JPS62229510A - Thin film magnetic head - Google Patents

Thin film magnetic head

Info

Publication number
JPS62229510A
JPS62229510A JP24706585A JP24706585A JPS62229510A JP S62229510 A JPS62229510 A JP S62229510A JP 24706585 A JP24706585 A JP 24706585A JP 24706585 A JP24706585 A JP 24706585A JP S62229510 A JPS62229510 A JP S62229510A
Authority
JP
Japan
Prior art keywords
core
magnetic
gap
magnetic core
gap depth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24706585A
Other languages
Japanese (ja)
Inventor
Sachiko Nanaumi
七海 祥子
Katsuo Konishi
小西 捷雄
Masamichi Yamada
雅通 山田
Masakatsu Saito
斉藤 正勝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP24706585A priority Critical patent/JPS62229510A/en
Publication of JPS62229510A publication Critical patent/JPS62229510A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • G11B5/3166Testing or indicating in relation thereto, e.g. before the fabrication is completed
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109Details
    • G11B5/3116Shaping of layers, poles or gaps for improving the form of the electrical signal transduced, e.g. for shielding, contour effect, equalizing, side flux fringing, cross talk reduction between heads or between heads and information tracks

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To regulate the gap depth with high accuracy by gradually increasing the core width of either of a lower magnetic core and an upper magnetic core up to a position where a desired gap depth is obtained in the gap depth direction from a tape slide face. CONSTITUTION:The 1st magnetic core 2 is increased gradually in the direction of magnetic gap depth (gd) and the gap depth (gd) is detected by measuring the core width TW2 of the 1st magnetic core. The track width of the magnetic head depends on the core width TW1 of the 2nd magnetic core and the width TW1 is constant in the direction of the gap. Further, the core width is reduced near the sliding face and the relation of TW1<TW2 exists, then the magnetic flux is reduced near the gap and the reducing effect is obtained. Since the magnetic head pattern itself controls the gap, the accuracy of gap is improved without being affected by the deviation between the polishment progressing direction and the parallelism of the magnetic head pattern and by the shape of curved face of polishment.

Description

【発明の詳細な説明】 〔発明0利用分創            2本発明は
、VTR等に好適なa膜磁気ヘッドに関する。
DETAILED DESCRIPTION OF THE INVENTION [Invention 0 Utilization Division 2] The present invention relates to an a-film magnetic head suitable for VTRs and the like.

〔発明の背景〕[Background of the invention]

磁気記録の高密度化の要求に伴い、磁気ヘッドの小型化
が進み、薄膜磁気ヘッドの開発が進められている。薄膜
磁気ヘッドは、従来の半導体製造技術を応用し、微小パ
ターンのヘッドを多数個同時に形成でき、また多トラツ
クヘッドも比較的低コストで製造できる等、多くの利点
を有している。このヘッドのギャップ深さは研摩加工に
より決定されるが、ギャップ深さは磁気ヘッドの電磁変
換効率に大きく影響するためギャップ深さ仕上げ精度を
向上することが課題であった。
With the demand for higher density magnetic recording, magnetic heads are becoming smaller and thin film magnetic heads are being developed. Thin film magnetic heads have many advantages, such as the ability to simultaneously form a large number of heads with minute patterns by applying conventional semiconductor manufacturing techniques, and the ability to manufacture multi-track heads at relatively low cost. The gap depth of this head is determined by polishing, and since the gap depth greatly affects the electromagnetic conversion efficiency of the magnetic head, it has been a challenge to improve the finishing accuracy of the gap depth.

