JPS6240146B2 - - Google Patents

Info

Publication number
JPS6240146B2
JPS6240146B2 JP58113793A JP11379383A JPS6240146B2 JP S6240146 B2 JPS6240146 B2 JP S6240146B2 JP 58113793 A JP58113793 A JP 58113793A JP 11379383 A JP11379383 A JP 11379383A JP S6240146 B2 JPS6240146 B2 JP S6240146B2
Authority
JP
Japan
Prior art keywords
processing container
tank
nozzle
boiling point
point solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58113793A
Other languages
Japanese (ja)
Other versions
JPS606352A (en
Inventor
Shigeru Sakuma
Seihachiro Pponma
Toshimasa Nakahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GENSHIRYOKU DAIKO KK
MIKI KOGYO KK
SHII ESU SHII KK
Original Assignee
GENSHIRYOKU DAIKO KK
MIKI KOGYO KK
SHII ESU SHII KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GENSHIRYOKU DAIKO KK, MIKI KOGYO KK, SHII ESU SHII KK filed Critical GENSHIRYOKU DAIKO KK
Priority to JP11379383A priority Critical patent/JPS606352A/en
Publication of JPS606352A publication Critical patent/JPS606352A/en
Publication of JPS6240146B2 publication Critical patent/JPS6240146B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C1/00Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
    • B24C1/08Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods for polishing surfaces, e.g. smoothing a surface by making use of liquid-borne abrasives

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Description

【発明の詳細な説明】 〔技術分野〕 本発明は処理液を機械部品等の被処理物に投射
して研削し被処理物に付着した汚れ、油脂、錆等
の表面固着物の研削、又は表面硬化等を行う湿式
ブラスト装置に関するものである。
[Detailed Description of the Invention] [Technical Field] The present invention is a method for grinding objects to be processed such as mechanical parts by spraying a processing liquid onto the objects to be processed, thereby removing dirt, oil, rust, etc. that have adhered to the surfaces of the objects. The present invention relates to a wet blasting device that performs surface hardening and the like.

〔従来技術〕[Prior art]

従来、この種の湿式ブラスト装置は、水とアル
ミナ又はガラス・ビーズ等の研磨材粒子の混合液
を圧縮空気と共にノズルから噴射させる構成のも
のがある。混合液の噴射によつて被処理物の表面
及び隙間等に付着した汚れ等の固着物の除去、表
面の効果等の加工を行うものである。
Conventionally, this type of wet blasting apparatus has a configuration in which a liquid mixture of water and abrasive particles such as alumina or glass beads is injected from a nozzle together with compressed air. By spraying the mixed liquid, it removes adhered substances such as dirt attached to the surface and crevices of the object to be treated, and processes the surface to improve its effects.

ところが、上記従来の湿式ブラスト装置におい
ては、被処理物の出し入れの際、処理容器内の汚
染空気が外部に漏洩する。特に前記被処理物が放
射性汚染物の場合には、処理容器内の汚染空気等
が外部に漏洩してしまい、大きな問題が発生す
る。
However, in the above-mentioned conventional wet blasting apparatus, contaminated air inside the processing container leaks to the outside when the object to be processed is taken in and out. Particularly when the object to be processed is radioactively contaminated, contaminated air or the like inside the processing container may leak to the outside, causing a serious problem.

〔目的〕〔the purpose〕

本発明は以上述べたような従来の問題点に鑑み
てなされたものであり、その目的とするところは
「少なくとも低沸点溶剤を含む溶液を貯えるタン
クを備え、被処理物の出し入れ及び密閉が可能な
処理容器と、前記タンク内の前記溶液を前記処理
容器内に設けたノズルに供給するポンプ手段と、
前記処理容器内から前記低沸点溶剤の気化ガスを
吸入する吸入手段と、吸入した前記気化ガスを加
圧し前記ノズルから高速噴射する噴射手段と、前
記吸入手段と噴射手段とを調整して前記処理容器
内を負圧状態にする調整手段とを備えたこと」を
特徴とし、低沸点溶剤を用いることにより被処理
物の効果的な洗浄、脱脂処理を実現し、かつ研磨
材及び被処理物から除去された洗浄汚物を乾燥し
た状態で容易に回収できる湿式ブラスト装置を提
供することにある。
The present invention has been made in view of the conventional problems described above, and its purpose is to provide a tank for storing a solution containing at least a low boiling point solvent, and to enable loading and unloading of objects to be treated and sealing. a processing container; a pump means for supplying the solution in the tank to a nozzle provided in the processing container;
A suction means for sucking the vaporized gas of the low boiling point solvent from inside the processing container, an injection means for pressurizing the sucked vaporized gas and injecting it at high speed from the nozzle, and adjusting the suction means and the injection means to carry out the processing. It is characterized by the fact that it is equipped with an adjustment means to bring the inside of the container into a negative pressure state, and by using a low-boiling point solvent, it realizes effective cleaning and degreasing of the object to be treated, and it also removes the abrasive material and the object to be treated. To provide a wet blasting device capable of easily collecting removed washed dirt in a dry state.

