JPS62276703A - Formation of gold film - Google Patents
Formation of gold filmInfo
- Publication number
- JPS62276703A JPS62276703A JP11937186A JP11937186A JPS62276703A JP S62276703 A JPS62276703 A JP S62276703A JP 11937186 A JP11937186 A JP 11937186A JP 11937186 A JP11937186 A JP 11937186A JP S62276703 A JPS62276703 A JP S62276703A
- Authority
- JP
- Japan
- Prior art keywords
- gold
- powder
- weight
- glass
- glass powder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 title claims description 48
- 239000010931 gold Substances 0.000 title claims description 33
- 229910052737 gold Inorganic materials 0.000 title claims description 33
- 230000015572 biosynthetic process Effects 0.000 title 1
- 239000011521 glass Substances 0.000 claims description 30
- 239000000843 powder Substances 0.000 claims description 21
- 239000011230 binding agent Substances 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 9
- 239000000919 ceramic Substances 0.000 claims description 7
- 239000002245 particle Substances 0.000 claims description 7
- 238000010304 firing Methods 0.000 claims description 6
- 238000002844 melting Methods 0.000 claims description 4
- 230000008018 melting Effects 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 description 15
- 238000000576 coating method Methods 0.000 description 15
- 238000001035 drying Methods 0.000 description 4
- 239000002904 solvent Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 238000005187 foaming Methods 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
Landscapes
- Conductive Materials (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
本発明は、特に半導体集積回路素子を収容するセラミッ
クパッケージの金被膜形成に好適の方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention particularly relates to a method suitable for forming a gold coating on a ceramic package housing a semiconductor integrated circuit element.
半導体集積回路素子を収容するパッケージング方式の一
つにセラミック(主としてアルミナ)基板を用いる方式
があり、該基板には素子を収容し得るように窪みが設け
られ、該窪みの平坦な底部には素子の接合のために金被
膜を施すのが一般的である。このような窪みへの金被膜
形成は従来、金粉末、ガラス粉末及び有機質ビヒクルか
らなる金ペーストを有機溶剤で希釈して滴下し、100
〜200℃に加熱して滴下ペーストが富み全体に広がる
ようにすると共に溶剤を蒸発させて乾燥し、800〜9
00℃の温度で焼成するという方法で行われている。と
ころがこの方法によると、窪みの側壁に金粉末が付着し
たり、焼成膜の周縁部がメクレは接着強度に対する信頼
に疑念が持たれ、ガラスのシミは素子の接合に支障を生
じる。このような不具合を解消、すべく、金粉末、ガラ
ス粉末の粒径を揃えたり、ガラス粉末として比重のでき
るだけ大きいものを用いたりしているが、未だ問題を完
全に解決するに至っていない。One of the packaging methods for accommodating semiconductor integrated circuit devices is a method using a ceramic (mainly alumina) substrate, in which a recess is provided to accommodate the device, and the flat bottom of the recess is It is common to apply a gold coating to bond elements. Conventionally, to form a gold film on such a depression, a gold paste consisting of gold powder, glass powder, and an organic vehicle is diluted with an organic solvent and dropped, and then
Heat to ~200°C to make the dripping paste rich and spread throughout, and evaporate the solvent and dry.
This is done by firing at a temperature of 00°C. However, with this method, if gold powder adheres to the sidewalls of the recess or if the peripheral edges of the fired film become smeared, there are doubts about the reliability of the adhesive strength, and stains on the glass cause problems in bonding the elements. In order to solve this problem, attempts have been made to make the particle sizes of gold powder and glass powder the same, and to use glass powder with as high a specific gravity as possible, but the problem has not yet been completely solved.
本発明の目的は、側壁への金粉付着、金被膜の周縁部に
おけるメクレ及び金被膜表面のガラスのシミを完全に解
消し得る金被膜形成方法を提供することにある。An object of the present invention is to provide a method for forming a gold film that can completely eliminate adhesion of gold powder to the side wall, scratches on the peripheral edge of the gold film, and glass stains on the surface of the gold film.
