JPS6224392B2 - - Google Patents
Info
- Publication number
- JPS6224392B2 JPS6224392B2 JP13593681A JP13593681A JPS6224392B2 JP S6224392 B2 JPS6224392 B2 JP S6224392B2 JP 13593681 A JP13593681 A JP 13593681A JP 13593681 A JP13593681 A JP 13593681A JP S6224392 B2 JPS6224392 B2 JP S6224392B2
- Authority
- JP
- Japan
- Prior art keywords
- powder
- cermet
- sintered body
- sintered
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000843 powder Substances 0.000 claims description 48
- 239000011195 cermet Substances 0.000 claims description 46
- 238000000034 method Methods 0.000 claims description 21
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 238000000465 moulding Methods 0.000 claims description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 3
- 239000002184 metal Substances 0.000 description 13
- 229910052751 metal Inorganic materials 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 238000007731 hot pressing Methods 0.000 description 7
- 238000001465 metallisation Methods 0.000 description 6
- 239000012188 paraffin wax Substances 0.000 description 6
- 238000005245 sintering Methods 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 229910003296 Ni-Mo Inorganic materials 0.000 description 4
- 238000005219 brazing Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 238000010304 firing Methods 0.000 description 3
- 239000004570 mortar (masonry) Substances 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000009795 derivation Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000011812 mixed powder Substances 0.000 description 2
- 239000006082 mold release agent Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910017309 Mo—Mn Inorganic materials 0.000 description 1
- VZGDMQKNWNREIO-UHFFFAOYSA-N carbon tetrachloride Substances ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Ceramic Products (AREA)
Description
【発明の詳細な説明】
本発明は概して金属化面を有する窒化珪素(以
下Si3N4を示す)焼結体を得る方法、更に詳しく
は、Si3N4焼結体の被メタライズ相当部位にSi3N4
焼結体と化学的結合力が高くしかもそれ自体良好
な電気伝導性を具備してメタライズを有効になし
得るサーメツト層を形成させる方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention generally relates to a method for obtaining a silicon nitride (hereinafter referred to as Si 3 N 4 ) sintered body having a metallized surface, and more specifically, a method for obtaining a silicon nitride (hereinafter referred to as Si 3 N 4 ) sintered body having a metallized surface, and more specifically, to Si 3 N 4
The present invention relates to a method for forming a cermet layer that has a high chemical bonding strength with a sintered body and also has good electrical conductivity and can be effectively metalized.
ホツトプレス成形したSi3N4焼結体は表面気孔
率が小さく化学的にも極めて安定であるためメタ
ライズすることは困難である。このメタライズに
当つて最重要となるものはSi3N4に対するメタル
の漏れ及びメタルの熱膨張係数がSi3N4のそれに
近いことであるが、残念ながらこの2つの性質を
同時充足させ得るものはない。 Hot-pressed Si 3 N 4 sintered bodies have low surface porosity and are chemically extremely stable, making it difficult to metalize them. The most important things in this metallization are the leakage of the metal to Si 3 N 4 and the thermal expansion coefficient of the metal being close to that of Si 3 N 4 , but unfortunately there is no way to satisfy these two properties at the same time. There isn't.
Si3N4焼結体のメタライズ方法として現在適用
されているものとしては、(イ)金属塩水溶液を焼結
体表面に塗布した後、還元性雰囲気下で焼成して
金属を析出させ金属化面を得、その上にメタライ
ズするもの、(ロ)Mo―Mn系もしくはMo―W系ペ
ーストを焼結体表面に焼付けて金属化面を得その
上にメタライズするもの…が挙げられるが、
Si3N4は一旦焼結されたものは前述の如く表面気
孔率が小さく化学的にも安定しているために、上
記(イ)(ロ)いづれの手法によつてもメタライズ層と焼
結体との化学的結合力は極めて小でこのメタライ
ズ層上に金属リードをろう着した場合、該リード
に剥離方向の外力が与えられるとこのメタライズ
層は母体である焼結体より容易に剥脱してしまう
と云う致命的欠陥を露呈する。 The currently applied methods for metallizing Si 3 N 4 sintered bodies include (a) applying an aqueous metal salt solution to the surface of the sintered body and then firing it in a reducing atmosphere to precipitate the metal and metallize it; (b) A method in which a Mo-Mn or Mo-W paste is baked onto the surface of a sintered body to obtain a metallized surface and metallization is performed on the surface.
