JPS6239423B2 - - Google Patents

Info

Publication number
JPS6239423B2
JPS6239423B2 JP13385679A JP13385679A JPS6239423B2 JP S6239423 B2 JPS6239423 B2 JP S6239423B2 JP 13385679 A JP13385679 A JP 13385679A JP 13385679 A JP13385679 A JP 13385679A JP S6239423 B2 JPS6239423 B2 JP S6239423B2
Authority
JP
Japan
Prior art keywords
liquid
compound
energy rays
diazonium salt
irradiated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13385679A
Other languages
Japanese (ja)
Other versions
JPS5657036A (en
Inventor
Kotaro Nagasawa
Ryuichi Fujii
Tsutomu Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Somar Corp
Original Assignee
Somar Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Somar Corp filed Critical Somar Corp
Priority to JP13385679A priority Critical patent/JPS5657036A/en
Publication of JPS5657036A publication Critical patent/JPS5657036A/en
Publication of JPS6239423B2 publication Critical patent/JPS6239423B2/ja
Granted legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/60Processes for obtaining vesicular images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

Description

【発明の詳现な説明】[Detailed description of the invention]

本発明は、結合剀ず感光性ゞアゟニりム塩ずを
含有し、カツプラヌを含有しおいない感光性局を
平面性支持䜓䞊に有する気泡画像圢成材料の補造
方法に関するものである。 埓来、前蚘のタむプの気泡画像圢成材料は、よ
く知られおおり、該材料を焌付露光した堎合露光
郚分の感光性局内に感光性ゞアゟニりム塩の光分
解による窒玠ガスが発生し、その状態にな぀おい
る該材料を加熱した堎合、該ガスが熱膚匵しお小
気泡矀を圢成し、これが光を散乱する䜜甚をしお
画像を圢成する。 䞀方、前蚘のタむプの気泡画像圢成材料の補造
方法ずしお、高分子結合剀䟋えば、塩化ビニリ
デン―アクリロニトリル共重合物、メタアクリロ
ニトリル―ヒドロキシ゚チルメタクリレヌト共重
合物等ず感光性ゞアゟニりム塩ずを䜎沞点有機
溶剀䟋えば、メチル゚チルケトン、アセトニト
リル等に溶解しおなる溶液を平面性支持䜓䞊に
局状に塗垃湿最膜厚50〜100ミクロン䜍し、
これを加熱通垞60〜150℃䜍䞋長時間也燥し
お薄い也燥膜膜厚〜ミクロン䜍に仕䞊げ
るずいう方法が知られおいる。そしお、加熱䞋長
時間也燥は、工業的には前蚘溶液付の支持䜓を、
粟密䜜動制埡された倚数のロヌルで搬送しながら
倧型也燥機䞭を通すこずによ぀お行な぀おいる。 しかるに、前蚘の埓来法によ぀お感光性局を圢
成する際には、次の欠点がある。 (a) 也燥に長時間を芁し、倧きな蚭備スペヌスを
必芁ずする。 (b) 也燥埌からの倧量の排気䞭に有機溶剀の蒞気
が皀薄な状態で含たれおおり、排気からの脱溶
剀を効率よく行なうこずが難しい。 (c) 也燥に長時間を芁するので、前蚘溶液付支持
䜓を搬送する倚数のロヌルを含め各装眮の粟密
な䜜動制埡を必芁ずする。 本発明の目的ずするずころは、これらの埓来法
の欠点を陀去した気泡画像圢成材料の補造方法を
提䟛するこずにある。 本発明は、高゚ネルギヌ線照射により架橋性を
瀺す化合物ずそれ自䜓は高゚ネルギヌ線照射によ
り架橋性を瀺さず、か぀カツプラヌを含有しおい
ない感光性ゞアゟニりム塩含有液の含浞に奜適な
高分子化合物以䞋、含浞性付䞎甚高分子化合物
ず称すずを含有する液状組成物以䞋、被照射
液状組成物ず称すを平面性支持䜓衚面に局状に
塗垃し、次いで該液状組成物に高゚ネルギヌ線照
射しお架橋硬化させるこずにより含浞受容局を圢
成し、これにカツプラヌを含有しおいない前蚘感
光性ゞアゟニりム塩含有液を含浞させ、也燥する
こずを特城ずする気泡画像圢成材料の補造方法で
ある。 本発明においお䜿甚する平面性支持䜓は、埓来
公知のゞアゟ画像圢成材料の補造時に䜿甚される
支持䜓であ぀およい。䟋えば、プラスチツクフむ
ルム、合成玙、パルプ玙、金属、ガラス、織垃、
䞍織垃等であ぀おもよいが物理的匷床、特に寞法
安定性、平面性および透明性においお優れたプラ
スチツクフむルム、䟋えば軞延䌞ポリ゚チレン
テレフタレヌトフむルムが特に奜たしい。 感光性ゞアゟニりム塩は、埓来公知のゞアゟ画
像圢成材料補造時に䜿甚されおいる感光性ゞアゟ
ニりム塩であ぀およく、該感光性ゞアゟニりム塩
ずしおは、䟋えば―ゞアゟ――ゞメチルアミ
ノベンれン塩化亜鉛耇塩、あるいは、―ゞアゟ
――モルホリノベンれンテトラフルオルボヌレ
ヌト等があげられる。 カツプラヌ䟋えば、プノヌル性化合物、掻
性メチレン基を有する化合物等を含有しおいな
い感光性ゞアゟニりム塩含有液を前蚘含浞受容局
に含浞させるには、埓来公知の含浞装眮䟋えば液
䟛絊ロヌルずかきずり郚材ずからなる含浞装眮を
甚いるこずができる。 前蚘感光性ゞアゟニりム塩含有液における溶媒
は、感光性ゞアゟニりム塩を溶解するこずがで
き、か぀前蚘含浞受容局を膚最ないし倚少溶解す
るこずができるものであればよく、かかる溶媒ず
しおは、䟋えばメチル゚チルケトン、アセトニト
リル、酢酞゚チル、アセトン、テトラヒドロフラ
ン、ゞオキサン等がある。 前蚘感光性ゞアゟニりム塩含有液を含浞受容に
含浞した埌の也燥は、通垞60〜130℃の枩床䞋で
行なわれる。 本発明においおは、含浞受容局は、高゚ネルギ
ヌ線照射により架橋性を瀺す化合物ず含浞性付䞎
甚高分子化合物ずを含有する液状組成物に高゚ネ
ルギヌ線照射しお架橋硬化させるこずにより造成
する。 本発明でいう高゚ネルギヌ線ずは、特に玫倖線
たたは電子線が望たしい。 玫倖線照射装眮の光源ずしおは、200nm〜
450nmの遠玫倖域から近玫倖域の玫倖光を発する
メタルハラむド―氎銀灯、䜎圧、高圧氎銀灯等を
䜿甚しおよい。電子線照射装眮ずしおは、通垞、
加圧電圧100〜600KeV、電流倀10〜100mAのも
のを䜿甚する。 前蚘高゚ネルギヌ線照射により架橋性を瀺す化
合物は、既に文献に十分開瀺されおいる。本発明
においおは、それら公知のものを䜿甚する。 該化合物のうちでも、゚チレン性䞍飜和結合を
〜個有するがオリゎマヌでない垞枩で液状の
化合物たたぱポキシ結合を〜個有する垞枩
で液状の化合物が奜たしい。特に、それら同䞀タ
むプ内での化合物を䜵甚するこずが奜たしい。た
た、それらの奜たしい化合物のうちでも100℃以
䞊の沞点を有するものが特に奜たしい。 ゚チレン性䞍飜和結合を〜個有するがオリ
ゎマヌでない垞枩で液状の化合物のうちで、゚チ
レン性䞍飜和結合を個のみ有する単量䜓ずしお
は、䟋えばメチルアクリレヌト、―゚チルヘキ
シルアクリレヌト、―ヒドロキシ゚チルアクリ
レヌト、テトラヒドロフルフリルアクリレヌト、
プノキシ゚チルアクリレヌトたたはそれらのメ
タクリレヌト、さらにはスチレン、―ビニルピ
ロリドン等がある。 ゚チレン性䞍飜和結合を〜個有するがオリ
ゎマヌでない垞枩で液状の化合物ずしおは、䟋え
ば゚チレングリコヌルゞアクリレヌト、プロピレ
ングリコヌルゞアクリレヌト、―ヘキサン
ゞオヌルゞアクリレヌト、トリメチロヌルプロパ
ントリアクリレヌト、ペンタ゚リトリトヌルペン
タアクリレヌトあるいは、それらのメタクリレヌ
ト等がある。 ゚ポキシ結合を〜個有し、か぀垞枩で液状
の化合物の䞭には、䟋えば次のものがある。 ―ヘキサンゞオヌルゞグリシゞル゚ヌテ
ル、グリセリントリグリシゞル゚ヌテル、ビスレ
ゟルシノヌルテトラグリシゞル゚ヌテル、゚ポキ
シノボラツク゚ポキシ圓量172〜181等があ
る。 含浞性付䞎甚高分子化合物ずしおは、塩化ビニ
リデンを䞻構成成分ずしたビニル共重合䜓ずかセ
ルロヌス誘導䜓が特に奜たしいが、他にビニル単
量䜓の単独重合䜓、ホルマリンの共瞮合暹脂等を
あげるこずもできる。これらの䞭でも前蚘のビニ
ル共重合䜓たたはセルロヌス誘導䜓で、しかも盞
溶性を満足しおいるものを遞択するこずが特に奜
たしい。 塩化ビニリデンを䞻構成成分ずしたビニル共重
合䜓ずしおは、塩化ビニリデンずアクリロニトリ
ル、塩化ビニル、アルキルアクリレヌト、アルキ
ルメタクリレヌトあるいは酢酞ビニルずの共重合
物等が䟋瀺される。これらの共重合䜓䞭における
塩化ビニリデンの共重合率は80〜95重合が奜た
しい。 セルロヌス誘導䜓ずしおは、次のものが䟋瀺さ
れる。(a)セルロヌスを脂肪酞により倉性しお埗た
アルキル゚ステル誘導䜓、䟋えばセルロヌスアセ
テヌト、セルロヌスアセテヌトブチレヌト、セル
ロヌスアセテヌトむ゜ブチレヌト、セルロヌスア
セテヌトプロピオネヌト、(b)セルロヌスを硝酞に
より倉性しお埗た゚ステル誘導䜓䟋えば、セルロ
ヌスナむトレヌト、(c)セルロヌスをゞアルキル硫
酞たたはハロゲン化アルキル等により倉性しお埗
た゚ヌテル誘導䜓、䟋えば゚チルセルロヌス、プ
ロピルセルロヌス。 ホルマリンの共瞮合暹脂ずしおは、䟋えば―
キシレンたたはメシチレンをホルマリン共瞮合し
お埗られるキシレン暹脂、およびメチル゚チルケ
トン、シクロヘキサノン、メチルシクロヘキサノ
ンたたはアセトプノヌル等ずホルマリンずを共
瞮合しお埗られるケトン暹脂等がある。 本発明においお䜿甚する含浞性付䞎甚高分子化
合物は、含浞受容局に感光性ゞアゟニりム塩含有
