JPS6261018B2 - - Google Patents
Info
- Publication number
- JPS6261018B2 JPS6261018B2 JP9422080A JP9422080A JPS6261018B2 JP S6261018 B2 JPS6261018 B2 JP S6261018B2 JP 9422080 A JP9422080 A JP 9422080A JP 9422080 A JP9422080 A JP 9422080A JP S6261018 B2 JPS6261018 B2 JP S6261018B2
- Authority
- JP
- Japan
- Prior art keywords
- liquid crystal
- trans
- acid
- point
- mol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004973 liquid crystal related substance Substances 0.000 claims description 27
- 239000000203 mixture Substances 0.000 claims description 20
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims description 11
- 239000005711 Benzoic acid Substances 0.000 claims description 5
- 235000010233 benzoic acid Nutrition 0.000 claims description 5
- 150000002148 esters Chemical class 0.000 claims description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 description 17
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 12
- -1 cyclohexanecarboxylic acid cyclohexane ester Chemical class 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 5
- 239000007795 chemical reaction product Substances 0.000 description 5
- 238000010992 reflux Methods 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 5
- FJKROLUGYXJWQN-UHFFFAOYSA-N 4-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 4
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 4
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- 239000004988 Nematic liquid crystal Substances 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 235000019441 ethanol Nutrition 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000012280 lithium aluminium hydride Substances 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N methanol Natural products OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- VQGHOUODWALEFC-UHFFFAOYSA-N 2-phenylpyridine Chemical compound C1=CC=CC=C1C1=CC=CC=N1 VQGHOUODWALEFC-UHFFFAOYSA-N 0.000 description 2
- 229940090248 4-hydroxybenzoic acid Drugs 0.000 description 2
- YVPZFPKENDZQEJ-UHFFFAOYSA-N 4-propylcyclohexan-1-ol Chemical compound CCCC1CCC(O)CC1 YVPZFPKENDZQEJ-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 125000004494 ethyl ester group Chemical group 0.000 description 2
- 230000002140 halogenating effect Effects 0.000 description 2
- 229910000042 hydrogen bromide Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- FNUWTRXUMODLEK-UHFFFAOYSA-N 1-(bromomethyl)-4-propylcyclohexane Chemical compound CCCC1CCC(CBr)CC1 FNUWTRXUMODLEK-UHFFFAOYSA-N 0.000 description 1
- SHFGENOBPXWUJF-UHFFFAOYSA-N 2-(2-phenylphenyl)benzonitrile Chemical group N#CC1=CC=CC=C1C1=CC=CC=C1C1=CC=CC=C1 SHFGENOBPXWUJF-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- LNEMDIUSUQPKIP-UHFFFAOYSA-N 2-phenyl-1,3-dioxane Chemical compound O1CCCOC1C1=CC=CC=C1 LNEMDIUSUQPKIP-UHFFFAOYSA-N 0.000 description 1
- QCNUKEGGHOLBES-UHFFFAOYSA-N 4-propylcyclohexane-1-carboxylic acid Chemical compound CCCC1CCC(C(O)=O)CC1 QCNUKEGGHOLBES-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- AGBINQHSDMZNBI-MGCOHNPYSA-N CCC[C@H]1CC[C@H](CO)CC1 Chemical compound CCC[C@H]1CC[C@H](CO)CC1 AGBINQHSDMZNBI-MGCOHNPYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910010082 LiAlH Inorganic materials 0.000 description 1