Once sintered, Si 3 N 4 has a small surface porosity and is chemically stable as described above, so it cannot be sintered with the metallized layer by either of the methods (a) and (b) above. The chemical bonding force with the body is extremely small, and when a metal lead is brazed onto this metallized layer, if an external force is applied to the lead in the direction of peeling, the metallized layer will peel off more easily than the sintered body that is the base body. It exposes the fatal flaw that it is.
本発明はこのような欠陥のない金属化面を有す
るSi3N4焼結体を得る法に関し、概略的解決手法
は、Si3N4を焼結してしまつた后に金属化面を形
成させると云うこれ迄の考えと異なり、金属化面
を形成させるための特殊なサーメツト粉末と、母
体となるSi3N4粉末とをホツトプレスによつて焼
結一体となすことによつてサーメツト層並びに母
体のSi3N4焼結体相互に高い化学的結合力を得併
せてサーメツト自体に良好な電気導伝性を付備せ
しめる点にある。 The present invention relates to a method for obtaining a Si 3 N 4 sintered body with such a defect-free metallized surface, and the general solution is to form the metallized surface after sintering the Si 3 N 4 . Unlike the previous idea that the metallized surface is formed by sintering the special cermet powder for forming the metallized surface and the base Si 3 N 4 powder by hot pressing, the cermet layer and the cermet layer are formed. The main point is that the Si 3 N 4 sintered body has a high chemical bonding strength with each other, and the cermet itself has good electrical conductivity.
以下に本発明を更に詳述する。 The present invention will be explained in further detail below.
本発明は次の4つの工程よりなる。()サー
メツト粉末を得る工程、()Si3N4粉末を所望の
形状に加圧(プレス)成形する工程、()サー
メツト粉末を()のSi3N4成形体上に加圧積層
するかもしくはサーメツト粉末をペースト状とな
して該Si3N4成形体上に積層する工程、()全体
をホツトプレスによつて焼結一体とする工程。 The present invention consists of the following four steps. () Step of obtaining cermet powder, () Step of pressing (pressing) Si 3 N 4 powder into a desired shape, () Pressing and laminating the cermet powder on the Si 3 N 4 molded body of () Alternatively, a step of forming a paste of cermet powder and layering it on the Si 3 N 4 molded body, and () a step of sintering the whole into a single piece by hot pressing.
本発明に於て最重要工程となるサーメツト粉末
を得る工程()は、Si3N4粉末50〜80%(重
量、以下同じ)とWc粉末+Co粉末50〜20%とか
らなるSi3N4―Wc―Co系のサーメツト粉末を混
合によつて得る工程である。サーメツト粉末のう
ち金属粉末としてはSi3N4との化学的親和性があ
り(漏れがあり)それ自体の焼結性がよく電解メ
ツキがつき易く且つろう付金属とのなじみのよい
ものが理想条件であり、この線に沿えると思われ
る種々の金属化合物、例えばTiC―Ni―Mo系、
Cr―Al2O3系、TiC―TiN―Ni―Mo系等を本発明
に先がけてSi3N4粉末と組合せて焼結(ホツトプ
レス焼結)してみたが、TiC―Ni―Mo系のもの
はプレス型であるカーボン型からの離型性が悪い
上にそれ自体の焼結性が不良で多数の気孔や亀裂
を発生しており、Cr―Al2O3系では同じく離型性
が不良である上にSi3N4焼結体との化学的結合が
殆んど得られず、TiC―TiN―Ni―Mo系に於て
は、Si3N4焼結体との結合が不在な上にカーボン
型に焼付いてしまう…等々の欠点のあることが知
見された。このような失敗の中でWc―Co系のも
のはSi3N4と組合つて前記の限定範囲内に於て
は、合目的な材料であることが判明したのであ
る。すなわち、本発明に於けるサーメツト粉末の
うち、Si3N4粉末が50%未満の場合はサーメツト
層の熱膨張が大きくなり過ぎて母体であるSi3N4
焼結体及びサーメツト層にクラツクが這入り易く
なり、80%を超えるとサーメツト層の金属性(金
属的性質)が失なわれNiメツキやろう接等に支
障が現われる。 The most important step in the present invention is the step () of obtaining cermet powder, which consists of Si 3 N 4 powder 50-80% (by weight, the same hereinafter) and Wc powder + Co powder 50-20%. - This is the process of obtaining Wc-Co based cermet powder by mixing. Among cermet powders, as metal powders, it is ideal that they have a chemical affinity with Si 3 N 4 (there is leakage), have good sinterability on their own, are easy to electrolytically plate, and are compatible with brazing metals. conditions, and various metal compounds that seem to meet this line, such as TiC-Ni-Mo system,