また他の目的として「少なくとも低沸点溶剤を
含む溶液を貯えるタンクを備え、被処理物の出し
入れ及び密閉が可能な処理容器と、前記処理容器
から、前記低沸点溶剤の気化ガスを吸入する吸入
手段と、吸入した前記気化ガスを加圧して前記ノ
ズルから高速噴射する噴射手段と、前記ノズル内
にベンチユリ効果を発生させる気化ガス噴出手段
と、前記ベンチユリ効果を利用して前記タンク内
の前記溶液を吸い上げる吸い上げ手段と、前記吸
入手段と前記噴射手段とを調整し、前記処理容器
内を負圧状態にする調整手段とを備えたこと」を
特徴とし、低沸点溶剤を用いることにより汚れ及
び油脂の付着が軽度な被処理物に最適な洗浄、脱
脂も行なう研磨力を有し、かつ研磨材及び被処理
物から除去された洗浄汚物を乾燥した状態で容易
に回収できる簡素な装置構成で低電力化を図つた
湿式ブラスト装置を提供することにある。
In addition, another object of the present invention is to provide a processing container which is equipped with a tank for storing a solution containing at least a low-boiling point solvent and is capable of taking in and out the object to be processed and sealing it, and a suction means for inhaling vaporized gas of the low-boiling point solvent from the processing container. an injection means for pressurizing the inhaled vaporized gas and injecting it at high speed from the nozzle; a vaporized gas ejection means for generating a Bench-Yuri effect in the nozzle; and a means for adjusting the suction means and the injection means to bring the inside of the processing container into a negative pressure state. It has abrasive power that is ideal for cleaning and degreasing objects with light adhesion, and it has a simple device configuration and low power consumption that can easily collect the cleaning dirt removed from the abrasive and the object in a dry state. The object of the present invention is to provide a wet blasting device that is designed to improve the

〔実施例〕〔Example〕

以下、本発明につき好適なる一実施例を示す図
面を参照して詳細に説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a preferred embodiment of the present invention will be described in detail with reference to the drawings.

本発明の一実施例に係る湿式ブラスト装置の基
本構成を示す図において、参照番号1は原子力発
電所における汚染工具等の被処理物(図示せず)
の処理を行う処理容器であり、高い密閉性を有す
る構造である。処理容器1の下部に設けられたタ
ンク3内には低沸点溶剤であるフロンとアルミナ
又はガラス・ビーズ等の研磨材を混合して成る混
合液2が貯えられている。4は噴射ノズルであ
る。タンク3の混合液2はポンプ6によりライン
30、バルブV8を介して送られ後述のフロンガ
スと共に噴射ノズル4から処理容器1内に配され
た被処理物に噴出される。
In a diagram showing the basic configuration of a wet blasting apparatus according to an embodiment of the present invention, reference number 1 indicates a workpiece (not shown) such as a contaminated tool in a nuclear power plant.
It is a processing container that performs processing, and has a highly airtight structure. In a tank 3 provided at the bottom of the processing container 1, a mixed liquid 2 made by mixing Freon, which is a low boiling point solvent, and an abrasive material such as alumina or glass beads is stored. 4 is an injection nozzle. The mixed liquid 2 in the tank 3 is sent by the pump 6 through a line 30 and a valve V8, and is ejected from the injection nozzle 4 onto the object to be processed disposed in the processing container 1 together with fluorocarbon gas, which will be described later.

