JPS62244137A - Drier for semiconductor wafer - Google Patents

Abstract

PURPOSE:To balance the title drier automatically when drying a semiconductor wafer, and to avoid the factor of the lowering of yield such as the cacking of a wafer due to a mistake on balancing by adopting an elastic mechanism capable of vertically moving a cradle, operating a weight detecting sensor at a time when a carrier is set into the cradle and adjusting the weight of the cradle by the supply of a liquid. CONSTITUTION:When a carrier in which a wafer is introduced is set to a cradle 1 first, the cradle is lowered up to some position by the weight of the carrier. A sensor is brought to an OFF state at that time, and the supply of water 11 is started to a balancer A from a water-supply port 7 automatically. Water supply is stopped at a time when the sensor is turned ON. Consequently, the weight of the cradle 1 is adjusted so as to be kept constant at all times regard less of the weight of the carrier. When the weight of the cradle is all kept constant, a drum 2 starts its revolution, but water 11 fed to the balancer A is shifted to a balancer B by centrifugal force at the time of revolution because the balancer A is tapered in the upper external direction. Water 11 supplied into the balancer B is discharged outside the cradle by gravity at the same time as the stoppage of turn.

Description

DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Application Field) The present invention relates to a semiconductor wafer drying apparatus in a semiconductor manufacturing apparatus.

(Prior Art) Conventionally, this type of drying apparatus for semiconductor wafers is as shown in FIG. In the figure, 1 is a cradle (for setting the carrier), 2 is a drum, 3 is a motor, and 4 is a drain port. That is, this apparatus is provided with four pairs of cradles 1 facing each other for holding carriers (on which wafers are set). Also, a drum 2 for holding the cradle 1
It is a centrifugal dehydration system that dries wafers by rotating a drum 2 with a motor 3.

In addition, since the drum 2 rotates at an extremely high speed, the drum 2 has a structure in which balancers such as wafers corresponding to the facing carriers must be manually set to maintain balance.

(Problems to be Solved by the Invention) In the conventional wafer drying apparatus described above, it was necessary for one person to set a weight such as a wafer corresponding to a position facing the semiconductor wafer when balancing the semiconductor wafer. In addition, wafer cracking occurs due to balance errors, and silicon debris adheres to the wafer, causing a decrease in yield.

Therefore, an object of the present invention is to automatically balance weights such as wafers without manually setting them, to avoid factors that reduce yield such as wafer cracking due to balance errors, and to automatically balance weights such as wafers without manual setting. This allows the weight to be removed.

[Structure of the invention]

(Means and effects for solving the problems) In the present invention, a cradle and an automatic balance mechanism are provided at intervals along the circumference of a rotating body, and the cradle adjusts the weight of the carrier on which the semiconductor wafer is set. The automatic balancer is supported by an elastic body so as to be movable up and down, and the automatic balancer is configured such that a weight adjustment liquid is supplied according to the weight in the cradle, and the liquid is automatically discharged after the wafer is dried. A cradle position detection mechanism is provided for supplying the liquid according to the position of the cradle, and the cradle is equipped with an elastic mechanism that allows the cradle to move upwardly and downwardly using a spring. When the carrier is taken in and set in the cradle, a weight detection sensor is activated via a cradle position detection mechanism such as a photosensor, and the weight of the cradle is adjusted by supplying liquid. Furthermore, while rotating, the balance liquid is held so that it does not escape, and when the rotation stops, this balance liquid is automatically discharged.

(Example) An example of the present invention will be described below with reference to the drawings. 1st
The figure is a configuration diagram of the same embodiment, and FIG. 2 is an enlarged view of the dashed-dotted line in FIG. 1. Here, parts corresponding to those in FIG. 0 in the figure 5 is a spring, 6
is the sensor, 7 is the water supply port, 8 is the cradle position detection rod, A
, B is a balancer. In other words, this configuration includes a cradle 1 that is elastically supported by a nozzle 5 on a drum 2, a sensor 6 that detects the height of the cradle, and water that is automatically supplied according to instructions from this sensor (liquids other than water can also be used). ), and consists of a balancer A that receives the supplied water, etc., and a paran fB that can hold the water etc. moved from the balance A when the drum rotates by centrifugal force. Note that this automatic balance mechanism, like the cradle, is arranged at intervals along the circumference of the drum.

The operation is as follows: First, a carrier containing a wafer is set in a cradle 1, and the cradle is lowered to a position corresponding to the weight K of the carrier. After setting the carrier there,
When the start switch is pressed for drying, the cradle has been set in advance and has not been lowered to the 9th position, so the Senna is in the OFF state and automatically starts supplying water 11 to the balancer from the water supply lower (3rd position). figure). Cradle 1
The water supply continues until the sensor falls to the set position and the senna turns on, at which point the water supply is staggered. Therefore, the weight of the cradle is adjusted so that it always remains constant regardless of the weight of the carrier. Next, when the weight of the cradle becomes constant, the drum 2 starts to rotate, but the water 11 supplied to the balancer A is tapered outward at the top, so the drum 2 starts rotating. It moves to Paran f-B due to centrifugal force (Fig. 4), (Shikashi-Nan f, B has a tenor arm on the inside in the lower direction, so while the drum is rotating, it moves due to centrifugal force. It is held in balancer B, but as soon as the rotation stops, due to gravity, paran-4
? Since the structure is such that the water 11 supplied in -B is discharged to the outside of the cradle (FIG. 5), the cradle can always return to its initial state upon completion of drying.

〔Effect of the invention〕

As explained above, according to the present invention, when drying a semiconductor wafer, it is possible to automatically balance the semiconductor wafer without setting it manually, thereby avoiding factors that reduce yield such as wafer cracking due to balance errors. , which can improve yield.

[Brief explanation of drawings]

Fig. 1 is a block diagram of an embodiment of the present invention, Fig. 2 is an enlarged view of essential parts of the same structure, Figs. 3 to 5 are explanatory diagrams of the operation of the same structure, and Fig. 6 is a block diagram of a conventional device. It is. l...Cradle, 2...Drum, 3...Motor, 4...Drain port, 5...Spring, 6...Sensor, 7
...Water inlet, 11...Water, A, B-...Balancer. Applicant's agent Patent attorney Take Hikoguchi Suzue = Figure 5 Figure 6 Figure 1 Figure 3 Figure 2 Figure 4

Claims (2)

[Claims] (1) A cradle and an automatic balance mechanism are provided at intervals along the circumference of the rotating body, and the cradle is supported by an elastic body so as to be movable up and down according to the weight of the carrier on which the semiconductor wafer is set; The automatic balancer has a structure in which a weight adjustment liquid is supplied according to the weight in the cradle, and the liquid is automatically discharged after the wafer is dried, and the liquid supply is adjusted according to the position of the cradle. 1. A semiconductor wafer drying apparatus characterized by being provided with a cradle position detection mechanism for performing this. (2) The automatic balance mechanism is a tapered balance mechanism that retains the weight adjustment liquid when the rotating body rotates, and automatically discharges the liquid when the rotating body stops rotating to return to the initial state. A semiconductor wafer drying apparatus according to claim 1.