JPS6263596A - Siloxane oligomer - Google Patents

Siloxane oligomer

Info

Publication number
JPS6263596A
JPS6263596A JP60204781A JP20478185A JPS6263596A JP S6263596 A JPS6263596 A JP S6263596A JP 60204781 A JP60204781 A JP 60204781A JP 20478185 A JP20478185 A JP 20478185A JP S6263596 A JPS6263596 A JP S6263596A
Authority
JP
Japan
Prior art keywords
formula
expressed
halogen
siloxane oligomer
compound expressed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60204781A
Other languages
Japanese (ja)
Other versions
JPH0255439B2 (en
Inventor
Akira Yamamoto
昭 山本
Minoru Takamizawa
高見沢 稔
Toshinobu Ishihara
俊信 石原
Tadao Kurosaki
黒崎 忠雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP60204781A priority Critical patent/JPS6263596A/en
Priority to US06/905,576 priority patent/US4727172A/en
Publication of JPS6263596A publication Critical patent/JPS6263596A/en
Publication of JPH0255439B2 publication Critical patent/JPH0255439B2/ja
Granted legal-status Critical Current

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  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

NEW MATERIAL:A compound expressed by formula I (Y is H, ClCH2 or formula II). EXAMPLE:Chloromethyltris(trifluorodimethylsiloxy)silane. USE:An intermediate for producing functional high polymers, useful for medical high polymeric materials, e.g. contact lenses, antithrombotic materials, etc., and having functions, e.g. gas permeability, etc., and compounds for silicone- modified high polymers. PREPARATION:An organosilicon halomagnesium salt expressed by formula III (X is halogen) is reacted with a halosilane or alkoxysilane expressed by the formula Y-Si-Z3 (Z is halogen or lower alkoxy), preferably at 30-80 deg.C and the resultant reaction mixture is poured into water. The resultant organic layer is then distilled to afford the aimed compound expressed by formula I. The compound expressed by formula III is normally obtained by reacting a Grignard reagent expressed by the formula RMgX (R is monofunctional hydrocarbon) with an organosiloxane expressed by formula IV.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は文献未載の新規なシロキサンオリゴマー、とく
には機能的高分子の中間体またはシリコーン変成高分子
用として有用とされるシロキサンオリゴマーに関するも
のある。
Detailed Description of the Invention (Field of Industrial Application) The present invention relates to a novel siloxane oligomer that has not been published in any literature, and particularly to a siloxane oligomer that is useful as an intermediate for functional polymers or for use in silicone-modified polymers. be.

(発明の構成) 本発明は一般式 (こ\にYは水素原子、CQCH,、 CH。(Structure of the invention) The present invention is based on the general formula (Here, Y is a hydrogen atom, CQCH, CH.

CH2=CC0○(CH2) −”示される基から選択
される原子または基)で示される文献未載の新規なシロ
キサンオリゴマーに関するものである。
The present invention relates to a novel siloxane oligomer represented by CH2=CC0○(CH2) - "an atom or group selected from the groups shown" which has not been described in any literature.

上記した式(1)におけるYは水素原子、CH。Y in the above formula (1) is a hydrogen atom, CH.

CQCH2、CH,=CC00(CH,)。CQCH2,CH,=CC00(CH,).

で示される基から選択される原子または基であり、した
がってこれにはつぎの3種のものが例示される。
It is an atom or group selected from the groups represented by, and therefore, the following three types are exemplified.

CH。CH.

CH2=CCOO(CH2)、Si− このシロキサンオリゴマーは例えば CH3 X−Mg−〇−5L−CH,CH,CF3   ・・・
(2)CH。
CH2=CCOO(CH2), Si- This siloxane oligomer is, for example, CH3X-Mg-〇-5L-CH,CH,CF3...
(2) CH.