- PHSPJQZRQAJPPF-UHFFFAOYSA-N N-alpha-Methylhistamine Chemical compound CNCCC1=CN=CN1 PHSPJQZRQAJPPF-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000004990 Smectic liquid crystal Substances 0.000 description 1
- 229960000583 acetic acid Drugs 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 125000005337 azoxy group Chemical group [N+]([O-])(=N*)* 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- IGARGHRYKHJQSM-UHFFFAOYSA-N cyclohexylbenzene Chemical compound C1CCCCC1C1=CC=CC=C1 IGARGHRYKHJQSM-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- JVZRCNQLWOELDU-UHFFFAOYSA-N gamma-Phenylpyridine Natural products C1=CC=CC=C1C1=CC=NC=C1 JVZRCNQLWOELDU-UHFFFAOYSA-N 0.000 description 1
- 239000012362 glacial acetic acid Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- XONPDZSGENTBNJ-UHFFFAOYSA-N molecular hydrogen;sodium Chemical compound [Na].[H][H] XONPDZSGENTBNJ-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- FCJSHPDYVMKCHI-UHFFFAOYSA-N phenyl benzoate Chemical compound C=1C=CC=CC=1C(=O)OC1=CC=CC=C1 FCJSHPDYVMKCHI-UHFFFAOYSA-N 0.000 description 1
- OPYYWWIJPHKUDZ-UHFFFAOYSA-N phenyl cyclohexanecarboxylate Chemical compound C1CCCCC1C(=O)OC1=CC=CC=C1 OPYYWWIJPHKUDZ-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Liquid Crystal Substances (AREA)
Description
本発明は新規な有機化合物に関し、更に詳しく
は液晶材料の一成分として使用することが出来る
新規な液晶化合物に関するものである。
周知の如く、正の誘電異方性を有する液晶物質
は捩れた配列を持つたネマチツク液晶を用いる液
晶表示素子、いわゆるTN型セルに利用出来る
他、適当な色素物質を添加して、ゲスト・ホスト
効果を応用したカラー液晶表示素子にも使用され
る。これらの液晶材料は、単独の化合物ではその
諸特性、即ち液晶温度範囲、動作電圧、応答性能
等で実用的な使用に耐えるものは今のところな
く、実用的には数種の液晶化合物又は非液晶化合
物を混合してある程度の使用に耐え得るものを得
ているのが現状である。
本発明の目的は、この様な実用的な性能のすぐ
れた、且つ安定な液晶組成物を構成する一成分と
して有用な液晶化合物を提供することにある。
本発明は上記の目的に合つた誘電異方性が極め
て小さい負の値の、液晶温度範囲が広く、且つ透
明点(N−I点)の高い、安定性にすぐれた新規
な液晶化合物を提供するものである。即ち本発明
は一般式
(但し上式に於てR1,R2はH又は炭素数1〜
10のアルキル基を示す)
で表わされる4−(トランス−4′−アルキルシク
ロヘキシルメトキシ)安息香酸トランス−4″−ア
ルキルシクロヘキシルエステルである。
本発明の化合物は広いネマチツク温度範囲を持
つが融点(C−N点)が高いため、この化合物単
独では表示素子用としての実用性はない。しかし
他の液晶化合物との相溶性にすぐれ、又その透明
点(N−I点)が高いため他の液晶物質、例えば
シツフ塩素系、アゾキシ系、安息香酸フエニルエ
ステル系、シクロヘキサンカルボン酸フエニルエ
ステル系、シクロヘキサンカルボン酸シクロヘキ
サンエステル系、ビフエニル系、フエニルシクロ
ヘキサン系、フエニルピリジン系、フエニルメタ
ジオキサン系などの液晶の一種類、あるいは数種
の系の混合物と混合させることにより、その透明
点を上昇せしめるいわゆる高温液晶成分として有
用であり、更に従来同じ様な目的で広く用いられ
ているシアノターフエニル系、シアノビフエニル
シクロヘキサン系などの液晶物質に比べ比較的低
粘度であるので、本化合物を利用することにより
応答性能がよく、温度依存性のより小さなすぐれ
た性能の液晶組成物を得ることができる。
次に本発明の化合物の製法を示す。まず化学式
でその概略を示すと
まずトランス−4−アルキルシクロヘキサンカ
ルボン酸()を出発原料とし、これとエチルア
ルコールとを酸触媒下反応させエステル化合物
()を得る(ステツプA)。次いで溶媒中で
()に水素化アルミニウムリチウムLiAlH4を低
温で反応せしめカルビノール化合物()を得る
(ステツプB)。この環元反応は触媒を用いた水素
還元によることも可能である。次に()に臭化
水素や三臭化燐の如きハロゲン化剤を反応させ臭
化物()を得(ステツプC)、この()とp
−ヒドロキシ安息香酸とを反応させると4−(ト
ランス−4′−シクロヘキシルメチル)安息香酸
()が得られる(ステツプD)。この()に
SOCl2に代表されるハロゲン化剤を反応させて酸
塩化物(又は酸ハロゲン化物)とし(ステツプ
E)、それとトランス−4−アルキルシクロヘキ
サノールとを不活性有機溶媒中で反応させること
により目的とする()式の化合物が得られる
(ステツプF)。
この様にして得られた()式の化合物の物性
(相転移点)を第1表に示す。
The present invention relates to a novel organic compound, and more particularly to a novel liquid crystal compound that can be used as a component of a liquid crystal material. As is well known, liquid crystal materials with positive dielectric anisotropy can be used in liquid crystal display devices that use nematic liquid crystals with twisted alignment, so-called TN cells, and can also be used as guest hosts by adding appropriate dye materials. It is also used in color liquid crystal display elements that apply this effect. As for these liquid crystal materials, there is currently no single compound that can withstand practical use due to its various