JPS6263595A - Vinylphenylketene methyltrimethylsilyl acetal - Google Patents
Vinylphenylketene methyltrimethylsilyl acetalInfo
- Publication number
- JPS6263595A JPS6263595A JP60202547A JP20254785A JPS6263595A JP S6263595 A JPS6263595 A JP S6263595A JP 60202547 A JP60202547 A JP 60202547A JP 20254785 A JP20254785 A JP 20254785A JP S6263595 A JPS6263595 A JP S6263595A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- reacted
- vinylphenylketene
- expressed
- compound expressed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- WIXBYMRVQXIQRZ-UHFFFAOYSA-N (1-methoxy-2-phenylbuta-1,3-dienoxy)-trimethylsilane Chemical compound C[Si](C)(C)OC(OC)=C(C=C)C1=CC=CC=C1 WIXBYMRVQXIQRZ-UHFFFAOYSA-N 0.000 title claims description 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 abstract description 18
- WYURNTSHIVDZCO-UHFFFAOYSA-N tetrahydrofuran Substances C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 abstract description 17
- 238000006116 polymerization reaction Methods 0.000 abstract description 8
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 abstract description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract description 5
- 150000001875 compounds Chemical class 0.000 abstract description 5
- VBRWJLQEFUANAQ-UHFFFAOYSA-N 2-(3-ethenylphenyl)acetonitrile Chemical compound C=CC1=CC=CC(CC#N)=C1 VBRWJLQEFUANAQ-UHFFFAOYSA-N 0.000 abstract description 4
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 abstract description 4
- 238000006243 chemical reaction Methods 0.000 abstract description 4
- 239000003505 polymerization initiator Substances 0.000 abstract description 4
- 239000002994 raw material Substances 0.000 abstract description 4
- HMDQPBSDHHTRNI-UHFFFAOYSA-N 1-(chloromethyl)-3-ethenylbenzene Chemical compound ClCC1=CC=CC(C=C)=C1 HMDQPBSDHHTRNI-UHFFFAOYSA-N 0.000 abstract description 3
- 239000000853 adhesive Substances 0.000 abstract description 3
- 230000001070 adhesive effect Effects 0.000 abstract description 3
- 238000007334 copolymerization reaction Methods 0.000 abstract description 3
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 abstract description 3
- 229910000041 hydrogen chloride Inorganic materials 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 3
- 239000005051 trimethylchlorosilane Substances 0.000 abstract description 3
- COPGOUMZVWGOQX-UHFFFAOYSA-N 2-(4-ethenylphenyl)ethenone Chemical compound C=CC1=CC=C(C=C=O)C=C1 COPGOUMZVWGOQX-UHFFFAOYSA-N 0.000 abstract description 2
- 238000004040 coloring Methods 0.000 abstract description 2
- 239000012046 mixed solvent Substances 0.000 abstract description 2
- 238000010992 reflux Methods 0.000 abstract description 2
- MNWBNISUBARLIT-UHFFFAOYSA-N sodium cyanide Chemical compound [Na+].N#[C-] MNWBNISUBARLIT-UHFFFAOYSA-N 0.000 abstract description 2
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 230000002542 deteriorative effect Effects 0.000 abstract 1
- NRUBUZBAZRTHHX-UHFFFAOYSA-N lithium;propan-2-ylazanide Chemical compound [Li+].CC(C)[NH-] NRUBUZBAZRTHHX-UHFFFAOYSA-N 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- -1 cyanmethyl groups Chemical group 0.000 description 12
- 239000000243 solution Substances 0.000 description 12
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 239000000178 monomer Substances 0.000 description 7
- 238000010521 absorption reaction Methods 0.000 description 6
- 239000003999 initiator Substances 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 150000003440 styrenes Chemical class 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 6
- CYOAEBLVGSUAKP-UHFFFAOYSA-N 2-(4-ethenylphenyl)acetic acid Chemical compound OC(=O)CC1=CC=C(C=C)C=C1 CYOAEBLVGSUAKP-UHFFFAOYSA-N 0.000 description 5
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 5
- 125000000524 functional group Chemical group 0.000 description 5
- 238000002329 infrared spectrum Methods 0.000 description 5
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 5
- ZCSHNCUQKCANBX-UHFFFAOYSA-N lithium diisopropylamide Chemical compound [Li+].CC(C)[N-]C(C)C ZCSHNCUQKCANBX-UHFFFAOYSA-N 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- ZRZHXNCATOYMJH-UHFFFAOYSA-N 1-(chloromethyl)-4-ethenylbenzene Chemical compound ClCC1=CC=C(C=C)C=C1 ZRZHXNCATOYMJH-UHFFFAOYSA-N 0.000 description 3
- CSDQQAQKBAQLLE-UHFFFAOYSA-N 4-(4-chlorophenyl)-4,5,6,7-tetrahydrothieno[3,2-c]pyridine Chemical compound C1=CC(Cl)=CC=C1C1C(C=CS2)=C2CCN1 CSDQQAQKBAQLLE-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 238000001723 curing Methods 0.000 description 3
- 238000000921 elemental analysis Methods 0.000 description 3
- 238000012690 ionic polymerization Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- NOSFCJPRLGDDKT-UHFFFAOYSA-N methyl 2-(3-ethenylphenyl)acetate Chemical compound COC(=O)CC1=CC=CC(C=C)=C1 NOSFCJPRLGDDKT-UHFFFAOYSA-N 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000000543 intermediate Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 125000002560 nitrile group Chemical group 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 239000003208 petroleum Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 239000005060 rubber Substances 0.000 description 2