Prior to the present invention, Cr-Al 2 O 3 system, TiC-TiN-Ni-Mo system, etc. were combined with Si 3 N 4 powder and sintered (hot press sintering), but TiC-Ni-Mo system was In addition to poor mold releasability from the press mold, which is a carbon mold, the mold itself has poor sintering properties, resulting in numerous pores and cracks . In addition to being defective, there is almost no chemical bonding with the Si 3 N 4 sintered body, and in the TiC-TiN-Ni-Mo system, there is no bonding with the Si 3 N 4 sintered body. Moreover, it was found that there were drawbacks such as burning into the carbon mold. Despite these failures, it was discovered that the Wc--Co system is a suitable material in combination with Si 3 N 4 within the above-mentioned limited range. That is, if the Si 3 N 4 powder in the cermet powder in the present invention is less than 50%, the thermal expansion of the cermet layer will be too large and the base Si 3 N 4
Cracks tend to creep into the sintered body and the cermet layer, and if it exceeds 80%, the cermet layer loses its metallic properties, causing problems in Ni plating, brazing, etc.
従つて上記組成範囲は目的達成上必要である。 Therefore, the above composition range is necessary to achieve the purpose.
更にこの場合、Co粉末のWc粉末+Co粉末に対
する含有量(重量%)が1〜10%であることは次
の理由で更に望ましい。即ちCo含有量が1%よ
り小さい時はサーメツト層の焼結性に多少の悪影
響を与え、10%を超えるとサーメツト層よりCo
が滲出してくる傾向が夫々あるからである。 Furthermore, in this case, it is more desirable that the content (wt%) of the Co powder to the Wc powder+Co powder is 1 to 10% for the following reason. That is, when the Co content is less than 1%, it has a somewhat negative effect on the sinterability of the cermet layer, and when it exceeds 10%, the Co content is less than the cermet layer.
This is because they each have a tendency to ooze out.
サーメツト粉末の混合は適当な混合手段、例え
ば乳鉢混合,湿式振動ミル等で行なうが、Wc,
Coの夫々の粉末とSi3N4粉末とをMeOH中にて混
合した后MeOHを除去し、四塩化炭素CCl4中で
結合剤としての固形パラフインを約4%程加えて
その后CCl4を除去し40メツシユパスの篩別にか
けて最終的なサーメツト粉末とする混合方法を一
例として適用した。 The cermet powder is mixed using an appropriate mixing means, such as a mortar mixer or a wet vibrating mill.
After mixing Co powder and Si 3 N 4 powder in MeOH, MeOH was removed, and about 4% solid paraffin was added as a binder in carbon tetrachloride CCl 4 . A mixing method in which the cermet powder is removed and sieved through 40 mesh passes to form the final cermet powder was applied as an example.
工程()はSi3N4を粉末を冷間で比較的低圧
にて所望の形状に成形する工程で、Si3N4が80%
以上含まれているSi3N4焼結用組成物を400〜500
Kg/cm2で軽く押し固めて所望の形状に成形する。 Process () is a process in which powdered Si 3 N 4 is formed into the desired shape under relatively low pressure in cold conditions, and Si 3 N 4 is 80%
Si 3 N 4 sintering composition containing more than 400~500
Lightly press with Kg/cm 2 and form into desired shape.