properties, such as liquid crystal temperature range, operating voltage, response performance, etc., and for practical use, several types of liquid crystal compounds or non-compounds are suitable. Currently, liquid crystal compounds are mixed to obtain products that can withstand a certain level of use. An object of the present invention is to provide a liquid crystal compound useful as a component constituting such a stable liquid crystal composition with excellent practical performance. The present invention provides a novel liquid crystal compound with extremely small negative dielectric anisotropy, wide liquid crystal temperature range, high clearing point (N-I point), and excellent stability, which meets the above objectives. It is something to do. That is, the present invention is based on the general formula (However, in the above formula, R 1 and R 2 are H or carbon number 1 to
4-(trans-4'-alkylcyclohexylmethoxy)benzoic acid trans-4''-alkylcyclohexyl ester represented by 10 alkyl groups). The compounds of the present invention have a wide nematic temperature range, but have a melting point (C -N point), this compound alone is not practical for display devices.However, it has excellent compatibility with other liquid crystal compounds, and its high clearing point (N-I point) makes it difficult to use for display devices. Substances such as Schiff chlorine type, azoxy type, benzoic acid phenyl ester type, cyclohexanecarboxylic acid phenyl ester type, cyclohexanecarboxylic acid cyclohexane ester type, biphenyl type, phenylcyclohexane type, phenylpyridine type, phenylmetadioxane type It is useful as a so-called high-temperature liquid crystal component that increases the clearing point by mixing it with one type of liquid crystal, or a mixture of several types, such as cyanoterphenyl, which has been widely used for the same purpose. It has a relatively low viscosity compared to liquid crystal materials such as cyanobiphenylcyclohexane-based and cyanobiphenylcyclohexane-based materials, so by using this compound, it is possible to obtain a liquid crystal composition with excellent performance that has good response performance and less temperature dependence. Next, the method for producing the compound of the present invention will be shown. First, the chemical formula will be shown briefly. First, trans-4-alkylcyclohexanecarboxylic acid () is used as a starting material, and this and ethyl alcohol are reacted under an acid catalyst to obtain an ester compound () (Step A). Next, () is reacted with lithium aluminum hydride LiAlH 4 in a solvent at low temperature to obtain a carbinol compound () (Step B). This ring reaction can also be carried out by hydrogen reduction using a catalyst. Next, () is reacted with a halogenating agent such as hydrogen bromide or phosphorus tribromide to obtain bromide () (Step C), and this () and p
-Hydroxybenzoic acid is reacted with 4-(trans-4'-cyclohexylmethyl)benzoic acid (Step D). to this ()
A halogenating agent such as SOCl 2 is reacted to form an acid chloride (or acid halide) (Step E), and this is reacted with trans-4-alkylcyclohexanol in an inert organic solvent to achieve the desired purpose. A compound of formula () is obtained (Step F). Table 1 shows the physical properties (phase transition point) of the compound of formula () thus obtained.