このために、例えば特開昭56−111120号に記載
の様に、薄膜磁気ヘッドパターンに隣接して研摩量を検
知するためのマーク体を形成し、この磁気ヘッドパター
ンとマーク体の複合体を研摩して所望の磁気ギャップ深
さを得る方法が提案されている。その−例を第7図に示
す。同図において2は磁気コア、3はギャップ、4は導
体、7は上下の磁気コアの接続部、8はマーク体である
。この方法によれば、研磨面からマーク体をil察する
ことにより磁気ギャップ深さを検知することができるた
め、ギャップ深さ精度は向上する。しかしこの方法では
、研摩方向と磁気ヘッドパターンの平行度にずれが生じ
た場合に、マーク体で検知したギャップ深さと磁気ヘッ
ドパターンのギャップ深さが一致しない。また、研摩面
は一般に曲面であるため。
For this purpose, for example, as described in JP-A-56-111120, a mark body for detecting the amount of polishing is formed adjacent to a thin film magnetic head pattern, and a composite of this magnetic head pattern and mark body is formed. A method of polishing to obtain the desired magnetic gap depth has been proposed. An example thereof is shown in FIG. In the figure, 2 is a magnetic core, 3 is a gap, 4 is a conductor, 7 is a connecting portion between the upper and lower magnetic cores, and 8 is a mark body. According to this method, since the magnetic gap depth can be detected by observing the mark body from the polished surface, the gap depth accuracy is improved. However, in this method, if a deviation occurs between the polishing direction and the parallelism of the magnetic head pattern, the gap depth detected by the mark body and the gap depth of the magnetic head pattern do not match. Also, because the polished surface is generally a curved surface.

本質的にマーク体と磁気ヘッドパターンのギャップ深さ
は一致しない、さらにはヘッドパターン密度が増加し、
トラック間がさらに狭められた場合、上記の様な検出印
を入れるスペースの確保が困難となる場合もある。
Essentially, the gap depth between the mark body and the magnetic head pattern does not match, and furthermore, the head pattern density increases,
If the distance between the tracks is further narrowed, it may become difficult to secure a space for inserting the detection mark as described above.

〔発明の目的〕 本発明の目的は、上記欠点を克服し磁気ヘッドのギャッ
プ深さを高精度に規制することができる構成の簿膜磁気
磁気ヘッドを提供することにある。
[Object of the Invention] An object of the present invention is to provide a thin film magnetic head having a structure that overcomes the above-mentioned drawbacks and allows the gap depth of the magnetic head to be regulated with high precision.

〔発明の概要〕[Summary of the invention]

本発明は、薄膜磁気ヘッドパターン自体から直接磁気ギ
ャップ深さを検知するため、第1磁気コアと第2磁気コ
アのいずれか一方のコア幅を研摩進行方向に漸次増加す
る構成としたものである。
The present invention has a structure in which the core width of either the first magnetic core or the second magnetic core is gradually increased in the polishing progress direction in order to directly detect the magnetic gap depth from the thin film magnetic head pattern itself. .

〔発明の実施例〕[Embodiments of the invention]

以下、本発明の実施例を図面を用いて説明する。第1図
(a)は、本発明による薄膜磁気ヘッドの一実施例を示
す平面図、第1図(b)はA−A断面図、(C)はB−
B断面図である。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1(a) is a plan view showing an embodiment of the thin film magnetic head according to the present invention, FIG. 1(b) is a cross-sectional view taken along line A-A, and FIG.
It is a sectional view of B.

1は非磁性基板、2は第1の磁気コア、3は非磁性材か
ら成るギャップ、4はCuやA1等から成る導体、6は
第2の磁気コア、7は第1磁気コア2と第2磁気コア6
の接続部である。第1磁気コア2は磁気ギャップ深さく
gd)方向に漸次増加しており、ギャップ深さは第1磁
気コアのコア幅Tw2を測定することで検知できる。磁
気ヘッドのトラック幅は第2磁気コアのコア幅Tw工て
決まる。なおTw、はギャップ深さ方向で一定である。
1 is a non-magnetic substrate, 2 is a first magnetic core, 3 is a gap made of non-magnetic material, 4 is a conductor made of Cu, A1, etc., 6 is a second magnetic core, 7 is a first magnetic core 2 and a second magnetic core. 2 magnetic core 6
This is the connection part. The magnetic gap depth (gd) of the first magnetic core 2 gradually increases in the direction, and the gap depth can be detected by measuring the core width Tw2 of the first magnetic core. The track width of the magnetic head is determined by the core width Tw of the second magnetic core. Note that Tw is constant in the gap depth direction.