液を含浞させるのに必芁䞍可欠なものである。 本発明の実斜に圓り、前蚘含浞受容局の重量に
察するゞアゟニりム塩の含浞量は通垞0.5〜25
、奜たしくは〜15である。 被照射液状組成物䞭に゚チレン性䞍飜和結合を
〜個有するがオリゎマヌでない液状の化合物
を含有する堎合は、高゚ネルギヌ線により架橋性
を瀺す化合物に察する含浞性付䞎甚高分子化合物
の重量比率は20〜80が奜たしく、特に奜たしく
は25〜68である。 ゚ポキシ結合を〜個有する液状の化合物を
含有する堎合には、前蚘重量比率は10〜90が奜
たしく、特に奜たしくは30〜70である。 ゚チレン性䞍飜和結合を〜個有するがオリ
ゎマヌでない液状の化合物を含む被照射液状組成
物に玫倖線を照射するずいう態様で本発明を実斜
する堎合には、玫倖線照射によりラゞカルを発生
する光架橋掻性化剀を䜿甚するこずが奜たしい。 かかる光架橋掻性化剀ずしおは、䟋えばベンゟ
むン、ベンゟむンメチル゚ヌテル、ベンゟプノ
ン、ベンゞル等がある。 ゚ポキシ結合を〜個有する液状の化合物を
含有しおいる被照射液状組成物に玫倖線を照射す
るずいう態様により本発明を実斜する堎合は、通
垞の゚ポキシ暹脂の速硬化剀ずなるようなLewis
酞を発生する光架橋掻性化剀を䜿甚するこずが、
実際䞊有利である。 かかるLewis酞を発生する奜適な光架橋掻性化
剀は、䟋えば米囜特蚱3708296号、同3721617号、
同3936557号、特公昭52−14277号、特公昭52−
14278号、特公昭52−14279号、特開昭52−30402
号等に開瀺されおいる。 ゚チレン性䞍飜和結合を〜個有するがオリ
ゎマヌでない液状の化合物を含有した被照射液状
組成物には、被照射液状組成物の貯蔵䞭のゲル化
を防止するため、熱重合犁止剀を少量添加するこ
ずが奜たしい。熱重合犁止剀ずしおは䟋えば、ヒ
ドロキノン、ヒドロキノンモノメチル゚ヌテル、
―ゞ―tert―ブチル――クレゟヌル、キ
ナペロン等がある。しかし熱重合犁止剀ずしお䞀
般的に䜿甚される銅塩はゞアゟニりム塩の分解を
促進するので䜿甚できない。 ゚チレン性䞍飜和結合を〜個有するがオリ
ゎマヌでない液状の化合物を含有する被照射液状
組成物を䜿甚する堎合には、該組成物䞭には、゚
チレン性䞍飜和結合を個以䞊有する架橋性オリ
ゎマヌを䜿甚するこずが奜たしい。 該架橋性オリゎマヌずしおは、前蚘゚チレン性
䞍飜和結合を〜個有するがオリゎマヌでない
液状の化合物に盞溶するものが奜たしい。䞀般に
は、分子量300以䞊、3000以䞋皋床のものが有利
に䜿甚される。 架橋性オリゎマヌずしおは、䟋えば、䜎分子量
ポリ゚ステルを䜿甚しお埗たポリ゚ステルアクリ
レヌトたたはポリ゚ステルメタクリレヌトあるい
ぱポキシアクリレヌト、゚ポキシメタクリレヌ
ト、りレタンアクリレヌト、りレタンメタクリレ
ヌト等がある。 ゚ポキシ結合を〜個有する液状の化合物を
含有する被照射液状組成物を䜿甚する堎合、゚ポ
キシ結合を個有する䜎分子量の液状化合物を垌
釈剀ずしお該組成物に含有させるこずが奜たし
い。該垌釈剀を䟋瀺すれば、通垞の゚ポキシ暹脂
の垌釈剀ずしお知られおいるスチレンオキシド、
プニルグリシゞル゚ヌテル等のほか゚ポキシ結
合ず゚チレン性䞍飜和結合をそれぞれ個有する
グリシゞルメタクリレヌト、アリルグリシゞル゚
ヌテル等がある。 以䞊詳现の本発明によるずきは、埓来法の堎合
ずは異なり、加熱也燥を、前蚘含浞受容局に含浞
しおいる前蚘感光性ゞアゟニりム塩含有液局の也
燥のためにだけ行なえばよいのであるから、次の
利点がある。 (a) 也燥に長時間を芁さず、倧きな蚭備スペヌス
を芁さない。 (b) 也燥機が小さくおよく、排気䞭に有機溶剀の
蒞気が濃厚な状態で含たれおおり、排気からの
脱溶剀を効率よく行なうこずができる。 (c) 搬送也燥時間が短くおよいので、感光性ゞア
ゟニりム塩含有付の支持䜓を運搬するロヌラヌ
矀を含め各装眮をコンパクトにできしかもそれ
らの䜜動制埡が容易ずなる。 したが぀お、本発明によるずきは、気泡画像圢
成材料を工業的に有利に補造するこずができる。 以䞋、実斜䟋を瀺す。実斜䟋䞭の郚は重量郚
Kgを意味し、たた容は容量を衚わす。 珟像定着枈み材料の特性評䟡法は次の通りであ
る。 濃床は米囜Mac Beth瀟補濃床蚈TD―102型
F4.5により枬定した。 珟像定着枈み材料の衚面硬床は鉛筆硬床によ぀
お衚瀺した。接着性はJIS ―0202に準拠し、い
わゆる碁盀目テストを行ない調べた。すなわち珟
像定着枈み材料衚面に剃刃で蟺mmの桝目を
100個10×10䜜り、セロフアンテヌプを桝目
に圧着、急速に匕きはがし、衚面に残぀た桝目の
数を衚瀺した。したが぀お、100100は100個の
桝目がすべお剥離しなか぀たこずを瀺す。 実斜䟋  䞋蚘成分からなる被照射液状組成物を調補し
た。 テトラヒドロフルフリルアクリレヌト架橋
剀 46郚 ゞ゚チレングリコヌルゞアクリレヌト同䞊
17郚 ポリアクリルニトリル―ビニリデンクロリ
ド含浞性付䞎甚高分子化合物旭ダり瀟補
サラン―202 44郚 ベンゟむンむ゜プロピル゚ヌテル光架橋掻性
化剀 郚 該被照射液状組成物〔粘床720cps25℃〕を
95℃に保ち、同枩床に保枩したマントル付き―
ダむ型ホツパヌにより、未凊理75ミクロン軞延
䌞ポリ゚チレンテレフタレヌトフむルム䞊に塗
垃、岩厎電気瀟補メタルハラむド氎銀灯80W
cm本を䜿甚し硬化させた含浞受容局の膜厚は
12ミクロンであ぀た。 次に、 ―ゞアゟ――ゞメチルアミノベンれン
テトラフルオルボヌレヌトゞアゟニりム塩
18郚 メチル゚チルケトン 295.7容 アセトニトリル 68.4容 よりなるゞアゟニりム塩溶液をワむダヌバヌで塗
垃、80℃〜115℃で也燥、気泡画像圢成材料を埗
た。 䞊蚘気泡画像圢成材料を露光、100℃で20秒間
加熱珟像した。次いで、党面露光した埌40℃で加
熱安定化するこずにより定着させた。珟像定着枈
み材料に぀き衚―の評䟡結果を埗た。
The present invention relates to a method for producing a cellular imaging material having a photosensitive layer on a planar support, containing a binder and a photosensitive diazonium salt, and without a coupler. Conventionally, the above-mentioned type of bubble image forming material is well known, and when the material is exposed to light by printing, nitrogen gas is generated in the photosensitive layer in the exposed area due to the photodecomposition of the photosensitive diazonium salt. When the material is heated, the gas thermally expands and forms small bubbles, which act to scatter light and form an image. On the other hand, as a method for producing the above-mentioned type of cellular image forming material, a polymer binder (for example, vinylidene chloride-acrylonitrile copolymer, methacrylonitrile-hydroxyethyl methacrylate copolymer, etc.) and a photosensitive diazonium salt with a low boiling point are combined. A solution prepared by dissolving in an organic solvent (e.g., methyl ethyl ketone, acetonitrile, etc.) is applied on a planar support in a layered manner (wet film thickness of about 50 to 100 microns),
A known method is to dry this for a long time under heat (usually at about 60 to 150°C) to form a thin dry film (film thickness of about 5 to 7 microns). Industrially, drying under heating for a long time is done by drying the support with the solution,
