JPS62244021A - Optical scanner - Google Patents

Abstract

PURPOSE:To form the titled device so that it is excellent in its durability and vibration resistance, can be easily adjusted, has a high light utilization efficiency, can execute a scan precisely, and can be made small in size, by setting light refractive indexes of a substrate and its adjacent layer of the part corresponding to an energy applied part, respectively, to each different state, and on the other hand, setting other light refractive indexes to each equal state. CONSTITUTION:A semiconductor laser 17 is driven, a laser beam 14' is emitted into an optical waveguide layer 11, converted to parallel rays 14 by a waveguide lens 16, and the rays 14 advance in the arranging direction of diffraction gratings G1-Gn in a waveguide mode in the optical waveguide layer 11. To electric heating bodies H1-Hn, a current from a heating power source 22 is allowed to flow through a driver 15, and the current is supplied by selecting successively the electric heating bodies H1-Hn one by one. A substrate 10 of a part which has contacted the heated electric heating body is heated, its light refractive index falls, and when the optical waveguide layer 11 becomes an asymmetrical waveguide, the light is emitted from the optical waveguide layer 11 to an adjacent layer 12 side, in this part, and emitted to the outside of the adjacent layer 12 by a diffracting action of the diffraction gratings G1-Gn. A body to be scanned 18 is scanned in the direction X by this emitted light 14.

Description

DETAILED DESCRIPTION OF THE INVENTION (Field of the Invention) The present invention relates to an optical scanning device, particularly a thermo-optic material, an electro-optic material, etc., which uses an optical scanning device to generate light by applying an external field or adding energy (hereinafter collectively referred to as energy addition). This relates to optical scanning ￥A＠ in which optical scanning is performed using a material that changes the refractive index.

(Prior Art) As is well known, various types of optical scanning recording devices and reading devices have been provided. Conventionally, as an optical scanning device that scans the recording light or reading light one-dimensionally in such a device, the light beam is deflected and scanned using a mechanical optical deflector such as a galvanometer mirror or a polygon mirror (rotating polygon mirror). ■A device that deflects and scans a light beam using an optical deflector using a solid-state optical deflection element such as an EOD (1! air-optic optical deflector) or an AOD (acousto-optic optical deflector), ■A liquid crystal element arrayer P
A device that combines a shutter array such as an LZT array with a line light source, connects a drive circuit individually to each shutter element of the shutter array, and performs line sequential scanning by selecting 0N10FF and opening them simultaneously according to the image signal. , in general, ■ A large number of light emitting elements such as LEDs are arranged in rows, and a drive circuit is individually connected to each light emitting element, and the 0N1
There are known devices that perform line-sequential scanning by selecting 0FF and emitting light at the same time, but the mechanical optical deflector mentioned above is weak against vibrations.
It also has the drawbacks of low mechanical durability and troublesome adjustment. Furthermore, since the optical system is large in order to swing and deflect the light beam, there is also the problem that the recording device and the reading device become larger.

In addition, even in the case of an optical scanning device using the EOD or AOD described in (■), the light beam is taken and deflected in the same way as described above.
There is a problem in that the device tends to be large. Especially the above E
Since OD and AOD cannot have a large optical deflection angle, the optical system tends to be much larger than when using a mechanical optical deflector (2).

On the other hand, in the case of the optical scanning device using the shutter array (2), since it is necessary to use two polarizing plates, there is a problem in that the light utilization efficiency of the light source is extremely low.

Furthermore, in the case of an optical scanning device using a large number of light-emitting elements arranged in parallel, there is a problem in that the light-emitting intensity of each light-emitting element varies, making it unsuitable for precision scanning.

(Object of the Invention) The present invention was made in view of the above circumstances, and has excellent durability and vibration resistance, easy adjustment, high light utilization efficiency, precision scanning, and small size. It is an object of the present invention to provide an optical scanning device that can be formed in the following manner.

