JPS6242514A - Molecular beam crystal growth device - Google Patents

Molecular beam crystal growth device

Info

Publication number
JPS6242514A
JPS6242514A JP18227085A JP18227085A JPS6242514A JP S6242514 A JPS6242514 A JP S6242514A JP 18227085 A JP18227085 A JP 18227085A JP 18227085 A JP18227085 A JP 18227085A JP S6242514 A JPS6242514 A JP S6242514A
Authority
JP
Japan
Prior art keywords
substrate
light
hole
view
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18227085A
Other languages
Japanese (ja)
Inventor
Kazuhiro Kondo
和博 近藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP18227085A priority Critical patent/JPS6242514A/en
Publication of JPS6242514A publication Critical patent/JPS6242514A/en
Pending legal-status Critical Current

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  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)

Abstract

PURPOSE:To prevent attenuation of light preventing a view port from becoming cloudy, by providing the device with a construction where light coming from the view point is applied to a substrate through a small hole in a shielding plate which is placed at the focal point. CONSTITUTION:A shielding plate 15 is, for example, made of tantalum and provided with a hole 15a with a diameter of 1mm, and a hole 15a is positioned on the focal point of a lens 12. The plate 15 is arranged a little bit distant from the wall of a chamber 19, and the flow of molecules produced by reevaporation of a substrate 16 is prevented from entering the furnace while the inside of the port 14 is held about the same vacuum degree as that of the chamber. The light is stopped down through the hole 15a and applied to the substrate 16, however, the molecules produced by the reevaporation of the substrate 16 scarcely reach the view port 13 since the hole is small, with the result that the view port 13 does not become cloudy, thereby preventing the the light form being attenuated.

Description

【発明の詳細な説明】 〔概要〕 ビューボート(光の透過窓)と基板の間に焦点を結ぶよ
うな光学系をもち、ビューポートから入った光が焦点位
置におかれた遮蔽板の小穴を通り基板に照射する構成と
した分子線結晶成長装置である。
[Detailed Description of the Invention] [Summary] A small hole in a shielding plate that has an optical system that focuses between a view port (light transmission window) and a substrate, and the light that enters from the view port is placed at the focal position. This is a molecular beam crystal growth apparatus configured to irradiate the substrate through the rays.

〔産業上の利用分野〕[Industrial application field]

本発明は光を用いる分子線エピタキシャル(MBE )
成長に関するもので、さらに詳しく言えばビューボート
のくもりを抑え光の減衰を防ぐ構成とした分子線結晶成
長装置に関する。
The present invention is based on molecular beam epitaxy (MBE) using light.
It relates to crystal growth, and more specifically, it relates to a molecular beam crystal growth apparatus configured to suppress clouding of the view boat and prevent attenuation of light.

〔従来の技術〕[Conventional technology]

光(例えば紫外光)を基板に照射し、光化学反応で結晶
成長や不純物拡散(ドーピング)を促進するMBE法の
研究が最近活発になってきた。第3図には光を利用する
ガスソースMBI!装置が模式的に断面図で示されるが
、高真空に保たれるチャンバ31にはヒータ33によっ
て加熱される基板32が配置され、チャンバ31にはポ
ート34が連結され、ポート内にはガス導入管35.3
6を通して成長用ガスとH2ガスがそれぞれ供給され、
基板とは反対側にはビューボート37が設けられ、光源
38から出る光はレンズ39、ビューボート38を通っ
て基板32上に照射される。成長用ガスは光を吸収し、
光分解を起して例えば結晶が基板上に堆積される。
Recently, research has become active on the MBE method, in which a substrate is irradiated with light (for example, ultraviolet light) to promote crystal growth and impurity diffusion (doping) through a photochemical reaction. Figure 3 shows a gas source MBI that uses light! The device is schematically shown in cross-sectional view, and a substrate 32 heated by a heater 33 is arranged in a chamber 31 maintained in a high vacuum, a port 34 is connected to the chamber 31, and a gas is introduced into the port. tube 35.3
Growth gas and H2 gas are respectively supplied through 6,
A view boat 37 is provided on the opposite side of the substrate, and light emitted from a light source passes through a lens 39 and the view boat 38 and is irradiated onto the substrate 32. The growth gas absorbs light,
For example, crystals are deposited on a substrate by photolysis.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

前記した如き装置において光を装置内に入れるためには
、光を通過しつつ高真空を保つことのできるビューボー
トが必要であるが、例えばGaAs基板上にGaAs結
晶を成長すると、Asを含むガス(例えばアルシン)が
大量に供給されるので、成長中基板からAsが再蒸発し
、このAsがビューボートの内側に蒸着され、ビューボ
ートがくもって基板にあたる光が弱められていた。それ
を防止すべくビューボートの近くにシャッタを設けるこ
とが提案されたが、結晶成長中シャッタは開にしておか
なければならないから、シャッタを設けてもビューボー
トの(ちりを抑えるにはさほど効果がない。
In order to let light into the device as described above, a view boat is required that can maintain a high vacuum while allowing the light to pass through. For example, when a GaAs crystal is grown on a GaAs substrate, a gas containing As Since a large amount of (eg, arsine) was supplied, As was re-evaporated from the substrate during growth, and this As was deposited inside the viewboat, clouding the viewboat and weakening the light hitting the substrate. In order to prevent this, it was proposed to install a shutter near the view boat, but since the shutter must be kept open during crystal growth, installing a shutter is not very effective in suppressing the dust on the view boat. There is no.