〔ステツプ A〕
トランス−4−n−プロピルシクロヘキサンカ
ルボン酸()170.24g(1モル)をエチルアル
コール350mlに溶解し、これに95%濃硫酸40mlを
加えて還流下で2時間反応させた後過剰のエチル
アルコールを留去した。反応生成物をn−ヘキサ
ン100mlで抽出し、抽出液を水洗後、無水硫酸マ
グネシウムを用いて乾燥し、n−ヘキサンを留去
し、残液を減圧蒸留して167.2gのトランス−4
−n−プロピルシクロヘキサンカルボン酸エチル
エステル()を得た。沸点73℃/1mmHg、収
率84.3%。
〔ステツプ B〕
ステツプAで得られたエチルエステル()
198g(1モル)を乾燥したテトラヒドロフラン
100mlに溶解し、一方乾燥したテトラヒドロフラ
ン700ml中に水素化アルミニウムリチウム24g
(0.633モル)を懸濁して激しく撹拌しながら先の
()の溶液を滴下して行く。滴下が終つてから
還流下に2時間加熱し、冷却後、過剰の水素化ア
ルミニウムリチウムを分解するために注意深く酢
酸エチルを添加する。次いで20%硫酸を無機物が
溶解するまで加えた。生成物をn−ヘキサンで抽
出し、抽出液を水洗、無水硫酸マグネシウムを用
いて乾燥後、n−ヘキサンを留去、残液を減圧蒸
留してトランス−4−n−プロピルシクロヘキシ
ルカルビノール()148g(0.94モル)を得
た。収率94.0%、沸点76℃/1mmHg。
〔ステツプ C〕
ステツプBで得られたカルビノール156,3g
(1モル)に47%臭化水素水307g(1.784モル)、
95%硫酸93gを添加して還流下に3時間加熱し
た。反応後冷却し、反応生成物をn−ヘキサンで
抽出し、抽出液を2%重ソウ水溶液で、続いて水
で洗浄後、無水硫酸マグネシウムを用いて乾燥
し、n−ヘキサンを留去してから残液を減圧蒸留
して臭化トランス−4−n−プロピルシクロヘキ
シルメチル()162.2g(0.74モル)を得た。
収率74.0%、沸点64℃/1mmHg。
〔ステツプ D〕
4−ヒドロキシ安息香酸13.81g(0.1モル)を
エチレングリコールモノメチルエーテル50mlに溶
解し、次いで苛性ソーダ8g(0.2モル)を15ml
の水に溶解したアルカリ水溶液を注意深く加え30
分間撹拌した。次いでステツプCで得られた化合
物()を21.92g(0.1モル)を30分間で加え、
更に還流下で5時間加熱した。冷却後、50%塩酸
を加えて析出した反応生成物を濾別し、水洗乾燥
した。それを氷酢酸150mlで再結晶して20.72g
(0.75モル)の4−(トランス−4′−n−プロピル
シクロヘキシルメトキシ)安息香酸()を得
た。収率75%、又このものはスメクチツク(S)
及びネマチツク液晶相を示し、C−S点は213
℃、S−N点は228℃、N−I点は235℃であつ
た。
〔ステツプ E,F〕
ステツプDで得られた安息香酸()13.82g
(0.05モル)を塩化チオニル50gに溶解し、還流
下で1時間反応させた後、過剰の塩化チオニルを
留去し酸クロリド()を得る(ステツプE)。
一方トランス−4−プロピルシクロヘキサノール
7.12g(0.05モル)を乾燥したピリジン20mlに溶
解させ、そこへ先の酸クロリドを室温で加え、更
に70℃で2時間加熱撹拌した。冷却後、反応生成
物を100mlのトルエンで抽出し、抽出液を希塩
酸、希アルカリ、水の順で洗浄後、無水硫酸マグ
ネシウムを用いて乾燥し、しかる後トルエンを留
去した。得られた反応生成物をベンゼン−エチル
アルコール混合溶媒から再結晶させて目的の4−
(トランス−4′−n−プロピルシクロヘキシルメ
トキシ)安息香酸トランス−4″−プロピルシクロ
ヘキシルエステル()9.61g(0.024モル)を
得た(収率48.0%)。その融点(C−N点)は97