この目的を達成するため本発明者は、上記不具合が金ペ
ーストの前記乾燥過程における種々の要因(ペーストの
表面張力、各粉末のペースト中における沈降又は対流に
よる上昇)によって起るのであり、予め乾燥してあれば
上記欠点が解消し得るものと予測し、種々実験の結果本
発明に到達したものである。即ち本発明の金被膜形成方
法は、平均粒径0.1〜10μmの金粉60〜96重量
%、平均粒径1〜25μmのガラス粉2〜20重量%及
び有機質バインダ2〜20重量%とからなる混合物の成
形薄片をセラミック基板に載置し、該ガラス粉の軟化点
以上で且つ金の融点以下の温度で焼成する点に特徴があ
る。In order to achieve this objective, the present inventor discovered that the above-mentioned problems are caused by various factors (surface tension of the paste, sedimentation of each powder in the paste, or rise due to convection) during the drying process of the gold paste. We predicted that the above-mentioned drawbacks could be overcome if we did so, and as a result of various experiments, we arrived at the present invention. That is, the method for forming a gold film of the present invention consists of 60-96% by weight of gold powder with an average particle size of 0.1-10 μm, 2-20% by weight of glass powder with an average particle size of 1-25 μm, and 2-20% by weight of an organic binder. It is characterized in that a molded thin piece of the mixture is placed on a ceramic substrate and fired at a temperature above the softening point of the glass powder and below the melting point of gold.
本発明に用いる金粉末は平均粒径が0.1〜10μmで
ある。0.1μm未満では嵩が大きくなり過ぎて緻密な
金被膜が得られず、10μmを超えると金被膜の表面が
粗くなり過ぎて素子が接合しにくくなるからである。金
粉の含有率は60〜96重量%とする必要がある。金粉
の含有率が60重量%未満ではガラス粉及び/又はバイ
ンダが多くなり過ぎ、ガラス粉が過多になると金被膜表
面にガラスが浮き出し、バインダが過多になると緻密な
膜が得られないからである。又逆に金粉の含有率が96
重量%を越えるとガラス粉及び/又はバインダが少なく
なり過ぎ、成形薄片が脆くなり、しかも金被膜と基板と
の接着力も低下する。The gold powder used in the present invention has an average particle size of 0.1 to 10 μm. This is because if it is less than 0.1 μm, the bulk becomes too large and a dense gold film cannot be obtained, and if it exceeds 10 μm, the surface of the gold film becomes too rough and it becomes difficult to bond the elements. The content of gold powder needs to be 60 to 96% by weight. This is because if the gold powder content is less than 60% by weight, there will be too much glass powder and/or binder, and if there is too much glass powder, the glass will stand out on the surface of the gold coating, and if there is too much binder, a dense film will not be obtained. . On the other hand, the content of gold powder is 96
If the weight percentage is exceeded, the amount of glass powder and/or binder becomes too small, the molded flakes become brittle, and the adhesion between the gold coating and the substrate also decreases.
ガラス粉は、軟化点が430〜600 ’C1熱膨張係
数が40X10−’〜100XIO−7/℃程度のもの
であれば何れでも良く、例えば鉛硼硅酸系のガラス粉を
用いることができるが、平均粒径は1〜25μmである
必要がある。1μm未満ではバインダが燃焼又は揮発す
る前にガラスが軟化し、金被膜面に発泡を生じる原因に
なるからであり、又25μmを超えると金被膜中に大き
なピンホールを残留せしめるので好ましくない。このガ
ラス粉の含有率は2〜20重量%とする必要がある。Any glass powder may be used as long as it has a softening point of 430 to 600' and a coefficient of thermal expansion of 40 x 10-' to 100 x IO-7/°C. For example, lead borosilicate glass powder may be used. , the average particle size must be 1 to 25 μm. If it is less than 1 μm, the glass will soften before the binder burns or volatilizes, causing foaming on the gold coating surface, and if it exceeds 25 μm, large pinholes will remain in the gold coating, which is undesirable. The content of this glass powder needs to be 2 to 20% by weight.
2重量%未満ではガラスが少な過ぎて充分な接着力が得
られず、20重N%を超えると金被膜表面にガラスが浮
き出して素子の接合が不能になるからである。If it is less than 2% by weight, there is too little glass and sufficient adhesive strength cannot be obtained, and if it exceeds 20% by weight, the glass will stand out on the surface of the gold coating, making it impossible to bond the elements.
本発明においてバインダを用いるのは上記金粉とガラス
粉が均一に混合された状態での成形を可能にするためで
あり、このようなバインダとして種々の公知の材料を使
用できるが、成形薄片をセラミック基板に載置して焼成
した際はぼ完全に消滅することが必要で、このためバイ
ンダは有機質であることが必要である。この有殿質バイ
ンダは500℃以下で燃焼又は揮発することが望ましい
。In the present invention, a binder is used to enable molding in a state in which the gold powder and glass powder are uniformly mixed. Although various known materials can be used as such a binder, ceramic When placed on a substrate and fired, it needs to disappear almost completely, and for this reason, the binder needs to be organic. It is desirable that this precipitate binder burns or volatilizes at a temperature below 500°C.
