JPS62283527A - Formation of thermal-deformation controlling membrane for shadow mask - Google Patents
Formation of thermal-deformation controlling membrane for shadow maskInfo
- Publication number
- JPS62283527A JPS62283527A JP12651386A JP12651386A JPS62283527A JP S62283527 A JPS62283527 A JP S62283527A JP 12651386 A JP12651386 A JP 12651386A JP 12651386 A JP12651386 A JP 12651386A JP S62283527 A JPS62283527 A JP S62283527A
- Authority
- JP
- Japan
- Prior art keywords
- shadow mask
- thermal deformation
- glass
- low melting
- melting point
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000015572 biosynthetic process Effects 0.000 title claims 2
- 239000012528 membrane Substances 0.000 title abstract 4
- 239000011521 glass Substances 0.000 claims abstract description 35
- 238000002844 melting Methods 0.000 claims abstract description 24
- 230000008018 melting Effects 0.000 claims abstract description 24
- 239000002245 particle Substances 0.000 claims abstract description 21
- 239000000126 substance Substances 0.000 claims abstract description 17
- 239000000843 powder Substances 0.000 claims abstract description 12
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000011701 zinc Substances 0.000 claims abstract description 3
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 3
- 239000011248 coating agent Substances 0.000 claims description 16
- 238000000576 coating method Methods 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 9
- 230000000694 effects Effects 0.000 claims description 6
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 2
- 239000011574 phosphorus Substances 0.000 claims description 2
- 229910052698 phosphorus Inorganic materials 0.000 claims description 2
- 230000002401 inhibitory effect Effects 0.000 claims 2
- 230000001629 suppression Effects 0.000 claims 1
- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(iii) oxide Chemical compound O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 abstract description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 230000001276 controlling effect Effects 0.000 abstract 5
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 18
- 239000011230 binding agent Substances 0.000 description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 235000019353 potassium silicate Nutrition 0.000 description 9
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 7
- 239000002002 slurry Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000012299 nitrogen atmosphere Substances 0.000 description 4
- 238000001035 drying Methods 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229920000298 Cellophane Polymers 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910003781 PbTiO3 Inorganic materials 0.000 description 1
- -1 Ta 205 Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 238000009125 cardiac resynchronization therapy Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- AEDZKIACDBYJLQ-UHFFFAOYSA-N ethane-1,2-diol;hydrate Chemical compound O.OCCO AEDZKIACDBYJLQ-UHFFFAOYSA-N 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N lead(II) oxide Inorganic materials [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- RLQWHDODQVOVKU-UHFFFAOYSA-N tetrapotassium;silicate Chemical compound [K+].[K+].[K+].[K+].[O-][Si]([O-])([O-])[O-] RLQWHDODQVOVKU-UHFFFAOYSA-N 0.000 description 1
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten(VI) oxide Inorganic materials O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Glass Compositions (AREA)
- Electrodes For Cathode-Ray Tubes (AREA)
Abstract
Description
【発明の詳細な説明】
３、発明の詳細な説明
［産業上の利用分野〕
本発明はシャドウマスクの熱変形抑制被膜の形成方法に
関する。さらに詳しくは、カラーブラウン管の色ずれ現
像を改善すべく、同装置の構成部品であるシャドウマス
クの片面に熱変形抑制効果の大きい物質の粉末を塗布す
る方法に関する。Detailed Description of the Invention 3. Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a method for forming a thermal deformation suppressing film for a shadow mask. More specifically, the present invention relates to a method of applying powder of a material having a large thermal deformation suppressing effect to one side of a shadow mask, which is a component of the color cathode ray tube, in order to improve color shift development.