℃,N−I点は149℃であつた。又その元素分析
値は次の如く計算値とよく一致し、目的物である
ことがわかる。
分析値(%) 計算値(%)
C27H42O3として)
C 78.18 78.01
H 10.12 10.00
実施例 2〜8
実施例1と全く同様の方法で()式でR1,
R2が第1表の実施例2〜8に示す様な組み合わ
せのものを夫々に対応する原料を使用して製造し
た。そのネマチツク液晶温度範囲は先に示した第
1表の通りである。
実施例9 (応用例1)
なる組成の液晶組成物(A)のN−I点は63.3℃であ
る。この液晶組成物85重量%に対し次の本発明の
化合物3種
を夫々5重量%加えた液晶組成物(B)を調製したと
ころ、そのN−I点は73.0℃に上昇し、−20℃で
2日間放置しても結晶の分離、析出等の異常は見
られなかつた。次に透明電極の上にSiO2膜を形
成させ、ラビングによる表面配向処理を施した2
板のガラス基板間に上記2種の液晶組成物を封入
して、セル厚10μmのTNセル(ねじれネマチツ
クセル)を作り、32Hzの短形波でそのしきい値電
圧を測定したところ、組成物(A)のそれは1.62V、
組成物(B)のそれは1.75Vであつたが、その0〜40
℃間の温度依存性は前者が−13.5mV/℃である
のに対し後者は−11.5mV/℃と小さくなつてい
た。又急峻性を示すγ値(V50−V10/V50×10
0(%)
で示される;V10,V50は夫々透過率が10%,50%
なる電圧を示す)は前者が14.8%後者が14.6%で
あり、更にそのγ値の0〜40℃間の温度依存性は
前者が0.81(%/℃)なのに対し後者では0.65
(%/℃)と少なくなつている。
実施例10 (応用例2)
なる組成の液晶組成物(C)のN−I点は72.5℃であ
る。この液晶組成物70重量%に対し次の3種の本
発明の化合物
を各10重量%加えた液晶組成物(D)を調製したとこ
ろ、そのN−点は84.8℃に上昇し、−20℃に2
日放置しても結晶の分離析出は見られなかつた。
又、応用例1の場合と同じ様に、この液晶組成物
を使用してTNセルを作り、その特性を測定した
ところ、組成物(C)のしきい値電圧は1.80V、組成
物(D)のそれは1.88Vであつたが、その0〜40℃間
の温度依存性は前者が−9.5mV/℃であるのに
対し後者は−7.3mV/℃と小さくなつている。
又γ値は前者が14.4%、後者が13.3%で、その温
度依存性は前者の0.52%/℃から0.38%/℃に低
くなつている。
[Step A] 170.24 g (1 mol) of trans-4-n-propylcyclohexanecarboxylic acid () was dissolved in 350 ml of ethyl alcohol, and 40 ml of 95% concentrated sulfuric acid was added thereto. After reacting under reflux for 2 hours, excess of ethyl alcohol was distilled off. The reaction product was extracted with 100 ml of n-hexane, the extract was washed with water, dried over anhydrous magnesium sulfate, the n-hexane was distilled off, and the residual liquid was distilled under reduced pressure to obtain 167.2 g of trans-4.
