JPS62262802A - Optical fiber for infrared rays - Google Patents
Optical fiber for infrared raysInfo
- Publication number
- JPS62262802A JPS62262802A JP61106232A JP10623286A JPS62262802A JP S62262802 A JPS62262802 A JP S62262802A JP 61106232 A JP61106232 A JP 61106232A JP 10623286 A JP10623286 A JP 10623286A JP S62262802 A JPS62262802 A JP S62262802A
- Authority
- JP
- Japan
- Prior art keywords
- optical fiber
- amorphous carbon
- carbon film
- film
- sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000013307 optical fiber Substances 0.000 title claims abstract description 28
- 229910003481 amorphous carbon Inorganic materials 0.000 claims abstract description 23
- 239000000463 material Substances 0.000 claims abstract description 14
- 238000004544 sputter deposition Methods 0.000 claims abstract description 11
- 239000000835 fiber Substances 0.000 abstract description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 9
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 abstract description 6
- 230000005540 biological transmission Effects 0.000 abstract description 3
- 230000007613 environmental effect Effects 0.000 abstract description 3
- 239000002253 acid Substances 0.000 abstract description 2
- 238000010828 elution Methods 0.000 abstract description 2
- 238000009434 installation Methods 0.000 abstract description 2
- 230000001681 protective effect Effects 0.000 abstract description 2
- 239000011780 sodium chloride Substances 0.000 abstract 2
- 150000007513 acids Chemical class 0.000 abstract 1
- 239000002585 base Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- -1 KH2-5 (Tlr/T4I) Chemical class 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000005387 chalcogenide glass Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000000075 oxide glass Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
Ａ、産業上の利用分野
この発明け、中間赤外光含導びく赤外用光ファイバ材料
の改良に関する。DETAILED DESCRIPTION OF THE INVENTION A. Field of Industrial Application This invention relates to improvements in infrared optical fiber materials that guide mid-infrared light.
Ｂ６発明の概要
この発明は、赤外用光ファイバ材料の表面な、アモルフ
ァスカーボン被膜で覆い赤外用光ファイバ材料が吸湿、
揮発するのを防止するようｆ二し友ものである。B6 Summary of the Invention This invention provides a method for covering the surface of an infrared optical fiber material with an amorphous carbon film so that the infrared optical fiber material absorbs moisture.
It is a good friend to prevent volatilization.
Ｃ１従来の技術
現在、実用化されている光ファイバは、石英系５１０２
がほとんどであって、この伝導損失は、理論限界のＱ、
２ｄＢ／ｋｍにほぼ達している。C1 Conventional technology The optical fiber currently in practical use is quartz-based 5102
This conduction loss is mostly due to the theoretical limit of Q,
It has almost reached 2dB/km.
Ｄ２発明が解決しようとする問題点
しかしながら、このような石英系の光ファイバの光透過
波長域は、長波長側で約４．５μｍｆでであって、現在
、医学や加工などの分野で用いられている炭酸ガスレー
ザ（１０，２μｍｌ’？Ｍすことが出来ない問題点を有
している。D2 Problems to be Solved by the Invention However, the light transmission wavelength range of such quartz-based optical fibers is approximately 4.5 μmf on the long wavelength side, and currently used in fields such as medicine and processing. The problem is that it cannot be used with a carbon dioxide laser (10.2 μml'?M).
また、このような赤外領域での光ファイバの必要付け、
これら医学、加工の分野ばかりでなく、伝導損失を１０
ｄＢ／ｋｍ ｌ１近づける低損失ファイバー、さら
には光エネルギーの伝送を考える上でも重要なものとな
る。なお、この赤外領域で使用可能な材料（赤外用光フ
ァイバ材料）としては、ＫＨ２−５（ＴｔＢｒ／ＴｔＩ
）、Ｃ，Ｉ、ＫＣｌ、ＮａＣＬなどがあり、これらの材
料は多・少なりとも潮解性を有しており、湿気に弱くそ
の構造安定性に問題点を有している。In addition, the need for optical fiber in the infrared region,
In addition to these medical and processing fields, conduction loss
This is important when considering low-loss fibers that can approach dB/km l1, and furthermore, the transmission of optical energy. In addition, KH2-5 (TtBr/TtI) is a material that can be used in this infrared region (infrared optical fiber material).