工程()は工程()で得たサーメツト粉末
を工程()で得たSi3N4成形体上に粉末のまゝ
適当な厚みに加圧積層するか或は粉末を練料と共
にペースト状としたものを積層するかのいづれか
であるが、前者の場合固形パラフインの如き結合
剤を少量添加することは成形性を良くする意味で
望まれる。母体であるSi3N4焼結体との接合性を
考慮する時または厚みの大なるサーメツト層を得
るためには前者が好適であり、複雑な形状のサー
メツト層を得るには後者が望ましい。なお上記粉
末の積層はプレス成形によつて得たサーメツト成
形品をSi3N4成形体上に載置することも含む。 In step (), the cermet powder obtained in step () is laminated under pressure to an appropriate thickness on the Si 3 N 4 molded body obtained in step (), or the powder is made into a paste with a paste. In the former case, it is desirable to add a small amount of a binder such as solid paraffin to improve moldability. The former is preferable when considering the bondability with the Si 3 N 4 sintered body that is the matrix or to obtain a cermet layer with a large thickness, and the latter is preferable to obtain a cermet layer with a complicated shape. Note that the above-mentioned layering of the powder also includes placing a cermet molded product obtained by press molding on the Si 3 N 4 molded body.
工程()は工程()で得た全体をホツトプ
レスによつて焼結一体とする工程であり、通常の
カーボン型内でホツトプレスを行なう。ホツトプ
レス条件はSi3N4のホツトプレス条件と実質的に
同一でよく殊更特異なものは不要である。 Step () is a step in which the whole obtained in step () is sintered into one piece by hot pressing, and the hot pressing is carried out in an ordinary carbon mold. The hot pressing conditions may be substantially the same as those for Si 3 N 4 and no special conditions are required.
次に上記工程()乃至()を経て得られた
金属化面を有する焼結体について説明するに、第
1図はその概略斜視図、第2図は第1図のSi3N4
焼結体(母体)とサーメツト層との接合境界を示
す図面代用写真(×250)であるが、第1図の如
くSi3N4焼結体1の上面にSi3N4―Wc―Co系サー
メツト層2が焼結一体とされて本発明の焼結体が
得らる。このサーメツト層2と焼結体1との境界
線に垂直な方向からXMA線分析した写真(×
2.0K)が第3図であるが、第2図より焼結体1
とサーメツト層2とは完全に接合しており、第3
図よりサーメツト層2自体も気孔のないほぼ完全
な焼結がなされていることが判る。そしてサーメ
ツト層2よりCo及びWが焼結体1内に拡散して
強固な結合をなしていることも明らかである。 Next, to explain the sintered body having the metallized surface obtained through the above steps () to (), FIG. 1 is a schematic perspective view thereof, and FIG. 2 is the Si 3 N 4 of FIG. 1.
This is a photograph (×250) showing the bonding boundary between the sintered body (base body) and the cermet layer. As shown in Figure 1, Si 3 N 4 -Wc -Co The cermet layer 2 is integrally sintered to obtain the sintered body of the present invention. A photograph (x
2.0K) is shown in Figure 3, but from Figure 2, the sintered body 1
and cermet layer 2 are completely bonded, and the third
It can be seen from the figure that the cermet layer 2 itself is almost completely sintered without any pores. It is also clear that Co and W diffuse into the sintered body 1 from the cermet layer 2 and form a strong bond.
またサーメツト層2自体はセラミツク
(Si3N4)粒子間にWc,Co粒子を充填して焼結さ
れているため金属的な性質が強く残つているので
その電気導伝性は良好に保たれている。 Furthermore, since the cermet layer 2 itself is sintered with Wc and Co particles filled between ceramic (Si 3 N 4 ) particles, it retains strong metallic properties and maintains good electrical conductivity. ing.
