JPS62195665A - Production of photosensitive lithographic printing plate - Google Patents
Production of photosensitive lithographic printing plateInfo
- Publication number
- JPS62195665A JPS62195665A JP3685186A JP3685186A JPS62195665A JP S62195665 A JPS62195665 A JP S62195665A JP 3685186 A JP3685186 A JP 3685186A JP 3685186 A JP3685186 A JP 3685186A JP S62195665 A JPS62195665 A JP S62195665A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive resin
- emulsion
- printing plate
- lithographic printing
- photosensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 239000011347 resin Substances 0.000 claims abstract description 41
- 229920005989 resin Polymers 0.000 claims abstract description 41
- OERNJTNJEZOPIA-UHFFFAOYSA-N zirconium nitrate Chemical compound [Zr+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O OERNJTNJEZOPIA-UHFFFAOYSA-N 0.000 claims abstract description 23
- 239000000839 emulsion Substances 0.000 claims abstract description 22
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 20
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 20
- 239000003960 organic solvent Substances 0.000 claims description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 12
- 239000007864 aqueous solution Substances 0.000 claims description 10
- 238000009835 boiling Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 4
- 238000001704 evaporation Methods 0.000 claims 1
- 239000011248 coating agent Substances 0.000 abstract description 9
- 238000000576 coating method Methods 0.000 abstract description 9
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 abstract description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 6
- 229910052782 aluminium Inorganic materials 0.000 abstract description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 5
- 239000011888 foil Substances 0.000 abstract description 5
- 239000001301 oxygen Substances 0.000 abstract description 5
- 229910052760 oxygen Inorganic materials 0.000 abstract description 5
- 239000002985 plastic film Substances 0.000 abstract description 5
- 229920006255 plastic film Polymers 0.000 abstract description 5
- 229920000728 polyester Polymers 0.000 abstract description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 abstract description 3
- 239000008096 xylene Substances 0.000 abstract description 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 abstract 2
- 239000002904 solvent Substances 0.000 abstract 2
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 abstract 1
- 230000001681 protective effect Effects 0.000 abstract 1
- 230000035945 sensitivity Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 12
- 238000001035 drying Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 4
- 239000000123 paper Substances 0.000 description 4
- 239000011241 protective layer Substances 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000003431 cross linking reagent Substances 0.000 description 3
- 238000000586 desensitisation Methods 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- -1 ethylhenzene Chemical compound 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- 230000005012 migration Effects 0.000 description 2
- 238000013508 migration Methods 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- 229920003169 water-soluble polymer Polymers 0.000 description 2
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical class [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- ZZAGLMPBQOKGGT-UHFFFAOYSA-N [4-[4-(4-prop-2-enoyloxybutoxy)benzoyl]oxyphenyl] 4-(4-prop-2-enoyloxybutoxy)benzoate Chemical group C1=CC(OCCCCOC(=O)C=C)=CC=C1C(=O)OC(C=C1)=CC=C1OC(=O)C1=CC=C(OCCCCOC(=O)C=C)C=C1 ZZAGLMPBQOKGGT-UHFFFAOYSA-N 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- 150000008049 diazo compounds Chemical class 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 230000005923 long-lasting effect Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
Abstract
Description
【発明の詳細な説明】
（イ）産業上の利用分野
本発明は、支持体上に感光性樹脂が塗布された感光性平
版印刷版材に関するものである。DETAILED DESCRIPTION OF THE INVENTION (a) Field of Industrial Application The present invention relates to a photosensitive lithographic printing plate material having a support coated with a photosensitive resin.