(Structure of the Invention) The optical scanning device of the present invention includes an optical waveguide layer (path) and an adjacent layer stacked on a substrate in close contact with each other in this order. a laminate formed of materials that can change the optical refractive index and have the same optical refractive index with each other; a plurality of energy adding means; a diffraction grating provided at least in a portion of the adjacent 1 surface corresponding to the energy adding portion by the energy adding means; and one of the plurality of energy adding means. Sequentially and alternatively, the optical refractive indexes of the substrate and the adjacent 1 are set to be different from each other in the portions corresponding to the energy adding points, while the other energy adding means are set respectively corresponding to the energy adding points. It is composed of a driving circuit that sets the optical refractive index of the adjacent substrate to be equal to each other.

Materials that change the optical refractive index by adding energy include:
Use of electro-optic materials that change the optical refractive index by electric fields, thermo-optic materials that change the optical refractive index by heat, acousto-optic materials that change the optical refractive index by ultrasonic waves, magneto-optic materials that change the optical refractive index by magnetic fields, etc. I can do it.

(Function) As described above, when one of the plurality of energy adding means is set to a state where the optical refractive index of the part of the substrate corresponding to the energy adding point and the adjacent 1 are different from each other, in this part, While the optical waveguide 1 becomes a so-called asymmetric waveguide, if the other energy adding means are set to make the optical refractive indexes of the substrate and the adjacent 1 equal to each other in the portions corresponding to the energy adding points,
In those portions, the optical waveguide 1 becomes a so-called symmetrical waveguide, and the guided light can be extracted to the outside only from the asymmetrical waveguide portion. If the portion that becomes the asymmetrical waveguide is sequentially and selectively changed as described above, the guided light extraction position from the optical waveguide 1 is continuously changed, and the light is
It becomes possible to scan dimensionally.

To explain in more detail, the optical scanning device of the present invention
As shown in the figure - a substrate 1 made of thermo-optic material, for example;
0, an optical waveguide +111, and an adjacent 1112 are laminated 1, a plurality of electric heating elements H are arranged in parallel on the lower surface of the substrate 1o, and each Electric heating element H
Diffraction gratings G are provided at positions facing each other, and the optical refractive index n of the substrate 10 when not heated is
3. Optical refractive index n2 of optical waveguide @11, optical refractive index n of adjacent layer 12! It is assumed that the relationship nz > nl - n3 holds between them. In this case, optical waveguide! The degree of asymmetry a of m11 is a=(nl2 n32
), '(nz2 rlx”), and this a
Optical waveguide for each value! 2 shows the relationship between the hood thickness and the effective refractive index of No. 111. Note that in this graph, m is the mode order of the guided light 14. Therefore, as an example, when the mode of the guided light 14 is 0th order, if nl-r+3 as described above, then naturally it is a-Q, so the dispersion curve in that case becomes like the solid line in FIG. 3. Optical waveguide at this time! Assuming that the effective refractive index of @11 is n eff and the depth of the optical waveguide @11 is TO, the portion 15 (N field distribution) of the guided light 14 is expressed as shown in FIG. 4(a).

FIG. 4(a) shows that the guided light 14 is connected to the adjacent layer 12 and the substrate 1.
0, but it does not interact with the diffraction grating G, indicating that the guided light 14 is proceeding through the optical waveguide 911 without leaking to the outside.

Next, one electric heating element HCN flow is supplied to heat it, and the optical refractive index of the portion of the substrate 10 facing this electric heating element H is changed from n3 to n3-Δn. Then, the value of a changes from O to a positive value, and the dispersion curve in FIG. 3 changes as indicated by a broken line. In other words, the effective refractive index of the optical waveguide 111 is adjacent @1
The optical refractive index n! of 2! is equal to Waveguide light 14 at that time
The field distribution changes as shown in FIG. 4(b), and the leaking light of the guided light 14 to the adjacent @12 sufficiently interacts with the diffraction grating G. As a result, the leaked light in the shaded area in the figure travels upward in the figure (downward or both depending on the type of diffraction grating G), and finally most of the guided light 14 is extracted to the outside.

As explained above, since the guided light 14 can be extracted to the outside of the product 13 at the portion heated by the electric heating body H, the electric heating body H is provided so as to extend in a line along the optical path of the guided light 14. Then, if a heating current is selectively supplied to each electric heating body H, light will be emitted from the laminated body 13 while changing the emitting position, and optical scanning will be performed.

