JPS6232270Y2 - - Google Patents

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Publication number
JPS6232270Y2
JPS6232270Y2 JP1980015418U JP1541880U JPS6232270Y2 JP S6232270 Y2 JPS6232270 Y2 JP S6232270Y2 JP 1980015418 U JP1980015418 U JP 1980015418U JP 1541880 U JP1541880 U JP 1541880U JP S6232270 Y2 JPS6232270 Y2 JP S6232270Y2
Authority
JP
Japan
Prior art keywords
aperture
sub
diaphragm
shutter
rotor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1980015418U
Other languages
Japanese (ja)
Other versions
JPS56117734U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1980015418U priority Critical patent/JPS6232270Y2/ja
Priority to DE19813104001 priority patent/DE3104001A1/en
Priority to US06/232,851 priority patent/US4348092A/en
Publication of JPS56117734U publication Critical patent/JPS56117734U/ja
Application granted granted Critical
Publication of JPS6232270Y2 publication Critical patent/JPS6232270Y2/ja
Expired legal-status Critical Current

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  • Exposure Control For Cameras (AREA)
  • Diaphragms For Cameras (AREA)
  • Shutters For Cameras (AREA)

Description

【考案の詳細な説明】 本考案は、副絞り測光を行うことにより露光量
を制御するシヤツタ装置に関し、特に、EE特性
を適正にする為の改良に関するものである。
[Detailed Description of the Invention] The present invention relates to a shutter device that controls the exposure amount by performing sub-diaphragm photometry, and particularly relates to an improvement for optimizing the EE characteristics.

一般に、副絞り測光を行うことにより露光量を
制御するシヤツタ装置では、その駆動力が変動し
てしまうと見込み制御分が変化し、EE特性が曲
がつて、特に小絞時の露出が不適正になつてしま
うといつた不都合があつた。
In general, in shutter devices that control the exposure amount by performing sub-aperture metering, if the driving force fluctuates, the estimated control amount will change, the EE characteristics will be distorted, and the exposure will be inappropriate, especially at small apertures. I had some inconveniences when I got used to it.

本考案は、上記不都合を解消する為になされた
もので、露光用羽根部材と、該露光用羽根部材に
連動して動作する測光用羽根部材と、該測光用羽
根部材と共に測光用開口を形成し、上記測光用羽
根部に対する重なり合いの位置関係を変化させて
上記測光用開口の開放開始時期を調整する位置調
整自在に設けられる調整部材とを備え、露光用開
口に先行する測光用開口の開放開始時期を調整す
ることにより、シヤツタの駆動力の変動に伴う開
口特性の変化を補正し、EE特性を適正なものに
するシヤツター装置を提供しようとするものであ
る。
The present invention was made to solve the above-mentioned disadvantages, and includes an exposure blade member, a photometry blade member that operates in conjunction with the exposure blade member, and a photometry aperture formed together with the photometry blade member. and a positionally adjustable adjustment member that adjusts the opening start timing of the photometric aperture by changing the overlapping positional relationship with the photometric blade, the opening of the photometric aperture preceding the exposure aperture. The present invention aims to provide a shutter device that corrects changes in aperture characteristics due to fluctuations in the driving force of the shutter by adjusting the start timing and makes the EE characteristics appropriate.