), C, I, KCl, NaCL, etc., and these materials have deliquescent properties to some extent, are sensitive to moisture, and have problems in their structural stability.
また、ＫＨ２−５にあっては、有害物質であるため取扱
いに注意を要する問題点がある。Additionally, KH2-5 has the problem of requiring care in handling because it is a hazardous substance.
この発明は、これらの問題点に着目して案出されたもの
であって、外気の湿気から惺護された構造安定性の高い
赤外用光ファイバを得んとするものである。The present invention was devised in view of these problems, and aims to provide an infrared optical fiber that is protected from moisture in the outside air and has high structural stability.
Ｅ２問題点を解決するための手段
この発明け、中間赤外光を導びく赤外用光ファイバ材料
の外側面に、スパッタリングにより製膜されるアモルフ
ァスカーボン被膜を形成させたことを、その構成として
いる。Means for Solving Problem E2 This invention has a structure in which an amorphous carbon film formed by sputtering is formed on the outer surface of an infrared optical fiber material that guides mid-infrared light. .
Ｆ１作用
アモルファスカーボン被膜は、赤外用光ファイバ材料に
湿気が浸入するのを阻止すると共に、赤外用光ファイバ
材料の揮発を阻止し、さらに、赤外用光ファイバ材料を
物理的、化学的に安定させる。The F1 action amorphous carbon film prevents moisture from entering the infrared optical fiber material, prevents the infrared optical fiber material from volatilizing, and further stabilizes the infrared optical fiber material physically and chemically. .
Ｇ、実施例
以下、この発明に係る赤外用光ファイバの詳細を図面に
示す一実施例について説明する。G. Example Hereinafter, an example will be described in which details of the infrared optical fiber according to the present invention are shown in the drawings.
図中、１は赤外用光ファイバであって、所定形状の多結
晶又は単結晶のＮＩＬＣｔでなるファイバ基体２に、ア
モルファスカーボン被膜３をスパッタリングｌ二より製
膜して構成されている。In the figure, reference numeral 1 denotes an infrared optical fiber, which is constructed by forming an amorphous carbon coating 3 on a fiber base 2 made of polycrystalline or single-crystalline NILCt in a predetermined shape by sputtering.
前記アモルファスカーボン被膜３け、波長０．２〜２５
μｍの光を透過せしめる特性を有しているため、中間赤
外光（数μｍ〜数ＩＯμｍ）の導光な可能としている。3 amorphous carbon films, wavelength 0.2-25
Since it has the property of transmitting light of .mu.m, it is possible to guide mid-infrared light (several .mu.m to several IO .mu.m).
また、該アモルファスカーボン１ｌ１３ば、ファイバ基
体２側への水の浸入を阻止すると共に、ＮａＣＬの溶出
ｌ防止する。さらに、該アモルファスカーボン被膜３
Ｖｉ、１ｔｔｆｆｉ性（３００℃程度まで）、耐酸性、
耐アルカリ性に優れている為、赤外用光ファイバ１の設
置条件、環境条件を考慮しても有効且つ安定な森瑣膜と
しての機能を有している。Further, the amorphous carbon 1113 prevents water from entering the fiber base 2 side, and also prevents the elution of NaCL. Furthermore, the amorphous carbon coating 3
Vi, 1ttffi property (up to about 300℃), acid resistance,
Since it has excellent alkali resistance, it functions as an effective and stable Moriwa film even considering the installation conditions and environmental conditions of the infrared optical fiber 1.
次に、アモルファスカーボン被膜３の製膜に用いるスパ
ッタ装置を第２図に基づいて蔽明する。Next, a sputtering apparatus used for forming the amorphous carbon film 3 will be explained based on FIG.
