JPS62193120A - Exposure system - Google Patents

Abstract

PURPOSE:To improve resolution and productivity, by providing a light transmitting body, which is displaced in the direction intersecting a light path, and has a rough surface between a light source and an original plate. CONSTITUTION:A light transmitting body 6, which has a rough surface 6a, is linearly displaced and reciprocated in the direction intersecting a light path of light 4 by a driving mechanism. The light transmitting body 6 is provided between a light source 3 and an original plate 5. Therefore, spatial interference of the light 4 of such as laser having relatively short wavelength e.g., is decreased. Occurrence of interference fringe due to excessively good spatial interference and the resultant unclear profile of a figure, which is transferred on a material 1 to be exposed from the original plate 5, is avoided. The figure on the original plate 5 is transferred to the material 1 to be exposed by the light 4. Thus the exposing time is shortened, and the resolution of the figure, which is transferred from the original plate to the material to be exposed, can be improved without impairing productivity.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an exposure technique, and particularly to a technique that is effective when applied to a wafer exposure technique in the manufacture of conductor devices.

[Prior art] Regarding wafer exposure technology in the manufacture of semiconductor devices, see Kogyo Kenkyukai Co., Ltd., published November 10, 1980,
[Electronic materials 4 November 1981 issue special issue, P103-P1
09, is described.

By the way, the present inventor studied wafer light exposure technology. The following is a technology considered by the present inventor, although it is not a publicly known technology, and its outline is as follows.

In other words, by using a laser with a relatively short wavelength to expose the wafer, the resolution of the figure transferred from the original plate such as a photomask to the wafer can be improved, and the illuminance of the light irradiated onto the wafer can be increased, thereby reducing the amount of light per unit time. This allows for an increase in the number of wafers to be exposed.

[Problems to be Solved by the Invention] However, when exposing a wafer using a laser, due to the good spatial coherence, which is an inherent characteristic of the laser, it is difficult to install a laser on a photomask etc. There is a drawback that interference fringes are likely to occur near the boundary between the light-shielding part and the light-transmitting part, and the outline of the figure transferred to the wafer becomes unclear and the resolution is reduced.

An object of the present invention is to provide an exposure technique that can improve the resolution and productivity of figures transferred from an original to an exposed object.

The above and other objects and novel features of the present invention include:
It will become clear from the description herein and the accompanying drawings.

[Means for solving the problem] 4Q of typical inventions disclosed in this application
A brief explanation of the main points is as follows.

That is, a light-transmitting body having a rough surface and displaced in a direction intersecting the optical path is interposed between the light source and the original.

[Function] According to the above-mentioned means, for example, when the light emitted from the light source is a laser with a relatively short wavelength, the laser is displaced in a direction intersecting the optical path, and the light transmitting body having a rough surface is displaced. During the transmission, the phase etc. become uneven and the spatial coherence is reduced, and the outline of the figure transferred from the original plate to the object to be exposed becomes clearer, and the exposure process is performed using a laser with relatively high illuminance. By doing so, the exposure time can be shortened, and the resolution and productivity of figures transferred from the original plate to the object to be exposed can be improved.

[Embodiment I] FIG. 1 is an explanatory diagram showing the main parts of an exposure apparatus that is an embodiment of the present invention.

For example, a light source 3 is positioned above a mounting table 2 on which an object l to be exposed such as a wafer is placed, and a light source 3 such as a laser having a relatively short wavelength is irradiated onto the flat surface of the object 1 to be exposed. It is composed of

Further, between the light rA3 and the exposed 'It, a transparent substrate 5a such as glass is provided with a light shielding portion 5b made of chromium (Cr) or the like.
An original plate 5 is provided, which is made up of a predetermined figure.

By irradiating the object 1 with light 4 from the light source 3 via the original 5, the figure on the original 5 is transferred onto the object 1.

In this case, between the light source 3 and the original 5, there is provided a transparent material having a neck surface 6a, which is linearly reciprocated in a direction intersecting the optical path of the light 4 by a predetermined drive mechanism (not shown). A light body 6 is interposed, and the light 4 is linearly reciprocated in a direction intersecting the optical path of the light 4 and transmitted through the light transmitting body 6 having a rough surface 6a, thereby creating spatial coherent interference. After that, the light reaches the surface of the object 1 to be exposed via the original 5.

The operation of this embodiment will be explained below.

First, the object to be exposed 1 to be exposed is placed on the mounting table 2, and the transparent body 6 having the rough surface 6a is
It is reciprocated in a direction intersecting the optical path of the light 4 by a predetermined drive mechanism (not shown).

Next, light 4 such as a laser having a relatively short wavelength is emitted from the light source 3, and the light 4 is reciprocated in a direction intersecting the optical path of the light 4, and the transparent body 6 having the rough surface 6a is exposed to i! ii, the surface of the object 1 to be exposed is irradiated through the original plate 5 with its spatial coherence reduced by the light 4, and the light 4 is illuminated on the surface of the original plate 5 without being affected by the spatial coherence of the light 4. The figure is clearly transferred to the exposed object 1 with good resolution.