本発明はこのような点に鑑みて創作されたもので、MB
ll+装置において、ビューボートのくもりを防止しう
る装置を提供することを目的とする。
The present invention was created in view of these points, and the MB
An object of the present invention is to provide a device that can prevent fogging of a view boat in a II+ device.

〔問題点を解決するための手段〕[Means for solving problems]

第1図は本発明の一実施例の断面図である。 FIG. 1 is a sectional view of an embodiment of the present invention.

第1図において、レンズ12、ビューボート13を通っ
てボート14に入る光11は、レンズL2の焦点位置に
配置された遮蔽板15の穴15aを通って基板16に照
射される構成となっている。
In FIG. 1, the light 11 that passes through the lens 12 and the view boat 13 and enters the boat 14 is irradiated onto the substrate 16 through the hole 15a of the shielding plate 15 arranged at the focal position of the lens L2. There is.

〔作用〕[Effect]

本発明の目的は、基板にあてる光をさえぎらず、基板か
らの再蒸発をさえぎり、ビューボートをくもらないよう
にすることにあるので、焦点位置に穴を設けることによ
って光をさえぎらず、また穴が小さいので基板から再蒸
発した分子はほとんどビューボートにあたらないように
したものである。
The purpose of the present invention is to not block the light hitting the substrate, block re-evaporation from the substrate, and prevent the view boat from becoming foggy. is small, so most of the molecules re-evaporated from the substrate do not hit the view boat.

〔実施例〕〔Example〕

以下、図面を参照して本発明の実施例を詳細に説明する
Embodiments of the present invention will be described in detail below with reference to the drawings.

本発明の一実施例は第1図の断面図に示され、図におい
て、11は図示しない光源例えば重水素ランプから出さ
れる光、12はレンズ、工3はビニ−ボート(光透過窓
)、14はボート、15は遮蔽板、15aは遮蔽板15
に形成した小さな穴、16は基板、17は基板が載置さ
れるステージ、18は基板16を例えば600℃〜70
0℃に加熱するヒータ、19は真空チャンバである。真
空チャンバは例えば始めに1×10〜” Torr程度
の高真空に保たれ、次いで成長用ガスが導入されるとき
にはI X 10−6Torr程度の真空に保たれる。
One embodiment of the present invention is shown in the cross-sectional view of FIG. 1, in which 11 is light emitted from a light source (not shown), such as a deuterium lamp, 12 is a lens, 3 is a vinyl boat (light-transmitting window), 14 is a boat, 15 is a shielding plate, 15a is a shielding plate 15
16 is a substrate, 17 is a stage on which the substrate is placed, 18 is a small hole formed in the substrate 16,
A heater for heating to 0° C. and a vacuum chamber 19 are provided. For example, the vacuum chamber is initially maintained at a high vacuum of about 1.times.10" Torr, and then maintained at a vacuum of about I.times.10@-6 Torr when the growth gas is introduced.

成長用ガスなどを供給するガス導入管は図示しないが、
チャンバ19に連結された他のボートに連結されている
Although the gas introduction pipe that supplies growth gas etc. is not shown,
It is connected to another boat connected to chamber 19.

遮蔽板15は例えばタンタル板で作り、直径1mm程度
の穴15aをあけ、穴15aの位置はレンズ12の焦点
位置にくるようにする。遮蔽板15はチャンバ19の壁
から若干能して配置し、ボート14内もチャンバ内と同
程度の真空度に保たれる一方で、基板16からの再蒸発
による分子流がファーネス内に入ることのないようにす
る。遮蔽板15は取外し可能に設置し、チャンバを清浄
するとき共に清浄されるようにするとよい。
The shielding plate 15 is made of, for example, a tantalum plate, and a hole 15a having a diameter of about 1 mm is formed so that the hole 15a is located at the focal point of the lens 12. The shielding plate 15 is arranged slightly from the wall of the chamber 19, and while the inside of the boat 14 is maintained at the same degree of vacuum as the inside of the chamber, the molecular flow due to re-evaporation from the substrate 16 enters the furnace. Make sure that there is no The shielding plate 15 is preferably installed in a removable manner so that it is also cleaned when the chamber is cleaned.

前記した構成により、光は穴15aで絞られ、しかる後
に基板16に照射されるが、基板16の再蒸発による分
子は、穴15aが前記した如く小さいものであるので、
はとんどビューボートに達することがなく、遮蔽板がな
いときは数枚の基板にエビクキシャル成長した段階でビ
ューボートがくもったが、図示の実施例においては、2
0枚の基板に結晶成長させてもくもりはほとんど観測さ
れなかった。
With the above-described configuration, the light is focused by the hole 15a and then irradiated onto the substrate 16, but the molecules due to re-evaporation of the substrate 16 are small as the hole 15a is as described above.
However, in the illustrated embodiment, when there was no shielding plate, the view boat was clouded at the stage of eviaxial growth on several substrates.
Even when crystal growth was performed on 0 substrates, almost no clouding was observed.