噴出した混合液2は被処理物から除去された固
着物と共に再びタンク3に戻るが、フロン液のう
ち一部は気化し処理容器1上部の排気筒よりフイ
ルタ7、バルブV2のあるライン31を通つて圧
縮機8に送られる。フイルタ7はフロンガスに含
まれている研磨材等の微粒子を除去するためのも
のである。ライン31を介して圧縮機8に送られ
たフロンガスは圧縮されて高圧ガスとなり、油分
離器9及びドライヤ10を経てライン32、バル
ブV1を通つて前述したポンプ6によつて吸い上
げられた混合液2の加圧源として噴射される。運
転中は以上の循環系により連続平衡状態を保つ。
ここで、油分離器9は圧縮機8内の潤滑油がフロ
ンガスに混入するため、これを除去すると共にラ
イン33及び34を介して再び圧縮機8内に戻す
ものである。これにより、潤滑油の消費が抑えら
れる。ドライヤ10は処理容器1内の残留空気が
フロンガスに混入するため、空気に含まれる水分
を除去するものである。
The spouted mixed liquid 2 returns to the tank 3 together with the solid matter removed from the object to be processed, but some of the fluorocarbon liquid is vaporized and flows from the exhaust pipe at the top of the processing container 1 to the line 31 where the filter 7 and valve V2 are located. and is sent to the compressor 8. The filter 7 is for removing particulates such as abrasives contained in the fluorocarbon gas. The fluorocarbon gas sent to the compressor 8 via the line 31 is compressed and becomes a high-pressure gas, which passes through the oil separator 9 and the dryer 10, passes through the line 32, and the valve V1, and is sucked up by the pump 6 as a liquid mixture. It is injected as a pressure source of 2. During operation, a continuous equilibrium state is maintained by the above circulation system.
Here, since the lubricating oil in the compressor 8 mixes with the freon gas, the oil separator 9 removes it and returns it to the compressor 8 via the lines 33 and 34. This reduces lubricant consumption. The dryer 10 removes moisture contained in the air since residual air in the processing container 1 mixes with the fluorocarbon gas.

なお、前述のポンプ6によりライン30、噴射
ノズル4、タンク3を高速循環する混合液2の一
部は撹拌用ライン35に分流して直接タンク3に
返還される。この撹拌用ライン35からの返還に
より、タンク3内の混合液2の撹拌がなされ、フ
ロン液と研磨材粒子との混合状態が均一に保た
れ、研磨材のみが沈澱することが防止される。
Note that a part of the mixed liquid 2 that is circulated at high speed through the line 30, the injection nozzle 4, and the tank 3 by the pump 6 described above is diverted to the stirring line 35 and directly returned to the tank 3. By this return from the stirring line 35, the mixed liquid 2 in the tank 3 is stirred, the mixed state of the Freon liquid and the abrasive particles is maintained uniformly, and only the abrasive is prevented from settling.

さて、噴射ノズル4から噴射された混合液2及
びフロンガスは高圧状態から急激に解放されるこ
とから、フロンガスの自己冷却作用が働き温度が
低下する。一方、ポンプ6により高速循環する混
合液2は前述の撹拌に伴う熱によつて温度が上昇
するが、上記の温度低下と平衡するため処理容器
1内の温度及びタンク3内の混合液2の温度はフ
ロンの大気圧での沸点以下の温度に保たれる。従
つて、被処理物を処理容器1に出し入れする時
に、開閉用扉を開放してもフロンの蒸発による消
費は微少に抑えられる。また、圧縮機8のフロン
ガス吸引量をノズル4からの噴出量よりも多くし
て運転中の処理容器内を常に外気より負圧に保つ
ことにより、ガスの漏れを防ぐと共に、汚染物の
外部漏洩を防いでいる。
Now, since the mixed liquid 2 and the fluorocarbon gas injected from the injection nozzle 4 are suddenly released from the high pressure state, the self-cooling action of the fluorocarbon gas acts and the temperature decreases. On the other hand, the temperature of the mixed liquid 2 that is circulated at high speed by the pump 6 increases due to the heat generated by the above-mentioned stirring, but in order to balance this temperature drop, the temperature in the processing container 1 and the mixed liquid 2 in the tank 3 increase. The temperature is kept below the boiling point of Freon at atmospheric pressure. Therefore, even if the opening/closing door is opened when the object to be processed is taken into or taken out of the processing container 1, the amount of fluorocarbon consumed by evaporation can be suppressed to a minimum. In addition, by increasing the amount of fluorocarbon gas suctioned by the compressor 8 than the amount ejected from the nozzle 4 to maintain the inside of the processing container at a negative pressure compared to the outside air at all times during operation, gas leakage is prevented and contaminants are leaked to the outside. is prevented.