- 125000005504 styryl group Chemical group 0.000 description 2
- SLBOQBILGNEPEB-UHFFFAOYSA-N 1-chloroprop-2-enylbenzene Chemical compound C=CC(Cl)C1=CC=CC=C1 SLBOQBILGNEPEB-UHFFFAOYSA-N 0.000 description 1
- JZHGRUMIRATHIU-UHFFFAOYSA-N 1-ethenyl-3-methylbenzene Chemical compound CC1=CC=CC(C=C)=C1 JZHGRUMIRATHIU-UHFFFAOYSA-N 0.000 description 1
- DUIIPHYNGUDOIM-UHFFFAOYSA-N 2-(4-ethenylphenyl)acetonitrile Chemical compound C=CC1=CC=C(CC#N)C=C1 DUIIPHYNGUDOIM-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 1
- XESZUVZBAMCAEJ-UHFFFAOYSA-N 4-tert-butylcatechol Chemical compound CC(C)(C)C1=CC=C(O)C(O)=C1 XESZUVZBAMCAEJ-UHFFFAOYSA-N 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- 101150091051 cit-1 gene Proteins 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920006351 engineering plastic Polymers 0.000 description 1
- CCGKOQOJPYTBIH-UHFFFAOYSA-N ethenone Chemical compound C=C=O CCGKOQOJPYTBIH-UHFFFAOYSA-N 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- JCYWCSGERIELPG-UHFFFAOYSA-N imes Chemical compound CC1=CC(C)=CC(C)=C1N1C=CN(C=2C(=CC(C)=CC=2C)C)[C]1 JCYWCSGERIELPG-UHFFFAOYSA-N 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- VFTZDFQTYJJPRO-UHFFFAOYSA-N methyl 2-phenylbut-3-enoate Chemical compound COC(=O)C(C=C)C1=CC=CC=C1 VFTZDFQTYJJPRO-UHFFFAOYSA-N 0.000 description 1
- 150000004702 methyl esters Chemical class 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 229920001490 poly(butyl methacrylate) polymer Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002776 polycyclohexyl methacrylate Polymers 0.000 description 1
- 229920005906 polyester polyol Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- IARSSOVWSJAVSZ-UHFFFAOYSA-N tris(dimethylamino)sulfanium Chemical compound CN(C)[S+](N(C)C)N(C)C IARSSOVWSJAVSZ-UHFFFAOYSA-N 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
(イ)発明の目的
(産業上の利用分野)
本発明はイオン重合法における重合開始剤として、又塗
料、接着剤、ゴム、エンジニアリングプラスチックなど
の原料中間体として有用である新規なm−ビニル又はP
−ビニルフェニルケテンメチルトリメチルシリルアセタ
ールに関するものである。Detailed Description of the Invention (a) Purpose of the Invention (Field of Industrial Application) The present invention is useful as a polymerization initiator in ionic polymerization methods, and as a raw material intermediate for paints, adhesives, rubber, engineering plastics, etc. Certain new m-vinyl or P
- Vinylphenylketene methyltrimethylsilyl acetal.
(従来技術)
従来、スチレン誘導体としてm−又はP−クロロメチル
スチレン、m−又はP−シアノメチルスチレン、α−メ
チルスチレン、m−又はP−メチルスチレン、P−ヒド
ロキシスチレンなどが知られており、これらのスチレン
誘導体はスチレン、アクリル酸エステル、メタクリル酸
エステルなどと共重合させることにより各種用途に使わ
れうるが、クロロメチル基、シアンメチル基、ヒドロキ
シ基などの官能基の反応性が乏しいため、共重合後の硬
化手段として例えばアミンなどの塩基性の強いものを使
い加熱硬化する必要があった。(Prior art) Conventionally, m- or P-chloromethylstyrene, m- or P-cyanomethylstyrene, α-methylstyrene, m- or P-methylstyrene, P-hydroxystyrene, etc. are known as styrene derivatives. These styrene derivatives can be used for various purposes by copolymerizing with styrene, acrylic esters, methacrylic esters, etc., but due to the poor reactivity of functional groups such as chloromethyl groups, cyanmethyl groups, and hydroxyl groups, As a curing means after copolymerization, it was necessary to use a strongly basic material such as amine to heat-cure.
しかし、このために硬化物が着色したり、劣化しやすく
なるという欠点につながり実用上余り利用されていなか
った。このためこれらのスチレン誘導体はそのまま共重
合させることは少なく、むしろ新規な機能性モノマーを
作るための中間体として使われている。しかし官能基の
反応性が乏しいために、機能性モノマーを作るための条
件を厳しくする必要があった。However, this leads to disadvantages in that the cured product becomes colored and easily deteriorates, so that it has not been used much in practice. For this reason, these styrene derivatives are rarely copolymerized as they are, but rather are used as intermediates for producing new functional monomers. However, due to the poor reactivity of the functional groups, it was necessary to tighten the conditions for producing functional monomers.
(発明が解決しようとする問題点)
本発明は共重合後の硬化反応を容易にし、又機能性モノ
マーを製造する際の条件を緩和しあるいは条件選択の範
囲を拡大し得る、反応性に富む官能基をもつスチレン誘
導体を提供しようとするものである。(Problems to be Solved by the Invention) The present invention facilitates the curing reaction after copolymerization, and also eases the conditions for producing functional monomers or expands the range of condition selection. The present invention aims to provide a styrene derivative having a functional group.
(ロ)発明の構成
(問題点を解決するだめの手段)
本発明者は、上記の問題点を解決するために、官能基を
もつスチレン誘導体について鋭意研究した結果、反応性
に富む官能基をもつスチレン誘導体を見出し、本発明に
到達したのである。(B) Structure of the Invention (Means for Solving the Problems) In order to solve the above problems, the inventor of the present invention has conducted extensive research on styrene derivatives having functional groups, and as a result, has developed highly reactive functional groups. The present invention was achieved by discovering a styrene derivative with the following characteristics.