（ロ）従来の技術及び発明が解決しようとする問題点
従来より、光硬化型樹脂（ネガ型感光性樹脂）や光分解
型樹脂（ポジ型感光性樹脂）を支持体上に塗布した感光
性平版印刷版材が各極用いられている。感光性樹脂は光
によって反応し、その性質が変化する樹脂のことである
が、感光性樹脂の種類、特に光硬化型樹脂（ネガ型感光
性樹脂）において樹脂組成中に不飽和化合物を含有する
ものは光でラジカル重合する際、空気中の酸素による重
合阻害が起こり、結果として減感してしまうことがあっ
た。減感すると、印刷版の製造に当たってより多量の光
エネルギーを必要とし製版時間が延長され平版印刷版の
作成に長時間を要し生産性が低下するという欠点を生じ
る。(b) Problems to be solved by conventional techniques and inventions Conventionally, photosensitive resins in which a photocurable resin (negative photosensitive resin) or a photodegradable resin (positive photosensitive resin) is coated on a support have been used. A variety of lithographic printing plate materials are used. Photosensitive resins are resins that react with light and change their properties, but types of photosensitive resins, especially photocurable resins (negative photosensitive resins), contain unsaturated compounds in the resin composition. When things undergo radical polymerization with light, polymerization can be inhibited by oxygen in the air, resulting in desensitization. Desensitization results in disadvantages in that a larger amount of light energy is required to produce the printing plate, prolonging the plate making time, requiring a longer time to produce the lithographic printing plate, and reducing productivity.
このような空気中の酸素の影響を防止するため、感光性
樹脂層の表面に更に保護層として水溶性高分子層を塗布
することが行われている。しかし、これは支持体上に感
光性樹脂を塗布、乾燥し更にその後水溶性高分子溶液を
塗布しなければならず、感光性平版印刷版材の製造が煩
雑であるという欠点を有している。In order to prevent such effects of oxygen in the air, a water-soluble polymer layer is further applied as a protective layer on the surface of the photosensitive resin layer. However, this method has the disadvantage that the photosensitive lithographic printing plate material is complicated to manufacture because it requires coating the support with a photosensitive resin, drying it, and then coating it with a water-soluble polymer solution. .
そこで、本発明は支持体上に一回塗布するのみで感光性
樹脂層上に保護層を設けることができる感光性平版印刷
版材の製造方法を提供しようとするものである。Therefore, the present invention aims to provide a method for producing a photosensitive lithographic printing plate material, which allows a protective layer to be provided on a photosensitive resin layer by just one coating on a support.
（ハ）問題点を解決するだめの手段及び作用即ち本発明
は、ポリビニルアルコールと硝酸ジルコニウムとよりな
る水溶液中に、沸点１００〜１５０℃の有機溶剤に溶解
させた感光性樹脂を分散してエマルジョンを作成し、次
いで該エマルジョンを支持体上に塗布した後乾燥して水
及び有機溶剤を蒸発させることを特徴とする感光性平版
印刷版材の製造方法に係るものである。(c) Means and action for solving the problems, that is, the present invention is an emulsion in which a photosensitive resin dissolved in an organic solvent having a boiling point of 100 to 150° C. is dispersed in an aqueous solution of polyvinyl alcohol and zirconium nitrate. The present invention relates to a method for producing a photosensitive lithographic printing plate material, which is characterized in that the emulsion is prepared, and then the emulsion is coated on a support and then dried to evaporate water and organic solvent.
まず本発明においては、ポリビニルアルコールと硝酸ジ
ルコニウムを含有する水溶液を準備する。First, in the present invention, an aqueous solution containing polyvinyl alcohol and zirconium nitrate is prepared.
ポリビニルアルコール及び硝酸ジルコニウムは水溶性で
あるため水に溶解する。硝酸ジルコニウムは水が蒸発し
ポリビニルアルコール膜が形成された時、ポリビニルア
ルコールとキレート化合物を生成し、ポリビニルアルコ
ールの吸湿性を低下させる作用をするものである。本発
明において作成する水溶液の組成割合は、ポリビニルア
ルコール１００重量部に対して硝酸ジルコニウム２〜１
０重量部程度が好ましい。また、水の割合はポリビニル
アルコール１００重量部に対して１５００〜５０００重
量部程度が好ましい。Polyvinyl alcohol and zirconium nitrate are water-soluble and therefore dissolve in water. Zirconium nitrate forms a chelate compound with polyvinyl alcohol when water evaporates and a polyvinyl alcohol film is formed, thereby reducing the hygroscopicity of polyvinyl alcohol. The composition ratio of the aqueous solution prepared in the present invention is 2 to 1 part by weight of zirconium nitrate to 100 parts by weight of polyvinyl alcohol.
