JPS62260860A - 前周期遷移金属含有無機高分子化合物およびその製造方法 - Google Patents
前周期遷移金属含有無機高分子化合物およびその製造方法Info
- Publication number
- JPS62260860A JPS62260860A JP10319486A JP10319486A JPS62260860A JP S62260860 A JPS62260860 A JP S62260860A JP 10319486 A JP10319486 A JP 10319486A JP 10319486 A JP10319486 A JP 10319486A JP S62260860 A JPS62260860 A JP S62260860A
- Authority
- JP
- Japan
- Prior art keywords
- transition metal
- complex
- polysulfide
- formula
- preperiodic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052723 transition metal Inorganic materials 0.000 title claims abstract description 41
- 150000003624 transition metals Chemical class 0.000 title claims abstract description 38
- 150000001875 compounds Chemical class 0.000 title claims description 29
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 229910052744 lithium Inorganic materials 0.000 claims abstract description 28
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims abstract description 27
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 8
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 8
- USFPINLPPFWTJW-UHFFFAOYSA-N tetraphenylphosphonium Chemical compound C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 USFPINLPPFWTJW-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 8
- 125000005207 tetraalkylammonium group Chemical group 0.000 claims abstract description 6
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 6
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 6
- 229920000592 inorganic polymer Polymers 0.000 claims description 29
- 239000010955 niobium Substances 0.000 claims description 13
- 239000000203 mixture Substances 0.000 claims description 10
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical group [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 7
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical group [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 7
- PJMJFVQKDBRMIP-UHFFFAOYSA-N tetraphenylarsonium Chemical group C1=CC=CC=C1[As+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 PJMJFVQKDBRMIP-UHFFFAOYSA-N 0.000 claims description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 5
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical group [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 5
- 239000010936 titanium Chemical group 0.000 claims description 5
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical group [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 claims 2
- 229920001021 polysulfide Polymers 0.000 abstract description 45
- 239000005077 polysulfide Substances 0.000 abstract description 45
- 150000008117 polysulfides Polymers 0.000 abstract description 45
- 229910001507 metal halide Inorganic materials 0.000 abstract description 10
- 150000005309 metal halides Chemical class 0.000 abstract description 10
- -1 tetraphenylphosphonium halide Chemical class 0.000 abstract description 9
- 239000012298 atmosphere Substances 0.000 abstract description 3
- 229910016323 MxSy Inorganic materials 0.000 abstract description 2
- 239000011261 inert gas Substances 0.000 abstract description 2
- 229910052736 halogen Inorganic materials 0.000 abstract 2
- 150000002367 halogens Chemical class 0.000 abstract 2
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 45
- 238000000034 method Methods 0.000 description 20
- 239000000047 product Substances 0.000 description 16
- 238000006243 chemical reaction Methods 0.000 description 15
- 239000007787 solid Substances 0.000 description 13
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 10
- 229910052799 carbon Inorganic materials 0.000 description 10
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 238000005979 thermal decomposition reaction Methods 0.000 description 9
- 238000000862 absorption spectrum Methods 0.000 description 8
- 229910052739 hydrogen Inorganic materials 0.000 description 8
- 239000000843 powder Substances 0.000 description 8
- 239000001257 hydrogen Substances 0.000 description 7
- 239000002904 solvent Substances 0.000 description 6
- 229910052717 sulfur Inorganic materials 0.000 description 6