即ち、本発明による化合物はm−又はP−の位置にビニ
ル基を有するビニルフェニルケテンメチルトリメチルシ
リルアセタールであって、これらは次の構造式で示され
る。That is, the compound according to the present invention is a vinyl phenylketene methyltrimethylsilyl acetal having a vinyl group at the m- or P-position, and is represented by the following structural formula.
m−ビニルフェニルケテンメチルトリメチルシリルアセ
タール:
P−ビニルフェニルケテンメチルトリメチルシリルアセ
タール;
本発明のm−又はP−の位置にビニル基を有するビニル
フェニルケテンメチルトリメチルシリルアセタールの製
法の一例は次のとおりである。m-Vinylphenylketene methyltrimethylsilylacetal: P-vinylphenylketenemethyltrimethylsilylacetal; An example of the method for producing vinylphenylketenemethyltrimethylsilylacetal having a vinyl group at the m- or P-position of the present invention is as follows.
即ち、m−又はP−ビニルベンジルクロライドを出発原
料として、これとNaCN をアルコール−水混合溶
媒中で還流下洗反応させ、濾過蒸留によって87℃/
2 wsHllの留分としてm−又はP−ビニルベンジ
ルシアニドを合成し、次いでメタノール中で等モルの塩
化水素を吹込み一昼夜放置後m−又はP−ビニルベンジ
ルイミドエステルの塩酸塩を沈殿として取得し、精製後
6倍量の水で加水分解して大過剰の石油エーテルで抽出
を行ない、蒸留により97℃/3sm H、litの留
分としてm−又はP−ビニルフェニル酢酸メチルエステ
ルを得る。That is, using m- or p-vinylbenzyl chloride as a starting material, this and NaCN were reacted under reflux in an alcohol-water mixed solvent, and the mixture was heated to 87°C/87°C by filtration and distillation.
2 Synthesize m- or p-vinylbenzylic cyanide as a fraction of wsHll, then blow equimolar hydrogen chloride into methanol and leave it for a day and night to obtain m- or p-vinylbenzylimide ester hydrochloride as a precipitate. After purification, it is hydrolyzed with 6 times the amount of water, extracted with a large excess of petroleum ether, and distilled to obtain m- or P-vinylphenyl acetic acid methyl ester as a fraction at 97°C/3sm H, lit.
次いでリチウムジイソプロピルアミドのテトラヒドロフ
ラン溶液に、上記で得たm−又はP−ビニルフェニル酢
酸メチルエステルをリチウムジイソプロピルアミドと等
モル量加えて攪拌下に約0℃で60分間保持し、続いて
過剰量のトリメチルクロロシランを添加して室温にもど
し、その後室温で30分間攪拌し反応混合物を濾過し、
溶液を濃縮する。これを無水エーテルで洗浄し無水エー
テルを除去後油状の液体を減圧蒸留して110℃/ 3
m H&の留分として、m−又はP−ビニルフェニル
ケテンメチルトリメチルシリルアセタールが得られる。Next, m- or P-vinylphenyl acetic acid methyl ester obtained above was added to a tetrahydrofuran solution of lithium diisopropylamide in an amount equimolar to that of lithium diisopropylamide, and the mixture was kept at about 0°C for 60 minutes with stirring, and then an excess amount was added. Add trimethylchlorosilane and return to room temperature, then stir at room temperature for 30 minutes, filter the reaction mixture,
Concentrate the solution. This was washed with anhydrous ether to remove the anhydrous ether, and the oily liquid was distilled under reduced pressure at 110°C/3.
m- or P-vinylphenylketene methyltrimethylsilyl acetal is obtained as a fraction of mH&.
これを式で示すと次のとおりである。なおビニル基の位
置はいずれもm−又はP−である。This is expressed by the following formula. Note that the position of the vinyl group is either m- or P-.
H2C1
前記した原料であるm−又はP−ビニルフェニル酢酸メ
チルエステルは既に知られており、その製造方法は例え
ばusp3,073,862号公報にはP−ビニルベン
ジルシアニドを加水分解した後、メチルエステルを合成
する方法が記載されている。H2C1 The aforementioned raw material m- or P-vinylphenyl acetic acid methyl ester is already known, and the method for producing it is described, for example, in USP No. 3,073,862, in which P-vinylbenzyl cyanide is hydrolyzed and then methyl A method for synthesizing esters is described.
このようにして得られたm−又はP−ビニルフェニルケ
テンメチルトリメチルシリルアセタールは後記各実施例
で示すように、NMRスペクトル、IRスペクトル、元
素分析により同定された。The m- or P-vinylphenylketene methyltrimethylsilyl acetal thus obtained was identified by NMR spectrum, IR spectrum, and elemental analysis, as shown in each example below.
以下に参考例及び実施例をあげて本発明をさらに具体的
に説明する。The present invention will be explained in more detail with reference to Reference Examples and Examples below.
参考例1
(p−ビニルベンジルシアニトノ合成)攪拌機、ジムロ
ート冷却器、温度計を備えたガラスフラスコに市販のP
−ビニルベンジルクロリドを122.9r、試薬−級N
aCN 501 r、溶媒としてメタノール122&r
及び水5011rを全量一括仕込して12時間還流させ
た。その時の温度は64℃であった。放冷後1紙にて副
生じたNaclを除去した後、ロータリーエバポレータ
ーを用いて濃縮を行なし・、再度1別した後減圧蒸留を
行った。主留分として2 ysHI 留出温87℃の
ものを80.1.!ilr得た。収率70%であった。Reference Example 1 (Synthesis of p-vinylbenzylcyanito) Commercially available P
-vinylbenzyl chloride at 122.9r, reagent-grade N
aCN 501r, methanol 122&r as solvent
and 5011 r of water were added at once and refluxed for 12 hours. The temperature at that time was 64°C. After cooling, the by-produced NaCl was removed using paper, and the mixture was concentrated using a rotary evaporator. After being separated again, vacuum distillation was performed. The main distillate was 2ysHI with a distillation temperature of 87°C at 80.1. ! I got ilr. The yield was 70%.