It is preferably about 0 parts by weight. The proportion of water is preferably about 1,500 to 5,000 parts by weight per 100 parts by weight of polyvinyl alcohol.
この水溶液中に沸点１００〜１５０℃の有機溶剤に溶解
させた感光性樹脂を分散させてエマルジョンを作成する
。沸点１００〜１５０℃の有機溶剤としては、キシレン
、エチルヘンゼン、トルエン等カ用いられる。ここで、
沸点１００℃以上の有機溶剤を用いる理由は、乾燥工程
で水を先に蒸発させるためである。また感光性樹脂とし
ては、ジアゾ化合物、キノンジアジド化合物、アジド化
合物、Ｐ−フユニレンジアクリル酸構成を持つ光二量型
ポリエ ゛ステル、不飽和ポリエステル等のポ
リマーとポリエチレングリコールジアクリレート等とか
らなるもの、ポリエステルアクリレート、ポリエーテル
アクリレート、ペンタエリスリトールトリアクリレート
、ポリウレタンアクリレート、エポキシアクリレート等
の多官能ビニル基を持つオリゴマーからなるもの等が用
いられる。光ラジカル重合型樹脂を含有してなる場合に
は、ベンゾイン、２−エチルアンスラキノン、ベンゾイ
ンエチルエーテル。A photosensitive resin dissolved in an organic solvent having a boiling point of 100 to 150° C. is dispersed in this aqueous solution to prepare an emulsion. As the organic solvent having a boiling point of 100 to 150°C, xylene, ethylhenzene, toluene, etc. are used. here,
The reason for using an organic solvent with a boiling point of 100°C or higher is to evaporate water first in the drying process. In addition, photosensitive resins include those made of polymers such as diazo compounds, quinone diazide compounds, azide compounds, photodimeric polyesters having a P-fuylene diacrylic acid structure, unsaturated polyesters, and polyethylene glycol diacrylate, etc. Those made of oligomers having polyfunctional vinyl groups such as polyester acrylate, polyether acrylate, pentaerythritol triacrylate, polyurethane acrylate, and epoxy acrylate are used. When containing a photoradical polymerizable resin, benzoin, 2-ethyl anthraquinone, benzoin ethyl ether.
ジ−ｔ−ブチルパーオキシド、アゾビスイソブチロニト
リル、ジベンゾチアゾリルスルフィド等の光重合開始剤
を併用して感光性樹脂とするのが好ましく、また非架橋
型樹脂の場合にはジエチレングリコールジアクリレート
等の架橋剤を併用して感光性樹脂とするのが好ましい。It is preferable to use a photopolymerization initiator such as di-t-butyl peroxide, azobisisobutyronitrile, or dibenzothiazolyl sulfide to make a photosensitive resin, and in the case of a non-crosslinked resin, diethylene glycol di It is preferable to use a crosslinking agent such as acrylate in combination to form a photosensitive resin.
感光性樹脂を溶解させる有機溶剤の量は、感光性樹脂１
００重量部に対して２００〜４００重量部程度が好まし
い。また、ポリビニルアルコール及び硝酸ジルコニウム
を溶解させた水溶液と感光性樹脂を溶解させた有機溶剤
との配合割合は、前者が１００重量部に対して後者は５
０〜１００ｉ量部程度が好ましく、このような割合の場
合０／Ｗ型エマルジヨンが得られる。The amount of organic solvent for dissolving the photosensitive resin is 1
It is preferably about 200 to 400 parts by weight per 00 parts by weight. Furthermore, the blending ratio of the aqueous solution in which polyvinyl alcohol and zirconium nitrate are dissolved and the organic solvent in which the photosensitive resin is dissolved is 100 parts by weight for the former and 5 parts by weight for the latter.