こうして得られたサーメツト及びセラミツク複
合焼結体1のサーメツト層2上には電解Niメツ
キ層がよくのるので、このメツキ層上にろう材を
流して金属リードを接合したものは、従来の
Si3N4焼結体に行なつたメタライズ手法では得ら
れない程強固な接合強度をもつたリード導出構造
が得られ、例えば強度測定のため上記金属リード
としてコバー金具(Co系合金)を用いろう材と
してAgろうを使用して該コバー金具を剥離方向
に引張つた所130Kg/cm2以上の値が得られ、この
場合メタライズ面での剥離はなくSi3N4焼結体1
の内部からのクラツク発生によつて剥がれる位で
あつた。以下に本発明の実施例を挙げる。 Since the electrolytic Ni plating layer is often placed on the cermet layer 2 of the cermet and ceramic composite sintered body 1 obtained in this way, the metal lead is bonded by pouring a brazing material on this plating layer, which is different from the conventional method.
A lead lead-out structure with a bonding strength so strong that cannot be obtained with the metallization method applied to Si 3 N 4 sintered bodies can be obtained. Using Ag solder as the brazing material, when the Cobar metal fitting was pulled in the peeling direction, a value of 130 Kg/cm2 or more was obtained, and in this case, there was no peeling on the metallized surface and the Si 3 N 4 sintered body 1
It was on the verge of peeling off due to cracks occurring from within. Examples of the present invention are listed below.
(実施例 1)
工程():Wc粉末49%(9.8g)とCo粉末1%
(0.2g)からなる混合粉末の50%(10g)に対
しSi3N4粉末(既述の「SN220」)を50%(10
g)を用意し両者を乳鉢混合してサーメツト粉
末を得た。この粉末中に少量の固形パラフイン
を加えた。(Example 1) Process (): 49% Wc powder (9.8g) and 1% Co powder
Si 3 N 4 powder (already mentioned "SN220") was added to 50% (10 g) of mixed powder (0.2 g).
g) was prepared and mixed in a mortar to obtain a cermet powder. A small amount of solid paraffin was added to this powder.
工程():同じくSi3N4(SN220)のみをを型
内に入れて圧力445Kg/cm2にて軽く押し固めて
第1図のような成形体を得た。Step (): Similarly, only Si 3 N 4 (SN220) was placed in a mold and lightly pressed under a pressure of 445 kg/cm 2 to obtain a molded body as shown in FIG.
工程():工程()のパラフイン含有のサー
メツト粉末を厚み約4mm程度となるよう上記
Si3N4成形体上に加圧積層(1335Kg/cm2)し
た。Step (): Pour the paraffin-containing cermet powder from Step () above to a thickness of about 4 mm.
It was laminated under pressure (1335 Kg/cm 2 ) onto a Si 3 N 4 molded body.
工程():工程()の成形体をBN離型剤と
共にカーボン型内に充填して1660℃,430Kg/
cm2の温度と圧力にて2時間ホツトプレス焼成し
た。Step (): The molded product from Step () is filled into a carbon mold with a BN mold release agent and heated at 1660℃, 430Kg/
Hot press firing was carried out for 2 hours at a temperature and pressure of cm 2 .
メタライズとリード導出:工程()で焼結一
体としたサーメツト層上に電解Niメツキを厚み
1μに亘つて施しその上にAgロウを溶融しなが
らコバー金具をほヾ水平にろう着した。 Metallization and lead derivation: Electrolytic Ni plating was applied to a thickness of 1μ on the cermet layer that had been sintered and integrated in step (), and a cover metal fitting was brazed thereon almost horizontally while melting Ag solder.
剥離テスト:上記コバー金具を水平方向に剥離
した所130Kg/cm2の剥離強度を得た。 Peeling test: When the above-mentioned cover metal fitting was peeled off in the horizontal direction, a peel strength of 130 kg/cm 2 was obtained.
(実施例 2)
工程():Wc粉末49%とCo粉末1%からなる
混合粉末の20%に対しSi3N4粉末(既述の
「SN220」)を80%を用意し両者を乳鉢混合して
サーメツト粉末を得た。この粉末中に少量の固
形パラフインを加えた。(Example 2) Process (): For 20% of a mixed powder consisting of 49% Wc powder and 1% Co powder, prepare 80% Si 3 N 4 powder ("SN220" as described above) and mix both in a mortar. A cermet powder was obtained. A small amount of solid paraffin was added to this powder.