- 238000002441 X-ray diffraction Methods 0.000 description 5
- 238000000921 elemental analysis Methods 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 230000000704 physical effect Effects 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 150000002431 hydrogen Chemical class 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 239000011593 sulfur Substances 0.000 description 3
- DUNKXUFBGCUVQW-UHFFFAOYSA-J zirconium tetrachloride Chemical compound Cl[Zr](Cl)(Cl)Cl DUNKXUFBGCUVQW-UHFFFAOYSA-J 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910021551 Vanadium(III) chloride Inorganic materials 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 239000012300 argon atmosphere Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000003746 solid phase reaction Methods 0.000 description 2
- 125000004434 sulfur atom Chemical group 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- OEIMLTQPLAGXMX-UHFFFAOYSA-I tantalum(v) chloride Chemical compound Cl[Ta](Cl)(Cl)(Cl)Cl OEIMLTQPLAGXMX-UHFFFAOYSA-I 0.000 description 2
- HQYCOEXWFMFWLR-UHFFFAOYSA-K vanadium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[V+3] HQYCOEXWFMFWLR-UHFFFAOYSA-K 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- DHBXNPKRAUYBTH-UHFFFAOYSA-N 1,1-ethanedithiol Chemical compound CC(S)S DHBXNPKRAUYBTH-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- QOVUQHJLIWOBNB-UHFFFAOYSA-N C1=CC=CC=C1[P](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 Chemical class C1=CC=CC=C1[P](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 QOVUQHJLIWOBNB-UHFFFAOYSA-N 0.000 description 1
- 229910011777 Li2 S Inorganic materials 0.000 description 1
- 229910004537 TaCl5 Inorganic materials 0.000 description 1
- 229910007938 ZrBr4 Inorganic materials 0.000 description 1
- 229910007932 ZrCl4 Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 229910052798 chalcogen Inorganic materials 0.000 description 1
- 150000004770 chalcogenides Chemical class 0.000 description 1
- 150000001787 chalcogens Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000002198 insoluble material Substances 0.000 description 1
- 150000002641 lithium Chemical class 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- YHBDIEWMOMLKOO-UHFFFAOYSA-I pentachloroniobium Chemical compound Cl[Nb](Cl)(Cl)(Cl)Cl YHBDIEWMOMLKOO-UHFFFAOYSA-I 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- GCPVYIPZZUPXPB-UHFFFAOYSA-I tantalum(v) bromide Chemical compound Br[Ta](Br)(Br)(Br)Br GCPVYIPZZUPXPB-UHFFFAOYSA-I 0.000 description 1
- BRKFQVAOMSWFDU-UHFFFAOYSA-M tetraphenylphosphanium;bromide Chemical compound [Br-].C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 BRKFQVAOMSWFDU-UHFFFAOYSA-M 0.000 description 1
- 150000007944 thiolates Chemical class 0.000 description 1
- UBZYKBZMAMTNKW-UHFFFAOYSA-J titanium tetrabromide Chemical compound Br[Ti](Br)(Br)Br UBZYKBZMAMTNKW-UHFFFAOYSA-J 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- LSWWNKUULMMMIL-UHFFFAOYSA-J zirconium(iv) bromide Chemical compound Br[Zr](Br)(Br)Br LSWWNKUULMMMIL-UHFFFAOYSA-J 0.000 description 1
Landscapes
- Inorganic Compounds Of Heavy Metals (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10319486A JPS62260860A (ja) | 1986-05-07 | 1986-05-07 | 前周期遷移金属含有無機高分子化合物およびその製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10319486A JPS62260860A (ja) | 1986-05-07 | 1986-05-07 | 前周期遷移金属含有無機高分子化合物およびその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62260860A true JPS62260860A (ja) | 1987-11-13 |
JPH0519489B2 JPH0519489B2 (enrdf_load_stackoverflow) | 1993-03-16 |
Family
ID=14347706
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10319486A Granted JPS62260860A (ja) | 1986-05-07 | 1986-05-07 | 前周期遷移金属含有無機高分子化合物およびその製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62260860A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022230437A1 (ja) * | 2021-04-28 | 2022-11-03 | Dowaエレクトロニクス株式会社 | ニオブ錯体およびリチウムを含む粉末および製造方法、並びに、ニオブ酸リチウムを含有する被覆層を有するリチウム二次電池正極活物質の製造方法 |
-
1986