IR咲、
スペクトルで二) IJル基の屹収が2250cIL’
付近に、ビニル基の吸収が1650cIt−1付近にミ
もし、P−ビニルベンジルシアニドの生成が確認された
。IR Saki, Spectrum 2) The yield of IJ group is 2250cIL'
Nearby, the absorption of vinyl groups appeared around 1650 cIt-1, and the formation of P-vinylbenzyl cyanide was confirmed.
参考例2
(P−ビニルフェニル酢酸メチルエステルの合成)
攪拌機、温度計、ジムロート冷却器及びガス吹込管を備
えたガラスフラスコに、参考例1で得たP−ビニルベン
ジルシアニド64.411r及びメタノール17.6&
rを入れた。攪拌しなから液温を0℃に保ちつつ、乾燥
塩化水素19IIrを吹込み吸収させた。終了後冷蔵庫
に一昼夜放置した。その後、生成した沈澱を取り出し、
細か(粉砕なして無水エーテルで洗い真空乾燥すること
によりイミドエステル塩酸塩を66.71/ r得た。Reference Example 2 (Synthesis of P-vinylphenyl acetic acid methyl ester) P-vinylbenzyl cyanide 64.411r obtained in Reference Example 1 and methanol were placed in a glass flask equipped with a stirrer, a thermometer, a Dimroth condenser, and a gas blowing tube. 17.6&
I put r. Dry hydrogen chloride 19IIr was blown into the solution and absorbed while keeping the liquid temperature at 0° C. without stirring. After finishing, I left it in the refrigerator overnight. After that, take out the formed precipitate,
By washing with anhydrous ether and vacuum drying without pulverization, imidoester hydrochloride was obtained at a yield of 66.71/r.
収率70チであった。The yield was 70 cm.
さらにこの塩酸基金fit 66.7 jW rに対し
、6倍当量の水54.0.9 rを室温で15分間かき
まぜた後、20倍量の石油エーテルを加えて2日間攪拌
した。分液後上層をロータリーエバポレーターを用いて
濃縮し、その後減圧蒸留を行った。主留分として3mH
1で97℃の留分な46.6&r得た。Further, this hydrochloric acid foundation fit 66.7 jW r was stirred with 6 times the equivalent of water 54.0.9 r at room temperature for 15 minutes, and then 20 times the amount of petroleum ether was added and stirred for 2 days. After separation, the upper layer was concentrated using a rotary evaporator, and then distilled under reduced pressure. 3mH as main fraction
1, a 97°C fraction of 46.6&r was obtained.
P−ビニルベンジルシアニドに対する収率は58.8チ
であった。The yield based on P-vinylbenzyl cyanide was 58.8%.
IRスペクトルでニトリル基の吸収が2250cm−’
付近にないためニトリル基が完全に反応したことが
分り、一方1740α−1付近にエステル結合の吸収ピ
ークがみられ、なおかつ1635cM7’ 付近にビ
ニル基の吸収が残っており、P−ビニルフェニル酢酸メ
チルエステルの生成か確認された。In the IR spectrum, the absorption of the nitrile group is 2250 cm-'
It was found that the nitrile group had completely reacted because it was not in the vicinity, and on the other hand, an absorption peak of the ester bond was observed near 1740α-1, and absorption of the vinyl group remained near 1635cM7', indicating that methyl P-vinylphenyl acetate It was confirmed that ester was produced.
参考例6
(m−ビニルベンジルシアニドの合成)原料トしてm−
ビニルベンジルクロリドを用いた以外は参考例1と同様
にしてm−ビニルベンジルシアニドを合成した。その収
率は70%であった。このm−ビニルベンジルシアニド
のIRスペクトルはP−ビニルベンジルシアニドと同様
であった。Reference Example 6 (Synthesis of m-vinylbenzyl cyanide) Using raw materials, m-
m-vinylbenzyl cyanide was synthesized in the same manner as in Reference Example 1 except that vinylbenzyl chloride was used. The yield was 70%. The IR spectrum of this m-vinylbenzyl cyanide was similar to that of p-vinylbenzyl cyanide.
参考例4
(m −ビニルフェニル酢酸メチルエステルの合成)
参考例6で得られたm−ビニルベンジルシアニドを用い
た以外は参考例2と同様圧してm−ビニルフェニル酢酸
メチルエステルを合成した。m−ベンジルシアニドに対
する収率は595チであった。このm−ビニルフェニル
6酸メチルエステルの沸点及びIRスペクトルはP−ビ
ニルフェニル酢酸メチルエステルと同様であった。Reference Example 4 (Synthesis of m-vinylphenyl acetic acid methyl ester) m-vinylphenyl acetic acid methyl ester was synthesized in the same manner as in Reference Example 2 except that m-vinylbenzyl cyanide obtained in Reference Example 6 was used. The yield based on m-benzyl cyanide was 595 cm. The boiling point and IR spectrum of this m-vinylphenyl 6-acid methyl ester were similar to that of P-vinylphenyl acetic acid methyl ester.