工程():同じくSi3N4(SN220)を圧力445
Kg/cm2にて軽く押し固めて第1図のような成形
体を得た。Process (): Si 3 N 4 (SN220) at a pressure of 445
The mixture was lightly compacted at a pressure of Kg/cm 2 to obtain a molded product as shown in FIG.
工程():工程()のパラフイン含有のサー
メツト粉末にメタノールを加えてペースト状に
し厚み約5mm程度となるよう上記Si3N4成形体
上に加圧積層(1335Kg/cm2)した。Step (): Methanol was added to the paraffin-containing cermet powder of Step () to form a paste, which was then laminated under pressure (1335 Kg/cm 2 ) on the Si 3 N 4 molded body to a thickness of approximately 5 mm.
工程():工程()の成形体をBN離型剤と
共にカーボン型内に充填して1660℃,430Kg/
cm2の温度と圧力にて2時間ホツトプレス焼成し
た。Step (): The molded product from Step () is filled into a carbon mold with a BN mold release agent and heated at 1660℃, 430Kg/
Hot press firing was carried out for 2 hours at a temperature and pressure of cm 2 .
メタライズとリード導出:工程()で焼結一
体としたサーメツト層上に電解Niメツキを厚み
1μに亘つて施しその上にAgロウを溶融しなが
らコバー金具をほぼ水平にろう着した。 Metallization and lead derivation: Electrolytic Ni plating was applied to a thickness of 1μ on the cermet layer that had been sintered and integrated in step (), and a cover metal fitting was soldered almost horizontally on top of it while melting Ag solder.
剥離テスト:上記コバー金具を水平方向に剥離
した所100Kg/cm2の剥離強度を得た。 Peeling test: When the above-mentioned cover metal fitting was peeled off in the horizontal direction, a peel strength of 100 kg/cm 2 was obtained.
叙述より既に理解されたように、本発明に於て
は、Si3N4―Wc―Co系サーメツト層と母材であ
るSi3N4焼結体とをホツトプレスにて焼結一体と
することによつて、サーメツト層がSi3N4焼結体
に化学的に強固に結合が可能となり同時にこのサ
ーメツト層の電気導伝性が良好となるため、従来
公知のメタライズ手法では得られなかつた優れた
剥離強度をもつて金属材の接合が可能となると共
に製造工程的にもホツトプレスによつて焼結一体
となし得るのでその生産性も高い…等本発明の効
果は著しいものがある。 As already understood from the description, in the present invention, the Si 3 N 4 -Wc-Co based cermet layer and the Si 3 N 4 sintered body as the base material are sintered into one piece by hot pressing. This enables the cermet layer to be chemically strongly bonded to the Si 3 N 4 sintered body, and at the same time improves the electrical conductivity of this cermet layer, which provides advantages that could not be obtained with conventional metallization methods. The effects of the present invention are remarkable, such as making it possible to join metal materials with a high peel strength, and also increasing productivity as it can be sintered into one piece by hot pressing in the manufacturing process.
第1図は本発明によつて得た焼結体の一実施例
を示す斜視図、第2図は第1図に於けるサーメツ
ト層と焼結体との接合境界の状態を示す図面に代
る顕微鏡写真(×250)、第3図は同接合境界の
XMA線分析写真(×2.0K)である。
符号の説明、1……Si3N4焼結体、2……サー
メツト層。
FIG. 1 is a perspective view showing one embodiment of a sintered body obtained by the present invention, and FIG. 2 is a substitute drawing showing the state of the bonding boundary between the cermet layer and the sintered body in FIG. 1. Micrograph (×250), Figure 3 shows the junction boundary.
This is an XMA ray analysis photograph (×2.0K). Explanation of symbols: 1...Si 3 N 4 sintered body, 2... Cermet layer.
