JPS6259953U - - Google Patents
Info
- Publication number
- JPS6259953U JPS6259953U JP15216085U JP15216085U JPS6259953U JP S6259953 U JPS6259953 U JP S6259953U JP 15216085 U JP15216085 U JP 15216085U JP 15216085 U JP15216085 U JP 15216085U JP S6259953 U JPS6259953 U JP S6259953U
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- electron beam
- insulator
- beam lithography
- lithography apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012212 insulator Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15216085U JPS6259953U (cs) | 1985-10-04 | 1985-10-04 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15216085U JPS6259953U (cs) | 1985-10-04 | 1985-10-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6259953U true JPS6259953U (cs) | 1987-04-14 |
Family
ID=31069887
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15216085U Pending JPS6259953U (cs) | 1985-10-04 | 1985-10-04 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6259953U (cs) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000251816A (ja) * | 1999-02-24 | 2000-09-14 | Leica Microsystems Lithography Gmbh | 粒子線を静電的に偏向させる装置 |
-
1985
- 1985-10-04 JP JP15216085U patent/JPS6259953U/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000251816A (ja) * | 1999-02-24 | 2000-09-14 | Leica Microsystems Lithography Gmbh | 粒子線を静電的に偏向させる装置 |