JPS6259953U - - Google Patents

Info

Publication number
JPS6259953U
JPS6259953U JP15216085U JP15216085U JPS6259953U JP S6259953 U JPS6259953 U JP S6259953U JP 15216085 U JP15216085 U JP 15216085U JP 15216085 U JP15216085 U JP 15216085U JP S6259953 U JPS6259953 U JP S6259953U
Authority
JP
Japan
Prior art keywords
electrode
electron beam
insulator
beam lithography
lithography apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15216085U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP15216085U priority Critical patent/JPS6259953U/ja
Publication of JPS6259953U publication Critical patent/JPS6259953U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
JP15216085U 1985-10-04 1985-10-04 Pending JPS6259953U (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15216085U JPS6259953U (enrdf_load_stackoverflow) 1985-10-04 1985-10-04

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15216085U JPS6259953U (enrdf_load_stackoverflow) 1985-10-04 1985-10-04

Publications (1)

Publication Number Publication Date
JPS6259953U true JPS6259953U (enrdf_load_stackoverflow) 1987-04-14

Family

ID=31069887

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15216085U Pending JPS6259953U (enrdf_load_stackoverflow) 1985-10-04 1985-10-04

Country Status (1)

Country Link
JP (1) JPS6259953U (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000251816A (ja) * 1999-02-24 2000-09-14 Leica Microsystems Lithography Gmbh 粒子線を静電的に偏向させる装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000251816A (ja) * 1999-02-24 2000-09-14 Leica Microsystems Lithography Gmbh 粒子線を静電的に偏向させる装置

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