This is done by passing the material through a large dryer while conveying it using a large number of precisely controlled rolls. However, when forming a photosensitive layer by the above-mentioned conventional method, there are the following drawbacks. (a) Drying takes a long time and requires a large equipment space. (b) Organic solvent vapor is contained in a diluted state in a large amount of exhaust gas after drying, making it difficult to efficiently remove solvent from the exhaust gas. (c) Since drying takes a long time, precise operation control of each device including a large number of rolls for conveying the support with the solution is required. It is an object of the present invention to provide a method for producing cellular imaging materials that eliminates the drawbacks of these conventional methods. The present invention relates to a compound that exhibits cross-linking properties when irradiated with high-energy rays and a polymer compound that itself does not exhibit cross-linking properties when irradiated with high-energy rays and is suitable for impregnating a liquid containing a photosensitive diazonium salt that does not contain a coupler. (hereinafter referred to as an impregnating polymer compound) (hereinafter referred to as the liquid composition to be irradiated) is coated on the surface of the planar support in a layered manner, and then the liquid composition is coated with a high A method for producing a cellular image-forming material, which comprises forming an impregnated receptor layer by crosslinking and curing it by irradiating it with energy rays, impregnating it with the photosensitive diazonium salt-containing solution that does not contain a coupler, and drying it. It is. The planar support used in the present invention may be a support used in the production of conventionally known diazo image forming materials. For example, plastic film, synthetic paper, pulp paper, metal, glass, woven fabric,
Although nonwoven fabrics and the like may be used, plastic films excellent in physical strength, particularly dimensional stability, flatness, and transparency, such as biaxially oriented polyethylene terephthalate films, are particularly preferred. The photosensitive diazonium salt may be a photosensitive diazonium salt that has been used in the production of conventionally known diazo image forming materials, and examples of the photosensitive diazonium salt include 1-diazo-4-dimethylaminobenzene zinc chloride double salt. , or 1-diazo-4-morpholinobenzene tetrafluoroborate. In order to impregnate the impregnation-receiving layer with a photosensitive diazonium salt-containing liquid that does not contain a coupler (e.g., a phenolic compound, a compound having an active methylene group, etc.), a conventionally known impregnating device such as a liquid supply roll and a scraping member is used. An impregnating device consisting of the following can be used. The solvent in the photosensitive diazonium salt-containing liquid may be any solvent as long as it can dissolve the photosensitive diazonium salt and swell or somewhat dissolve the impregnated receiving layer. Examples of such a solvent include methyl ethyl ketone, Examples include acetonitrile, ethyl acetate, acetone, tetrahydrofuran, and dioxane. Drying after impregnating the impregnated receptor with the photosensitive diazonium salt-containing liquid is usually carried out at a temperature of 60 to 130°C. In the present invention, the impregnated receiving layer is formed by irradiating a liquid composition containing a compound exhibiting crosslinking properties and a polymer compound for imparting impregnating properties with high energy rays to crosslink and cure the composition. The high-energy rays referred to in the present invention are particularly preferably ultraviolet rays or electron beams. As a light source for ultraviolet irradiation equipment, 200nm ~
Metal halide-mercury lamps, low-pressure, high-pressure mercury lamps, etc. that emit ultraviolet light in the far-ultraviolet to near-ultraviolet ranges of 450 nm may be used. As an electron beam irradiation device, usually
Use one with a pressurizing voltage of 100 to 600 KeV and a current value of 10 to 100 mA. Compounds that exhibit crosslinking properties upon irradiation with high-energy rays have already been sufficiently disclosed in the literature. In the present invention, those known materials are used. Among these compounds, preferred are compounds that are liquid at room temperature and have 1 to 4 ethylenically unsaturated bonds but are not oligomers, or compounds that are liquid at room temperature and have 2 to 6 epoxy bonds. In particular, it is preferable to use compounds within the same type together. Furthermore, among these preferable compounds, those having a boiling point of 100°C or higher are particularly preferable. Among compounds that have 1 to 4 ethylenically unsaturated bonds but are not oligomers and are liquid at room temperature, examples of monomers having only one ethylenically unsaturated bond include methyl acrylate, 2-ethylhexyl acrylate, and 2-ethylhexyl acrylate. Hydroxyethyl acrylate, tetrahydrofurfuryl acrylate,
