JPS62251743A - Photosensitive compositions and photosensitive lithographic plate - Google Patents

Photosensitive compositions and photosensitive lithographic plate

Info

Publication number
JPS62251743A
JPS62251743A JP9460386A JP9460386A JPS62251743A JP S62251743 A JPS62251743 A JP S62251743A JP 9460386 A JP9460386 A JP 9460386A JP 9460386 A JP9460386 A JP 9460386A JP S62251743 A JPS62251743 A JP S62251743A
Authority
JP
Japan
Prior art keywords
photosensitive
compound
acid
photosensitive composition
lithographic plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9460386A
Inventor
Sei Goto
Yoshihiro Maeda
Hideyuki Nakai
Nobumasa Sasa
Hiroshi Tomiyasu
Toshiyoshi Urano
Original Assignee
Konika Corp
Mitsubishi Chem Ind Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konika Corp, Mitsubishi Chem Ind Ltd filed Critical Konika Corp
Priority to JP9460386A priority Critical patent/JPS62251743A/en
Publication of JPS62251743A publication Critical patent/JPS62251743A/en
Application status is Pending legal-status Critical

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials

Abstract

PURPOSE:To enhance sensitivity and to enlarge development allowance by incorporating a compound to be allowed to produce an acid by radiation of actinic rays and a compound having in the main chain at least one carbonate ester group decomposable with an acid. CONSTITUTION:The photosensitive composition contains the compound to be allowed to produce an acid by radiation of actinic rays in a proper amount of 0.1-50wt%, preferably, 0.2-10wt% of the total solids of the photosensitive composition, and the compound having in the main chain at least one carbonate ester group represented by formula I decomposable with an acid, preferably, in an amount of 5-70wt%, especially, 10-50wt% of the total solids of the photosensitive composition.
JP9460386A 1986-04-25 1986-04-25 Photosensitive compositions and photosensitive lithographic plate Pending JPS62251743A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9460386A JPS62251743A (en) 1986-04-25 1986-04-25 Photosensitive compositions and photosensitive lithographic plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9460386A JPS62251743A (en) 1986-04-25 1986-04-25 Photosensitive compositions and photosensitive lithographic plate

Publications (1)

Publication Number Publication Date
JPS62251743A true JPS62251743A (en) 1987-11-02

Family

ID=14114828

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9460386A Pending JPS62251743A (en) 1986-04-25 1986-04-25 Photosensitive compositions and photosensitive lithographic plate

Country Status (1)

Country Link
JP (1) JPS62251743A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03206458A (en) * 1989-03-14 1991-09-09 Internatl Business Mach Corp <Ibm> Chemically intensified photoresist
EP1627736A1 (en) 2004-08-18 2006-02-22 Konica Minolta Medical &amp; Graphic Inc. Method of manufacturing light sensitive planographic printing plates and method of using the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03206458A (en) * 1989-03-14 1991-09-09 Internatl Business Mach Corp <Ibm> Chemically intensified photoresist
EP1627736A1 (en) 2004-08-18 2006-02-22 Konica Minolta Medical &amp; Graphic Inc. Method of manufacturing light sensitive planographic printing plates and method of using the same

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