以下、本考案の一実施例を図面を基に説明す
る。以下の実施例では本考案を電磁駆動シヤツタ
に適用した場合を示すもので、第1図は電磁駆動
シヤツタの主要構成を示し、第1図中、1は撮影
レンズ、2は撮影レンズ1の保持部材、3は遮光
筒、4はフイルムである。上記保持部材2と遮光
筒3との間には電磁駆動シヤツタユニツトが介在
されている。この電磁駆動シヤツタユニツトは第
1の基板5、磁性体より成る第2の基板6を有す
るとともに、第1の基板5と第2の基板6との間
にはシヤツタ開口動作域規制部材7、絞りを兼ね
た3枚の合成樹脂製のシヤツタ羽根8,9,1
0、磁性体より成る案内板11、ロータ12、永
久磁石13を備えた位置決め部材14が順に介在
される。第2の基板6の背面にはプリント基板1
5が配置されている。第1の基板5、規制部材
7、位置決め部材14は撮影レンズ1からの被写
体光を通過させる開口部が設けられ、この光の通
路を遮光するためにシヤツタ羽根8,9,10が
設けられている。位置決め部材14の軸受部には
案内板11並びにロータ12が位置決めされてい
る。また第1の基板5、案内板11、位置決め部
材14、プリント基板15にはプリント基板15
上の受光素子16に被写体輝度を測定させるため
の副絞り開口が設けられ、この光の通路はシヤツ
タ羽根8と副絞り羽根16とによりその開口径が
決められる。第1の基板5と案内板11はビス1
7により取付けられている。シヤツタ羽根8,
9,10は規制部材7とともに第1の基板5と案
内板11との間に配置され、第1の基板5の突出
部5a,5bがシヤツタ羽根8,9,10の可動
空間を形成するものである。また案内板11の軸
受周辺にはシヤツタ羽根8,9,10の回動軸と
なるピン11a,11b,11cが植設され、こ
れらのピン11a,11b,11cはシヤツタ羽
根8,9,10及び規制部材7を挿通して第1の
基板5の孔部の挿入されるものである。また、案
内板11にはロータ12からの植設ピン12a,
12b,12cを挿入するガイド穴が設けられて
おり、このロータ12からの植設ピン12a,1
2b,12cがシヤツタ羽根8,9,10の駆動
軸となつている。位置決め部材14には板厚方向
に着磁され極性の異る一対の永久磁石13が4組
配設されている。この永久磁石13は第2の基板
6並びに案内板11とで磁気回路を構成し、第2
図の斜線で示した磁場を構成している。
An embodiment of the present invention will be described below with reference to the drawings. The following embodiments show the case where the present invention is applied to an electromagnetic drive shutter. Fig. 1 shows the main structure of the electromagnetic drive shutter. The members 3 are a light-shielding tube, and 4 is a film. An electromagnetically driven shutter unit is interposed between the holding member 2 and the light shielding tube 3. This electromagnetic drive shutter unit has a first substrate 5 and a second substrate 6 made of a magnetic material, and between the first substrate 5 and the second substrate 6 there is a shutter opening movement range regulating member 7 and a diaphragm. Three synthetic resin shutter blades 8, 9, 1 that also serve as
0, a guide plate 11 made of a magnetic material, a rotor 12, and a positioning member 14 equipped with a permanent magnet 13 are interposed in this order. On the back of the second board 6 is a printed circuit board 1.
5 is placed. The first substrate 5, the regulating member 7, and the positioning member 14 are provided with an opening through which the subject light from the photographing lens 1 passes, and shutter blades 8, 9, and 10 are provided to block the path of this light. There is. The guide plate 11 and the rotor 12 are positioned on the bearing portion of the positioning member 14 . In addition, the first board 5, the guide plate 11, the positioning member 14, and the printed board 15 have a printed board 15.
A sub-diaphragm aperture is provided for the upper light-receiving element 16 to measure the subject brightness, and the aperture diameter of this light path is determined by the shutter blade 8 and the sub-diaphragm blade 16. The first board 5 and the guide plate 11 are connected by screws 1
It is attached by 7. Shutter blade 8,
9 and 10 are arranged together with the regulating member 7 between the first substrate 5 and the guide plate 11, and the protrusions 5a and 5b of the first substrate 5 form a movable space for the shutter blades 8, 9, and 10. It is. Further, pins 11a, 11b, 11c are installed around the bearings of the guide plate 11, and these pins 11a, 11b, 11c serve as rotation axes of the shutter blades 8, 9, 10, and The regulating member 7 is inserted into the hole of the first substrate 5. In addition, the guide plate 11 also includes implant pins 12a from the rotor 12,
Guide holes are provided for inserting the pins 12b and 12c, and the pins 12a and 1 are inserted from the rotor 12.
2b and 12c serve as drive shafts for the shutter blades 8, 9, and 10. The positioning member 14 is provided with four pairs of permanent magnets 13 that are magnetized in the thickness direction and have different polarities. This permanent magnet 13 constitutes a magnetic circuit with the second substrate 6 and the guide plate 11, and the second
It constitutes the magnetic field indicated by diagonal lines in the figure.