圧縮機8から吐出された高圧のフロンガスの一
部はライン36で分流され圧力弁11を経て液化
器12へ送られる。圧力弁11は圧縮機8による
吸引、吐出を調節するものであり、処理容器1か
らライン31、ライン32を経て処理容器1へ至
るフロンガスの流れが平衡状態を保つよう余剰の
ガスを液化器12へ導く。液化器12は送られた
フロンガスを冷却器12―1によつて液化される
と共に、フロンガスに混入していた残留空気を排
気管12―1から分離除去させることができる。
更に、液化したフロンは液化器12からライン3
7、バルブV3を経て蒸留器13に送られる。蒸
留器13に送られたフロンはヒータ14の加熱に
よる蒸発と、冷凍機19からの冷却器13―1に
よる液化によつて再度凝縮され、ライン38を介
して次の貯液器16に送られる。なお、15は水
分離器であり、蒸留器13内の残留水分を除去す
る。また、上記蒸留によつてフロンから分離され
蒸留器13下部に溜つた油(前記油分離器9によ
つて除去しきれなかつた圧縮機8の潤滑油)はラ
イン39を介して圧縮機8に戻される。
A part of the high-pressure fluorocarbon gas discharged from the compressor 8 is divided into lines 36 and sent to the liquefier 12 via the pressure valve 11. The pressure valve 11 is used to adjust suction and discharge by the compressor 8, and is used to drain excess gas to the liquefier 12 so that the flow of fluorocarbon gas from the processing container 1 to the processing container 1 via the lines 31 and 32 maintains an equilibrium state. lead to. The liquefier 12 can liquefy the sent Freon gas by the cooler 12-1 and separate and remove residual air mixed in the Freon gas from the exhaust pipe 12-1.
Furthermore, the liquefied Freon is transferred from the liquefier 12 to the line 3.
7. It is sent to the distiller 13 via valve V3. The fluorocarbons sent to the distiller 13 are evaporated by heating by the heater 14 and condensed again by the cooler 13-1 from the refrigerator 19, and then sent to the next liquid reservoir 16 via the line 38. . Note that 15 is a water separator, which removes residual moisture in the distiller 13. In addition, the oil separated from the fluorocarbons by the distillation and accumulated at the bottom of the distiller 13 (the lubricating oil of the compressor 8 that could not be removed by the oil separator 9) is transferred to the compressor 8 via a line 39. be returned.

貯液器16は蒸留された清浄フロンを貯えるた
め冷凍機19による冷却器16―1を備える。ま
た新液供給のための給液口17を備える。貯液器
16に接続された給液ポンプ18は、貯えられた
フロンをライン40を経て処理容器1内のタンク
3に供給すると共に、噴射ノズル4による処理が
終了した被処理物の最終洗浄のため洗浄ノズル5
へ送る。洗浄ノズル5へのフロン液の供給はライ
ン40から分流するライン41を介して行われ
る。また、タンク3及び洗浄ノズル5への供給は
バルブ10,11の開閉により同時に又は必要に
応じ一方のみが行われ、かつ供給量が調節され
る。タンク3に取付けられた液面計20は常に適
正な液量を保つよう、減少分を検知し、給液ポン
プを作動させて液面を一定に保つ。
The liquid reservoir 16 is equipped with a cooler 16-1 including a refrigerator 19 for storing distilled clean fluorocarbon. It also includes a liquid supply port 17 for supplying new liquid. A liquid supply pump 18 connected to the liquid storage device 16 supplies the stored fluorocarbon to the tank 3 in the processing container 1 through a line 40, and also performs the final cleaning of the processed material after the treatment by the injection nozzle 4. Refill cleaning nozzle 5
send to The fluorocarbon liquid is supplied to the cleaning nozzle 5 via a line 41 that branches off from a line 40. Further, the supply to the tank 3 and the cleaning nozzle 5 is performed simultaneously or only to one side as necessary by opening and closing the valves 10 and 11, and the supply amount is adjusted. A liquid level gauge 20 attached to the tank 3 detects the decrease and operates a liquid supply pump to keep the liquid level constant so as to maintain an appropriate liquid level at all times.

次に、前述した如くポンプ6で吸い上げられた
混合液2の一部はライン42,バルブV7を通つ
て2本のサイクロン21に送られる。サイクロン
21によつて混合液2に含まれる噴射ノズル4の
噴出による研削のために破砕した微細な研磨材や
被処理物から除去された表面固着物(洗浄汚物)
を分離除去し、下部に連結されているスラツジタ
ンク22に落す。このシステムより、タンク3内
に研磨材等の微塵や洗浄汚物が蓄積するのを防止
することができる。サイクロン21による分離除
去が終了して残つたフロンは、ライン43、バル
ブV6を介して再びタンク3に回収される。ま
た、洗浄汚物と共にタンク22内に混入したフロ
ン液はライン49、バルブV9を介してタンク3
に戻る。
Next, as described above, a part of the mixed liquid 2 sucked up by the pump 6 is sent to the two cyclones 21 through the line 42 and the valve V7. Fine abrasives crushed by the cyclone 21 for grinding by jetting from the jetting nozzle 4 contained in the liquid mixture 2 and surface-fixed matter (cleaning dirt) removed from the object to be processed.
is separated and removed and dropped into a sludge tank 22 connected to the bottom. With this system, it is possible to prevent fine dust such as abrasive material and cleaning dirt from accumulating in the tank 3. The remaining fluorocarbons after separation and removal by the cyclone 21 are recovered into the tank 3 via the line 43 and the valve V6. In addition, the Freon liquid mixed into the tank 22 together with the cleaning waste is transferred to the tank 3 via the line 49 and valve V9.
Return to

