxide film, polysilicon film, etc. grown on the wafer sample 4 can be increased.

As described above, according to this invention, a cylindrical body is provided that concentrically surrounds the outer periphery of a wafer sample fitted and held in a number of slits provided in a pair of holding members on both sides, and the cylindrical body is Since the body is divided into an upper part and a bottom part, and is detachably supported by a pair of support rods on both sides, the wafer sample is not affected by the support rods or the reaction tube, and an extremely stable membrane can be obtained. Furthermore, even if the diameters of wafer samples differ, one type of reaction tube can be used.

[Brief explanation of the drawing]

1 and 2 are a front view and a side view of a conventional wafer sample processing boat, FIG. 3 is a front view showing the film thickness distribution of a wafer sample held and grown in the processing boat of FIG. 1, and FIG. 5 and 5 are front and side views of a wafer sample processing boat according to an embodiment of this invention, and FIG. 6 is a front view showing the film thickness distribution of the wafer sample held and grown in the processing boat of FIG. 4. , 7 and 8 are a front view and a side view of a wafer sample processing boat according to another embodiment of the present invention. 2... Connecting rod, 3... Holding member, 3a... Slit, 4... Wafer sample, 10... Support rod, 1
2... Cylindrical body, 13... Upper part, 14... Bottom part,
15... Reaction tube, 16... Cylindrical body, 17... Upper part, 18... Flange, 19... Bottom, 20...
Flange: The same reference numerals in the figures indicate the same or equivalent parts.

Claims (1)

[Claims for Utility Model Registration] (1) Both sides are arranged horizontally parallel to each other and fixedly connected at each end by a pair of connecting rods.
A pair of support rods, a pair of holding members on both sides that are fixedly connected upwardly to these support rods and have a large number of slits arranged in the horizontal direction in the upper part, and each of the above-mentioned slits that spans both of the holding members. The cylindrical body surrounds the outer periphery of the wafer sample fitted and held at a predetermined distance, is removably divided into two parts, an upper part and a bottom part, and is supported by the pair of support rods. Wafer sample processing boat. (2) Utility model registration claim 1, characterized in that flanges are provided in the outer circumferential direction at both ends of the top and bottom of the cylindrical body, respectively, to close the gap with the inner diameter of the reaction tube. Wafer sample processing boat as described.