-n-propylcyclohexanecarboxylic acid ethyl ester () was obtained. Boiling point 73℃/1mmHg, yield 84.3%. [Step B] Ethyl ester obtained in Step A ()
198g (1 mol) of dried tetrahydrofuran
24 g of lithium aluminum hydride dissolved in 100 ml of tetrahydrofuran while drying
(0.633 mol) is suspended and the solution in () is added dropwise while stirring vigorously. After the addition is complete, the mixture is heated under reflux for 2 hours, and after cooling, ethyl acetate is carefully added to decompose the excess lithium aluminum hydride. Then 20% sulfuric acid was added until the inorganics were dissolved. The product was extracted with n-hexane, the extract was washed with water, dried over anhydrous magnesium sulfate, the n-hexane was distilled off, and the residual liquid was distilled under reduced pressure to obtain trans-4-n-propylcyclohexylcarbinol (). 148g (0.94 mol) was obtained. Yield 94.0%, boiling point 76℃/1mmHg. [Step C] 156.3 g of carbinol obtained in Step B
(1 mol) to 47% hydrogen bromide water 307g (1.784 mol),
93 g of 95% sulfuric acid was added and heated under reflux for 3 hours. After the reaction was cooled, the reaction product was extracted with n-hexane, and the extract was washed with a 2% aqueous sodium hydrogen solution and then with water, dried over anhydrous magnesium sulfate, and the n-hexane was distilled off. The residual liquid was distilled under reduced pressure to obtain 162.2 g (0.74 mol) of trans-4-n-propylcyclohexylmethyl bromide ().
Yield 74.0%, boiling point 64℃/1mmHg. [Step D] Dissolve 13.81 g (0.1 mol) of 4-hydroxybenzoic acid in 50 ml of ethylene glycol monomethyl ether, then dissolve 8 g (0.2 mol) of caustic soda in 15 ml.
Carefully add an aqueous alkaline solution dissolved in water of 30
Stir for a minute. Next, 21.92 g (0.1 mol) of the compound () obtained in Step C was added over 30 minutes.
The mixture was further heated under reflux for 5 hours. After cooling, 50% hydrochloric acid was added and the precipitated reaction product was filtered out, washed with water and dried. Recrystallize it with 150ml of glacial acetic acid and get 20.72g.
(0.75 mol) of 4-(trans-4'-n-propylcyclohexylmethoxy)benzoic acid () was obtained. Yield 75%, and this product is smectic (S)
It shows a nematic liquid crystal phase, and the C-S point is 213
℃, the SN point was 228°C, and the NI point was 235°C. [Step E, F] 13.82 g of benzoic acid () obtained in Step D
(0.05 mol) was dissolved in 50 g of thionyl chloride and reacted under reflux for 1 hour, and then excess thionyl chloride was distilled off to obtain acid chloride (2) (Step E).
On the other hand, trans-4-propylcyclohexanol
7.12 g (0.05 mol) was dissolved in 20 ml of dry pyridine, the above acid chloride was added thereto at room temperature, and the mixture was further heated and stirred at 70°C for 2 hours. After cooling, the reaction product was extracted with 100 ml of toluene, and the extract was washed with dilute hydrochloric acid, dilute alkali, and water in that order, and then dried using anhydrous magnesium sulfate, and then the toluene was distilled off. The obtained reaction product was recrystallized from a benzene-ethyl alcohol mixed solvent to obtain the desired 4-
(trans-4'-n-propylcyclohexylmethoxy)benzoic acid trans-4''-propylcyclohexyl ester () 9.61 g (0.024 mol) was obtained (yield 48.0%). Its melting point (C-N point) was 97
℃, the N-I point was 149℃. Moreover, the elemental analysis values agree well with the calculated values as shown below, indicating that it is the desired product. Analyzed value (%) Calculated value (%)
C 27 H 42 O 3 ) C 78.18 78.01 H 10.12 10.00 Examples 2 to 8 In the same manner as in Example 1, R 1 ,
Combinations of R 2 as shown in Examples 2 to 8 in Table 1 were produced using the corresponding raw materials. The nematic liquid crystal temperature range is shown in Table 1 above. Example 9 (Application example 1) The NI point of the liquid crystal composition (A) having the following composition is 63.3°C. The following three compounds of the present invention are added to 85% by weight of this liquid crystal composition. When a liquid crystal composition (B) was prepared in which 5% by weight of each of I couldn't help it. Next, a SiO 2 film was formed on the transparent electrode, and surface alignment treatment was performed by rubbing.