図中、４は真空室であり、この真空室４ ＋：は、雰囲
気ガス導入管５及び排気管６が連通していて、該排気管
６には、図示しない真空ポンプが直結されている。７１
ｄ接地電位の電子引抜き対向電極、８け炭素質ターゲッ
ト電極であり、マツチングボックス９を介して高周波Ｒ
Ｆ電源１０に接続されている。８は、真空室４内で且つ
プラズマＩ：よる励起ソースのトランスポートする領域
より外側に配置した堆積基板であって、トランスポート
されたＳ子がソフトにデボジツションするようにしてい
る。尚、雰囲気ガス導入管５からは、水素ガスが送られ
るものとする。In the figure, 4 is a vacuum chamber, and this vacuum chamber 4+: is connected with an atmospheric gas introduction pipe 5 and an exhaust pipe 6, and a vacuum pump (not shown) is directly connected to the exhaust pipe 6. 71
d A counter electrode for drawing electrons at ground potential, an 8-layer carbonaceous target electrode, and a high-frequency R
It is connected to the F power supply 10. Reference numeral 8 denotes a deposition substrate placed within the vacuum chamber 4 and outside the region to which the excitation source of plasma I is transported, so that the transported S particles are deposited softly. It is assumed that hydrogen gas is sent from the atmospheric gas introduction pipe 5.
ここで、この実施例で行なわれたスパッタリングの方法
を説明する。Here, the sputtering method performed in this example will be explained.
まず、ファイバ基体２としてのＮａＣ４基板（１０１１
１１Ｘ１０＋＋＋ｍＸ１ｍ ）を、前記し之スパッタ装
置の堆積基板１１にセツティングすると共に、ターゲッ
トとしては、直径７５咽、厚さ５ｍｌのグラファイト（
ｗｔ。First, a NaC4 substrate (1011
11 x 10 + + + m
wt.
９９．９９９ ％ ）をセツティングする。99.999%).
次に、真空室４内を１ 、３３Ｘ１０−４ Ｐ” 以下
Ｃ二なるまで減圧し、Ｈ２ガスを該真空室４に導入し、
圧力を６６．７Ｐａにする。Next, the pressure inside the vacuum chamber 4 is reduced to 1.33X10-4 P" or less, and H2 gas is introduced into the vacuum chamber 4,
The pressure is set to 66.7 Pa.
基板温度は、冷却装置ｆ二より５０℃以下に保った。The substrate temperature was maintained at 50° C. or lower using a cooling device f2.
スパッタ条件としては、ＲＦ （１３，５６ＭＨｚ ）
の高周波電力３００Ｗを投入し、５時間のスパッタな行
なった。この時のアモルファスカーボンの膜厚ば、０．
７μｍであった。The sputtering conditions are RF (13,56MHz)
A high frequency power of 300 W was applied, and sputtering was performed for 5 hours. The film thickness of the amorphous carbon at this time is 0.
It was 7 μm.
なお、Ｎ、Ｃ１基板の未成膜部け、上記のスパッタリン
グを繰返しアモルファスカーボンのコーティングな行な
った。Incidentally, the above sputtering was repeated to coat the unformed portions of the N and C1 substrates with amorphous carbon.
上記の方法により作成された赤外用光ファイバ１の耐水
性を確認する次め、以下のような条件で耐水試験を行な
った。After confirming the water resistance of the infrared optical fiber 1 produced by the above method, a water resistance test was conducted under the following conditions.
耐水条件：３０℃純水に１週間漬けた。Water resistance conditions: Soaked in pure water at 30°C for one week.
結 果：（１）目視検査により変化は認められなかっ
た（にごり等なし）。Results: (1) No change was observed by visual inspection (no cloudiness, etc.).
（２重事変化もなかった。(There were no significant changes.
次に、透過率の測定を行なった結果、赤外用光ファイバ
の耐水試験前後における赤外吸収スペクトル（０，２〜
２４声ｍ）には変化汀なかった。また、アモルファスカ
ーボンを被接する前後においても、その時性に変化は鼠
られなかった。Next, as a result of transmittance measurements, the infrared absorption spectra (0,2~
24 voices m) remained unchanged. Moreover, there was no change in the timing before and after applying amorphous carbon.
さらに、耐水試験後テープ剥離試験を行なったが問題な
く、アモルファスカーボン被膜３けファイバ基体に対し
良い密着性を示した。Furthermore, a tape peeling test was conducted after the water resistance test, but no problems were found, and good adhesion to the amorphous carbon coated three-layer fiber substrate was demonstrated.