As described above, according to this embodiment, the following effects can be obtained.

(l), between the light source 3 and the original 5, the rough surface 6 is reciprocally displaced in a direction intersecting the optical path of the light 4 emitted from the light source 3;
Since the transparent body 6 having a wavelength a is provided, the spatial coherence of the light 4 such as a laser having a relatively short wavelength is reduced, and the spatial coherence is excessively good. The outline of the figure transferred from the original 5 to the object 1 to be exposed becomes unclear due to the occurrence of interference fringes caused by the light 4, and the outline of the figure transferred from the original 5 to the object 1 to be exposed by the light 4 is prevented from becoming unclear. Resolution is improved.

(2) As a result of (1) above, it becomes possible to use a laser with a relatively short wavelength and relatively high illuminance as the light 4, and the time required for exposure processing of one object 1 to be exposed can be shortened. It is possible to increase the number of objects 1 to be exposed per hour, and it is possible to improve the resolution and productivity of figures transferred from the original 5 to the object 1 to be exposed.

[Embodiment 2] FIG. 2 is an explanatory diagram showing the main parts of an exposure apparatus that is another embodiment of the present invention.

The second embodiment is different from the first embodiment in that the displacement of the transparent body 7 having the rough surface 7a in the direction intersecting the optical path of the light 4 is achieved by rotational movement by the motor 8. be.

As described above, in the second embodiment, the following effects can be obtained.

(1) A transparent body 7 having a rough surface 7a is disposed between the light source 3 and the original 5 and is rotationally displaced by a motor 8 in a direction intersecting the optical path of the light 4 emitted from the light source 3. As a result, the spatial coherence of the light 4 e.g. from a laser with a relatively short wavelength is reduced, and interference fringes due to the excessively good spatial coherence may cause the original 5 to This prevents the outline of the figure transferred from the master plate 5 to the object l to be exposed to become unclear, and the resolution of the figure transferred from the original plate 5 to the object l to be exposed is improved by the light 4.

(2) As a result of (11) above, it becomes possible to use a laser with a relatively short wavelength and relatively high illuminance as the light 4, and the time required for exposure processing of one exposed object 1 can be shortened, and the unit time It is possible to increase the number of objects 1 to be exposed per exposure process, and it is possible to improve the resolution and productivity of figures transferred from the original plate 5 to the object 1 to be exposed.

Although the invention made by the present inventor has been specifically explained above based on Examples, it goes without saying that the present invention is not limited to the Examples and can be modified in various ways without departing from the gist thereof. Nor.

In the above explanation, the invention made by the present inventor was mainly applied to the wafer exposure technology in the manufacturing of semiconductor devices, which is the background field of application, but the invention is not limited to this. The present invention can be widely applied to techniques that require highly accurate transfer of the figure onto the object 1 to be exposed.

[Effects of the Invention] The effects obtained by typical inventions disclosed in this application are briefly described below.

That is, an exposure apparatus that transfers the figure of the original to the object to be exposed by interposing an original in which a light-shielding part is formed in a predetermined shape on a transparent substrate in the optical path from the light source to the object to be exposed. By disposing a transparent body having a rough surface and being displaced in a direction intersecting the optical path between the blind light source and the original, for example, the light emitted from the light source has a relatively short wavelength. In the case of a laser, the laser is displaced in a direction that intersects the optical path, and when it passes through a transparent material with a rough surface, the phase becomes uneven and the spatial coherence is reduced,
The outline of the figure transferred from the original plate to the exposed object becomes clearer with the laser, and the exposure time can be shortened by performing the exposure process using a laser with relatively high illuminance, making it possible to transfer the image from the original plate to the exposed object without sacrificing productivity. The resolution of figures transferred to objects can be improved.

[Brief explanation of drawings]

FIG. 1 is an explanatory diagram showing the main parts of an exposure apparatus which is one embodiment of the present invention, and FIG. 2 is an explanatory diagram showing the main parts of an exposure apparatus which is another embodiment of the invention. l... Object to be exposed, 2... Mounting table, 3... Light source, 4
...light, 5a...substrate, 5b...light shielding part, 5...
・Original plate, 6a, 7a... Neon surface, 6.7... Translucent body, 8... Motor.

Claims (1)

[Claims] 1. By interposing an original in which a light-shielding portion is formed in a predetermined shape on a transparent substrate in the optical path from the light source to the object to be exposed, the figure of the original is transferred to the object to be exposed. What is claimed is: 1. An exposure apparatus characterized in that a light-transmitting body having a rough surface is disposed between the light source and the original plate and is displaced in a direction intersecting the optical path. 2. The exposure apparatus according to claim 1, wherein the light emitted from the light source is a laser. 3. The exposure apparatus according to claim 1, wherein the object to be exposed is a wafer.