Examples include phenoxyethyl acrylate or their methacrylates, as well as styrene, N-vinylpyrrolidone, and the like. Compounds that have 2 to 4 ethylenically unsaturated bonds but are not oligomers and are liquid at room temperature include, for example, ethylene glycol diacrylate, propylene glycol diacrylate, 1,6-hexanediol diacrylate, trimethylolpropane triacrylate, and pentaerythritol. Examples include pentaacrylate and their methacrylates. Examples of compounds that have 2 to 6 epoxy bonds and are liquid at room temperature include the following. Examples include 1,6-hexanediol diglycidyl ether, glycerin triglycidyl ether, bisresorcinol tetraglycidyl ether, and epoxy novolak (epoxy equivalent: 172 to 181). As the polymer compound for imparting impregnating properties, vinyl copolymers containing vinylidene chloride as a main component and cellulose derivatives are particularly preferred, but other examples include homopolymers of vinyl monomers and formalin cocondensation resins. You can also do it. Among these, it is particularly preferable to select one of the above-mentioned vinyl copolymers or cellulose derivatives that also satisfies compatibility. Examples of the vinyl copolymer containing vinylidene chloride as a main component include copolymers of vinylidene chloride with acrylonitrile, vinyl chloride, alkyl acrylate, alkyl methacrylate, or vinyl acetate. The copolymerization rate of vinylidene chloride in these copolymers is preferably 80 to 95%. Examples of cellulose derivatives include the following. (a) Alkyl ester derivatives obtained by modifying cellulose with fatty acids, such as cellulose acetate, cellulose acetate butyrate, cellulose acetate isobutyrate, cellulose acetate propionate, (b) esters obtained by modifying cellulose with nitric acid. Derivatives such as cellulose nitrate, (c) ether derivatives obtained by modifying cellulose with dialkyl sulfate or alkyl halides, such as ethyl cellulose and propyl cellulose. Examples of formalin co-condensation resin include m-
There are xylene resins obtained by cocondensing xylene or mesitylene with formalin, and ketone resins obtained by cocondensing formalin with methyl ethyl ketone, cyclohexanone, methylcyclohexanone, acetophenol, etc. The impregnating polymer compound used in the present invention is essential for impregnating the impregnated receiving layer with the photosensitive diazonium salt-containing liquid. In carrying out the present invention, the amount of diazonium salt impregnated with respect to the weight of the impregnated receiving layer is usually 0.5 to 25
%, preferably 1% to 15%. When the liquid composition to be irradiated contains a liquid compound that has 1 to 4 ethylenically unsaturated bonds but is not an oligomer, the weight ratio of the polymer compound for imparting impregnating properties to the compound that exhibits crosslinking properties by high-energy rays. is preferably 20 to 80%, particularly preferably 25 to 68%. When containing a liquid compound having 2 to 6 epoxy bonds, the weight ratio is preferably 10 to 90%, particularly preferably 30 to 70%. When carrying out the present invention in an embodiment in which an irradiated liquid composition containing a liquid compound having 1 to 4 ethylenically unsaturated bonds but not an oligomer is irradiated with ultraviolet rays, photocrosslinking that generates radicals by ultraviolet irradiation is required. Preference is given to using activators. Examples of such photocrosslinking activators include benzoin, benzoin methyl ether, benzophenone, and benzyl. When carrying out the present invention in an embodiment in which a liquid composition to be irradiated containing a liquid compound having 2 to 6 epoxy bonds is irradiated with ultraviolet rays, Lewis
Using a photocrosslinking activator that generates an acid can
Practically advantageous. Suitable photocrosslinking activators that generate such Lewis acids are disclosed, for example, in U.S. Pat.
No. 3936557, Special Publication No. 14277, Special Publication No. 14277, Special Publication No. 52-
No. 14278, JP 52-14279, JP 52-30402
Disclosed in the No. For liquid compositions to be irradiated containing liquid compounds having 1 to 4 ethylenically unsaturated bonds but not oligomers, a small amount of a thermal polymerization inhibitor is added in order to prevent gelation during storage of the liquid composition to be irradiated. It is preferable to add. Examples of thermal polymerization inhibitors include hydroquinone, hydroquinone monomethyl ether,