23はタンク3内の研磨材を外部に回収するた
めのウエツトサイクロンである。ウエツトサイク
ロン23は図中A,A′において連結するライン
44を介してタンク3に接続しており、タンク3
内から送られた混合液2から研磨材を分離する。
分離された研磨材は回収タンク24に貯えられ
る。また、残つたフロンはライン45を介してタ
ンク3へ戻される。
23 is a wet cyclone for recovering the abrasive material in the tank 3 to the outside. The wet cyclone 23 is connected to the tank 3 via a line 44 connected at A and A' in the figure.
The abrasive material is separated from the mixed liquid 2 sent from inside.
The separated abrasive material is stored in a recovery tank 24. Further, the remaining fluorocarbon is returned to the tank 3 via the line 45.

なお、上記スラツジタンク22及び回収タンク
24に貯えられた洗浄汚物や研磨材にはフロンが
含まれているが、その場合バルブV5,V9およ
びバルブV13等を操作することによりスラツジ
タンク22のライン46、回収タンク24のライ
ン47(B,B′において接続している)を圧縮機
8の吸入側のライン31,48と連通させれば、
圧縮機8の吸引によりスラツジタンク22、回収
タンク24内のフロンは気化回収され、タンク2
2,24内に残留した洗浄汚物や研磨材は短時間
で乾燥状態となる。これにより、洗浄汚物及び回
収した研磨材の処理が極めて容易となる。また、
以上の動作により研磨材を回収した後のタンク3
内のフロンはバルブV2開、バルブV1閉の状態
で圧縮機8のみを作動させることにより貯液器1
6に気化回収することができる。この場合気化熱
による温度低下を防ぎ、かつ気化を促進させるた
めヒータ25により加熱する。
Note that the cleaning filth and abrasive material stored in the sludge tank 22 and recovery tank 24 contain fluorocarbons, but in this case, by operating valves V5, V9, valve V13, etc., the line 46 of the sludge tank 22 and the recovery If the line 47 of the tank 24 (connected at B and B') is communicated with the lines 31 and 48 on the suction side of the compressor 8,
The fluorocarbons in the sludge tank 22 and the recovery tank 24 are vaporized and recovered by the suction of the compressor 8, and the fluorocarbons are recovered in the tank 2.
Cleaning dirt and abrasive material remaining in the cleaning parts 2 and 24 become dry in a short time. This makes it extremely easy to dispose of the washed dirt and recovered abrasive material. Also,
Tank 3 after collecting the abrasive material through the above operations
The fluorocarbons in the tank are removed by operating only the compressor 8 with valve V2 open and valve V1 closed.
6 can be vaporized and recovered. In this case, heating is performed by the heater 25 in order to prevent a temperature drop due to heat of vaporization and to promote vaporization.

また、50は前述のポンプ6に代わつて高圧フ
ロンガスの気流によるベンチユリ効果を用いてタ
ンク3内の混合液2を吸い上げ噴射ノズル4から
噴出させるための吸い上げラインである。吸い上
げライン50によつて混合液2の吸い上げを行う
場合、バルブV8を閉じてバルブV12を開く。
ライン32よりバルブV1を通して高圧フロンガ
スが送り込まれると、噴射ノズル4の出口にて負
圧状態となるためベンチユリ効果によつてタンク
3内の混合液2が吸い上げライン50を介して噴
射ノズル4まで吸い上げられ、フロンガスと共に
噴射ノズル4から噴射されるものである。このベ
ンチユリ効果を用いた混合液2の吸い上げでは、
ポンプ6による吸い上げの場合に比べ吸い上げる
力が弱く噴射流量が少ないため洗浄及び研削効果
は低下するが、被処理物に付着する汚れや油脂分
が軽微な場合には充分な効果が得られる。また、
ポンプ6を用いる場合より、消費電力が少なくか
つ装置を簡略化できる利点がある。
Further, 50 is a suction line for sucking up the mixed liquid 2 in the tank 3 and ejecting it from the injection nozzle 4 by using the bench-lily effect caused by the airflow of high-pressure freon gas instead of the pump 6 described above. When sucking up the mixed liquid 2 through the suction line 50, the valve V8 is closed and the valve V12 is opened.
When high-pressure fluorocarbon gas is sent from the line 32 through the valve V1, a negative pressure is created at the outlet of the injection nozzle 4, so the mixed liquid 2 in the tank 3 is sucked up to the injection nozzle 4 via the suction line 50 due to the bench lily effect. It is injected from the injection nozzle 4 together with the fluorocarbon gas. When sucking up mixed liquid 2 using this bench lily effect,
Compared to the case of suction by the pump 6, the suction force is weaker and the jetting flow rate is lower, so the cleaning and grinding effects are lowered, but sufficient effects can be obtained when the amount of dirt or oil adhering to the object to be treated is small. Also,
This has the advantage that power consumption is lower than when using the pump 6, and the device can be simplified.