また、第1磁気コア2は摺動面付近でコア幅が減少して
おり、さらにTw□(Tw2となっているため、ギャッ
プ近傍で磁束が絞られ絞り効果が得られる。
In addition, the first magnetic core 2 has a core width reduced near the sliding surface, and furthermore, Tw□ (Tw2), so that the magnetic flux is narrowed near the gap, resulting in a throttling effect.

本発明では、上記のように磁気ヘッドパターン自体でギ
ャップ深さを制御することができるため、研摩進行方向
と磁気ヘッドパターンの平行度のずれや研摩の曲面形状
の影響を受けることなく、ギャップ深さ精度が向上する
In the present invention, since the gap depth can be controlled by the magnetic head pattern itself as described above, the gap depth can be controlled without being affected by the deviation in parallelism between the polishing progress direction and the magnetic head pattern or the curved shape of the polishing surface. accuracy is improved.

次に第2図により上記実施例の製造方法を説明する。第
2図は第1図のC−C断面部分を示す要部断面図である
Next, the manufacturing method of the above embodiment will be explained with reference to FIG. FIG. 2 is a cross-sectional view of a main part showing a section taken along the line CC in FIG. 1.

(a)  非磁性基板1上に第1の磁気コアとなる磁性
薄膜を蒸着やスパッタ等で形成、エツチングにより所望
のパターンに第1磁気コア2を形成する。
(a) A magnetic thin film that will become a first magnetic core is formed on a nonmagnetic substrate 1 by vapor deposition, sputtering, etc., and a first magnetic core 2 is formed in a desired pattern by etching.

(b)  ギャップ材3.導体4.絶縁層5を形成する
(b) Gap material 3. Conductor 4. An insulating layer 5 is formed.

(c)  第2磁気コアとなる磁性薄膜を蒸着やスパッ
タ等で形成し、エツチングを行ない所定形状の第2磁気
コア6を形成する。
(c) A magnetic thin film that will become the second magnetic core is formed by vapor deposition, sputtering, etc., and etched to form the second magnetic core 6 in a predetermined shape.

(d)  薄膜磁気ヘッドパターンの1チツプ毎に切断
し、テープ摺動を研摩し、ギャップ深さを決定する。第
1磁気コア2のコア幅Tw、は研摩の方向に漸時増加し
ているため、Tw2を測定することによりギャップ深さ
を検知することができる。
(d) Cut each chip of the thin film magnetic head pattern, polish the tape slide, and determine the gap depth. Since the core width Tw of the first magnetic core 2 gradually increases in the polishing direction, the gap depth can be detected by measuring Tw2.

上記実施例では1チツプについてのみ示したが、実際に
は同一基板上に多数個のチップを配置し、(C)に示し
た工程までは基板上で同時に処理する。
In the above embodiment, only one chip is shown, but in reality, a large number of chips are arranged on the same substrate, and the processes up to the step shown in (C) are performed simultaneously on the substrate.

第3図は本発明の他の実施例で、第2磁気コア6のコア
幅を変化させた例である。研摩時のギャップ深さは第2
磁気コア6のコア幅から検知できる。
FIG. 3 shows another embodiment of the present invention, in which the core width of the second magnetic core 6 is changed. Gap depth during polishing is 2nd
It can be detected from the core width of the magnetic core 6.

本発明は多トラツクヘッドにも有効であり、2トラツク
ヘツドに適用した例を第4図に示す。
The present invention is also effective for multi-track heads, and an example applied to a two-track head is shown in FIG.

2a、2bは第1磁気コア、3a、3bはギャップ、4
a、4bは導体、6a、6bは第2磁気コアである。本
実施例では第1磁気コア2a。
2a, 2b are first magnetic cores, 3a, 3b are gaps, 4
a and 4b are conductors, and 6a and 6b are second magnetic cores. In this embodiment, the first magnetic core 2a.

2bのコア幅を変化させた構成としたが、第2磁気コア
6a、6bのコア幅を変化させてもよい。
Although the core width of the second magnetic core 2b is changed, the core width of the second magnetic cores 6a and 6b may be changed.