［従来の技術］
カラーブラウン管の色ずれ現象の主要な原因は、同装置
におけるシャドウマスクが電子ビームが照射されたとき
に起こる同マスク面の熱変形に基づくものであると考え
られている。従来よりそのような色ずれ現象を改善する
ため、同マスクの電子ビーム衝突面側に熱変形抑制物質
の粉末を塗布して被膜を形成する方法が提案されている
が、そのような被膜においては該被膜中の粒子間結合力
および該被膜とシャドウマスク面との密着力を確保する
ことが重要であるために塗布被膜中にバインダーとして
水ガラスを加えることが行なわれている。[Prior Art] The main cause of the color shift phenomenon in color cathode ray tubes is thought to be due to thermal deformation of the shadow mask surface that occurs when the shadow mask in the device is irradiated with an electron beam. In order to improve such color shift phenomenon, a method has been proposed in the past in which a powder of a thermal deformation suppressing material is applied to the electron beam impact side of the mask to form a film. Since it is important to ensure the interparticle bonding force in the coating and the adhesion between the coating and the shadow mask surface, water glass is added as a binder to the coated coating.
［発明が解決しようとする問題点］
しかしながら、水ガラスの粒子間接着力は弱く、またシ
ャドウマスク本体の金属との密着力も著しく弱い。さら
に水ガラスは本来含水けい酸を主成分としており、分子
構造中に水分子を含んでいることから、通常の熱処理に
よって完全に水分子を除くことができないという問題が
ある。そのため残存水分が管球寿命を制限してしまう可
能性が大きい。またこのようなトラブルを避けるため、
熱処理温度を高くし、完全脱水を行うようにすると、水
ガラスはバインダーとしての機能を失ってしまうという
問題がある。[Problems to be Solved by the Invention] However, the adhesion between water glass particles is weak, and the adhesion to the metal of the shadow mask body is also extremely weak. Furthermore, since water glass originally contains hydrated silicic acid as its main component and contains water molecules in its molecular structure, there is a problem in that water molecules cannot be completely removed by ordinary heat treatment. Therefore, there is a high possibility that residual moisture will limit the tube life. Also, to avoid such troubles,
If the heat treatment temperature is increased and complete dehydration is performed, there is a problem that water glass loses its function as a binder.
本発明は以上のごとき水ガラスをバインダーとして利用
することの欠点を改善すべくなされたものであり、バイ
ンダー成分中に水分などの容易にｗｉ脱ガス化する成分
を含まず、粉末粒子間の結合力およびシャドウマスク金
属との高い密着力を達成することが可能なシャドウマス
クの熱変形抑制被膜の形成方法を提供せんとするもので
ある。The present invention was made in order to improve the above-mentioned drawbacks of using water glass as a binder, and the binder component does not contain components that easily degas, such as water, and bonds between powder particles. It is an object of the present invention to provide a method for forming a thermal deformation suppressing coating for a shadow mask that can achieve high adhesive strength and shadow mask metal.
［問題点を解決するための手段］
本発明は、熱変形抑制効果の大きい物質に低融点ガラス
の粉末を添加し、前記低融点ガラスの粉末が添加された
前記熱変形抑制物質をシャドウマスクの片側に塗布し、
そのようにして形成された塗布被膜を前記低融点ガラス
の軟化点以上で熱処理することを特徴とする。[Means for Solving the Problems] The present invention includes adding low melting point glass powder to a substance having a large thermal deformation suppressing effect, and using the thermal deformation suppressing material to which the low melting point glass powder is added as a shadow mask. Apply on one side,
The coating film thus formed is characterized by being heat treated at a temperature higher than the softening point of the low melting point glass.
［作 用］
本発明では、バインダーとして水ガラスのかわりに、低
融点ガラスを用いたので、熱変形抑制物質の粒子間およ
びシャドウマスク本体の金属と被膜との密着力が強くな
り、また低融点ガラス中には水分などのガス成分が含ま
れていないので水ガラスをバインダーとして用いていた
ばあいに生じていた管球寿命の低下などの不具合を避け
ることができる。[Function] In the present invention, since low melting point glass is used as the binder instead of water glass, the adhesion between the particles of the thermal deformation suppressing substance and between the metal of the shadow mask body and the film is strengthened, and the low melting point glass is used as the binder. Since glass does not contain gaseous components such as moisture, problems such as a reduction in the life of the tube, which occur when water glass is used as a binder, can be avoided.
［実施例］ つぎに本発明の詳細な説明する。[Example] Next, the present invention will be explained in detail.