Approximately 0 to 100 parts by weight is preferable, and in the case of such a ratio, an 0/W type emulsion can be obtained.
次いで得られたエマルジョンを支持体に塗布する。支持
体としては、アルミニウム箔又は板、プラスチックスフ
ィルム、紙等が用いられる。又、アルミニウム箔とプラ
スチックスフィルム、アルミニウム箔と紙１ プラスチ
ックスフィルムと紙とを貼合した二層構造物やアルミニ
ウム箔とプラスチックスフィルムと紙とを貼合した三層
構造物等も用いることができる。The resulting emulsion is then applied to a support. As the support, aluminum foil or plate, plastic film, paper, etc. are used. In addition, a two-layer structure in which aluminum foil and plastic film, aluminum foil, paper, plastic film and paper are laminated together, and a three-layer structure in which aluminum foil, plastic film and paper are laminated can also be used. I can do it.
支持体にエマルジョンが塗布された後、このエマルジョ
ンを乾燥する。乾燥温度は適宜法められるが、１００℃
より若干高温が好ましく、１１０〜１４０℃程度が好ま
しい。この乾燥工程において水と有機溶剤が蒸発する。After the emulsion has been applied to the support, the emulsion is dried. Drying temperature is determined as appropriate, but 100℃
A slightly higher temperature is preferable, and about 110 to 140°C is preferable. During this drying process, water and organic solvent evaporate.
有機溶剤の沸点はｉｏｏ ’ｃ以上であるから、水の沸
点より高く水が先に蒸発することになる。これにより、
いわゆるマイグレーシコン効果で水に溶解しているポリ
ビニルアルコールと硝酸ジルコニウムはエマルジョンの
上層即ち表面に移行して、ポリビニルアルコール膜が形
成される。そして、感光性樹脂はエマルジョンの下層即
ち支持体と接触している側に留まることになる。従って
、得られた感光性平版印刷版材は支持体上に主に感光性
樹脂が存在し、感光性樹脂層上に主にポリビニルアルコ
ール膜が存在スることになる。Since the boiling point of the organic solvent is above ioo'c, it is higher than the boiling point of water, and water evaporates first. This results in
Due to the so-called migration effect, polyvinyl alcohol and zirconium nitrate dissolved in water migrate to the upper layer or surface of the emulsion, forming a polyvinyl alcohol film. The photosensitive resin then remains in the lower layer of the emulsion, that is, the side that is in contact with the support. Therefore, in the obtained photosensitive lithographic printing plate material, the photosensitive resin is mainly present on the support, and the polyvinyl alcohol film is mainly present on the photosensitive resin layer.
（ニ）実施例 まず下記の組成よりなる水溶液を作成した。(d) Examples First, an aqueous solution having the following composition was prepared.
ポリビニルアルコール（信越化学工業１１１製Ｃ−１７
）３重量部
硝酸ジルコニウム ０．２重量部水
１００ｆｉｆ
ｉ部次いでこの水溶液６０重量部を攪拌しながら、下記
組成よりなる感光製樹脂を溶解させた有機溶剤を４０重
量部加えてＯ／Ｗ型エマルジョンを作成した。Polyvinyl alcohol (C-17 manufactured by Shin-Etsu Chemical Co., Ltd. 111)
) 3 parts by weight Zirconium nitrate 0.2 parts by weight Water
100fif
Next, to 60 parts by weight of this aqueous solution, 40 parts by weight of an organic solvent in which a photosensitive resin having the following composition was dissolved was added to 60 parts by weight of this aqueous solution to prepare an O/W emulsion.