Examples include 2,6-di-tert-butyl-4-cresol and Kyuperon. However, copper salts, which are commonly used as thermal polymerization inhibitors, cannot be used because they accelerate the decomposition of diazonium salts. When using a liquid composition to be irradiated containing a liquid compound having 1 to 4 ethylenically unsaturated bonds but not an oligomer, the composition contains a crosslinked compound having 2 or more ethylenically unsaturated bonds. Preference is given to using oligomers. The crosslinkable oligomer is preferably one that has 1 to 4 ethylenically unsaturated bonds but is compatible with the liquid compound that is not an oligomer. Generally, those having a molecular weight of about 300 or more and 3000 or less are advantageously used. Examples of crosslinkable oligomers include polyester acrylates or polyester methacrylates obtained using low molecular weight polyesters, epoxy acrylates, epoxy methacrylates, urethane acrylates, urethane methacrylates, and the like. When using a liquid composition to be irradiated containing a liquid compound having 2 to 6 epoxy bonds, it is preferable to include a low molecular weight liquid compound having one epoxy bond as a diluent in the composition. Examples of the diluent include styrene oxide, which is known as a diluent for ordinary epoxy resins;
In addition to phenyl glycidyl ether, there are glycidyl methacrylate, allyl glycidyl ether, etc. each having one epoxy bond and one ethylenically unsaturated bond. According to the present invention described in detail above, unlike the conventional method, heat drying need only be performed to dry the photosensitive diazonium salt-containing liquid layer impregnated into the impregnated receiving layer. , has the following advantages. (a) Drying does not take a long time and does not require large equipment space. (b) The dryer can be small, the exhaust gas contains concentrated organic solvent vapor, and the solvent can be efficiently removed from the exhaust gas. (c) Since the transport and drying time is short, each device including the roller group for transporting the photosensitive diazonium salt-containing support can be made compact and its operation can be easily controlled. Therefore, according to the present invention, a cellular image forming material can be produced industrially advantageously. Examples are shown below. In the examples, "part" means part by weight (Kg), and "capacity" means volume (). The method for evaluating the characteristics of the developed and fixed material is as follows. The concentration was measured using a densitometer model TD-102 (F4.5) manufactured by Mac Beth, USA. The surface hardness of the developed and fixed material was expressed by pencil hardness. Adhesion was determined in accordance with JIS D-0202 using a so-called grid test. In other words, use a razor blade to make squares of 1 mm on each side on the surface of the developed and fixed material.
100 pieces (10 x 10) were made, cellophane tape was pressed onto the squares, rapidly peeled off, and the number of squares remaining on the surface was displayed. Therefore, 100/100 indicates that all 100 squares were not peeled off. Example 1 A liquid composition to be irradiated consisting of the following components was prepared. Tetrahydrofurfuryl acrylate (crosslinking agent) 46 parts diethylene glycol diacrylate (same as above)
17 parts poly(acrylonitrile-vinylidene chloride) (polymer compound for imparting impregnation properties) (Saran Viscosity 720cps (25℃)
A T-shirt with a mantle kept at 95℃ and kept at the same temperature.
Coated onto an untreated 75 micron biaxially stretched polyethylene terephthalate film using a die-type hopper, using a metal halide mercury lamp (80W/
The film thickness of the impregnated receptor layer cured using one cm) is
It was 12 microns. Next, 1-diazo-N,N-dimethylaminobenzene tetrafluoroborate (diazonium salt)
A diazonium salt solution consisting of 18 parts methyl ethyl ketone 295.7 volumes and acetonitrile 68.4 volumes was applied with a wire bar and dried at 80°C to 115°C to obtain a bubble image forming material. The above bubble image forming material was exposed to light and developed by heating at 100° C. for 20 seconds. Next, after exposing the entire surface to light, it was fixed by heating and stabilizing at 40°C. The evaluation results shown in Table 1 were obtained for the developed and fixed materials.