A TN cell (twisted nematic cell) with a cell thickness of 10 μm was made by sealing the two types of liquid crystal compositions between the glass substrates of the plate, and the threshold voltage was measured using a rectangular wave of 32 Hz. A) It is 1.62V,
That of composition (B) was 1.75V;
The temperature dependence between the two temperatures was -13.5 mV/°C for the former, while it was -11.5 mV/°C for the latter. In addition, the γ value (V 50 −V 10 /V 50 ×10
0 (%); V 10 and V 50 have transmittance of 10% and 50%, respectively.
The former is 14.8% and the latter is 14.6%, and the temperature dependence of the γ value between 0 and 40°C is 0.81 (%/°C) for the former, but 0.65 for the latter.
(%/℃). Example 10 (Application example 2) The NI point of the liquid crystal composition (C) having the following composition is 72.5°C. The following three compounds of the present invention are added to 70% by weight of this liquid crystal composition. When a liquid crystal composition (D) was prepared in which 10% by weight of each of
No separation and precipitation of crystals was observed even after being left in the sun.
In addition, in the same way as in Application Example 1, a TN cell was made using this liquid crystal composition and its characteristics were measured. The threshold voltage of composition (C) was 1.80V, and that of composition (D). ) was 1.88V, but its temperature dependence between 0 and 40°C was -9.5mV/°C for the former, while it was -7.3mV/°C for the latter.
Furthermore, the γ value is 14.4% for the former and 13.3% for the latter, and its temperature dependence has decreased from 0.52%/°C for the former to 0.38%/°C.
Claims (1)
〜10のアルキル基を示す) で表わされる4−(トランス−4′−アルキルシク
ロヘキシルメトキシ)安息香酸トランス−4″−ア
ルキルシクロヘキシルエステル。 2 一般式 (但し、上式に於てR1,R2はH又は炭素数1
〜10のアルキル基を示す) で表わされる4−(トランス−4′−アルキルシク
ロヘキシルメトキシ)安息香酸トランス−4″−ア
ルキルシクロヘキシルエステルを少なくとも一種
含有することを特徴とする液晶組成物。[Claims] 1. General formula (However, in the above formula, R 1 and R 2 are H or carbon number 1
-10 alkyl groups) 4-(trans-4'-alkylcyclohexylmethoxy)benzoic acid trans-4''-alkylcyclohexyl ester represented by 2 General formula (However, in the above formula, R 1 and R 2 are H or carbon number 1
A liquid crystal composition containing at least one type of 4-(trans-4'-alkylcyclohexylmethoxy)benzoic acid trans-4''-alkylcyclohexyl ester represented by the following formula (10 to 10 alkyl groups).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9422080A JPS5718649A (en) | 1980-07-10 | 1980-07-10 | 4-(trans-4'-alkylcyclohexylmethoxy)benzoic acid trans-4"- alkylcyclohexyl ester |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9422080A JPS5718649A (en) | 1980-07-10 | 1980-07-10 | 4-(trans-4'-alkylcyclohexylmethoxy)benzoic acid trans-4"- alkylcyclohexyl ester |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5718649A JPS5718649A (en) | 1982-01-30 |
JPS6261018B2 true JPS6261018B2 (en) | 1987-12-18 |
Family
ID=14104226
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9422080A Granted JPS5718649A (en) | 1980-07-10 | 1980-07-10 | 4-(trans-4'-alkylcyclohexylmethoxy)benzoic acid trans-4"- alkylcyclohexyl ester |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5718649A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101336292B (en) | 2005-12-27 | 2013-09-11 | 协和发酵生化株式会社 | Method for production of L-glutamine |
-
1980
- 1980-07-10 JP JP9422080A patent/JPS5718649A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5718649A (en) | 1982-01-30 |
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