第5図には、所望のギャップ深さgdを得る位置で第1
磁気コア2と第2磁気コア6のコア幅が一致する構造と
した本発明の実施例を示す。
In FIG. 5, the first
An embodiment of the present invention is shown in which the magnetic core 2 and the second magnetic core 6 have a structure in which the core widths are the same.

図には摺動面の研摩を行なう前のへラドチップを示した
。2点破線で示した位置まで研摩すると第1磁気コア2
と第2磁気コア6のコア幅は等しくなり、また所望のギ
ャップ深さを得る。
The figure shows the Herad tip before the sliding surface was polished. When polished to the position indicated by the two-dot broken line, the first magnetic core 2
The core widths of the second magnetic core 6 and the second magnetic core 6 are made equal, and a desired gap depth is obtained.

本実施例においては、研摩終了時に2つの磁気コア幅が
一致するため研摩終了の判定が容易となる。なお、第5
図には第1の磁気コア2のコア幅を変化させた例を示し
たが、第2磁気コア6のコア幅が変化する構成としても
よい。
In this embodiment, since the widths of the two magnetic cores match at the end of polishing, it is easy to determine whether polishing is complete. Furthermore, the fifth
Although the figure shows an example in which the core width of the first magnetic core 2 is changed, a configuration in which the core width of the second magnetic core 6 is changed may also be used.

第6図には、第1磁気コア2と第2磁気コア6の両方の
コア幅を変化させた例を示す。トラック幅Tw□は2つ
のコアの重なり部分で決まり、テープ摺動面の研摩進行
方向に対し一定で、変化しない。また、ギャップ深さは
2つのコアのずれTw3,7w4から検知することがで
きる。
FIG. 6 shows an example in which the core widths of both the first magnetic core 2 and the second magnetic core 6 are changed. The track width Tw□ is determined by the overlapping portion of the two cores, and is constant and does not change with respect to the polishing progress direction of the tape sliding surface. Further, the gap depth can be detected from the deviations Tw3 and 7w4 between the two cores.

本実施例では、第1磁気コア2と第2磁気コア6の両方
のコア幅がトラック幅Tw□より大きいため、2つの磁
気コアについてギャップ部での磁束絞り効果が得られる
In this embodiment, since the core widths of both the first magnetic core 2 and the second magnetic core 6 are larger than the track width Tw□, a magnetic flux throttling effect can be obtained in the gap between the two magnetic cores.

以上述べてきたように、本発明によれば磁気ヘッドパタ
ーンから直接ギャップ深さを検知できるために、ギャッ
プ深さを高精度に規制することができる。また、磁束の
絞り効果により磁気ヘッドの性能を向上することができ
る。
As described above, according to the present invention, since the gap depth can be detected directly from the magnetic head pattern, the gap depth can be regulated with high precision. Furthermore, the performance of the magnetic head can be improved due to the magnetic flux throttling effect.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、薄膜磁気ヘッドパターンにおいて、1
つの磁気コアのコア幅がテープ摺動面の研摩方向に漸次
増加する構成としたことにより磁気ギャップ深さが磁気
ヘッドパターン自体から検知できるので、ギャップ深さ
を高精度に規制することができる。
According to the present invention, in the thin film magnetic head pattern, 1
By adopting a configuration in which the core width of the two magnetic cores gradually increases in the polishing direction of the tape sliding surface, the magnetic gap depth can be detected from the magnetic head pattern itself, so that the gap depth can be regulated with high precision.

【図面の簡単な説明】[Brief explanation of drawings]