【衚】 実斜䟋  垂販の゚ポキシ系架橋剀組成物ならびにゞアゟ
ニりムハラむドのLewis酞耇塩からなる光架橋掻
性化剀を䜿甚し、䞋蚘の架橋剀ならびに含浞性付
䞎甚高分子化合物を添加再調補した。 すなわち、 アデカりルトラセツト―28―L1個以䞋
の゚ポキシ結合を有す゚ポキシ系架橋剀の混合
物旭電化瀟販売 45郚 プニルグリシゞル゚ヌテル垌釈剀 30郚 ―ヘキサンゞオヌルゞグリシゞル゚ヌテ
ル架橋剀 25郚 キシレン暹脂含浞性付䞎甚高分子化合物
䞉菱瓊斯化孊瀟補ニカノヌル 21郚 アデカりルトラセツト甚光架橋掻性化剀PP―
33旭電化瀟販売 4.3郚 該被照射液状組成物〔粘床98cps25℃を
䞋匕凊理した。75ミクロンの厚さの軞延䌞ポリ
゚チレンテレフタレヌトフむルムに局状に塗垃、
3KW超高圧氎銀灯を1mの距離で45秒間照射、膜
厚ミクロンの含浞受容局を造成した。 次に、 ビス―ゞアゟ――ゞメチルアミノベ
ンれンテトラクロルゞンケヌト 31郚 ゞオキサン 372容 アセトニトリル 129.5容 よりなるゞアゟニりム塩溶液をワむダヌバヌで塗
垃、80〜110℃で也燥気泡画像圢成材料を埗た。 䞊蚘気泡画像圢成材料を露光、100℃で30〜60
秒間加熱珟像した。次いで、党面露光した埌400
℃で加熱安定化するこずにより定着させた。珟像
定着枈み材料に぀き衚―の評䟡結果を埗た。
[Table] Example 2 Using a commercially available epoxy crosslinking agent composition and a photocrosslinking activator consisting of Lewis acid double salt of diazonium halide, the following crosslinking agent and polymeric compound for imparting impregnability were added and reconstituted. . Namely, Adeka Ultraset M-28-L1 (mixture of epoxy crosslinking agents having 6 or less epoxy bonds) (sold by Asahi Denka Co., Ltd.) 45 parts phenyl glycidyl ether (diluent) 30 parts 1,6-hexane Diol diglycidyl ether (crosslinking agent) 25 parts xylene resin (polymer compound for imparting impregnating properties)
(Nicanol H manufactured by Mitsubishi Gas Chemical Co., Ltd.) 21 parts Photocrosslinking activator PP for Adeka Ultraset
33 (sold by Asahi Denka Co., Ltd.) 4.3 parts The irradiated liquid composition [viscosity 98 cps (25° C.)] was subtracted. Coated in layers on a 75 micron thick biaxially oriented polyethylene terephthalate film.
A 3KW ultra-high pressure mercury lamp was irradiated for 45 seconds at a distance of 1m to create an impregnated receptor layer with a thickness of 6 microns. Next, a diazonium salt solution consisting of 31 parts of bis(1-diazo-N,N-dimethylaminobenzene)tetrachlorosincate, 372 parts of dioxane, and 129.5 volumes of acetonitrile was applied with a wire bar, and the foamed imaging material was dried at 80 to 110°C. Obtained. Expose the above bubble imaging material to light for 30-60 min at 100°C.
Developed by heating for seconds. Then, after full exposure, 400
It was fixed by heat stabilization at ℃. The evaluation results shown in Table 2 were obtained for the developed and fixed materials.