第2図はロータ12並びにシヤツタ羽根8,
9,10を具体的に示すもので、案内板11は図
が繁雑となるため省略している。
FIG. 2 shows the rotor 12 and shutter blades 8,
9 and 10 are specifically shown, and the guide plate 11 is omitted because it would make the diagram complicated.

ロータ12はバネ18a,18bには時計方向
に附勢され、ストツパ19の位置で静止されてい
る。このストツパ19は偏心しており、ストツパ
19の偏心状態を調節することにより、ロータ1
2の静止位置を調整することができる。ロータ1
2には両面にコイル20がパターン化されてお
り、両面のコイル20は1本の駆動ピン12bで
電気的に結合されている。ロータ12は配設され
たコイル20はロータ12の内面側でリード線2
1a,21bに半田付けされ、これらのリード線
21a,21bは位置決め部材14の軸受部と永
久磁石13との間の空間をタワミのスペースと
し、所定の長さ配設して外側に取り出し不図示の
駆動回路に接続される。前記駆動ピン12bは電
位を持つのでシヤツタ羽根8,9,10は絶縁性
の有る非金属、例えば黒色に染色したポリエステ
ルシートで作つている。シヤツタ羽根8には副絞
り用窓8aが形成され、この窓8aは副絞り羽根
22のマスク部22aとともに副絞りを構成して
いる。この副絞り羽根22は調整部22bを動か
し、マスク部22aを調整するものである。ロー
タ12は例えばガラスエポキシ製の合成樹脂によ
り形成されている。このロータ12のストツパ1
9に当る部分はコイルと同質の金属が残つてお
り、補強金属部23a,23bとなつている。こ
の補強金属部23a,23bは金属の強さで補強
され、ストツパ19により運動が規制された際の
衝撃でクラツクが発生するのを防止するものであ
る。また、ロータ12の端部外周及び端部内周に
もコイル20と同質の金属が残つており、外周金
属部23cと内周金属部23dを形成している。
外周金属部23cはプレス加工時の衝撃によるク
ラツクの発生を防止しており、内周金属部23d
は温度変化による熱膨張の影響を防止して、位置
決め部材14に対するロータ12の回動運動を円
滑に行うようにしているものである。またバネ1
8a,18bの取付部も補強部23e,23fと
なつている。そしてロータ12のコイル20には
カバー24が付けられ、コイル20と案内板11
との間の電気的接触を防止している。
The rotor 12 is biased clockwise by springs 18a and 18b and is held stationary at a stopper 19. This stopper 19 is eccentric, and by adjusting the eccentric state of the stopper 19, the rotor 1
The rest position of 2 can be adjusted. Rotor 1
2 has coils 20 patterned on both sides, and the coils 20 on both sides are electrically connected by one drive pin 12b. The rotor 12 has a coil 20 disposed thereon and a lead wire 2 on the inner surface of the rotor 12.
1a and 21b, and these lead wires 21a and 21b are arranged in a predetermined length using the space between the bearing part of the positioning member 14 and the permanent magnet 13 as a bending space, and are taken out to the outside (not shown). connected to the drive circuit. Since the drive pin 12b has a potential, the shutter blades 8, 9, and 10 are made of an insulating nonmetal, for example, a polyester sheet dyed black. A sub-diaphragm window 8a is formed in the shutter blade 8, and this window 8a, together with the mask portion 22a of the sub-diaphragm blade 22, constitutes a sub-diaphragm. This sub aperture blade 22 moves the adjustment section 22b and adjusts the mask section 22a. The rotor 12 is made of synthetic resin such as glass epoxy. Stopper 1 of this rotor 12
In the portion corresponding to 9, metal of the same quality as the coil remains, and serves as reinforcing metal portions 23a and 23b. These reinforcing metal parts 23a and 23b are reinforced with the strength of metal, and are used to prevent cracks from occurring due to impact when movement is restricted by the stopper 19. Furthermore, metal of the same quality as the coil 20 remains on the outer periphery of the end portion and the inner periphery of the end portion of the rotor 12, forming an outer periphery metal portion 23c and an inner periphery metal portion 23d.
The outer metal part 23c prevents cracks from occurring due to impact during press working, and the inner metal part 23d
This prevents the effects of thermal expansion due to temperature changes and allows the rotor 12 to rotate smoothly relative to the positioning member 14. Also spring 1
The attachment parts 8a and 18b also serve as reinforcement parts 23e and 23f. A cover 24 is attached to the coil 20 of the rotor 12, and a cover 24 is attached to the coil 20 and the guide plate 11.
prevents electrical contact between the