As described above, in addition to forming the substrate 10 from a thermo-optic material and changing its optical refractive index n3, conversely, the adjacent @ 12 is formed from a thermo-optic material and an electrothermal holiday is provided there.
The optical waveguide @11 may be changed from a symmetrical waveguide to an asymmetrical waveguide by changing the optical refractive index n1 of 12, or more generally, both the substrate 10 and the adjacent @12 may be formed from a thermo-optic material. An electric heating body H is provided on both sides, and the optical refractive index n3 of both is set.
, nu may be changed. When the electric heating element H is provided on the surface of the adjacent layer 12, the electric heating element H may be formed by forming the diffraction grating G from a transparent electric heating element, for example.

When changing the optical refractive index n1 of the adjacent layer 12 as described above, the optical refractive index nl of this adjacent layer 12 and the substrate 10,
From the state where n3 are equal to each other, the optical refractive index n of the adjacent layer 12
! It is preferable to make the optical waveguide @11 an asymmetric waveguide by increasing
Alternatively, the relationship of the optical refractive index changes to n2≦n1, and by utilizing the resulting change in the effective refractive index of the leading wave @11, it becomes possible to transfer the guided light 14 to the outside. In this way, the optical refractive index n2 of the optical waveguide 111 and the optical refractive index n of the adjacent layer 12 are
1. Regarding the fact that the guided light 14 can be taken out to the outside by changing the relationship, it is disclosed in the patent application filed in 1983 by the applicant.
A detailed description is given in the specification of No. 0-74061 and the like.

Also, from the state of n,=n3, n! In order to make the optical waveguide @11 into an asymmetric waveguide with ≠n3, as described above, the substrate 10 and the adjacent [112] are always made of materials with the same optical refractive index, and the glue between them is zero. In addition to setting the nl end n3 by applying heat, applying an electric field, etc., it is also possible to set nl = 03 under heating, applying an electric field, etc., and then setting n1≠03 by canceling the heating, applying the electric field, etc.

Roughly speaking, by appropriately selecting the structure of the diffraction grating G,
The guided light 14 extracted from the adjacent l112 can be parallel light, convergent light, or diffused light.

For example, if the structure of the diffraction grating G is a condensing diffraction grating, the extracted light can be condensed to one point and prevented from being dissipated.

(Actual M mode) Below, the actual M shown in the drawings! The present invention will be described in detail based on aspects.

5 and 6 show an optical scanning device 20 according to a first embodiment of the present invention. On the substrate 10, an optical waveguide 11111 and an adjacent layer 12 are laminated in this order in close contact with each other to form a laminate 13. Note that the substrate 10 is made of a thermo-optic material. In order to allow light to travel within the optical waveguide @11, the optical waveguide l111, the adjacent 1112, and the substrate 10 each satisfy the optical refractive index relationship nz > nl, n3, and the optical waveguide @11 is always symmetrical. The waveguide is made of nl-n3 material. Note that nz and nl are the optical refractive indexes of the optical waveguide 1111 and the adjacent @12, respectively, and n3 is the optical refractive index of the substrate 10 when it is not heated.

Examples of such combinations of materials for the adjacent layer 12, the optical waveguide @ 11, and the substrate 10 include the following.

Adjacent 112 ... Optical glass made by Schott (West Germany) 51 Thickness: 5 μm nl -1,503 Δn, /ΔT=+5X10, /”C optical waveguide 11i1
1... Cord 1059 manufactured by Corning Inc. (USA) Glass hood thickness 0.1 μm nz-1,544 Δn/ΔT=+4X10 /'C Tobboard board...Diethylene glycol hisallyl carbonate Thickness approximately 0.5 mm+ n3=1.
503 Δn/ΔT--100 XIO/"C (nl, nz, ni are He-N with a wavelength of 6328 nm
Refractive index for e-laser) The above Δn/Δd is the absolute temperature coefficient at +20-+40°C. Regarding optical waveguides, for example,
') Meal (T, Tam1 r) Duck g Inch Grated Obtakes (Integrated 0pt
ics>+ (Topics 1nApp1ied Phys
sics) Volume 7) Springer-Verlag (SDr
Published by Inger-Verlag (1975):
Co-authored by Nishihara, Haruna, and Izuhara 1-Published by Photonic Integrated Circuit Coohmsha (1
A detailed description can be found in works such as 985). Generally, the optical waveguide layer 11, the adjacent layer 112, and the substrate 10 each have a thickness of 0.
It is formed to have a thickness of 5 to 10 μm, 1 to 50 μm, or 1 μm or more, but is not limited thereto.