Claims (1)
粉末の合計が50〜20%(重量)よりなるサーメツ
ト粉末を得る工程()と、Si3N4粉末を所望の
形状に加圧成形する工程()と、この工程
()によつて得られたSi3N4成形体上に上記サー
メツト粉末を加圧積層するかもしくは該サーメツ
ト粉末をペースト状にしたものを該Si3N4成形体
上に成層する工程()と、全体をホツトプレス
にて成形一体とする工程()と、より成る金属
化面を有する窒化珪素焼結体の製造法。 2 上記Co粉末の(WC+Co)粉末に対する含
有量が1〜10%(重量)である特許請求の範囲第
1項記載の製造法。[Claims] 1 Si 3 N 4 powder 50-80% (by weight), WC powder and Co
The process () of obtaining a cermet powder with a total powder content of 50 to 20% (by weight), the process () of pressure-molding the Si 3 N 4 powder into a desired shape, and the process () obtained by this process () The above cermet powder is laminated under pressure on the Si 3 N 4 molded body, or the cermet powder is made into a paste and layered on the Si 3 N 4 molded body (), and the whole is hot pressed. A method for manufacturing a silicon nitride sintered body having a metallized surface, comprising a step of integrally molding (). 2. The manufacturing method according to claim 1, wherein the content of the Co powder based on the (WC+Co) powder is 1 to 10% (by weight).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13593681A JPS5849670A (en) | 1981-08-28 | 1981-08-28 | Manufacture of silicon nitride sintered body having metallized surface |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13593681A JPS5849670A (en) | 1981-08-28 | 1981-08-28 | Manufacture of silicon nitride sintered body having metallized surface |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5849670A JPS5849670A (en) | 1983-03-23 |
JPS6224392B2 true JPS6224392B2 (en) | 1987-05-28 |
Family
ID=15163299
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13593681A Granted JPS5849670A (en) | 1981-08-28 | 1981-08-28 | Manufacture of silicon nitride sintered body having metallized surface |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5849670A (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6082005U (en) * | 1983-11-14 | 1985-06-06 | 旭化成株式会社 | wall panel mounting device |
JPH0490549U (en) * | 1990-12-21 | 1992-08-06 | ||
JP4808852B2 (en) * | 2001-01-17 | 2011-11-02 | 日本特殊陶業株式会社 | Silicon nitride / tungsten carbide composite sintered body |
-
1981
- 1981-08-28 JP JP13593681A patent/JPS5849670A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5849670A (en) | 1983-03-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100432075B1 (en) | A method of coating a non-wetting fluid material on a substrate, a method of manufacturing a ceramic metal structure, a method of bonding a plurality of ceramic bodies, and a layered structure formed by such a method | |
US20060130998A1 (en) | Heat sink having a high thermal conductivity | |
EP0122522B1 (en) | Method of manufacturing sintered ceramic body | |
WO2010116679A1 (en) | Process for producing porous sintered aluminum, and porous sintered aluminum | |
CN101925999A (en) | Heat sink and method for producing heat sink | |
CN110731543A (en) | Preparation method of microporous ceramic heating element for atomizer | |
JP2001339022A (en) | Heat sink material and its manufacturing method | |
JP4113971B2 (en) | Low expansion material and manufacturing method thereof | |
JPS6224392B2 (en) | ||
JPH0639605B2 (en) | Multi-layer sintered sliding member with cast iron backing | |
JPH0475876B2 (en) | ||
JP4017135B2 (en) | Electromagnetic cooking container and method for manufacturing the same | |
EP0593591B1 (en) | Boron carbide-copper cermets and method for making same | |
US6143421A (en) | Electronic components incorporating ceramic-metal composites | |
CN1277743C (en) | Method for producing molybdenum disilicide electric heating element or high temperature resistance structural element | |
JPH03103369A (en) | Production of cemented body of ceramic-metal | |
JP2004131318A (en) | Joined body of silicon carbide-based member and method of manufacturing the same | |
JPS60149702A (en) | Manufacture of sintered material for vacuum switch contact part | |
JPH03205389A (en) | Method for metallizing ceramics and method for joining ceramics to metal | |
JP2508157B2 (en) | Method for joining silicon carbide ceramics | |
JPH046163A (en) | Production of carrier consisting of aluminium nitride | |
TW201249565A (en) | Metal-carbon composite and method for manufacturing the same | |
JPS59141393A (en) | Brazing filler material | |
JPS5864270A (en) | Silicon nitride sintered body | |
JPS6228067A (en) | Joining method for ceramics |