第１図は本発明にかかわるカラーブラウン管の一部断面
図である。同図において、（１）はブラウン管のパネル
、（ａはシャドウマスクである。シャドウマスク（２の
電子ビームが衝突する側の面には熱変形抑制物質（３）
とバインダーである低融点ガラス（４）からなる被ＩＩ
！（５１が形成されている。FIG. 1 is a partial sectional view of a color cathode ray tube according to the present invention. In the figure, (1) is a cathode ray tube panel, (a is a shadow mask, and a thermal deformation suppressing material (3) is placed on the side of the shadow mask (2) on which the electron beam collides.
and a low melting point glass (4) as a binder.
! (51 is formed.
本発明に用いる熱変形抑制効果の大きい物質としｒ Ｇ
ｔ、Ｂｉ２Ｏ３、ＷＯ３、ＰｂＯ、ＰｂＴｉＯ３、Ｔａ
２０５、ＢａＴｉＯ３などがあげられ、通常は平均粒径
０．１〜１、ＯＪのものが好適に用いられる。The material used in the present invention has a large thermal deformation suppressing effect.
t, Bi2O3, WO3, PbO, PbTiO3, Ta
205, BaTiO3, etc., and those with an average particle size of 0.1 to 1 OJ are usually preferably used.
本発明に用いる低融点ガラスとしては、軟化点がシャド
ウマスクが通常熱変形を起す温度である７００〜８００
℃程度より低い、たとえば３００〜６００℃の鉛含有ガ
ラス、亜鉛含有ガラスまたはリン含有ガラスから選ばれ
たいずれかが好ましく、具体的にはＰｂＯ−８２０３−
５ｉ０２、ＰｂＯ−ＺｎＯ−８２０３、ＮａＮａ２０−
５ｉｏ２−２０３−Ｐ２０ｓ、に２Ｏ−３ｉ ０２−Ｍ
２０３−Ｐ２０ｓ、ｐｂｏ−ａａｏ−Ｂ２Ｏ５−５ｉ
０２などの組成を有するものがあげられる。The low melting point glass used in the present invention has a softening point of 700 to 800, which is the temperature at which a shadow mask normally undergoes thermal deformation.
Preferably, one selected from lead-containing glass, zinc-containing glass, or phosphorus-containing glass with a temperature lower than approximately 300 to 600 °C, specifically PbO-8203-
5i02, PbO-ZnO-8203, NaNa20-
5io2-203-P20s, 2O-3i 02-M
203-P20s, pbo-aao-B2O5-5i
Examples include those having a composition such as 02.
前記低融点ガラスの粒径は、前記熱変形抑制物質の粒径
と同等またはそれ以下、たとえば平均粒径１．〇−以下
であるのが好ましい。前記低融点ガラスを前記熱変形抑
制物質に対して６％（重量％、以下同様）以下の割合で
添加するのが好ましく、低融点ガラスを添加する効果を
つるためには２％程度以上であるのが好ましい。さらに
要すれば水、ジエチレングリコールなどを加え、ボール
ミルなどを用いて混合しスラリーをうる。The particle size of the low melting point glass is equal to or smaller than the particle size of the thermal deformation suppressing substance, for example, an average particle size of 1. It is preferable that it is 〇- or less. It is preferable that the low melting point glass is added in a proportion of 6% (wt%) or less (the same applies hereinafter) to the thermal deformation suppressing substance, and in order to enhance the effect of adding the low melting point glass, the proportion is about 2% or more. is preferable. Further, if necessary, water, diethylene glycol, etc. are added and mixed using a ball mill or the like to obtain a slurry.
低融点ガラスの添加量が６％をこえると焼付は時に被膜
の収縮が大きくなり、皮膜の亀裂、剥離が生じやすい。If the amount of low melting glass added exceeds 6%, the shrinkage of the coating may become large during baking, and cracking and peeling of the coating may easily occur.
えられたスラリーをスプレ一方式の塗布装置などを用い
てシャドウマスク（２１の電子ビーム衝突面側１〜３ａ
ｙ／ｄ程度の厚さに塗布し、乾燥後Ｎ２、Ａｒ、空気な
どの雰囲気中で２、用いた低融点ガラスの軟化点以上た
とえば３００〜６００℃で５〜３０分間程度熱処理して
、第１図に示されるごとき熱変形抑制被膜（５）が形成
されたシャドウマスク（２］をうろことができる。The obtained slurry is applied to a shadow mask (electron beam collision surface side 1 to 3a of 21) using a spray coating device or the like.