On the surface of the adjacent @12, diffraction gratings G1, G2, G3... (3n) made of a transparent material are arranged in parallel in a row.As this transparent material, for example, TazOs (light refractive index of about 1 .9).In addition, the diffraction gratings G1 to Q
The size of n is, for example, 10X10μm-Q, 2X5ff
iffi, the thickness is about 0.2 μm, and the spacing between each diffraction grating G1 to 3n is set to about 100 to 200.czm.As shown in the side view of FIG. On the lower surface of the substrate 10, each of the above-mentioned diffraction gratings G1 and G2 is provided.
, G3...(3n) are provided with electric heating bodies H1,!-12, H3...1-1n, respectively.

- On the force leading wave @11, a waveguide lens 16 is formed on the extension of the arrangement direction of the diffraction gratings 01 to 3n, and on the end face of the optical waveguide 111, the waveguide lens 16 is formed.
Laser beam towards 6<f! A semiconductor laser 17 which emits an i-ray beam) 14' is directly coupled.

FIG. 7 shows the drive circuit 21 of the optical scanning device 20. The operation of the optical scanning device 20 will be described below with reference to FIG. 7 as well. First, the aforementioned semiconductor laser 17 is driven, and a laser beam 14' is emitted into the optical waveguide @11. This laser beam 14' is converted into parallel light 14 by a waveguide lens 16, and this light 14 is optically guided! 111
In the waveguide mode, the diffraction gratings 01 to 3n travel in the direction in which they are lined up (see Figure 5).The electric heating elements H1 to Hn have
Electric current (ml) from the heating power source 22 is passed through the driver 15. This driver 15 operates in response to the output of the shift register 23 which operates in synchronization with the output signal CLK, and sequentially selects the electric heating holidays 1 to Hn to which the current ■ is supplied one by one, and supplies the current. . That is, at first, the current (2) is supplied only to the first electric heating element H1 among the n electric heating elements H1 to Hn, then only to the second electric heating element H2, and so on. When current I is passed through the electric heating bodies H1 to Hn in this manner, each of the electric heating bodies H1 to Hn sequentially generates heat, and the portion of the substrate 10 that is in contact with the heated electric heating body is heated, and its optical refractive index decreases. Therefore, in this part, n3≠n! Therefore, the optical waveguide layer 11 becomes an asymmetric waveguide. Then, as described above, the guided light 14 is emitted from the optical waveguide @ 11 to the adjacent layer 12 side in this asymmetrical waveguide portion, and
Due to the diffraction action of diffraction gratings 01 to 3n, light is emitted to the outside of the adjacent @12. That is, first from diffraction grating G1, then from diffraction grating G2, then back to diffraction grating G1 after diffraction grating (3n), and so on. Since the emission position of the light 14 changes clearly, the object to be scanned 18 is scanned by the emitted light 14 in the direction of the arrow X in FIG.・Old...(3n→G (n-1)→
G (n-2) -...G change 1, electric heating element H1
~Hn may be controlled. Then, main scanning is performed as described above, and the clock signal @CL
K, the object 18 to be scanned is moved to the fifth position in synchronization with the main scanning.
If sub-scanning is performed by moving in the direction of the arrow Y in the figure, the object to be scanned 18 will be two-dimensionally scanned by the light 14.

As described above (the substrate 10 is
When the substrate 10 is heated, the optical waveguide l in close contact with the substrate 10
l111 and the adjacent @12 will also be slightly heated, but if the substrate 1o, the optical waveguide @11, and the adjacent 1112 are made of the materials shown above, the temperature coefficients Δn and /ΔT of the substrate 1o will be On the other hand, that of the optical waveguide layer 11 and the adjacent layer 112 is less than 1/10, and the change in the optical refractive index of the optical waveguide layer 111 and the adjacent layer 112 can be practically ignored.