以上ではポンプ6と吸い上げライン50を併設
したことから、バルブV8とV12を調節するこ
とにより被処理物の汚れ等の度合に応じてポンプ
6による吸い上げとライン50による吸い上げの
いずれかを適宜選択することができるので、より
効率的な洗浄、研削が行え極めて便利である。な
お、ポンプ6と吸い上げライン50は必ずしも併
設する必要はなく、装置の用途に応じていずれか
一方のみの吸い上げ手段を設けてもよい。
In the above, since the pump 6 and the suction line 50 are installed together, by adjusting the valves V8 and V12, either suction by the pump 6 or suction by the line 50 can be selected as appropriate depending on the degree of contamination of the object to be treated. This makes cleaning and grinding more efficient and extremely convenient. Note that the pump 6 and the suction line 50 do not necessarily need to be installed together, and only one of the suction means may be provided depending on the application of the device.

本発明の一実施例に係る湿式プラスト装置は以
上の如く構成されかつ動作するものであり、気化
により損失し易いが洗浄、脱脂処理に優れた低沸
点溶剤であるフロンを用い損失を最少限に抑えた
効率のよい使用を行うものである。
The wet-type blasting apparatus according to an embodiment of the present invention is constructed and operates as described above, and uses CFC, which is a low boiling point solvent that is easily lost due to vaporization but is excellent in cleaning and degreasing, to minimize loss. It is intended to be used in a controlled and efficient manner.

そして、本装置によればフロンの良好な洗浄、
脱脂効果により被処理物の処理を迅速に行うこと
ができると共に、フロンを損失なく循環させて使
用することができる。また、フロンの低沸点性に
より、被処理物が短時間で乾燥すると共に、洗浄
汚物及び研磨材を短時間で乾燥させ回収すること
ができる。更に、フロンの気化ガスを加圧して噴
射用に用いるので、従来の水と研磨材の混合液2
を圧縮空気と共に噴射する湿式ブラスト装置のよ
うに別に圧縮空気の供給装置を設ける必要がな
い。
According to this device, good cleaning of Freon,
Due to the degreasing effect, it is possible to quickly process the object to be processed, and the fluorocarbon can be circulated and used without loss. Further, due to the low boiling point of fluorocarbons, the object to be treated can be dried in a short time, and cleaning dirt and abrasive material can be dried and recovered in a short time. Furthermore, since the vaporized fluorocarbon gas is pressurized and used for injection, it is possible to
There is no need to provide a separate compressed air supply device unlike a wet blasting device that injects the air with compressed air.

また、以上の実施例では低沸点溶剤であるフロ
ンと研磨材を混ぜた混合液2を洗浄液として用い
た場合を示したが、研磨材を混入せずフロンのみ
を洗浄液として用いてもよい。被処理物に付着し
た汚れ、油脂等が軽度な場合には、フロンの噴射
だけで充分な洗浄効果が得られる。この場合、研
磨材の分だけ洗浄に要する費用が少なくなると共
に、使用済の研磨材を分離回収するためのウエツ
トサイクロン23及び回収タンク24が必要なく
なるので装置全体が簡素化されよう。また、低沸
点溶剤としてフロンを用いた例を示したが、他の
低沸点溶剤であるトリクロエチレン及びパークロ
ロエチレン等を用いても上記フロン液と同様の効
果を得ることができる。ただ、不燃性、無毒性、
無臭性の点でフロン液が最適であろう。
Further, in the above embodiment, a case was shown in which a mixture 2 of a low-boiling point solvent, fluorocarbon, and an abrasive was used as the cleaning liquid, but fluorocarbon alone may be used as the cleaning liquid without mixing an abrasive. If the amount of dirt, oil, etc. adhering to the object to be treated is light, a sufficient cleaning effect can be obtained just by spraying Freon. In this case, the cost required for cleaning will be reduced by the amount of the abrasive material, and the entire apparatus will be simplified because the wet cyclone 23 and recovery tank 24 for separating and recovering the used abrasive material are no longer required. Further, although an example using fluorocarbon as a low-boiling point solvent has been shown, the same effect as the above-mentioned fluorocarbon solution can be obtained by using other low-boiling point solvents such as trichlorethylene and perchlorethylene. However, it is non-flammable, non-toxic,
Freon liquid is probably the best because it is odorless.