It is applied to a thickness of about y/d, and after drying, it is heat-treated in an atmosphere of N2, Ar, air, etc. for about 5 to 30 minutes at a temperature above the softening point of the low melting point glass used, e.g. 300 to 600°C. A shadow mask (2) on which a thermal deformation suppressing coating (5) as shown in FIG. 1 is formed can be walked around.
以下、実施例１〜５および比較例１〜２に基づき本発明
の詳細な説明する。Hereinafter, the present invention will be explained in detail based on Examples 1 to 5 and Comparative Examples 1 to 2.
実施例１
熱変形抑制物質（３）として平均粒径１ρの８１２０３
９４ｇとバインダー（４）として軟化点３２０℃のＰｂ
Ｏ−８２０３”５ｉＯ２（Ｐｂ０７０％、８２０３１５
％、５ｉＯ２１５％）からなる平均粒径０，５項の低融
点ガラス粉末６ｇを用い、水２００ｃｃ １ジエチレン
グリコール１ＣＣとともにボールミルを用いて混合し、
えられたスラリーをスプレ一方式の塗布装置でシャドウ
マスク（２１の電子ビーム衝突面側に１〜３ ｔｘａ／
ＣＩ２の厚さに塗布し、乾燥後ＮＺ雰囲気中で４５０
℃で２０分間熱処理して、第１図に示されるごとき熱変
形抑制被膜（５）が形成されたシャドウマスク（２をえ
た。Example 1 81203 with an average particle size of 1ρ as the thermal deformation suppressing substance (3)
94g and Pb with a softening point of 320°C as a binder (4)
O-8203”5iO2 (Pb070%, 820315
%, 5iO2 (15%) with an average particle size of 0.5, mixed with 200 cc of water and 1 cc of diethylene glycol using a ball mill,
The resulting slurry is sprayed onto the shadow mask (1 to 3 txa/
Coated to a thickness of CI2 and dried at 450°C in a NZ atmosphere.
A heat treatment was performed at .degree. C. for 20 minutes to obtain a shadow mask (2) on which a thermal deformation suppressing film (5) as shown in FIG. 1 was formed.
実施例２
熱変形抑制物質（３）として平均粒径０８虜の８！２０
３９４Ｑとバインダー（４）として軟化点３７０℃のＰ
ｂＯ−ＺｎＯ−８２０ｔ （ｐｂｏ ｅｏ％、Ｚｎ０
１０％、８２０３３０％）からなる平均粒径ｏ、 ５．
ｎの低融点ガラス粉末４Ｑを用い、水２００ｃｃ 、ジ
エチレングリコール１ＣＣとともにボールミルを用いて
混合し、えられたスラリーを実施例１と同様の方法で１
〜３０１（＋／Ｃ１の厚さに塗布し、乾燥後Ｎ２雰囲気
中で４８０℃で１５分間熱処理して熱変形抑制被膜（５
）が形成されたシャドウマスク（ａをえた。Example 2 As thermal deformation suppressing substance (3), average particle size of 8!20 is 08.
394Q and P with a softening point of 370°C as a binder (4)
bO-ZnO-820t (pbo eo%, Zn0
10%, 820330%) average particle size o, 5.
n low melting point glass powder 4Q was mixed with 200 cc of water and 1 cc of diethylene glycol using a ball mill, and the resulting slurry was mixed in the same manner as in Example 1.
~301 (+/C1), and after drying, heat-treated at 480°C for 15 minutes in N2 atmosphere to form a thermal deformation suppressing coating (5
) with a shadow mask (a) formed.