しかして、ロータ12を組み込んだ電磁駆動シ
ヤツタにおいて、リード線21a,21bを用い
てロータ12のコイル20に不図示の回路から電
流を流すと、永久磁石13の磁束によりコイル2
0にフレミングの左手の法則に従つて電磁力が発
生し、ロータ12をバネ18a,18bに抗して
反時計方向に回動させ、主絞りを兼ねたシヤツタ
羽根10,8,9を開口する方向に作動させる。
最初に、副絞り羽根22のマスク部22aの角2
2a1とシヤツタ羽根8の副絞り用窓8aの間で測
光用開口としての副絞りの開口が始まる。この時
の秒時が第3図のt1で示してある。これにより被
写体光が受光素子16に入射する。副絞りの開口
が進むにつれて秒時t2で露光用開口としてのシヤ
ツタの開口が始まり、フイルム4への露光が開始
される。やがて副絞りが秒時t3で全開するが、こ
の時、シヤツタはまだ開き続けている。そして副
絞りはバウンズの影響を少なくするために少し絞
られ(秒時t4)シヤツタが全開する。この時副絞
りの開口面積は全開時の1/2である。そして受光
素子16の出力に基づく測光演算を不図示の回路
により行い、この演算出力に基づいてロータ12
のコイル20の電流を断つ。この結果ロータ12
はバネ18a,18bのバネ圧により復帰回動し
てシヤツタ羽根10,8,9を閉じるものであ
る。この時、ロータ12はストツパ19の位置で
回動が阻止され停止されるものである。
Therefore, in an electromagnetic drive shutter incorporating the rotor 12, when a current is applied to the coil 20 of the rotor 12 from a circuit (not shown) using the lead wires 21a and 21b, the magnetic flux of the permanent magnet 13 causes the coil 20 to
0, an electromagnetic force is generated according to Fleming's left-hand rule, causing the rotor 12 to rotate counterclockwise against the springs 18a and 18b, opening the shutter blades 10, 8, and 9, which also serve as the main diaphragm. operate in the direction.
First, the corner 2 of the mask portion 22a of the sub aperture blade 22
The aperture of the sub-diaphragm as a photometric aperture begins between 2a1 and the sub-diaphragm window 8a of the shutter blade 8. The time in seconds at this time is shown as t1 in FIG. As a result, the subject light enters the light receiving element 16. As the aperture of the sub-diaphragm advances, the shutter starts to open as an exposure aperture at time t2 , and exposure of the film 4 is started. Eventually, the sub-diaphragm fully opens at t3 , but at this time the shutter is still open. The sub-diaphragm is then narrowed down a little to reduce the effect of bounce (second time t 4 ) and the shutter is fully opened. At this time, the aperture area of the sub-diaphragm is 1/2 that of when it is fully open. Then, a photometric calculation based on the output of the light receiving element 16 is performed by a circuit (not shown), and based on this calculation output, the rotor 12
The current in the coil 20 is cut off. As a result, rotor 12
The shutter blades 10, 8, and 9 are rotated back by the spring pressure of the springs 18a and 18b to close the shutter blades 10, 8, and 9. At this time, the rotor 12 is prevented from rotating and stopped at the position of the stopper 19.