【衚】 実斜䟋  䞋蚘成分からなる被照射液状組成物を調補し
た。 プニルグリシゞル゚ヌテル垌釈剀 19郚 グリシゞルメタクリレヌト 〃  52郚 グリセリントリグリシゞル゚ヌテル架橋剀
23郚 セルロヌスアセテヌトブチレヌト含浞性付䞎
甚高分子化合物米囜Kodak瀟補CAB551―
0.01 30郚 ゚チルヒドロキシ゚チルセルロヌス同䞊
米囜Hercules瀟補EHEC―Low 13郚 䞊蚘組成物〔粘床860cps25℃〕を䞋匕き凊
理を斜した75ミクロン軞延䌞ポリ゚チレンテレ
フタレヌトフむルムに塗垃、加速電圧300KeV、
電流倀100mAで玄1.5Mradの線吞収量で電子線照
射により硬化させ膜厚玄ミクロンの含浞受容局
を造成した。 䞋蚘のゞアゟニりム塩溶液を調補、ワむダヌバ
ヌコヌタヌで局状に塗垃、80〜110℃で也燥、気
泡画像圢成材料を埗た。 ―ゞアゟ――゚チル――ベンゞルアミノ
ベンれンテトラフルオルポレヌト 23郚 ゞオキサン 213郚 アセトニトリル 74郚 トル゚ン 18郚 䞊蚘気泡画像圢成材料を実斜䟋ず同様に露
光、珟像、定着させた。珟像定着枈み詊料に関す
る詊隓結果は衚―の評䟡結果を埗た。
[Table] Example 3 A liquid composition to be irradiated consisting of the following components was prepared. Phenyl glycidyl ether (diluent) 19 parts glycidyl methacrylate ( ) 52 parts glycerin triglycidyl ether (crosslinking agent)
23 parts cellulose acetate butyrate (polymer compound for impregnation) (CAB551 manufactured by Kodak, USA)
0.01 30 parts ethylhydroxyethylcellulose (same as above)
(EHEC-Low manufactured by Hercules, USA) 13 parts The above composition [viscosity 860 cps (25°C)] was applied to a 75 micron biaxially stretched polyethylene terephthalate film that was subjected to subbing treatment, acceleration voltage 300 KeV,
It was cured by electron beam irradiation at a current value of 100 mA and a radiation absorption amount of about 1.5 Mrad to form an impregnated receptor layer with a film thickness of about 8 microns. The following diazonium salt solution was prepared, coated in layers with a wire bar coater, and dried at 80 to 110°C to obtain a cellular image-forming material. 1-Diazo-N-ethyl-N-benzylaminobenzene tetrafluoroporate 23 parts Dioxane 213 parts Acetonitrile 74 parts Toluene 18 parts The above bubble image forming material was exposed, developed and fixed in the same manner as in Example 2. The test results for the developed and fixed samples were as shown in Table 3.