実施例３
熱変形抑制物質（３）として平均粒径１項のＢｉ２０３
９７ｇとバインダー（４）として軟化点３９０℃のＮａ
２０（ＫｘＯ）−Ｓｉ０２− ／Ｖ２０ａ −Ｐ２Ｏ５
（Ｎａ２０（Ｎ２０） ５％、５ｉＯ２５％、Ａ＃２（
ｈ３％、Ｐ２Ｏ５８７％）からなる平均粒径０．５ρの
低融点ガラス粉末３ｇを用い、水２００ＣＣ１ジエチレ
ングリコール１ｃｃとともにボールミルを用いて混合し
、えられたスラリーを実施例１と同様の方法で１〜３
Ｂ／ ｃｍ２の膜厚に塗布し、乾燥後Ｎ２雰囲気中で５
２０℃で５分間熱処理して熱変形抑制液１！（５］が形
成されたシャドウマスク（２をえた。Example 3 Bi203 with an average particle size of 1 term as the thermal deformation suppressing substance (3)
97g and Na with a softening point of 390°C as binder (4)
20(KxO)-Si02- /V20a-P2O5
(Na20(N20) 5%, 5iO25%, A#2(
3% of P2O, 587% of P2O) with an average particle diameter of 0.5ρ was mixed with 200cc of water, 1cc of diethylene glycol using a ball mill, and the resulting slurry was mixed in the same manner as in Example 1. 3
Coated to a film thickness of B/cm2 and dried for 5 minutes in an N2 atmosphere.
Heat deformation suppressing liquid 1 after heat treatment at 20℃ for 5 minutes! (5) Shadow mask formed (gained 2).
実施例４
熱変形抑制物質（３）として平均粒径１．ＯＪｓの−０
３９７（ｌとバインダー（４）として軟化点５２０℃の
に２０−５ｉＯｚ −Ｍ ２０３ −Ｐ２Ｏ５（に２
０５％、５ｉＯ２３％、＃２０３３％、Ｐ２Ｏ５８９％
）からなる平均粒径１．〇−の低融点ガラス粉末３Ｑを
用い、水２００ｃｃ、ジエチレングリコール１ｃｃとと
もにボールミルを用いて混合し、えられたスラリーを実
施例１と同様の方法で１〜３１１ｇ／Ｃｉの膜厚に塗布
し、乾燥後Ｎ２雰囲気中で５２０℃で１０分間熱処理し
て熱変形抑制被膜（５）が形成されたシャドウマスク（
２）をえた。Example 4 Thermal deformation suppressing substance (3) had an average particle size of 1. -0 of OJs
397 (l and binder (4) with a softening point of 520°C, 20-5 iOz -M 203 -P2O5 (2
05%, 5iO23%, #2033%, P2O589%
) average particle size consisting of 1. 〇- low melting point glass powder 3Q was mixed with 200 cc of water and 1 cc of diethylene glycol using a ball mill, the resulting slurry was applied to a film thickness of 1 to 311 g/Ci in the same manner as in Example 1, and dried. The shadow mask (5) on which the thermal deformation suppressing film (5) was formed was then heat-treated at 520°C for 10 minutes in an N2 atmosphere.
2) was obtained.
実施例５
熱変形抑制物質（３）として平均粒径０．７−のＰｂＴ
ｉ０ｓ９５Ｑとバインダー（４）として軟化点４００℃
のＰｂｏ−ＢａＯ−Ｂ２Ｏ３−３ｉＯ２（Ｐｂ０６５％
、Ｂａ０５％、８２０３７％、５ｉＯ２２３％）からな
る平均粒径０１８−の低融点ガラス粉末５ｇを用い、水
２００ＣＣ、ジエチレングリコールｌｃｃとともにボー
ルミルを用いて混合し、えられたスラリーを実施例１と
同様の方法で１〜３ ｍｇ／ ｃｒａ２の膜厚に塗布し
、乾燥後Ｎ２雰囲気中で５５０℃で３０分間熱処理して
熱変形抑制皮膜（ＳＩが形成されたシャドウマスク（２
）をえた。Example 5 PbT with an average particle size of 0.7- as the thermal deformation suppressing substance (3)
Softening point 400℃ as i0s95Q and binder (4)
of Pbo-BaO-B2O3-3iO2 (Pb065%
, Ba05%, 82037%, 5iO223%) with an average particle size of 018- was mixed using a ball mill with 200cc of water and diethylene glycol lcc, and the resulting slurry was mixed in the same manner as in Example 1. After drying, heat treatment was performed at 550°C for 30 minutes in an N2 atmosphere to form a shadow mask (2
) was obtained.