また、上記の実施例においては蒸留器13、ヒ
ータ14、貯液器16、冷凍機19等から成る蒸
留系統が前記装置内に組込まれた構成となつてい
るが前記同様の作用が得られれば別設してもさし
つかえない。
Further, in the above embodiment, the distillation system consisting of the distiller 13, the heater 14, the liquid reservoir 16, the refrigerator 19, etc. is built into the apparatus, but if the same effect as described above can be obtained. It is okay to set it up separately.

〔効果〕〔effect〕

本発明によれば、「少なくとも低沸点溶剤を含
む溶液を貯えるタンクを備え、被処理物の出し入
れ及び密閉が可能な処理容器と、前記タンク内の
前記溶液を前記処理容器内に設けたノズルに供給
するポンプ手段と、前記処理容器内から前記低沸
点溶剤の気化ガスを吸入する吸入手段と、吸入し
た前記気化ガスを加圧し前記ノズルから高速噴射
する噴射手段と、前記吸入手段と噴射手段とを調
整して前記処理容器内を負圧状態にする調整手段
とを備えたこと」を特徴とすることによつて、完
全密閉状態にし、汚染空気の漏洩防止を達成する
ことができる。また、処理容器内部の圧力は、そ
の外部の空気圧よりも常に低い状態にあることに
より、被処理物の出入れの際においても汚染空気
が外部に漏洩しないことをも可能とする。従つ
て、本発明による湿式ブラスト装置は原子力関係
施設における放射線汚染物の廃棄処理の際に行う
除染作業に最も有効である。
According to the present invention, "a processing container is provided with a tank for storing a solution containing at least a low-boiling point solvent and is capable of taking in and out the object to be processed and is sealed; and the solution in the tank is transferred to a nozzle provided in the processing container. a supply pump means, a suction means for sucking the vaporized gas of the low boiling point solvent from inside the processing container, an injection means for pressurizing the sucked vaporized gas and injecting it at high speed from the nozzle, and the suction means and the injection means. and adjusting means to bring the interior of the processing container into a negative pressure state, thereby achieving a completely sealed state and preventing leakage of contaminated air. Furthermore, since the pressure inside the processing container is always lower than the air pressure outside the processing container, it is also possible to prevent contaminated air from leaking to the outside even when the objects to be processed are taken in and out. Therefore, the wet blasting apparatus according to the present invention is most effective for decontamination work performed during the disposal of radioactive contaminated materials in nuclear facilities.

また、上記効果に加えて、「少なくとも低沸点
溶剤を含む溶液を貯えるタンクを備え、被処理物
の出し入れ及び密閉が可能な処理容器と、前記処
理容器から、前記低沸点溶剤の気化ガスを吸入す
る吸入手段と、吸入した前記気化ガスを加圧して
前記ノズルから高速噴射する噴射手段と、前記ノ
ズル内にベンチユリ効果を発生させる気化ガス噴
出手段と、前記ベンチユリ効果を利用して前記タ
ンク内の前記溶液を吸い上げる吸い上げ手段と、
前記吸入手段と前記噴射手段とを調整し、前記処
理容器内を負圧状態にする調整手段とを備えたこ
と」を特徴とすることによつて、ベンチユリ効果
を利用した吸い上げ手段を備えることで装置の簡
素化及び運転を低電力化を図ることができるとい
う効果も達成できる。
In addition to the above effects, the present invention also provides a processing container which is equipped with a tank for storing a solution containing at least a low boiling point solvent, and into which the object to be processed can be put in and taken out and sealed, and the vaporized gas of the low boiling point solvent is inhaled from the processing container. an injecting means for pressurizing the inhaled vaporized gas and injecting it at high speed from the nozzle; a vaporized gas ejection means for generating a Bench-Yuri effect in the nozzle; a suction means for sucking up the solution;
and adjusting means for adjusting the suction means and the injection means to bring the inside of the processing container into a negative pressure state. It is also possible to achieve the effects of simplifying the device and reducing power consumption for operation.