ポリエステルアクリレート（サンノブコ■製フォトマー
５０１８） １５重量部アクリル
系樹脂（ポリブタジェン−メチルメタアクリレート−ス
チレン−アクリル酸四元共重合体、分子量約３５０００
） １０重量部架橋剤（共栄社油脂■製Ｔ
ＭＰ） ５重量部架橋剤（共栄社油脂■！！！
２ＥＧ） ５重量部光重合開始剤（ベンゾイ
ン）０．５重量部光重合開始剤（２−エチルアンスラキ
ノン）０．５重量部
キシレン １００重量部このよ
うにして得られたエマルジョンを＃８のバーコーターを
用いて、予め脱脂して表面目立てされた０、２５１厚の
アルミニウム板上に塗布した後、温度１２０℃の熱風乾
燥機にて１分間乾燥し、感光性平版印刷版材をｉ４た。Polyester acrylate (Photomer 5018 manufactured by San Nobuco ■) 15 parts by weight Acrylic resin (polybutadiene-methyl methacrylate-styrene-acrylic acid quaternary copolymer, molecular weight approximately 35,000
) 10 parts by weight crosslinking agent (Kyoeisha Yushi ■ T
MP) 5 parts by weight crosslinking agent (Kyoeisha Yushi■!!!
2EG) 5 parts by weight Photoinitiator (benzoin) 0.5 parts by weight Photoinitiator (2-ethyl anthraquinone) 0.5 parts by weight xylene 100 parts The emulsion thus obtained was placed in a #8 bar. Using a coater, the coating was applied onto a 0.251-thick aluminum plate whose surface had been previously degreased and polished, and then dried for 1 minute in a hot air dryer at a temperature of 120° C. to obtain a photosensitive lithographic printing plate material.
この感光性平版印刷版材を暗室にて３日間そのまま放置
した。その後、この感光性平版印刷版材にネガフィルム
を重ねて２にｗ超高圧水銀灯を用いて露光した後、現像
液（日本製箔■製Ｎ−２２１）を用いて現像し、水洗し
て平版印刷版を得た。この平版印刷版には鮮明な画像が
形成されており、この平版印刷版を用いて印刷機（小株
印刷機械＠製オフセント印刷機）にて印刷した結果、再
現性の良好な印刷物１０万枚を得ることができた。This photosensitive lithographic printing plate material was left as it was in a dark room for 3 days. Thereafter, a negative film was layered on this photosensitive lithographic printing plate material, exposed to light using an ultra-high pressure mercury lamp, developed using a developer (N-221 manufactured by Nihon Seifaku ■), washed with water, and plated. Got the print version. A clear image is formed on this lithographic printing plate, and as a result of printing with a printing machine (Offcent printing machine manufactured by Kobu Printing Machinery Co., Ltd.) using this lithographic printing plate, 100,000 prints with good reproducibility were printed. I was able to get
（ホ）発明の効果
本発明に係る感光性平版印刷版材の製造方法は、ポリビ
ニルアルコールと硝酸ジルコニウムとよりなる水溶液中
に沸点１００℃以上の有機溶剤に？８解させた感光！！
！樹脂を分散させたエマルジョンを支持体上に塗布し、
その後乾燥することにより、水が先に蒸発しいわゆるマ
イグレーション効果によってポリビニルアルコールが塗
布されたエマルジョンの上層に偏在し、感光性樹脂が塗
布されたエマルジョンの下Ｎ（支持体と接触している側
）に偏在することになる。従って、感光性樹脂層の上に
ポリビニルアルコール膜が積層された状態になり、空気
中の酸素が感光性樹脂のラジカル重合を阻害することが
ないので、露光時に減感することがなく、また長期間放
置しておいても空気中の酸素の影響によって減感するこ
とがない。(E) Effects of the Invention The method for producing the photosensitive lithographic printing plate material according to the present invention is to add an organic solvent having a boiling point of 100° C. or higher to an aqueous solution of polyvinyl alcohol and zirconium nitrate. 8. Photosensitivity that made me understand! !
