JPS6237921U - - Google Patents

Info

Publication number
JPS6237921U
JPS6237921U JP12974985U JP12974985U JPS6237921U JP S6237921 U JPS6237921 U JP S6237921U JP 12974985 U JP12974985 U JP 12974985U JP 12974985 U JP12974985 U JP 12974985U JP S6237921 U JPS6237921 U JP S6237921U
Authority
JP
Japan
Prior art keywords
opposing electrodes
chamber
impedance
cvd apparatus
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12974985U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12974985U priority Critical patent/JPS6237921U/ja
Publication of JPS6237921U publication Critical patent/JPS6237921U/ja
Pending legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Landscapes

  • Chemical Vapour Deposition (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの考案の一実施例を示す概略正面図
、第2図は電極の斜視図、第3図は従来のプラズ
マCVD装置の概略正面図である。 1…チヤンバー、2,3…対向電極、9…第3
小電極。
FIG. 1 is a schematic front view showing an embodiment of this invention, FIG. 2 is a perspective view of an electrode, and FIG. 3 is a schematic front view of a conventional plasma CVD apparatus. 1...Chamber, 2, 3...Counter electrode, 9...Third
Small electrode.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] プラズマ分解を行なうためにチヤンバー内に設
けられた2枚の対向電極に対して、これらの対向
電極間の空間を低インピーダンス化させる第3小
電極を設けたことを特徴とするプラズマCVD装
置。
A plasma CVD apparatus characterized in that, for two opposing electrodes provided in a chamber for plasma decomposition, a third small electrode is provided to reduce the impedance of the space between these opposing electrodes.
JP12974985U 1985-08-26 1985-08-26 Pending JPS6237921U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12974985U JPS6237921U (en) 1985-08-26 1985-08-26

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12974985U JPS6237921U (en) 1985-08-26 1985-08-26

Publications (1)

Publication Number Publication Date
JPS6237921U true JPS6237921U (en) 1987-03-06

Family

ID=31026600

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12974985U Pending JPS6237921U (en) 1985-08-26 1985-08-26

Country Status (1)

Country Link
JP (1) JPS6237921U (en)

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