- 1986-05-07 JP JP10319486A patent/JPS62260860A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022230437A1 (ja) * | 2021-04-28 | 2022-11-03 | Dowaエレクトロニクス株式会社 | ニオブ錯体およびリチウムを含む粉末および製造方法、並びに、ニオブ酸リチウムを含有する被覆層を有するリチウム二次電池正極活物質の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH0519489B2 (enrdf_load_stackoverflow) | 1993-03-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Bartlett et al. | Synthesis and spectroscopic and x-ray structural studies of the mesitylphosphines Ph2Mes and PHMes2 (Mes= 2, 4, 6-Me3C6H2) and their lithium salts [Li (THF) 3PHMes] and [{Li (OEt2) PMes2} 2] | |
Bonasia et al. | Synthesis and characterization of gold (I) thiolates, selenolates, and tellurolates: x-ray crystal structures of Au4 [TeC (SiMe3) 3] 4, Au4 [SC (SiMe3) 3] 4, and Ph3PAu [TeC (SiMe3) 3] | |
Steigerwald et al. | Initial stages in the molecule-based growth of the solid-state compound cobalt telluride (CoTe) | |
Adams et al. | Cluster syntheses. 14. The syntheses and structural characterizations of the high-nuclearity sulfidoruthenium carbonyl cluster compounds Ru5 (CO) 14 (. mu. 4-S) 2, Ru6 (CO) 17 (. mu. 4-S) 2, and RU7 (CO) 20 (. mu. 4-S) 2 | |
Gong et al. | Synthesis, structure and property of metal thiophene 2, 5-dicarboxylates: Novel three dimensional coordination polymers | |
Zhao et al. | Organotelluride chemistry: an unusual free organotelluride anion and the metal complex [Ag4 (TeR) 6] 2-(R= thienyl) | |
Evans et al. | Organosamarium Tetrathiometalate Chemistry: Synthesis and Structure of the Mixed-Metal Complexes {[(C5Me5) 2Sm] 2Mo (. mu.-S) 4}-and [(C5Me5) 2Sm (. mu.-S) 2WS2]- | |
McCullough et al. | Toward new magnetic, electronic, and optical materials: synthesis and characterization of new bimetallic tetrathiafulvalene tetrathiolate building blocks | |
Sellmann et al. | Transition metal complexes with sulfur ligands. 97. Coordinatively and electronically unsaturated and saturated chromium, molybdenum, and tungsten dithiolate complexes of the type [M (CO) 3 ('S2')] 2-and [M2 (CO) 7 ('S2')] 2-{'S2'2-= S2C6R42-(R= H, Cl, Me); S2C2H42-} | |
Román et al. | Magneto-structural studies and thermal analysis of the 4-aminopyridinium tetrabromocuprate (II) monohydrate | |
Talja et al. | Synthesis, structure and polymerization behavior of tri-and dichloroaminopyridinato complexes of titanium | |
JPS5819604B2 (ja) | ホスフアゼンオリゴマ−の製造法 | |
Olmstead et al. | Differences in the coordinating ability of water, perchlorate and tetrafluoroborate toward copper (I). The X-ray crystal structures of [Cu (1, 4-thioxane) 3OClO3],[Cu (1, 4-thioxane) 3OH2] BF4 and [Cu (1, 4-thioxane) 4BF4 | |
Uhl et al. | Formation of the Digallium Compound [(C5C6) 2N3](R) Ga–Ga (R)[N3 (C6H5) 2] with Two Bis (trimethylsilyl) methyl Groups and Two Terminal Chelating Diphenyltriazenido Ligands | |
JPS62260860A (ja) | 前周期遷移金属含有無機高分子化合物およびその製造方法 | |
Rahbarnoohi et al. | Synthesis and Molecular Structures of the First Example of Tellurolate Dimers,[Mes2In (. mu.-Te-n-Pr)] 2 and [Mes2In (. mu.-TePh)] 2: Potential Precursors to Indium Chalcogenides | |
Goher et al. | 1D polymeric copper (II) complexes containing bridging tridentate pyrazinato and terminal chloro or azido anions. Synthesis, spectral, structural and thermal study of [CuCl (pyrazinato)(H2O)] n and [Cu (N3)(pyrazinato)(H2O)] n complexes | |
Arnáiz et al. | Addition compounds of MoO2Br2 from MoO2Br2 (H2O) 2. Molecular structure of MoO2Br2 {OP [N (CH3) 2] 3} 2 and MoO2Br2 {CH2 [P (O)(C6H5) 2] 2} | |
Sillett et al. | Insertion of transition metals into the phosphorus-phosphorus bond of 1, 2-dihydro-1, 2-diphosphetes: toward the phosphorus analogs of metal dithiolene complexes | |
Klein et al. | Silyl-, stannyl-and plumbyl-copper compounds containing chelating and monodentate phosphine ligands | |
JPS62260719A (ja) | 前周期遷移金属ポリスルフイド錯体およびその製造方法 | |
Johnson | Inorganic Chemistry of the Transition Elements Volume 6 | |
US3933876A (en) | Hydride complexes of metals of groups IVB and VB | |
Clot et al. | Synthesis and reactivity of ruthenium (II) complexes containing hemilabile phosphine–thiophene ligands | |
Marganian et al. | Discrete mononuclear nickel (II) selenolate complexes: syntheses, structures, and properties of K2 [Ni (SeCH2CH2Se) 2]. cntdot. 2C2H5OH and (Me4N) 2 [Ni (SeCH2CH2Se) 2]. cntdot. 1.2 H2O |