比較例１
バインダー（４）として、カリウム系水ガラスを用いた
ほかは実施例５と同様にして熱変形抑制被膜（５］が形
成されたシャドウマスク（ａをえた。Comparative Example 1 A shadow mask (a) on which a thermal deformation suppressing film (5) was formed was obtained in the same manner as in Example 5 except that potassium water glass was used as the binder (4).
比較例２
バインダー（４）として、ナトリウム系水ガラスを用い
たほかは実施例５と同様にして熱変形抑制被膜（５］が
形成されたシャドウマスク（２）をえた。Comparative Example 2 A shadow mask (2) on which a thermal deformation suppressing film (5) was formed was obtained in the same manner as in Example 5, except that sodium-based water glass was used as the binder (4).
前記実施例１〜５および比較例１〜２について、被膜の
剥離試験を行ない、熱処理後の水分放出量を測定した。For Examples 1 to 5 and Comparative Examples 1 to 2, a film peeling test was conducted to measure the amount of water released after heat treatment.
前記剥離試験は、１ ｃｍｘ １ ｃｌＩｌの粘着セロ
ハンテープを熱変形抑制液ＩＩ（５１の表面に貼着した
のち、それを剥がし、そのとき粘着セロハンテープに熱
変形抑制液１１（５）がくっついて、部分的に剥がれる
かあるいはシャドウマスク（′２Ｊの金属部から剥がれ
るかを判定した。結果を第１表に示す。第１表中、Ｏは
熱変形抑制被膜（５）の剥がれが認められなかったもの
、×は剥がれが認められたものである。In the peel test, a 1 cm x 1 clI adhesive cellophane tape was attached to the surface of the heat deformation suppressing liquid II (51), and then it was peeled off. , it was determined whether it peeled off partially or from the metal part of the shadow mask ('2J). The results are shown in Table 1. In Table 1, O shows no peeling of the thermal deformation suppressing coating (5). * indicates that peeling was observed.
水分放水量の測定は、加熱質最分析法によりＨ２０ガス
の放出歯を測定することにより行なった。The amount of water discharged was measured by measuring the H20 gas release teeth using the heating quality analysis method.
結果を第１表に示す。なお、水分の放出量が０．００１
ｐｐｍ以下であったものを微量、０．００１〜１１）Ｉ
）ｌであったものを少量、ｉ ｐｐｍ以上であったもの
を多量とした。The results are shown in Table 1. In addition, the amount of moisture released is 0.001
Trace amounts of ppm or less, 0.001 to 11) I
) 1 was defined as a small quantity, and that which was i ppm or more was defined as a large quantity.
第１表から明らかなように、本発明の各実施例において
は、水ガラスをバインダーとして用いた従来の熱変形抑
制被膜に比べ、密着力に優れ、水分放出量が少ないこと
が判る。As is clear from Table 1, each of the examples of the present invention has superior adhesion and releases less water than the conventional thermal deformation suppressing coating using water glass as a binder.
［以下余白］
、／
［発明の効果］
本発明の方法によるシャドウマスク上の熱変形抑制被膜
は粒子間およびシャドウマスク本体との強い密着性がえ
られるとともに被膜からの放出ガスを極小に抑えること
ができるため、色ずれ防止形カラーブラウン管の製造上
の歩留り、および寿命について大巾な改善を連成するこ
とができた。[Margins below] , / [Effects of the Invention] The thermal deformation suppressing coating on the shadow mask obtained by the method of the present invention has strong adhesion between particles and with the shadow mask body, and also minimizes gas released from the coating. As a result, we were able to significantly improve the manufacturing yield and lifespan of color CRTs that prevent color shift.