実施例1
(p−ビニルフェニルケテンメチルトリメチルシリルア
セタールの合成)
攪拌機、温度計、滴下ロート、及びジムロート冷却器を
備えたガラスフラスコを充分窒素置換した後、窒素雰囲
気内で8チリチウムジインプロピルアミド−テトラヒド
ロフラン溶液2681rをフラスコに入れ、外部から氷
−水バスにより冷却しながら、参考例2で得られたP−
ビニルフェニル酢酸メチルエステル65.2jlrを5
分間かけて滴下した後、さらにO′Cを保ったまま30
分間攪拌反応させた。その後、同温度で過剰のトリメチ
ルクロロシラン54.3#rを5分間かけて滴下した。Example 1 (Synthesis of p-vinylphenylketene methyltrimethylsilyl acetal) After a glass flask equipped with a stirrer, a thermometer, a dropping funnel, and a Dimroth condenser was sufficiently purged with nitrogen, 8-thilithium diimpropylamide was added in a nitrogen atmosphere. Put the tetrahydrofuran solution 2681r into a flask, and cool the P- obtained in Reference Example 2 while cooling from the outside with an ice-water bath.
Vinyl phenylacetic acid methyl ester 65.2jlr 5
After dripping for a minute, continue to maintain O'C for 30 minutes.
The reaction was stirred for a minute. Thereafter, excess trimethylchlorosilane 54.3#r was added dropwise over 5 minutes at the same temperature.
攪拌しながら徐々に液温を室温にもどし、室温で30分
経過した後、反応液をd−I過してP液をロータリーエ
バポレーターで濃縮した。残渣を無水エチルエーテルで
洗浄しe過をすることにより目的物をエーテル中に抽出
した。次いでロータリーエバポレーターでエーテルを除
去した後、残った油状の液体を減圧蒸留した。The temperature of the solution was gradually returned to room temperature while stirring, and after 30 minutes at room temperature, the reaction solution was passed through dI, and the P solution was concentrated using a rotary evaporator. The residue was washed with anhydrous ethyl ether and filtered to extract the desired product into ether. After removing the ether using a rotary evaporator, the remaining oily liquid was distilled under reduced pressure.
主留分として6誌Hpで110℃の留分22.lr得た
。収率45チであった。The main fraction is the fraction 22. I got lr. The yield was 45 cm.
重合防止剤として、4−t−ブチルカテコールを15
ppm入れて冷暗所に保存した3゜IRスペクトルでC
=C結合に由来する吸収ピークが1630〜1670α
−1に出ており、一方5i−Cによる吸収ピークが85
0cIL’付近に強く出ているため、ケテントリメテル
シリルアセタータ構造をもっていることが充分裏づけら
れた。As a polymerization inhibitor, 15% of 4-t-butylcatechol was added.
ppm and stored in a cool dark place.
=Absorption peak derived from C bond is 1630-1670α
-1, while the absorption peak due to 5i-C is 85
Since it appears strongly near 0cIL', it is fully confirmed that it has a ketene trimester silyl acetata structure.
一方NMRスペクトルは第1図に示すように、5i(C
H5)3に基づくピークが0.3δ付近に、OCH3に
基づくピークが6.65δ付近にまたフェニル基に基づ
くピークが72δ付近にみられる。On the other hand, the NMR spectrum shows 5i(C
A peak based on H5)3 is seen around 0.3δ, a peak based on OCH3 is seen around 6.65δ, and a peak based on the phenyl group is seen around 72δ.
元素分析値はC67,75係(計算値6770%)、H
8,06チ(計算値8.11チ)であった。Elemental analysis values are C67,75 (calculated value 6770%), H
It was 8.06 inches (calculated value 8.11 inches).
実施例2
(m−ビニルフェニルケテンメチルトリメチルシリルア
セタールの合成)
参考例4で得られたm−ビニルフェニル酢酸メチルエス
テルを用いた以外は実施例1と同様にしてm−ビニルフ
ェニルケテンメチルトリメチルシリルアセタールを合成
した。その収率は48.3 %であった。Example 2 (Synthesis of m-vinylphenylketene methyltrimethylsilyl acetal) m-vinylphenylketene methyltrimethylsilyl acetal was produced in the same manner as in Example 1 except that the m-vinylphenyl acetic acid methyl ester obtained in Reference Example 4 was used. Synthesized. The yield was 48.3%.
得られたm−ビニルフェニルケテンメチルトリメチルシ
リルアセタール忙ついて、IRスペクトルを測定した結
果、C=C結合に基づ(ピークが1630〜1670c
m に、5i−C結合に基づくピークが850c+
a’付近に出ていることを確認した。As a result of measuring the IR spectrum of the obtained m-vinylphenylketene methyltrimethylsilylacetal, it was found that the peak was 1630-1670c based on the C=C bond.
m, a peak based on 5i-C bond is 850c+
I confirmed that it appeared near a'.
また、NMRスペクトルは第2図に示すとおりであり、
5i(CH,)、に基づくピークが16δ付近に、OC
H3に基づくピークが3.65δ付近K、またフェニル
基〈基づくピークが7.2 J付近にあることを確認し
た。In addition, the NMR spectrum is as shown in Figure 2,
5i(CH,), the peak based on OC
It was confirmed that the peak based on H3 was around 3.65[delta]K, and the peak based on phenyl group was around 7.2J.
元素分析値はC67,75% (計算値67.70%)
、88.06チ(計算値8.11チ)であった。Elemental analysis value is C67.75% (calculated value 67.70%)
, 88.06 inches (calculated value 8.11 inches).