【図面の簡単な説明】[Brief explanation of the drawing]

図は本発明の一実施例に係る湿式ブラスト装置
の基本構成図である。 ここで、1…処理容器、2…混合液、3…タン
ク、4…噴射ノズル、6…ポンプ、8…圧縮機、
12…液化器、13…蒸留器、16…貯液器、2
1…サイクロン、22…スラツジタンク、23…
ウエツトサイクロン、24…回収タンク、50…
吸い上げラインである。
The figure is a basic configuration diagram of a wet blasting device according to an embodiment of the present invention. Here, 1... processing container, 2... mixed liquid, 3... tank, 4... injection nozzle, 6... pump, 8... compressor,
12... liquefier, 13... distiller, 16... liquid reservoir, 2
1...Cyclone, 22...Sludge tank, 23...
Wet cyclone, 24... Recovery tank, 50...
It is a suction line.

Claims (1)

【特許請求の範囲】 1 少なくとも低沸点溶剤を含む溶液を貯えるタ
ンクを備え、被処理物の出し入れ及び密閉が可能
な処理容器と、前記タンク内の前記溶液を前記処
理容器内に設けたノズルに供給するポンプ手段
と、前記処理容器内から前記低沸点溶剤の気化ガ
スを吸入する吸入手段と、吸入した前記気化ガス
を加圧し前記ノズルから高速噴射する噴射手段
と、前記吸入手段と噴射手段とを調整して前記処
理容器内を負圧状態にする調整手段とを備えたこ
とを特徴とする湿式ブラスト装置。 2 少なくとも低沸点溶剤を含む溶液を貯えるタ
ンクを備え、被処理物の出し入れ及び密閉が可能
な処理容器と、前記処理容器から、前記低沸点溶
剤の気化ガスを吸入する吸入手段と、吸入した前
記気化ガスを加圧して前記ノズルから高速噴射す
る噴射手段と、前記ノズル内にベンチユリ効果を
発生させる気化ガス噴出手段と、前記ベンチユリ
効果を利用して前記タンク内の前記溶液を吸い上
げる吸い上げ手段と、前記吸入手段と前記噴射手
段とを調整し、前記処理容器内を負圧状態にする
調整手段とを備えたことを特徴とする湿式ブラス
ト装置。
[Scope of Claims] 1. A processing container that is equipped with a tank that stores a solution containing at least a low-boiling point solvent and that can take in and take out the object to be processed and seal it, and the solution in the tank is transferred to a nozzle provided in the processing container. a supply pump means, a suction means for sucking the vaporized gas of the low boiling point solvent from inside the processing container, an injection means for pressurizing the sucked vaporized gas and injecting it at high speed from the nozzle, and the suction means and the injection means. A wet blasting apparatus characterized by comprising: an adjusting means for adjusting the inside of the processing container to bring the inside of the processing container into a negative pressure state. 2. A processing container that is equipped with a tank for storing a solution containing at least a low-boiling point solvent and that can take in and take out the object to be processed and seal it, a suction means that sucks the vaporized gas of the low-boiling point solvent from the processing container, and a an injection means for pressurizing vaporized gas and injecting it at high speed from the nozzle; a vaporized gas ejection means for generating a bench-lily effect in the nozzle; and a suction means for sucking up the solution in the tank using the bench-lily effect. A wet blasting apparatus comprising: an adjustment means for adjusting the suction means and the injection means to bring the inside of the processing container into a negative pressure state.
JP11379383A 1983-06-24 1983-06-24 Wet type blast device Granted JPS606352A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11379383A JPS606352A (en) 1983-06-24 1983-06-24 Wet type blast device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11379383A JPS606352A (en) 1983-06-24 1983-06-24 Wet type blast device

Publications (2)

Publication Number Publication Date
JPS606352A JPS606352A (en) 1985-01-14
JPS6240146B2 true JPS6240146B2 (en) 1987-08-26

Family

ID=14621222

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11379383A Granted JPS606352A (en) 1983-06-24 1983-06-24 Wet type blast device

Country Status (1)

Country Link
JP (1) JPS606352A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0623546U (en) * 1992-08-27 1994-03-29 株式会社伊藤製作所 Fall prevention net for construction work

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4712217U (en) * 1971-03-13 1972-10-13
JPS4716137U (en) * 1971-03-23 1972-10-25

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4712217U (en) * 1971-03-13 1972-10-13
JPS4716137U (en) * 1971-03-23 1972-10-25

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0623546U (en) * 1992-08-27 1994-03-29 株式会社伊藤製作所 Fall prevention net for construction work

Also Published As

Publication number Publication date
JPS606352A (en) 1985-01-14

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