この温度があまり高いとガラス粉が先に軟化して金被膜
表面に発泡によるピンホールが生じるからである。上記
条件を満足する有機質バインダとして、エチルセルロー
ズ、メチルメタアクリレート等が挙げられる。有機質バ
インダの含有率は2〜20重量%とする必要がある。2
重■%未満ではバインダ量が少な過ぎて成形薄片の強度
が小さくなり、取扱い中に容易に破1員し、又20重量
%を超えると焼成中のガス発生量が多く、緻密な金被膜
が得られないからである。This is because if this temperature is too high, the glass powder will soften first and pinholes will occur on the surface of the gold coating due to foaming. Examples of organic binders that satisfy the above conditions include ethyl cellulose and methyl methacrylate. The content of the organic binder needs to be 2 to 20% by weight. 2
If the amount of binder is less than 20% by weight, the strength of the molded flakes will be low and the pieces will easily break during handling, and if it exceeds 20% by weight, the amount of gas generated during firing will be large and a dense gold coating will be formed. Because you can't get it.
上記の金粉、ガラス粉及び有機質バインダを混合し、成
形薄片を得るには、該混合物を金型により成形しても良
いし、有機質バインダが適当な溶媒に溶解し得るならこ
の溶媒によって該混合物をペースト状とし、スクリーン
印刷によって平坦な板上に所望の寸法で薄く塗布し、乾
S後基板から、剥離する方法、又は該ペーストをシート
状にして、弊燥後所望の寸法でフツス打抜きする方法、
などメ
ンの手段も採用できる。To obtain molded flakes by mixing the above gold powder, glass powder, and organic binder, the mixture may be molded using a mold, or if the organic binder can be dissolved in a suitable solvent, the mixture may be mixed with this solvent. A method in which the paste is formed into a paste, which is thinly applied to the desired dimensions on a flat board by screen printing, and then peeled off from the substrate after drying, or a method in which the paste is formed into a sheet and, after drying, is punched out in the desired dimensions. ,
Men's methods such as these can also be adopted.
このようにして得られた成形薄片をセラミック基板の窪
みへ載置し、用いたガラス粉の軟化点以上で且つ金の融
点以下の温度で焼成する。ガラス粉の軟化点未満では金
被膜がセラミック基板に融着せず、金の融点を超える温
度では金の溶融により均一な被膜にならないからである
。好ましい焼成温度は700〜950℃であり、このよ
うな焼成は従来の金ペーストを用いる方法と全く同様に
行うことができる。The formed thin piece thus obtained is placed in a recess of a ceramic substrate and fired at a temperature above the softening point of the glass powder used and below the melting point of gold. This is because at temperatures below the softening point of the glass powder, the gold coating will not fuse to the ceramic substrate, and at temperatures above the melting point of gold, the gold will melt and will not form a uniform coating. A preferred firing temperature is 700 to 950°C, and such firing can be performed in exactly the same manner as a conventional method using gold paste.
金粉、ガラス粉及び有機質バインダを種々の割合で混合
し、これに若干の有機溶剤を添加してペースト状とし、
該ペーストをガラス板上に5關×2.5鶴の大きさで4
0μmの厚さにスクリーン印刷し、150℃で10分間
加熱して乾燥後、乾燥膜をガラス板から剥離して成形薄
片とした。該薄片は約20μmの厚さであった。この成
形薄片を6.4寵X 3.3 msの大きさの窪みを有
する黒色アル゛/′
じ設定されたベルト式焼成炉で焼成した。焼成膜につい
て周縁部のメクレ、ガラスのシミを観察後この金被膜に
シリコンチップをグイボンダーにより接合し、接合強度
を測定した。結果を第1表に示す。第1表においてガラ
スのシミは、シミが全く認められない場合をO印、シミ
の面積が1710以下なら、Δ印、それ以上をX印とし
た。又メクレは本実施例においては全く認められず、当
然ながら窪み側壁への金粉付着も認められなかった。接
合力とチップ付性はシリコンチップを横方向から押して
剥離させ、チップと金メタライズ層の界面で剥離する場
合はチップ付性不良でX印、この界面剥離の面積が10
%未満をΔ印、この界面剥離が全く認められないものを
○印とし、剥離が基板との間で起り、押圧力5 kg以
下で剥離した場合は接合力不良でX印、これ以上の押圧
力で剥離又はチップ割れがあった場合を○印とした。Gold powder, glass powder, and organic binder are mixed in various proportions, and a small amount of organic solvent is added to this to form a paste.