第2図は本発明の他の実施例の断面図で、この実施例に
おいては、遮蔽板15に代えて遮蔽ブロック25を用い
る。ブロック25は中央部にテーバした開孔部25aが
形成されたもので、開孔部25aのビューボートに近い
側で小穴を提供する構成とし、この小穴がレンズ12の
焦点位置にあるようにする。
FIG. 2 is a sectional view of another embodiment of the present invention, in which a shielding block 25 is used in place of the shielding plate 15. The block 25 has a tapered aperture 25a formed in its center, and is configured to provide a small hole on the side of the aperture 25a closer to the view boat, so that this small hole is located at the focal point of the lens 12. .

ブロックの形状は直方体または円柱体いずれでもよいが
、それをチャンバ内に固定するときには遮蔽板15の場
合と同様にチャンバの壁との間に僅かの空隙を残すよう
にする。この実施例では開孔部25aがつまり難く、遮
蔽板よりもより長期の使用が可能である。
The shape of the block may be either a rectangular parallelepiped or a cylinder, but when it is fixed in the chamber, a small gap is left between it and the wall of the chamber, as in the case of the shielding plate 15. In this embodiment, the aperture 25a is less likely to be clogged and can be used for a longer period of time than a shielding plate.

〔発明の効果〕〔Effect of the invention〕

以上述べてきたように本発明によれば、MBE装置にお
いてビューボートのくもりが抑えられ、半導体装置製造
工程の作業性を改善するに有効である。
As described above, according to the present invention, fogging of the view port is suppressed in an MBE apparatus, and is effective in improving workability in a semiconductor device manufacturing process.

【図面の簡単な説明】[Brief explanation of drawings]

第1図と第2図は本発明実施例の断面図、第3図は従来
例断面図である。 第1図と第2図において、 11は光、 12はレンズ、 13はビューボート、 14はボート、 15は遮蔽板、 15aは穴、 16は基板、 17はステージ、 18はヒータ、 19はチャンバ、 25は遮蔽ブロック、 25aは開孔部である。
FIGS. 1 and 2 are cross-sectional views of an embodiment of the present invention, and FIG. 3 is a cross-sectional view of a conventional example. 1 and 2, 11 is a light, 12 is a lens, 13 is a view boat, 14 is a boat, 15 is a shielding plate, 15a is a hole, 16 is a substrate, 17 is a stage, 18 is a heater, and 19 is a chamber , 25 is a shielding block, and 25a is an opening.

Claims (1)

【特許請求の範囲】 チャンバ(19)に連結されたファーネスのチャンバ内
の基板(16)とは反対側に光透過窓(13)を設け、 前記窓(13)の外方には光(11)を絞るレンズ(1
2)を配置し、 チャンバ(19)のポート(14)に近い部分には穴(
15a)が形成された遮蔽板(15)を配置し、前記穴
(15a)の位置はレンズ(12)の焦点位置に合致せ
しめ、 光(11)をレンズ(12)、窓(13)、穴(15a
)を通して基板(16)に照射する構成としたことを特
徴とする分子線結晶成長装置。
[Claims] A light transmitting window (13) is provided on the side opposite to the substrate (16) in the chamber of the furnace connected to the chamber (19), and a light (11) is provided outside the window (13). ) to narrow down the lens (1
2), and a hole (
15a) is arranged, and the position of the hole (15a) is made to match the focal position of the lens (12), and the light (11) is passed through the lens (12), the window (13), and the hole. (15a
) A molecular beam crystal growth apparatus characterized in that it is configured to irradiate a substrate (16) through a substrate (16).
JP18227085A 1985-08-20 1985-08-20 Molecular beam crystal growth device Pending JPS6242514A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18227085A JPS6242514A (en) 1985-08-20 1985-08-20 Molecular beam crystal growth device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18227085A JPS6242514A (en) 1985-08-20 1985-08-20 Molecular beam crystal growth device

Publications (1)

Publication Number Publication Date
JPS6242514A true JPS6242514A (en) 1987-02-24

Family

ID=16115322

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18227085A Pending JPS6242514A (en) 1985-08-20 1985-08-20 Molecular beam crystal growth device

Country Status (1)

Country Link
JP (1) JPS6242514A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6306246B1 (en) * 2000-01-14 2001-10-23 Advanced Micro Devices, Inc. Dual window optical port for improved end point detection
US6712927B1 (en) * 1998-06-11 2004-03-30 Applied Materials Inc. Chamber having process monitoring window

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6712927B1 (en) * 1998-06-11 2004-03-30 Applied Materials Inc. Chamber having process monitoring window
US6835275B1 (en) * 1998-06-11 2004-12-28 Michael N. Grimbergen Reducing deposition of process residues on a surface in a chamber
US6306246B1 (en) * 2000-01-14 2001-10-23 Advanced Micro Devices, Inc. Dual window optical port for improved end point detection

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