応用例1
乾燥窒素下で100ゴの無水テトラヒドロフラン(TH
F)中1c、m、P−ビニルフェニルケテンメチルトリ
メチルシリルアセタール(以下VPKTSAと称する)
(メタ体6o%とバラ体40%の混合物) 1.585
部(5,65ミリモル)とトリス(ジメチルアミノ)ス
ルホニウムジフルオロトリメチルシリケート(以下TA
S F2S iMe3と省略する)0.0部(0,11
ミリモル)とカルシウムハイドライド(CaH2)上で
精製したメチルメタクリレート(以下M M Aと省略
する)16.9部(0,17モル)を加え、室温下3時
間重合させた。5チメタノール入りヘキサン液に加え、
Mn=5500. Mw/Mn = t O9(7)
片末端にスチリル基を有するポリMMAのマクロモノマ
ーを収率90.3襲で得た。Application example 1 100 grams of anhydrous tetrahydrofuran (TH) under dry nitrogen
F) 1c, m, P-vinylphenylketene methyltrimethylsilyl acetal (hereinafter referred to as VPKTSA)
(Mixture of 60% meta and 40% bulk) 1.585
(5.65 mmol) and tris(dimethylamino)sulfonium difluorotrimethylsilicate (hereinafter referred to as TA
S F2S iMe3) 0.0 part (0,11
16.9 parts (0.17 mol) of methyl methacrylate (hereinafter abbreviated as MMA) purified on calcium hydride (CaH2) were added and polymerized at room temperature for 3 hours. In addition to the hexane solution containing 5 timemethanol,
Mn=5500. Mw/Mn = tO9(7)
A polyMMA macromonomer having a styryl group at one end was obtained in a yield of 90.3 times.
エニルプロトンによるピークが見られ、このフェニルプ
ロトンによるピークの積分値とメトキシ基のメチルプロ
トンによるピーク(3,6ppm) の積分値を比較
した結果、ポIJ M M Aの末端に1つステリル基
が導入していることがわかった。A peak due to the enyl proton was observed, and as a result of comparing the integral value of the peak due to this phenyl proton and the integral value of the peak due to the methyl proton of the methoxy group (3.6 ppm), it was found that there is one steryl group at the end of PoIJ MMA. I found out that it has been installed.
また、このポリマーのタフティシティをNMRで調べた
ところ、シンジオタクチックが58.6%、アイソタク
チックが56.0%、ヘテロタクチックが54%であっ
た。Further, when the toughness of this polymer was examined by NMR, it was found to be 58.6% syndiotactic, 56.0% isotactic, and 54% heterotactic.
応用例2〜4
M M A単量体と開始剤V P K ’l’ S A
との仕込みモル比を30 : I VPKTSAと触媒
’I’ASF2SiMe3のモル比を100:5と一定
とし、室温で所定時間実施例1と同様に重合した。得ら
れた結果を表−1に示す。いずれの実施例でも、マクロ
七ツマ−の分子量分布は1.1以下と単分散に近いもの
であった。Application examples 2 to 4 MMA monomer and initiator V P K 'l' S A
The molar ratio of VPKTSA and the catalyst 'I'ASF2SiMe3 was kept constant at 100:5, and polymerization was carried out in the same manner as in Example 1 at room temperature for a predetermined period of time. The results obtained are shown in Table-1. In all of the examples, the molecular weight distribution of the macro-natsummer was 1.1 or less, which was close to monodisperse.
応用例5〜10
MMAと開始剤の仕込み割合を60〜1000間で変え
、重合温度を0℃と室温とでおこなうほかは実施例1と
同様の操作でMMAの重合をおこない下表の結果をえた
。Application Examples 5 to 10 MMA was polymerized in the same manner as in Example 1, except that the charging ratio of MMA and initiator was varied between 60 and 1000, and the polymerization temperature was 0°C and room temperature.The results are shown in the table below. I got it.
実施例6で得たポリMMAマクロモノマーのGPCチャ
ートを第4図に示す。第4図から分子量1oooo以上
の分子量であっても、対称性のすぐれたGPCチャート
となり、単分散性のよいマクロモノマーであることがわ
かる。A GPC chart of the polyMMA macromonomer obtained in Example 6 is shown in FIG. From FIG. 4, it can be seen that even when the molecular weight is 1 ooooo or more, the GPC chart has excellent symmetry and is a macromonomer with good monodispersity.
応用例11
乾燥窒素下に20!R1の無水テトラヒドロフラン中に
開始剤VPKTSA1.23部(5ミリモル)とTA
S F25j Mes 0.03部(0,1ミリモル
)およびCaH,で精製したアクリル酸エチル(以下E
Aと略す)10部(100ミIJモル)を混ぜ、室温下
24時間重合させた。これを5チメタノール入りヘキサ
ン液で4回洗浄し、ポIJEAのマクロモノマーを得た
(収率4 B、 2 % )。このものの分子量をGP
Cで調べたところ、Mn=1800、Mw/Mn=12
8であった。Application example 11 20 under dry nitrogen! Initiator VPKTSA 1.23 parts (5 mmol) and TA in anhydrous tetrahydrofuran in R1
S F25j Mes 0.03 part (0.1 mmol) and ethyl acrylate purified with CaH (hereinafter referred to as E
10 parts (abbreviated as A) (100 mmol) were mixed and polymerized at room temperature for 24 hours. This was washed four times with a hexane solution containing 5-timeethanol to obtain a macromonomer of poIJEA (yield: 4B, 2%). The molecular weight of this substance is GP
When I checked with C, Mn=1800, Mw/Mn=12
It was 8.