(ニーにXはハロゲン原子)で示される有機けい素ハロ
マグネシウム塩に一般式 %式%(3) (こ\にYは前記に同じ、2はハロゲン原子または低級
アルコキシ基)で示されるハロシランまたはアルコキシ
シランを反応させると、この反応が次式 %式% によって進行するので、反応終了後これらを水中に注ぎ
有機層を蒸溜すれば目的とするシロキサンオリゴマーを
高純度、高収率で得ることができるが、この反応は0℃
〜還流温度の範囲、好ましくは30〜80℃で行わせれ
ばよい。
(wherein, When alkoxysilanes are reacted, this reaction proceeds according to the following formula % formula %, so if the reaction is completed and the organic layer is poured into water and the organic layer is distilled, the desired siloxane oligomer can be obtained with high purity and high yield. Yes, but this reaction takes place at 0°C.
to reflux temperature, preferably 30 to 80°C.

なお、上記した一般式(2)で示される有機けい素ハロ
マグネシウム塩は常法で製造したRMgX  (Rは一
価炭化水素基)で示されるグリニヤール試薬に式 で示されるオルガノシロキサンを滴下し50〜120℃
で反応させることによって得ることかできる。また、こ
の有機けい素ハロマグネシウム塩に添加される上記した
一般式(3)で示されるオルガノシランとしては H8
1CQ、、 H81(○CH3)3、CQ CH2SiCQ□。
The organosilicon halomagnesium salt represented by the above general formula (2) is obtained by adding dropwise an organosiloxane represented by the formula to a Grignard reagent represented by RMgX (R is a monovalent hydrocarbon group) prepared by a conventional method. ~120℃
It can be obtained by reacting with In addition, the organosilane represented by the above general formula (3) added to this organosilicon halomagnesium salt is H8
1CQ,, H81(○CH3)3,CQ CH2SiCQ□.

CH。CH.

CH2=CC00(CH,)、5iCLなどが例示され
る。
Examples include CH2=CC00(CH,) and 5iCL.

本発明のシロキサンオリゴマーは種々の用途に使用され
るが、これは特にはガス透過性や撥水性の機能を有する
機能高分子化合物、シリコ−変性高分子化合物となるの
で、コンタクトレンズ、包帯、抗血栓性材料などのよう
な医療用高分子物質として有用とされるほか、透湿性防
水布などの分野にも有用とされる。
The siloxane oligomer of the present invention can be used for various purposes, and in particular, it can be used as a functional polymer compound with gas permeability or water repellency, or as a silico-modified polymer compound, so it can be used in contact lenses, bandages, anti-inflammatory materials, etc. It is said to be useful as a medical polymer substance such as a thrombotic material, and also in fields such as moisture-permeable waterproof fabric.

つぎに本発明の実施例をあげる。Next, examples of the present invention will be given.

実施例1 反応器中に金属マグネシウム24.3 g (1モル)
とテトラハイドロフラン300wQを仕込んだのち、こ
れにメチルクロライドを吹き込んでメチルマグネシウム
クロライドのテトラハイドロフラン溶液を作り、これに
還流下でトリフルオロプロピルメチルシロキサントリマ
ー テトラハイドロフラン200mMにとかして液を2時間
で滴下して反応させ、さらに2時間還流させてから、こ
の反応液にトリクロロシラン(HS iCQ 、) 4
5 g (0,33モル)を還流温度で滴下して反応さ
せたのち、これを水IQ中に注ぎ込み、分離した有機層
を減圧蒸溜したところ、4rmHg、125℃の留分(
GC純度99.2%)のものが146g得られた。
Example 1 24.3 g (1 mol) of magnesium metal in the reactor
After charging 300 wQ of tetrahydrofuran with methyl chloride, a solution of methylmagnesium chloride in tetrahydrofuran was prepared by blowing methyl chloride into the solution, and 200 mM of trifluoropropylmethylsiloxane trimer in tetrahydrofuran was dissolved in this under reflux, and the solution was stirred for 2 hours. After refluxing for another 2 hours, trichlorosilane (HS iCQ, ) 4 was added to the reaction solution.
After dropping 5 g (0.33 mol) at reflux temperature to react, it was poured into water IQ and the separated organic layer was distilled under reduced pressure.
146 g of a product with a GC purity of 99.2% was obtained.

