JPS6226036U - - Google Patents
Info
- Publication number
- JPS6226036U JPS6226036U JP11648285U JP11648285U JPS6226036U JP S6226036 U JPS6226036 U JP S6226036U JP 11648285 U JP11648285 U JP 11648285U JP 11648285 U JP11648285 U JP 11648285U JP S6226036 U JPS6226036 U JP S6226036U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- rotating shaft
- platens
- fixing
- utility
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005468 ion implantation Methods 0.000 description 1
Description
第１図ａは本考案実施例の斜視図、第１図ｂは
上記実施例を備えたイオン注入装置の平面図。第
２図ａ，ｂ，ｃは従来装置のそれぞれ斜視図、部
分断面側面図および裏面図。
１…プラテン装置、２…回転軸、３…プラテン
、７…ウエハー。
FIG. 1a is a perspective view of an embodiment of the present invention, and FIG. 1b is a plan view of an ion implantation apparatus equipped with the above embodiment. Figures 2a, b, and c are a perspective view, a partially sectional side view, and a back view of the conventional device, respectively. 1...platen device, 2...rotating shaft, 3...platen, 7...wafer.
Claims (1)
板を取付けた複数個のプラテンを一定の角度関隔
で放射状に取り付けたことを特徴とするプラテン
装置。 A platen device is characterized in that a plurality of platens each having holding plates for holding down and fixing a wafer are attached radially around a rotating shaft at a constant angular distance.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985116482U JPH0648852Y2 (en) | 1985-07-31 | 1985-07-31 | Platen device for ion implantation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985116482U JPH0648852Y2 (en) | 1985-07-31 | 1985-07-31 | Platen device for ion implantation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6226036U true JPS6226036U (en) | 1987-02-17 |
| JPH0648852Y2 JPH0648852Y2 (en) | 1994-12-12 |
Family
ID=31001113
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985116482U Expired - Lifetime JPH0648852Y2 (en) | 1985-07-31 | 1985-07-31 | Platen device for ion implantation |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0648852Y2 (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5984838U (en) * | 1982-11-30 | 1984-06-08 | 日本電気ホームエレクトロニクス株式会社 | Wafer heating device |
-
1985
- 1985-07-31 JP JP1985116482U patent/JPH0648852Y2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5984838U (en) * | 1982-11-30 | 1984-06-08 | 日本電気ホームエレクトロニクス株式会社 | Wafer heating device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0648852Y2 (en) | 1994-12-12 |