JPS62192639U - - Google Patents

Info

Publication number

JPS62192639U

JPS62192639U JP7949586U JP7949586U JPS62192639U JP S62192639 U JPS62192639 U JP S62192639U JP 7949586 U JP7949586 U JP 7949586U JP 7949586 U JP7949586 U JP 7949586U JP S62192639 U JPS62192639 U JP S62192639U

Authority

JP

Japan

Prior art keywords

film

integrated circuit

semiconductor integrated

circuit device

passivation film

Prior art date

1986-05-28

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Pending

Links

• Espacenet
• Global Dossier
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• VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
• 238000002161 passivation Methods 0.000 claims description 5
• 239000004065 semiconductor Substances 0.000 claims description 5
• 239000000377 silicon dioxide Substances 0.000 claims description 3
• 239000000758 substrate Substances 0.000 claims description 2
• XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
• 229910052710 silicon Inorganic materials 0.000 claims 1
• 239000010703 silicon Substances 0.000 claims 1
• 238000010586 diagram Methods 0.000 description 2
• 229910052581 Si3N4 Inorganic materials 0.000 description 1
• HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1