ついてIRlNMRおよび元素分析を行ったところ、こ
れらについて エR:第1図 NMR:  δ 0.17ppm  −5iCH318
Hδ 0.77ppm  −S iCH2S Hδ 2
.Oppm  −CH2CF、  6 Hδ 5.25
ppm  −SiHI H元素分析: 0%  H%  Six 計算値  33.19  5.76  20.70実測
値  33,16  5.76  20.74が得られ
たので、これは次式 で示されるシロキサンオリゴマーであることが確認され
た。
When IRlNMR and elemental analysis were performed on these, the following results were obtained: Figure 1 NMR: δ 0.17ppm -5iCH318
Hδ 0.77ppm -S iCH2S Hδ 2
.. Oppm -CH2CF, 6 Hδ 5.25
ppm -SiHI H elemental analysis: 0% H% Six Calculated value 33.19 5.76 20.70 Actual value 33,16 5.76 20.74 was obtained, so this is a siloxane oligomer represented by the following formula. It was confirmed that there is.

実施例2 実施例1におけるトリクロロシラン45gの代りにクロ
ロメチルトリクロロシラン (CQCH2SiCO3)61 gを使用したほかは実
施例1と同様に処理したところ、4mHg、139℃の
留分(GC,純度96%)のものが156g得られた。
Example 2 The same procedure as in Example 1 was performed except that 61 g of chloromethyltrichlorosilane (CQCH2SiCO3) was used instead of 45 g of trichlorosilane in Example 1. As a result, a fraction of 4 mHg and 139°C (GC, purity 96%) was obtained. ) was obtained.

このものは屈折率 25が1.3850であり、そのI
R,NMRおよび元素分析結果が 工R:第2図 NMR:δO,17ppm  −SiCHffl 8 
H3O,77ppm−8iCH26H δ 2.0ρpm  −CH,CF、  6Hδ 2.
55ppm  −8iCH,CI2 2H元素分析: 0%  H%  Six 計算値  32,56  5.46  19.00実測
値  32,59  5.47  18.96であるこ
とから、これは次式 で示されるクロロメチルトリス(トリフルオロジメチル
シロキシ)シランであることが確認された。
The refractive index 25 of this one is 1.3850, and its I
R, NMR and elemental analysis results are shown.
H3O, 77ppm-8iCH26Hδ 2.0ρpm -CH,CF, 6Hδ 2.
55ppm -8iCH,CI2 2H elemental analysis: 0% H% Six Calculated value 32,56 5.46 19.00 Actual value 32,59 5.47 18.96, so this is chloromethyl expressed by the following formula It was confirmed to be tris(trifluorodimethylsiloxy)silane.

実施例3 実施例1におけるトリクロロシラン45gの代りに3−
メタクリロキシプロピルトリクロロシラン 86gを使用したほかは実施例1と同様に処理したとこ
ろ、 lnmHg 、 156℃の留分(GC純度96
%)のものが161g得られた。
Example 3 Instead of 45 g of trichlorosilane in Example 1, 3-
When treated in the same manner as in Example 1 except that 86 g of methacryloxypropyltrichlorosilane was used, the fraction at lnmHg and 156°C (GC purity 96
%) was obtained.

