JPS625635U - - Google Patents
Info
- Publication number
- JPS625635U JPS625635U JP9708885U JP9708885U JPS625635U JP S625635 U JPS625635 U JP S625635U JP 9708885 U JP9708885 U JP 9708885U JP 9708885 U JP9708885 U JP 9708885U JP S625635 U JPS625635 U JP S625635U
- Authority
- JP
- Japan
- Prior art keywords
- resist film
- coated substrate
- plate
- heating body
- shaped heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010438 heat treatment Methods 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 5
- 230000017525 heat dissipation Effects 0.000 claims 1
Landscapes
- Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
- Coating Apparatus (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985097088U JPH0234822Y2 (US20100012521A1-20100121-C00001.png) | 1985-06-26 | 1985-06-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985097088U JPH0234822Y2 (US20100012521A1-20100121-C00001.png) | 1985-06-26 | 1985-06-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS625635U true JPS625635U (US20100012521A1-20100121-C00001.png) | 1987-01-14 |
| JPH0234822Y2 JPH0234822Y2 (US20100012521A1-20100121-C00001.png) | 1990-09-19 |
Family
ID=30963661
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985097088U Expired JPH0234822Y2 (US20100012521A1-20100121-C00001.png) | 1985-06-26 | 1985-06-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0234822Y2 (US20100012521A1-20100121-C00001.png) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101877403B1 (ko) * | 2016-01-12 | 2018-07-13 | 에이피시스템 주식회사 | 기판 처리 장치 및 방법 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52142972A (en) * | 1976-05-25 | 1977-11-29 | Toshiba Corp | Semiconductor production device |
| JPS5726433A (en) * | 1980-07-23 | 1982-02-12 | Hitachi Ltd | Bake of photoresist or the like and apparatus therefor |
| JPS5961027A (ja) * | 1982-09-29 | 1984-04-07 | Toshiba Corp | 半導体基板加熱装置 |
| JPS59211243A (ja) * | 1983-05-17 | 1984-11-30 | Toshiba Corp | 半導体基板処理装置 |
-
1985
- 1985-06-26 JP JP1985097088U patent/JPH0234822Y2/ja not_active Expired
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52142972A (en) * | 1976-05-25 | 1977-11-29 | Toshiba Corp | Semiconductor production device |
| JPS5726433A (en) * | 1980-07-23 | 1982-02-12 | Hitachi Ltd | Bake of photoresist or the like and apparatus therefor |
| JPS5961027A (ja) * | 1982-09-29 | 1984-04-07 | Toshiba Corp | 半導体基板加熱装置 |
| JPS59211243A (ja) * | 1983-05-17 | 1984-11-30 | Toshiba Corp | 半導体基板処理装置 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101877403B1 (ko) * | 2016-01-12 | 2018-07-13 | 에이피시스템 주식회사 | 기판 처리 장치 및 방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0234822Y2 (US20100012521A1-20100121-C00001.png) | 1990-09-19 |