応用例12
乾燥窒素下に20m1の無水テトラヒドロフラン中に開
始剤VPKTSAα62部(2,5ミリモル)とTAS
F2SiMe+ 0.05部(o、1ミリモル)およ
びCaH,上で精製したシクロヘキシルメタクリレート
3.36部(20ミリモル)を0〜35℃に保持しなが
ら、24時間重合させた。重合終了後この溶液をメタノ
ールに加え、ポリマーを析出させ、減圧乾燥するとMn
=1280、Mw/Mn=115のポリ(シクロヘキシ
ルメタクリレート)マクロモノマーが収率92.0%で
得られた。Application example 12 62 parts of initiator VPKTSAα (2.5 mmol) and TAS in 20 ml of anhydrous tetrahydrofuran under dry nitrogen
0.05 parts (o, 1 mmol) of F2SiMe+ and 3.36 parts (20 mmol) of cyclohexyl methacrylate purified over CaH were polymerized for 24 hours while being maintained at 0-35°C. After the polymerization was completed, this solution was added to methanol to precipitate the polymer, and when dried under reduced pressure, Mn
Poly(cyclohexyl methacrylate) macromonomer with =1280 and Mw/Mn =115 was obtained in a yield of 92.0%.
応用例13
乾燥窒素下50dの無水T HF中に開始剤VPKTS
A1.23部(5ミリモル)とTASF SiMes
Q、03部(0,1ミリモル)を混合し?
た溶液KCaH,上で精製したブチルメタクリレート2
8.4部(0,2モル)を温度が30℃以上に上昇しな
いように少しずつ滴下し、12時間重合させた。得られ
た溶液を真空で蒸発し、Mn=4700、Mw/Mn=
111のポリ(ブチルメタクリレート)マクロモノ
マーを収率893チで得た。Application example 13 Initiator VPKTS in anhydrous THF for 50 d under dry nitrogen
1.23 parts (5 mmol) of A and TASF SiMes
Q. Mix 03 parts (0.1 mmol)? solution KCaH, butyl methacrylate 2 purified above
8.4 parts (0.2 mol) was added dropwise little by little so that the temperature did not rise above 30° C., and the mixture was polymerized for 12 hours. The resulting solution was evaporated in vacuo, Mn=4700, Mw/Mn=
111 poly(butyl methacrylate) macromonomers were obtained in a yield of 893 cm.
応用例14
乾燥窒素下に0℃において50m1の無水THF中にV
PKTSAt23部(5ミリモル)およびTASF2S
iMes O,03部(0,1ミリモル)の混合溶液
にCaH2上で精製したMMA5部(O,OSモル)と
アルミナ上で精製したグリシジルメタクリレート11部
(O,OSモル)の混合物を、滴下中湿度を0〜60℃
に維持させながら滴下した。Application example 14 V in 50 ml of anhydrous THF at 0°C under dry nitrogen
23 parts (5 mmol) of PKTSAt and TASF2S
A mixture of 5 parts of MMA purified on CaH2 (O, OS mol) and 11 parts of glycidyl methacrylate purified on alumina (O, OS mol) was added dropwise to a mixed solution of iMes O, 3 parts (0,1 mmol). Humidity 0-60℃
It was dripped while maintaining the temperature.
滴下終了後、更に3時間攪拌したのち、ヘキサンでポリ
マーを沈でんさせ、減圧乾燥させ、12.05Iのポリ
(MMA/グリシジルメタクリレート共重合体)マクロ
モノマーをえた。このもののMn=2500、Mw/M
n 1.15であった。After the addition was completed, the mixture was further stirred for 3 hours, and then the polymer was precipitated with hexane and dried under reduced pressure to obtain a 12.05I poly(MMA/glycidyl methacrylate copolymer) macromonomer. Mn=2500, Mw/M of this
n was 1.15.
応用例15
実施例1で得た末端スチリル基のボIJMMAマクロモ
ノ−r −(Mn = 3500、Mw/M n =
1.09 )28部(8ミリモル)と開始剤AIBN0
.25部(1,5ミリモル)をベンゼン1001に溶解
し、真空下60℃でラジカル重合させた。重合率の時間
変化を第5図に示した。これによりポリMMAマクロモ
ノマーは高いラジカル重合性を有すると同時に純度も9
5%以上であることがわかった。Application example 15 IJMMA macromono-r-(Mn = 3500, Mw/Mn =
1.09) 28 parts (8 mmol) and initiator AIBN0
.. 25 parts (1.5 mmol) were dissolved in benzene 1001 and subjected to radical polymerization at 60° C. under vacuum. Figure 5 shows the change in polymerization rate over time. As a result, the polyMMA macromonomer has high radical polymerizability and at the same time has a purity of 9.
It was found that it was 5% or more.
(ハ)発明の効果
本発明のm−又はP−ビニルフェニルケテンメチルトリ
メチルシリルアセタールは、そのメチルトリメチルシリ
ルケテンアセタール基を利用することによりイオン重合
法における重合開始剤として使用することができ、例え
ばメタクリル酸メチルのイオン重合において、重合開始
剤トしてm−又はP−ビニルフェニルケテンメチルトリ
メチルシリルアセタールを用い、助触媒としてトリス(
ジメチルアミノ)スルホニウムジフルオロトリメチルシ
リケートを使い、室温にてメタクリル酸メチルを重合さ
せることにより、片末端にラジカル重合性のステリル基
をもつポリメタクリル酸メチルを作ることができ、さら
にこれを他モノマーとラジカル重合させることにより容
易にグラフトポリマーを作ることができる。(c) Effects of the invention The m- or P-vinylphenylketene methyltrimethylsilyl acetal of the present invention can be used as a polymerization initiator in an ionic polymerization method by utilizing its methyltrimethylsilylketene acetal group, such as methacrylic acid. In the ionic polymerization of methyl, m- or P-vinylphenylketene methyl trimethylsilyl acetal is used as a polymerization initiator, and tris(
By polymerizing methyl methacrylate using dimethylamino)sulfonium difluorotrimethylsilicate at room temperature, polymethyl methacrylate having a radically polymerizable steryl group at one end can be produced, and this can be further combined with other monomers to form a radically polymerizable steryl group. A graft polymer can be easily produced by polymerization.