Spread the paste on a glass plate in a size of 5 squares x 2.5 cranes.
After screen printing to a thickness of 0 μm and drying by heating at 150° C. for 10 minutes, the dried film was peeled from the glass plate to obtain a shaped thin piece. The flakes were approximately 20 μm thick. The formed flakes were fired in a belt-type firing furnace with a recess of 6.4 mm x 3.3 ms and a black aluminum plate with the same settings. After observing the periphery of the fired film for scratches and stains on the glass, a silicon chip was bonded to the gold coating using a Gui bonder, and the bonding strength was measured. The results are shown in Table 1. In Table 1, regarding stains on glass, if no stains were observed at all, it was marked O, if the area of the stain was 1710 or less, it was marked Δ, and if it was larger than that, it was marked X. Furthermore, no scratches were observed in this example, and naturally, no gold powder was observed to adhere to the side walls of the recesses. Bonding force and chipping property are determined by pushing the silicon chip from the side and peeling it off. If the chip peels off at the interface between the chip and the gold metallized layer, the chipping property is poor, marked with an X, and the area of this interface peeling is 10
Less than % is marked Δ, and no interfacial peeling is observed at all, marked ○. If peeling occurs between the substrate and the pressure is less than 5 kg, the bonding force is poor, and marked X. Cases where there was peeling or chip cracking due to pressure were marked with an ○ mark.
第1表の結果から金粉が55重量%では少な過ぎてチッ
プ付に支障があること、又、逆に98重量%では多過ぎ
て接合力が不充分になること、ガラス粉が0.5μmで
は小さ過ぎてガラスのシミが出、又チップ付性が悪化し
、又29μmでは大き過ぎることが分る。From the results in Table 1, it can be seen that 55% by weight of gold powder is too small and causes problems in chip attachment, and conversely, 98% by weight is too large and the bonding force is insufficient, and 0.5 μm of glass powder It can be seen that if it is too small, stains appear on the glass and the chipability deteriorates, and 29 μm is too large.
本発明により、必要な部分へ必要な大きさだけの金被膜
形成が可能となり、しかも金被膜の厚ざた。又、本発明
によれば上記のように必要な大きさだけの金被膜を形成
できるので、高価な金の節約にもなる。According to the present invention, it is possible to form a gold coating in the necessary size on the necessary part, and the thickness of the gold coating can be reduced. Further, according to the present invention, as described above, it is possible to form a gold coating of only the required size, which results in the saving of expensive gold.
Claims (1)
平均粒径1〜25μmのガラス粉2〜20重量%及び有
機質バインダ2〜20重量%とからなる混合物の成形薄
片をセラミック基板に載置し、該ガラス粉の軟化点以上
で且つ金の融点以下の温度で焼成することを特徴とする
金被膜形成方法。60-96% by weight of gold powder with an average particle size of 0.1-10 μm,
A molded thin piece of a mixture consisting of 2 to 20% by weight of glass powder with an average particle size of 1 to 25 μm and 2 to 20% by weight of an organic binder is placed on a ceramic substrate, and the temperature is above the softening point of the glass powder and below the melting point of gold. A method for forming a gold film, characterized by firing at a temperature of .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11937186A JPS62276703A (en) | 1986-05-26 | 1986-05-26 | Formation of gold film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11937186A JPS62276703A (en) | 1986-05-26 | 1986-05-26 | Formation of gold film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62276703A true JPS62276703A (en) | 1987-12-01 |
Family
ID=14759847
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11937186A Pending JPS62276703A (en) | 1986-05-26 | 1986-05-26 | Formation of gold film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62276703A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6342148A (en) * | 1986-08-07 | 1988-02-23 | Showa Denko Kk | Conductive sheet and metallizing method using said sheet |
-
1986
- 1986-05-26 JP JP11937186A patent/JPS62276703A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6342148A (en) * | 1986-08-07 | 1988-02-23 | Showa Denko Kk | Conductive sheet and metallizing method using said sheet |
JPH0455536B2 (en) * | 1986-08-07 | 1992-09-03 | Showa Denko Kk |
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