! An emulsion in which resin is dispersed is applied onto a support,
After that, by drying, water evaporates first and due to the so-called migration effect, it is unevenly distributed in the upper layer of the emulsion coated with polyvinyl alcohol, and the lower N (side in contact with the support) of the emulsion coated with the photosensitive resin. It will be unevenly distributed. Therefore, a polyvinyl alcohol film is laminated on top of the photosensitive resin layer, and oxygen in the air does not inhibit the radical polymerization of the photosensitive resin, so there is no desensitization during exposure, and there is no long-lasting effect. Even if left for a long period of time, it will not become desensitized due to the influence of oxygen in the air.
また本発明の方法によれば、支持体に一回塗布するのみ
で感光性樹脂層上にポリビニルアルコールよりなる保護
層が形成できるので、従来の如く感光性樹脂の塗布とポ
リビニルアルコールの塗布とを二回行うことがなく、感
光性平版印刷版材の製造を合理化することができるとい
う特有の効果を奏する。Furthermore, according to the method of the present invention, a protective layer made of polyvinyl alcohol can be formed on the photosensitive resin layer by just one coating on the support, so that it is possible to form a protective layer made of polyvinyl alcohol on the photosensitive resin layer, so that the coating of the photosensitive resin and the coating of polyvinyl alcohol are not necessary as in the conventional method. This has the unique effect of streamlining the production of photosensitive lithographic printing plate materials without having to perform the process twice.
Claims (1)
溶液中に、沸点１００〜１５０℃の有機溶剤に溶解させ
た感光性樹脂を分散してエマルジョンを作成し、次いで
該エマルジョンを支持体上に塗布した後乾燥して水及び
有機溶剤を蒸発させることを特徴とする感光性平版印刷
版材の製造方法。An emulsion is prepared by dispersing a photosensitive resin dissolved in an organic solvent with a boiling point of 100 to 150°C in an aqueous solution of polyvinyl alcohol and zirconium nitrate, and then the emulsion is coated on a support and dried. A method for producing a photosensitive lithographic printing plate material, the method comprising evaporating water and an organic solvent.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3685186A JPS62195665A (en) | 1986-02-21 | 1986-02-21 | Production of photosensitive lithographic printing plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3685186A JPS62195665A (en) | 1986-02-21 | 1986-02-21 | Production of photosensitive lithographic printing plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62195665A true JPS62195665A (en) | 1987-08-28 |
| JPH0473941B2 JPH0473941B2 (en) | 1992-11-25 |
Family
ID=12481273
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3685186A Granted JPS62195665A (en) | 1986-02-21 | 1986-02-21 | Production of photosensitive lithographic printing plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62195665A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS635345A (en) * | 1986-06-25 | 1988-01-11 | Nippon Foil Mfg Co Ltd | Production of photosensitive lithographic printing plate |
| JPS6363031A (en) * | 1986-09-04 | 1988-03-19 | Fuji Photo Film Co Ltd | Photosensitive composition |
| EP0703499A1 (en) * | 1994-09-23 | 1996-03-27 | Minnesota Mining And Manufacturing Company | Top coats for shoot and run printing plates |
-
1986
- 1986-02-21 JP JP3685186A patent/JPS62195665A/en active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS635345A (en) * | 1986-06-25 | 1988-01-11 | Nippon Foil Mfg Co Ltd | Production of photosensitive lithographic printing plate |
| JPS6363031A (en) * | 1986-09-04 | 1988-03-19 | Fuji Photo Film Co Ltd | Photosensitive composition |
| EP0703499A1 (en) * | 1994-09-23 | 1996-03-27 | Minnesota Mining And Manufacturing Company | Top coats for shoot and run printing plates |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0473941B2 (en) | 1992-11-25 |
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