また、本発明のm−又はP−ビニルフェニルケテンメチ
ルトリメチルシリルアセタールは、反応性に富むトリメ
チルシリル基をもつため、ラジカル重合を行った後、例
えばエチレングリコール、ブタンジオール、ポリエステ
ルポリオールなどを架橋剤として容易に硬化できる。こ
の硬化方法はアミンなどを使う方法でないため着色や劣
化等の問題が生じにくい。又、特殊な機能をもつアルコ
ールなどと反応させることにより容易に機能性モノマー
を合成でき、これを基に各種樹脂を製造することができ
る。In addition, since the m- or P-vinylphenylketene methyltrimethylsilyl acetal of the present invention has a highly reactive trimethylsilyl group, it can be easily used as a crosslinking agent, such as ethylene glycol, butanediol, or polyester polyol, after radical polymerization. It can be hardened to Since this curing method does not use amines or the like, problems such as coloring and deterioration are less likely to occur. Further, functional monomers can be easily synthesized by reacting with alcohols having special functions, and various resins can be produced based on this.
上記のようにして得られた種々の重合体は、塗料、ゴム
、接着剤等として工業的に有用である。The various polymers obtained as described above are industrially useful as paints, rubbers, adhesives, and the like.
第1図は実施例1において得られたP−ビニルフェニル
ケテンメチルトリメチルシリルアセタールのNMRスペ
クトルを示し、第2図は実施例2において得られたm−
ビニルフェニルケテンメチルトリメチルシリルアセター
ルのNMRスペクトルを示す。また第3図は応用例1で
得られた片末端ステリル基を有するポリMMAのマクロ
モノマーのNMRチャートであり、第4図は応用例6で
得られた片末端スチリル基を有するポIJMMAのマク
ロモノマーのGPCチャー) (UVは245nm、R
Iは屈折率を表わす)であり、第5図は応用例15にお
ける重合率と時間の関係を示したグラフである。FIG. 1 shows the NMR spectrum of P-vinylphenylketenemethyltrimethylsilylacetal obtained in Example 1, and FIG. 2 shows the m-
1 shows an NMR spectrum of vinyl phenylketene methyltrimethylsilyl acetal. Figure 3 is an NMR chart of the macromonomer of polyMMA having a steryl group at one end obtained in Application Example 1, and Figure 4 is an NMR chart of the macromonomer of polyMMA having a styryl group at one end obtained in Application Example 6. GPC chart of monomer) (UV is 245 nm, R
I represents the refractive index), and FIG. 5 is a graph showing the relationship between the polymerization rate and time in Application Example 15.
Claims (1)
位置にビニル基を有するビニルフェニルケテンメチルト
リメチルシリルアセタール。 ▲数式、化学式、表等があります▼(1) ▲数式、化学式、表等があります▼(2)[Claims] 1. Vinyl phenylketene methyltrimethylsilyl acetal having a vinyl group at the m- or P-position represented by the following formula (1) or (2). ▲There are mathematical formulas, chemical formulas, tables, etc.▼(1) ▲There are mathematical formulas, chemical formulas, tables, etc.▼(2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60202547A JPS6263595A (en) | 1985-09-14 | 1985-09-14 | Vinylphenylketene methyltrimethylsilyl acetal |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60202547A JPS6263595A (en) | 1985-09-14 | 1985-09-14 | Vinylphenylketene methyltrimethylsilyl acetal |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6263595A true JPS6263595A (en) | 1987-03-20 |
Family
ID=16459307
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60202547A Pending JPS6263595A (en) | 1985-09-14 | 1985-09-14 | Vinylphenylketene methyltrimethylsilyl acetal |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6263595A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010148520A3 (en) * | 2009-09-15 | 2011-02-17 | Mylan Group | Copolymers, polymeric particles comprising said copolymers and copolymeric binders for radiation-sensitive coating compositions for negative-working radiation-sensitive lithographic printing plates |
WO2011006265A3 (en) * | 2010-09-14 | 2011-07-21 | Mylan Group | Copolymers for near-infrared radiation-sensitive coating compositions for positive-working thermal lithographic printing plates |
-
1985
- 1985-09-14 JP JP60202547A patent/JPS6263595A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010148520A3 (en) * | 2009-09-15 | 2011-02-17 | Mylan Group | Copolymers, polymeric particles comprising said copolymers and copolymeric binders for radiation-sensitive coating compositions for negative-working radiation-sensitive lithographic printing plates |
AU2010265775B2 (en) * | 2009-09-15 | 2013-09-12 | Mylan Group | Copolymers, polymeric particles comprising said copolymers and copolymeric binders for radiation-sensitive coating compositions for negative-working radiation-sensitive lithographic printing plates |
US9482944B2 (en) | 2009-09-15 | 2016-11-01 | Mylan Group | Copolymers, polymeric particles comprising said copolymers and copolymeric binders for radiation-sensitive coating compositions for negative-working radiation-sensitive lithographic printing plates |
WO2011006265A3 (en) * | 2010-09-14 | 2011-07-21 | Mylan Group | Copolymers for near-infrared radiation-sensitive coating compositions for positive-working thermal lithographic printing plates |
US9822206B2 (en) | 2010-09-14 | 2017-11-21 | Mylan Group | Copolymers for near-infrared radiation-sensitive coating compositions for positive-working thermal lithographic printing plates |
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