For example, when the substrate 10 made of the above-mentioned material is heated to 100°C, its optical refractive index n3 decreases by 0.01.
11. Optical waveguide @1 ignoring the change in the optical refractive index of the adjacent @12
When the degree of asymmetry a of 1 is calculated, a= (n1z
n32) / (n2 ” nl 2) (1,5032
-1,5022>(1,5442-1,5032> =0.024.

In this embodiment, the diffraction gratings G1 to Gn provided on the surface of the adjacent @12 are formed as collimator diffraction gratings, and the light 1 emitted from the diffraction gratings 01 to On is
4 is adapted to be irradiated onto the object to be scanned 18 as parallel light. This collimator diffraction grating is one in which linear gratings are arranged substantially parallel to each other and at substantially equal intervals in a direction substantially perpendicular to the traveling direction of the guided light 14 in the optical waveguide 11, thereby achieving the above-mentioned effect. It has a collimating effect.

In addition, the semiconductor laser 17 is not directly coupled to the end face of the optical waveguide @11, but the optical waveguide l! The light may be incident on 11 in a mixed manner. Further, the semiconductor laser 17 may be formed integrally with the leading wave layer when it is formed. In general, the light source that generates the scanning light is not limited to the above-described semiconductor laser 17, but other sources such as a gas laser or a solid-state laser may also be used.

Further, on the transparent side of the implementation M, the optical refractive index n3 of the substrate 10 is lowered to n! By setting ≠n3, the leading wave @
11 is made into an asymmetric waveguide, but on the contrary, the optical refractive index n3 of the substrate 10 is increased to n! By setting ≠03, the optical waveguide 11 may be made into an asymmetric waveguide.

Next, a second embodiment of the present invention will be described with reference to FIG. In this FIG. 8, elements equivalent to those in FIG.

In the optical scanning device @40 according to the second embodiment:
The adjacent @12 is normally formed from a thermo-optic material exhibiting the same optical refractive index as the substrate 10, and the diffraction gratings G1-Gn are formed from a transparent electrothermal material. Examples of such transparent electrothermal materials include those made of InzO3 and 5n02. In this optical scanning device 40, the diffraction gratings G1 to G3n are sequentially and selectively heated in the same manner as in the device shown in FIG. By doing this, each diffraction grating G1~
It becomes possible to sequentially change the optical refractive index nl@ of the adjacent portion 112 in the opposing portion of Gn to make the optical waveguide @11 into an asymmetric waveguide, and to sequentially take out the light 14 from that portion and scan it. In this case, even if the optical refractive index n1 of the adjacent layer 12 is increased or decreased, n1≠n3 can be satisfied, but as described above, n.

It is preferable to set n1≠n3 by increasing .Next, a third embodiment of the present invention will be described with reference to FIG. In the optical scanning device 50 according to the third embodiment, the adjacent layer 12 is normally formed of an electro-optic material exhibiting the same optical refractive index as the substrate 10, and the adjacent layer 12 has diffraction gratings 01 to Gn. Electrode pairs (C1, DI>, (C2゜D2>, (C3, D3)
(Cn, Dn> are buried. Electrodes 01 to Cn
are mutually conductive common electrodes, and electrodes D1 to [)n are mutually independent individual electrodes. Then, the substrate 10, the optical waveguide @11,
The adjacent portion 112 is formed of a material that satisfies the optical refractive index relationship n2 >nl, n3. Note that nl is the optical refractive index of the adjacent @12 when no electric field is applied, and is nl-n3 as described above. As a combination of such materials,
Examples include the following:

Adjacent @12...L! Nb03nt = 2,
200 model thickness 10μm optical waveguide @11...L'! NbO:+T! diffusion n2
= '2.205 91 thickness approximately 0.2μm substrate 10
-L I N bo3n3-2,200 drops 0.5mm
FIG. 10 shows the drive circuit 51 of the optical scanning device @50. Hereinafter, referring to FIG. 10, the optical scanning device 5
The operation of 0 will be explained. A voltage (2) generated from the voltage generation circuit 52 is applied via the driver 15 between the common electrodes C1 to Cn and the individual electrodes D1 to Dn. Here, the driver 15 operates in response to the output of the shift register 23 which operates according to the clock signal CLK, and applies voltage between the common electrodes C1 to On and the individual electrodes D1 to On.
Dn is selected one by one and the voltage is applied.