以上の動作で電磁力が大きく設定され、小絞り
時での露光量がオーバーになる時はt1をt1′に早め
るように調整部22bを動かし副絞り羽根22を
反時計方向に回転してやる。そうすると第3図に
示す左側の線のような開口特性に変わり不図示の
回路からの信号がより早く出されるようになり小
絞り時の露光量過多が補償される。
If the electromagnetic force is set to be large by the above operation and the exposure amount at a small aperture becomes excessive, move the adjustment section 22b to advance t 1 to t 1 ' and rotate the sub-diaphragm blades 22 counterclockwise. . Then, the aperture characteristic changes as shown by the left line in FIG. 3, and a signal from a circuit (not shown) is output more quickly, thereby compensating for excessive exposure when the aperture is small.

逆に電磁駆動が小さく小絞り時での露光量がア
ンダーとなる時はt1をt1″に遅くするよう調整部2
2bを動かし副絞り羽根22を時計方向に回転し
てやる。そうすると第3図に示す右側の線のよう
な副絞り開口特性となり、不図示の回路からの閉
じ信号がより遅く出されるようになり、小絞り時
の露光不足が補償される。この時、副絞り兼用羽
根8の回転中心軸、副絞り羽根22の回転中心軸
及び副絞り羽根22のマスク部22aの角22a1
を直線上に構成しておく事により副絞り羽根の調
整による副絞形状の劣化は少なくなる。すなわち
最小のマスクの移動で最大の秒時変化が得られる
ようになつている。
On the other hand, if the electromagnetic drive is small and the exposure amount is undersized at a small aperture, adjust the adjustment unit 2 to slow down t 1 to t 1 ″.
2b to rotate the sub aperture blade 22 clockwise. In this case, the sub-diaphragm aperture characteristic will be as shown by the line on the right side of FIG. 3, and the closing signal from the circuit (not shown) will be output later, thereby compensating for the underexposure when the aperture is small. At this time, the rotation center axis of the sub-diaphragm blades 8, the rotation center axis of the sub-diaphragm blades 22, and the corner 22a 1 of the mask portion 22a of the sub-diaphragm blades 22.
By configuring the sub-diaphragm on a straight line, deterioration of the sub-diaphragm shape due to adjustment of the sub-diaphragm blades is reduced. In other words, the maximum change in time can be obtained with the minimum mask movement.

この為に調整部22bを軸から十分長くしてお
く事が有効であり、又、十分長くする事により調
整時、副絞兼用羽根8あるいは調整工具に付着し
ている磁性のゴミが永久磁石に引きつけられて故
障の原因となるのを防止する事ができる。
For this reason, it is effective to make the adjustment part 22b sufficiently long from the axis. Also, by making it sufficiently long, magnetic dust attached to the sub-diaphragm blade 8 or the adjustment tool will be transferred to the permanent magnet during adjustment. This can prevent it from being attracted and causing a malfunction.

磁場中のコイルが通電による電磁力で駆動され
る場合、ロータ及びシヤツタ羽根は常に加速を受
け運動エネルギーの増す加速運動を行う。従つ
て、副絞の開口開始時点ではシヤツタ羽根の運動
速度は遅く、この時点では、ほんのわずかの位置
調整でも開口開始の秒時の観点で見れば大きく拡
大される。一方、このような開口開始時期を調整
しても副絞全開に近づくと、その位置調整の移動
量は全開までの秒時という観点からすると縮小さ
れてしまい(速度が速くなつているので同じ0.1
mmを通過する為の秒時は非常に小さくなつてい
る)無視できるようになつてしまう。
When a coil in a magnetic field is driven by electromagnetic force due to energization, the rotor and shutter blades are constantly accelerated and perform accelerated motion with increased kinetic energy. Therefore, the movement speed of the shutter blade is slow at the time when the sub-diaphragm starts to open, and at this point, even a slight position adjustment will greatly increase the speed in terms of the seconds at which the sub-diaphragm starts opening. On the other hand, even if the aperture start timing is adjusted in this way, as the sub-diaphragm approaches full opening, the amount of movement for the position adjustment will be reduced in terms of seconds until the sub-diaphragm fully opens (since the speed is faster, it will remain the same 0.1
The time it takes to pass mm has become very small) and can be ignored.