第1図(a)は本発明の実施例を示す平面図、第1図(
b)は本発明の実施例を示す第1図(a)のA−A線断
面図、第1図(C)は本発明の実施例を示す第1図(a
)のB−B線断面図、第2図はその製造方法を示す第1
図(a)のC−C線断面図、第3図と第4図は本発明の
実施例を示す平面図、第5図は磁気記録パターンを示す
平面図、第6図は従来例を示す平面図である。 1・・・非磁性囲板、2・・・第1磁気コア、3・・・
ギャップ、4・・・導体、6・−・第2磁気コア第 2
 図 嶌3図 塔 4 図 第 5 図 第 6 図 (α)(b) 手続補正書(方式) 事件の表示 昭和60  年特許願第  247065 号発明の名
称  薄膜磁気ヘッド 補正をする者 譜とのl係 特許出願人 名 称  (510)株式会+1  日 立 製 作 
折代  理   人
FIG. 1(a) is a plan view showing an embodiment of the present invention;
b) is a sectional view taken along the line A-A in FIG. 1(a) showing an embodiment of the present invention, and FIG. 1(C) is a cross-sectional view of FIG.
), and Figure 2 is a sectional view taken along line B-B of
3 and 4 are plan views showing the embodiment of the present invention, FIG. 5 is a plan view showing the magnetic recording pattern, and FIG. 6 is a conventional example. FIG. DESCRIPTION OF SYMBOLS 1... Non-magnetic surrounding plate, 2... First magnetic core, 3...
Gap, 4...Conductor, 6...Second magnetic core 2nd
Figure 3 Figure Tower 4 Figure 5 Figure 6 Figure 6 (α) (b) Procedural amendment (method) Indication of the case 1985 Patent Application No. 247065 Title of the invention Information on the person who corrects the thin film magnetic head Patent applicant name (510) Co., Ltd. +1 Manufactured by Hitachi
Oriyo Masato

Claims (1)

【特許請求の範囲】 1、非磁性基板と下部磁気コアと非磁性スペーサー(ギ
ャップ)と導体と絶縁層と上部磁気コアを堆積して成る
薄膜磁気ヘッドにおいて、該下部磁気コアと該上部磁気
コアのいずれか一方のコア幅が、テープ摺動面からギャ
ップ深さ方向に少なくとも所望のギャップ深さを得る位
置まで漸次増加する構成としたことを特徴とする薄膜磁
気ヘッド。 2、所望のギャップ深さを得る位置で前記下部磁気コア
と前記上部磁気コアのコア幅が一致する構成としたこと
を特徴とする特許請求の範囲第1項記載の薄膜磁気ヘッ
ド。 3、前記該下部磁気コアと該上部磁気コア双方のコア幅
が、テープ摺動面からギャップ深さ方向に少なくとも所
望のギャップ深さを得る位置まで漸次増加し互のコアの
オーバラップ幅はギャップ深さ方向に一定となる構成と
したことを特徴とする特許請求の範囲第1項記載の薄膜
磁気ヘッド。
[Claims] 1. A thin film magnetic head comprising a nonmagnetic substrate, a lower magnetic core, a nonmagnetic spacer (gap), a conductor, an insulating layer, and an upper magnetic core, the lower magnetic core and the upper magnetic core. 1. A thin film magnetic head characterized in that the core width of either one of the above gradually increases in the gap depth direction from the tape sliding surface to a position at least at which a desired gap depth is obtained. 2. The thin film magnetic head according to claim 1, wherein the core widths of the lower magnetic core and the upper magnetic core match at a position where a desired gap depth is obtained. 3. The core widths of both the lower magnetic core and the upper magnetic core gradually increase from the tape sliding surface in the gap depth direction to a position where at least a desired gap depth is obtained, and the overlap width of the mutual cores increases as the gap width increases. The thin film magnetic head according to claim 1, characterized in that the thickness is constant in the depth direction.
JP24706585A 1985-11-06 1985-11-06 Thin film magnetic head Pending JPS62229510A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24706585A JPS62229510A (en) 1985-11-06 1985-11-06 Thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24706585A JPS62229510A (en) 1985-11-06 1985-11-06 Thin film magnetic head

Publications (1)

Publication Number Publication Date
JPS62229510A true JPS62229510A (en) 1987-10-08

Family

ID=17157899

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24706585A Pending JPS62229510A (en) 1985-11-06 1985-11-06 Thin film magnetic head

Country Status (1)

Country Link
JP (1) JPS62229510A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0536032A2 (en) * 1991-09-30 1993-04-07 Quantum Corporation Thin film read/write head for minimizing erase fringing and method of making the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0536032A2 (en) * 1991-09-30 1993-04-07 Quantum Corporation Thin film read/write head for minimizing erase fringing and method of making the same
EP0536032A3 (en) * 1991-09-30 1994-03-02 Digital Equipment Corp

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