以上、実施例について説明したが、この他にファイバ基
体２の材質は、各種変更が可能であり、例えば上記実施
例にあっては、Ｎ、Ｃｔをファイバ基体２Ｊ−シている
が、ＫＣｌ、ＫＨ２−５（Ｔｌｒ／Ｔ４Ｉ）、などのア
ルカリハライドや、Ａ！１２Ｓ３゜ＧｅＳなどのカルコ
ゲナイドガラスや、Ｇ ｅ ０２ 系＋Ｔ・０２系など
の酸化物系ガラスを選択ｌ、でもよく、同様の耐水特性
や、透過率の変化を生じ斤い結果が得られている。The embodiments have been described above, but the material of the fiber base 2 can be changed in various ways. For example, in the above embodiments, N and Ct are used as the fiber base 2J, but KCl, Alkali halides such as KH2-5 (Tlr/T4I), A! Chalcogenide glasses such as 12S3゜GeS or oxide glasses such as Ge02+T・02 may also be selected, and similar results have been obtained with similar water resistance properties and changes in transmittance. .
また、アモルファスカーボンの製嘆け、８０℃以下で１
ｌｉＫ［可能であるため、スパッタリングにおいて、基
板の冷却は必要に応じて行なえばよい。In addition, the production of amorphous carbon is limited to 1 at temperatures below 80℃.
Since liK is possible, cooling of the substrate may be performed as necessary during sputtering.
Ｈ０発明の効果
以上の貯量で明らかなよう（＝、この発明Ｃ１係る赤外
用光ファイバにあっては、潮解物質からなるファイバ基
体であっても、水分浸入を阻止するため、ファイバ基体
を有効に保護する効果がある。As is clear from the storage capacity exceeding the effect of the invention H0 (=, in the infrared optical fiber according to this invention C1, even if the fiber base is made of a deliquescent substance, the fiber base is effective in preventing water intrusion. has a protective effect.
また、アモルファスカーボンは、スパッタリングによる
製膜に際し、８０℃以下で成膜可能なため、有毒ガスの
発生、その他挿散を防止する効果がある。Further, since amorphous carbon can be formed into a film at a temperature of 80° C. or lower when it is formed by sputtering, it has the effect of preventing the generation of toxic gases and other dispersion.
さらに、アモルファスカーボン被膜が耐腐食性が高いた
め、赤外用光ファイバはあらゆる環境条件にも適用可能
となる効果がある。Furthermore, since the amorphous carbon coating has high corrosion resistance, the infrared optical fiber has the effect of being applicable to all environmental conditions.
さらにまた、アモルファスカーボン被膜は、可視から遠
赤外に亘り透明なため、光ファイバの被捗材として適切
なものであり、また、製膜条件によっては、可撓性な有
する膜とすることも可能なため、ファイバ基体の大きな
曲がりに対しても、対応できる効果がある。Furthermore, since the amorphous carbon film is transparent from the visible to the far infrared, it is suitable as a covering material for optical fibers, and depending on the film forming conditions, it can also be made into a flexible film. Therefore, it is possible to cope with large bends in the fiber substrate.