【衚】【table】

Claims (1)

【特蚱請求の範囲】  高゚ネルギヌ線照射により架橋性を瀺す化合
物ずそれ自䜓は高゚ネルギヌ線照射により架橋性
を瀺さず、か぀カツプラヌを含有しおいない感光
性ゞアゟニりム塩含有液の含浞に奜適な高分子化
合物ずを含有する液状組成物を平面性支持䜓衚面
に塗垃し、次いで該液状組成物に高゚ネルギヌ線
照射しお架橋硬化させるこずにより含浞受容局を
圢成し、これにカツプラヌを含有しおいない前蚘
感光性ゞアゟニりム塩含有液を含浞させ、也燥さ
せるこずを特城ずする気泡画像圢成材料の補造方
法。  高゚ネルギヌ線照射により架橋性を瀺す化合
物が゚チレン性䞍飜和結合を〜個有するがオ
リゎマヌでない液状の化合物である特蚱請求の範
囲第項蚘茉の方法。  高゚ネルギヌ線照射による架橋性を瀺す化合
物が゚ポキシ結合を〜個有する液状の化合物
である特蚱請求の範囲第項蚘茉の方法。  高゚ネルギヌ線照射により架橋性を瀺さずか
぀カツプラヌを含有しおいない感光性ゞアゟニり
ム塩含有液の含浞に奜適な高分子化合物が、塩化
ビニリデンを䞻構成成分ずするビニル共重合䜓で
ある特蚱請求の範囲第項蚘茉の方法。  高゚ネルギヌ線照射により架橋性を瀺さずカ
ツプラヌを含有しおいない感光性ゞアゟニりム塩
含有液の含浞に奜適な高分子化合物がセルロヌス
誘導䜓である特蚱請求の範囲第項蚘茉の方法。
[Scope of Claims] 1. A compound that exhibits crosslinking properties when irradiated with high energy rays and which itself does not exhibit crosslinking properties when irradiated with high energy rays, and which is suitable for impregnating a liquid containing a photosensitive diazonium salt that does not contain a coupler. A liquid composition containing a polymer compound is applied onto the surface of a planar support, and then the liquid composition is cross-linked and cured by irradiation with high energy rays to form an impregnated receiving layer, which contains a coupler. A method for producing a cellular image-forming material, which comprises impregnating the material with the photosensitive diazonium salt-containing liquid and drying the material. 2. The method according to claim 1, wherein the compound exhibiting crosslinking properties upon irradiation with high-energy rays is a liquid compound having 1 to 4 ethylenically unsaturated bonds but not an oligomer. 3. The method according to claim 1, wherein the compound exhibiting crosslinkability upon high-energy ray irradiation is a liquid compound having 2 to 6 epoxy bonds. 4. A patent claim in which the polymer compound suitable for impregnation with a photosensitive diazonium salt-containing liquid that does not exhibit crosslinking properties upon irradiation with high-energy rays and does not contain couplers is a vinyl copolymer containing vinylidene chloride as a main component. The method described in item 1. 5. The method according to claim 1, wherein the polymer compound suitable for impregnation with a photosensitive diazonium salt-containing liquid that does not exhibit crosslinking properties and does not contain couplers when irradiated with high-energy rays is a cellulose derivative.
JP13385679A 1979-10-17 1979-10-17 Manufacture of bubble image forming material Granted JPS5657036A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13385679A JPS5657036A (en) 1979-10-17 1979-10-17 Manufacture of bubble image forming material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13385679A JPS5657036A (en) 1979-10-17 1979-10-17 Manufacture of bubble image forming material

Publications (2)

Publication Number Publication Date
JPS5657036A JPS5657036A (en) 1981-05-19
JPS6239423B2 true JPS6239423B2 (en) 1987-08-22

Family

ID=15114627

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13385679A Granted JPS5657036A (en) 1979-10-17 1979-10-17 Manufacture of bubble image forming material

Country Status (1)

Country Link
JP (1) JPS5657036A (en)

Also Published As

Publication number Publication date
JPS5657036A (en) 1981-05-19

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