第１図は本発明にかかわるカラーブラウン管の一部断面
図である。
（図面の符号）
（１）ニブラウン管のパネル
（２１：シャドウマスク
（３）：熱変形抑制物言
（４）：バインダーである低融点ガラス（５１；熱変形
抑制被膜FIG. 1 is a partial sectional view of a color cathode ray tube according to the present invention. (Numbers in drawings) (1) Panel of Ni cathode ray tube (21: shadow mask (3): thermal deformation suppressing statement (4): low melting point glass as binder (51; thermal deformation suppressing coating)
Claims (3)
被膜を形成する方法であって、熱変形抑制効果の大きい
物質に低融点ガラスの粉末を添加し、前記低融点ガラス
の粉末が添加された前記熱変形抑制物質をシャドウマス
クの片側に塗布し、そのようにして形成された塗布被膜
を前記低融点ガラスの軟化点以上の温度で熱処理するこ
とを特徴とするシャドウマスクの熱変形抑制被膜の形成
方法。(1) A method for forming a thermal deformation suppressing film on a shadow mask of a color cathode ray tube, the method comprising: adding low melting point glass powder to a substance having a large thermal deformation suppressing effect; A method for forming a thermal deformation suppressing film for a shadow mask, comprising applying a deformation suppressing substance to one side of a shadow mask, and heat-treating the thus formed coated film at a temperature equal to or higher than the softening point of the low melting point glass. .
ウマスクが熱変形を起す温度以下である鉛含有ガラス、
亜鉛含有ガラス、またはリン含有ガラスから選ばれたい
ずれかであり、前記熱変形抑制物質に対して６重量％以
下の割合で添加する特許請求の範囲第（１）項記載の熱
変形抑制被膜の形成方法。(2) The low melting point glass is a lead-containing glass whose glass softening point is below the temperature at which the shadow mask causes thermal deformation;
The thermal deformation inhibiting coating according to claim (1), which is either a zinc-containing glass or a phosphorus-containing glass, and is added in a proportion of 6% by weight or less to the thermal deformation inhibiting substance. Formation method.
体である熱変形抑制物質の粉末の粒径と同等またはそれ
以下である特許請求の範囲第（１）項記載の熱変形抑制
被膜の形成方法。(3) Thermal deformation suppression according to claim (1), wherein the particle size of the low melting point glass powder is equal to or smaller than the particle size of the powder of the thermal deformation suppressing substance that is the main component of the coating. How to form a film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12651386A JPS62283527A (en) | 1986-05-31 | 1986-05-31 | Formation of thermal-deformation controlling membrane for shadow mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12651386A JPS62283527A (en) | 1986-05-31 | 1986-05-31 | Formation of thermal-deformation controlling membrane for shadow mask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62283527A true JPS62283527A (en) | 1987-12-09 |
Family
ID=14937066
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12651386A Pending JPS62283527A (en) | 1986-05-31 | 1986-05-31 | Formation of thermal-deformation controlling membrane for shadow mask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62283527A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5841223A (en) * | 1994-01-26 | 1998-11-24 | Kabushiki Kaisha Toshiba | Color cathode ray tube and method of manufacturing the same |
| US6094003A (en) * | 1996-10-31 | 2000-07-25 | Samsung Display Devices Co., Ltd. | Anti-doming composition for a shadow-mask and processes for preparing the same |
| KR20010084244A (en) * | 2000-02-24 | 2001-09-06 | 구자홍 | shadow mask for coler cathod ray tlbe |
-
1986
- 1986-05-31 JP JP12651386A patent/JPS62283527A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5841223A (en) * | 1994-01-26 | 1998-11-24 | Kabushiki Kaisha Toshiba | Color cathode ray tube and method of manufacturing the same |
| US6060112A (en) * | 1994-01-26 | 2000-05-09 | Kabushiki Kaisha Toshiba | Color cathode ray tube and method of manufacturing the same |
| US6094003A (en) * | 1996-10-31 | 2000-07-25 | Samsung Display Devices Co., Ltd. | Anti-doming composition for a shadow-mask and processes for preparing the same |
| US6342756B1 (en) * | 1996-10-31 | 2002-01-29 | Samsung Display Devices Co., Ltd. | Anti-doming compositions for a shadow-mask and processes for preparing the same |
| KR20010084244A (en) * | 2000-02-24 | 2001-09-06 | 구자홍 | shadow mask for coler cathod ray tlbe |
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