このものは屈折率nDが1.4005であり、このIR
,NMRおよび元素分析結果が 工R:第3図 NMR:δ0.17ppn+  −8iCH,18Hδ
0.77ppm  −S iCH2S Hδ4.O4p
pm  −C○○CH2−2Hδ 5.45ρpffl
               IHδ 6.99pp
m  −CH,=C−I H元素分析: 0%  H%  Six 計算値  39.50  6.18  16.80実測
値  39.44  6.18  16.82であるこ
とから、これは次式 で示される3−メタクリロキシプロピルトリス(トリフ
ルオロプロピルジメチルシロキシ)シランであることが
確認された。
This material has a refractive index nD of 1.4005, and this IR
, NMR and elemental analysis results are shown in Figure 3. NMR: δ0.17ppn+ -8iCH, 18Hδ
0.77ppm -S iCH2S Hδ4. O4p
pm -C○○CH2-2Hδ 5.45ρpffl
IHδ 6.99pp
m -CH,=C-I H elemental analysis: 0% H% Six Calculated value 39.50 6.18 16.80 Actual value 39.44 6.18 16.82, so this is shown by the following formula. It was confirmed that it was 3-methacryloxypropyltris(trifluoropropyldimethylsiloxy)silane.

【図面の簡単な説明】[Brief explanation of the drawing]

図はいずれも本発明のシロキサンオリゴマーの赤外線吸
収スペクトル(IR)を示したものであり、第1図〜第
3図はそれぞれ実施例1〜3で得られたシロキサンオリ
ゴマーのIRを図示したものである。
Each figure shows the infrared absorption spectrum (IR) of the siloxane oligomer of the present invention, and Figures 1 to 3 illustrate the IR of the siloxane oligomer obtained in Examples 1 to 3, respectively. be.

Claims (1)

【特許請求の範囲】 1、 一般式 ▲数式、化学式、表等があります▼ (こゝにYは水素原子、ClCH_2、 ▲数式、化学式、表等があります▼で示される基から選
択 される原子または基)で示されるシロキサンオリゴマー
[Claims] 1. An atom selected from the groups represented by the general formula ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (Here, Y is a hydrogen atom, ClCH_2, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ or group).
JP60204781A 1985-09-12 1985-09-17 Siloxane oligomer Granted JPS6263596A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60204781A JPS6263596A (en) 1985-09-17 1985-09-17 Siloxane oligomer
US06/905,576 US4727172A (en) 1985-09-12 1986-09-09 Method for the preparation of an organosiloxane oligomer and a novel organosiloxane oligomer thereby

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60204781A JPS6263596A (en) 1985-09-17 1985-09-17 Siloxane oligomer

Publications (2)

Publication Number Publication Date
JPS6263596A true JPS6263596A (en) 1987-03-20
JPH0255439B2 JPH0255439B2 (en) 1990-11-27

Family

ID=16496238

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60204781A Granted JPS6263596A (en) 1985-09-12 1985-09-17 Siloxane oligomer

Country Status (1)

Country Link
JP (1) JPS6263596A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0211588A (en) * 1988-06-30 1990-01-16 Chisso Corp Organosiloxane compound
CN1058760C (en) * 1996-03-22 2000-11-22 株式会社村田制作所 Cerium-containing magnetic garnet single crystal and production method therefor
US6973805B2 (en) 2001-03-14 2005-12-13 Showa Denko K.K. Layered heat exchanger, layered evaporator for motor vehicle air conditioners and refrigeration system
JP2017510637A (en) * 2014-03-17 2017-04-13 ダウ コーニング コーポレーションDow Corning Corporation Fluorinated compound, curable composition containing the compound, and cured product

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0211588A (en) * 1988-06-30 1990-01-16 Chisso Corp Organosiloxane compound
CN1058760C (en) * 1996-03-22 2000-11-22 株式会社村田制作所 Cerium-containing magnetic garnet single crystal and production method therefor
US6973805B2 (en) 2001-03-14 2005-12-13 Showa Denko K.K. Layered heat exchanger, layered evaporator for motor vehicle air conditioners and refrigeration system
JP2017510637A (en) * 2014-03-17 2017-04-13 ダウ コーニング コーポレーションDow Corning Corporation Fluorinated compound, curable composition containing the compound, and cured product

Also Published As

Publication number Publication date
JPH0255439B2 (en) 1990-11-27

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