第１図は、本発明に係る赤外用光ファイバの断面図、第
２図は、本発明の実施に用いられたスバツ装置の説明図
である。
１・・・赤外用光ファイバ、２・・・ファイバ基体、３
・・・アモルファスカーボン被膜。
第１図
第２図FIG. 1 is a cross-sectional view of an infrared optical fiber according to the present invention, and FIG. 2 is an explanatory diagram of a subassembly apparatus used in implementing the present invention. 1... Infrared optical fiber, 2... Fiber base, 3
...Amorphous carbon film. Figure 1 Figure 2
Claims (1)
スパッタリングにより製膜されるアモルファスカーボン
被膜を形成させたことを特徴とする赤外用光ファイバ。On the outer surface of the infrared optical fiber material that guides mid-infrared light,
An infrared optical fiber characterized by having an amorphous carbon film formed by sputtering.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61106232A JPS62262802A (en) | 1986-05-09 | 1986-05-09 | Optical fiber for infrared rays |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61106232A JPS62262802A (en) | 1986-05-09 | 1986-05-09 | Optical fiber for infrared rays |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62262802A true JPS62262802A (en) | 1987-11-14 |
Family
ID=14428376
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61106232A Pending JPS62262802A (en) | 1986-05-09 | 1986-05-09 | Optical fiber for infrared rays |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62262802A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02309307A (en) * | 1989-05-24 | 1990-12-25 | Mitsubishi Cable Ind Ltd | Optical fiber |
| JPH0339708A (en) * | 1989-07-06 | 1991-02-20 | Nippon Telegr & Teleph Corp <Ntt> | Carbon coated optical fiber |
| JPH03107907A (en) * | 1989-09-22 | 1991-05-08 | Hitachi Cable Ltd | Optical fiber |
| JPH03110508A (en) * | 1989-09-25 | 1991-05-10 | Hitachi Cable Ltd | Optical fiber |
| US7504154B2 (en) * | 2005-03-23 | 2009-03-17 | Lockheed Martin Corporation | Moisture barrier coatings for infrared salt optics |
-
1986
- 1986-05-09 JP JP61106232A patent/JPS62262802A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02309307A (en) * | 1989-05-24 | 1990-12-25 | Mitsubishi Cable Ind Ltd | Optical fiber |
| JPH0339708A (en) * | 1989-07-06 | 1991-02-20 | Nippon Telegr & Teleph Corp <Ntt> | Carbon coated optical fiber |
| JPH03107907A (en) * | 1989-09-22 | 1991-05-08 | Hitachi Cable Ltd | Optical fiber |
| JPH03110508A (en) * | 1989-09-25 | 1991-05-10 | Hitachi Cable Ltd | Optical fiber |
| US7504154B2 (en) * | 2005-03-23 | 2009-03-17 | Lockheed Martin Corporation | Moisture barrier coatings for infrared salt optics |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Atanassov et al. | Optical properties of TiO2, Y2O3 and CeO2 thin films deposited by electron beam evaporation | |
| JP2716230B2 (en) | Infrared transparent material | |
| Franks | Preparation and properties of diamondlike carbon films | |
| CN111308599B (en) | Ultra-narrow band filter with high optical stability and preparation method thereof | |
| JPS62262802A (en) | Optical fiber for infrared rays | |
| Hsu et al. | Single-and dual-ion-beam sputter deposition of titanium oxide films | |
| US4663234A (en) | Coating capables of resisting to high thermal stress and particularly to coatings for satellites and spatial vessels and to methods for producing those coatings | |
| CN104834025B (en) | A kind of day based on nanolithographic blind ultraviolet anti-reflection film | |
| JP5027980B2 (en) | Method for depositing fluorinated silica thin film | |
| Limam et al. | Local degradation mechanisms by tarnishing of protected silver mirror layers studied by combined surface analysis | |
| CN113412047B (en) | Copper-based graphene coating structure and preparation method thereof | |
| JPH07331412A (en) | Optical parts for infrared ray and their production | |
| Schultz et al. | Hermetic coatings for bulk fluoride glasses and fibers | |
| JP3361621B2 (en) | Anti-reflection coating for infrared region | |
| CN210775900U (en) | Light-reducing optical filter for observing strong light source | |
| JPH02240605A (en) | Fluoride optical fiber subjected to coating on end face and production thereof | |
| JPS6187104A (en) | Reflection preventive film | |
| JP3168302B2 (en) | Manufacturing method of black glass | |
| CN1006825B (en) | Process and uses of plating hardfilm for optical plastic lens | |
| JPH05232301A (en) | Barium fluoride-base composite optical member | |
| Stamate et al. | IR absorption of TiO2 thin films | |
| Varnier et al. | Influence of ion-assisted deposition on structure and surface roughness of aluminum oxide | |
| Wolf et al. | Application of coherent-mode representation to inverse propagation problems | |
| RU1809846C (en) | Solution for preparing of semiconducting films on tin dioxide-base | |
| Williams et al. | Ion-assisted optical coatings deposited at low temperature |