That is, first, only between the first individual electrode D1 and the common electrode C1 among the n individual electrodes D1 to [)n, and then only between the second individual electrode D2 and the common N-pole C2. ...
... and voltage V is applied. In this way, each electrode pair (C1, Dl) to (Cn) has an opening for applying a voltage.

An electric field is generated between the electrodes of Dn>, and the optical refractive index n! of the part adjacent to which the electric field is applied is @12. changes (decreases or increases) and nl:I! -03. As a result, optical waveguide is formed in the portions facing the diffraction gratings 01 to Gn! 11
1 becomes an asymmetric waveguide sequentially, and the guided light 14 is taken out to the outside while changing the output position and optical scanning is performed.

Note that instead of forming the adjacent layer 12 from an electro-optic material as described above, the substrate 102G is formed from an electro-optic material, a voltage applying electrode pair is provided on this substrate 10, and the optical refractive index n3 of the substrate 10 is changed. Maybe n! Of course, it is also possible to take out the guided light 14 as light n3. Also board 1
0 and the adjacent 112 are both formed from an electro-optic material, and the optical diffraction index of both is n! , n3 by changing n,
The guided light 14 may be taken out as the light n3. In this case, the substrate 10 and the adjacent substrate 112 are made of a material whose optical refractive index decreases and a material whose optical diffraction index increases upon application of an electric field, so that a large difference in optical refractive index occurs with the application of a small voltage. Of course, the thermo-optic material mentioned earlier,
Alternatively, by adding energy (even when using a material that changes the optical diffraction index, both the substrate 10 and the %a contact piece 12 are made of such a material, and the optical refractive index n1, n3 of both is changed by adding energy. may be changed so that n!≠n3.

As described above, when no energy is added (the optical waveguide I!11 is a symmetrical waveguide, the substrate 10 and/or adjacent @1
An example has been described in which the optical waveguide layer 11 is made into an asymmetric waveguide by adding energy to the substrate 10! 1
1? It is also possible to form the optical waveguide layer 11 from a material that normally exhibits different optical refractive indexes (that is, when no energy is applied), and to make the optical waveguide layer 11 into an asymmetric waveguide by applying energy.

That is, in this case, the drive circuit first sets all of the energy adding means to a predetermined energy adding state to nl x n3 at each energy adding point, and then sequentially sets the energy adding means to an alternative energy adding state, n1 in the part where energy addition is removed
What is necessary is to configure it so that φn3.

Further, it is not always necessary to collimate the light 14 emitted from the adjacent light 112 as described above, and depending on the case, the object to be scanned 18 may be scanned with focused light or diffused light. The light 14 emitted from the adjacent layer 12 can be shaped by selecting the structure of the diffraction grating G, by providing an appropriate optical system between the adjacent layer 12 and the object to be scanned 18, or by a combination of both. This can be done arbitrarily. For example, the focused light can be implemented as described above consisting of a linear grating! ! ! By replacing the collimator grating with a condensing grating consisting of a quadratic curved grating, or by
This can be achieved by placing a condensing optical system such as a SELFOC lens array between the object 18 and the scanned object 18, or by a combination of both.

Further, the optical scanning device of the present invention can be formed so that a plurality of rows of diffraction gratings G1 to Gn, which are the scanning light extraction portions, are lined up so that a plurality of scanning light beams can be extracted simultaneously.

(Effects of the Invention) As explained in detail above, since the optical scanning device of the present invention uses a single light source, there is almost no problem of variations in the light emission intensity of the light source seen in the LED array, etc., and precision is achieved. Scanning becomes possible, and the light utilization efficiency of the light source is also increased. Furthermore, since the optical scanning device of the present invention does not include any mechanically operating parts, it has excellent durability and photographic resistance, and is easy to adjust.
Because it is possible to scan without taking a large beam of light,
According to the aspect of the present invention, it is possible to avoid increasing the size of the optical scanning system and to form an optical scanning recording device or reading device in a small size.