駆動力の変化による通電OFFの主絞露光量の
変動は、通電OFFとなる時点でのシヤツターの
イナーシヤーによるものが主で、駆動力が大きい
程通電OFF後の露光量は大きくなるが、上述の
様にその影響は、制御期間の短い小絞り時ほど大
きなものとなる。
The fluctuation in the main aperture exposure amount when the power is turned off due to changes in the driving force is mainly due to the inertia of the shutter at the time when the power is turned off, and the greater the driving force, the greater the exposure amount after the power is turned off. Similarly, the effect becomes greater when the control period is short and the aperture is small.

そして、上述のように副絞位置の調整を主絞時
間経過の過程を変える事なく行う事は、特に小絞
り時の副絞の主絞に対する先行時間を調整する事
であり、駆動力の変化によるEE特性の劣化に対
しては極めて有効である。
As mentioned above, adjusting the sub-aperture position without changing the main aperture time elapsed means adjusting the lead time of the sub-aperture relative to the main aperture, especially when the aperture is small, and this changes the driving force. It is extremely effective against deterioration of EE characteristics due to

以上のように本考案によれば、シヤツタの駆動
力の変化に伴う開口特性の変化に対し、主絞りに
先行する副絞り開口の先行量を調整するように
し、以つて、EE特性がフラツトになるようにで
きるものである。
As described above, according to the present invention, the amount of advance of the sub-diaphragm aperture that precedes the main aperture is adjusted in response to changes in the aperture characteristics due to changes in the driving force of the shutter, thereby flattening the EE characteristics. It is possible to make it happen.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の一実施例を示す電磁駆動シヤ
ツタの構成図、第2図は第1図に示すロータとシ
ヤツタの詳細図、第3図は第1図及び第2図に示
す主絞りと副絞りの開口特性図である。 10,8,9……主絞りを兼ねたシヤツタ羽
根、12……ロータ、13……永久磁石、20…
…コイル、19……ストツパ、22……副絞り羽
根。
Fig. 1 is a configuration diagram of an electromagnetic drive shutter showing an embodiment of the present invention, Fig. 2 is a detailed view of the rotor and shutter shown in Fig. 1, and Fig. 3 is a main aperture shown in Figs. 1 and 2. and an aperture characteristic diagram of the sub-diaphragm. 10, 8, 9...Shutter blade that also serves as a main diaphragm, 12...Rotor, 13...Permanent magnet, 20...
...Coil, 19...Stopper, 22...Sub-aperture blade.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 露光用羽根部材と、該露光用羽根部材に連動し
て動作する測光用羽根部材と、該測光用羽根部材
と共に測光用開口を形成し、上記測光用羽根部に
対する重なり合いの位置関係を変化させて上記測
光用開口の開放開始時期を調整する位置調整自在
に設けられる調整部材とを備えたことを特徴とす
るシヤツタ装置。
An exposure blade member, a photometric blade member that operates in conjunction with the exposure blade member, and a photometric aperture formed together with the photometric blade member, and a positional relationship of overlapping with the photometric blade member is changed. A shutter device comprising: an adjusting member whose position is freely adjustable and adjusts the opening start timing of the photometric aperture.
JP1980015418U 1980-02-08 1980-02-08 Expired JPS6232270Y2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP1980015418U JPS6232270Y2 (en) 1980-02-08 1980-02-08
DE19813104001 DE3104001A1 (en) 1980-02-08 1981-02-05 Electromagnetically driven shutter
US06/232,851 US4348092A (en) 1980-02-08 1981-02-09 Electromagnetically driven shutter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1980015418U JPS6232270Y2 (en) 1980-02-08 1980-02-08

Publications (2)

Publication Number Publication Date
JPS56117734U JPS56117734U (en) 1981-09-09
JPS6232270Y2 true JPS6232270Y2 (en) 1987-08-18

Family

ID=29611872

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1980015418U Expired JPS6232270Y2 (en) 1980-02-08 1980-02-08

Country Status (1)

Country Link
JP (1) JPS6232270Y2 (en)

Also Published As

Publication number Publication date
JPS56117734U (en) 1981-09-09

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