Moreover, in the optical scanning device of the present invention, the scanning light is extracted from the optical waveguide 1 by changing the symmetrical waveguide to an asymmetrical waveguide, so that the change in the optical yoke refractive index is positive with respect to the energy addition. The wide availability of both materials and negative materials facilitates design. Roughly speaking, since the device of the present invention extracts the scanning light as described above,
There is no need to significantly change the optical refractive index of the substrate and/or the adjacent layer for optical scanning, which also increases the degree of freedom in selecting the materials to be used, and furthermore reduces energy consumption.

[Brief explanation of drawings]

Fig. 1 is an explanatory diagram explaining the optical scanning mechanism of the device of the present invention, Fig. 2 is a graph showing the relationship between the optical waveguide film thickness, effective refractive index, and degree of waveguide asymmetry according to the present invention, and Fig. 3 is a graph showing the dispersion curve of the configuration of FIG. 1, FIG. 4 is a conceptual diagram showing the electric field distribution of guided light in the configuration of FIG. 1, and FIGS. 5 and 6 are each according to the first embodiment of the present invention. FIG. 7 is a block diagram showing an electrical circuit of the optical scanning device; FIGS. 8 and 9 are a second embodiment fl device and a third embodiment of the present invention, respectively. M! FIG. 10 is a perspective view showing the embodiment device, and FIG. 10 is a block diagram showing the electric circuit of the third actual M embodiment device. 10... Substrate 11... Optical waveguide 112
... Adjacent 11 13 ... Product 1 body 14 ...
- Light 15... Driver 16... Waveguide lens 17... Semiconductor laser 20, 40.
50... Optical scanning device 21.51... Drive circuit 2
2...Heating II source 23...Shift register 30...Lens array 31...Lens array gate 52...Voltage generation circuit 01-Cn...Common electrode D1-Dn-... Individual electrode 01~Gn-
...Diffraction grating H1~Hn...Electric heating element Fig. 1 Fig. 2 Fig. 3 Fig. 4 (b) Slot Q Fig. 8 Fig. 9

Claims (5)

[Claims] (1) An optical waveguide layer and an adjacent layer are laminated on a substrate in close contact with each other in this order, and the optical waveguide layer and/or the adjacent layer can change the optical refractive index by applying energy and have the same optical refractive index. a plurality of energy adding means provided on the substrate and/or the adjacent layer along the optical path of the guided light traveling into the optical waveguide layer; , a diffraction grating provided at least in a portion corresponding to an energy adding point by the energy adding means; and a diffraction grating provided in each of the portions corresponding to the energy adding point by sequentially and selectively applying one of the plurality of energy adding means. The optical refractive index of the substrate and the adjacent layer is set to be different from each other, while the other energy adding means is set so that the optical refractive index of the substrate and the adjacent layer of the portion corresponding to the energy applying point is made equal to each other. An optical scanning device consisting of a drive circuit that is set to (2) The substrate and the adjacent layer are usually formed of materials exhibiting the same optical refractive index, and the drive circuit is configured to sequentially and selectively set the energy applying means to a predetermined energy applying state. An optical scanning device according to claim 1, characterized in that: (3) The substrate and the adjacent layer are usually formed of materials exhibiting different optical refractive indexes, and the drive circuit sets all of the energy applying means to a predetermined energy applying state and applies the energy to the substrate at the energy applying point. and the adjacent layer are made equal to each other, and then the energy applying means are sequentially and selectively set to the energy application release state. Optical scanning device. (4) The material is a thermo-optic material that changes the optical refractive index by heating, and the energy adding means is an electric heating means,
Claims 1 to 3, characterized in that the energy application point is a heated point by the electric heating means, and the drive circuit is formed to supply heating current to the electric heating means. The optical scanning device according to any one of the items. (5) The material is an electro-optic material that changes the optical refractive index by applying an electric field, the energy applying means is an electrode pair, the energy applying location is a gap between the electrodes of the electrode pair, and the drive circuit is the 4. The optical scanning device according to claim 1, wherein the optical scanning device is formed to apply an electric field between the electrodes of the pair of electrodes.