JPS62192237U - - Google Patents
Info
- Publication number
- JPS62192237U JPS62192237U JP7888786U JP7888786U JPS62192237U JP S62192237 U JPS62192237 U JP S62192237U JP 7888786 U JP7888786 U JP 7888786U JP 7888786 U JP7888786 U JP 7888786U JP S62192237 U JPS62192237 U JP S62192237U
- Authority
- JP
- Japan
- Prior art keywords
- light source
- mask film
- exposure light
- parallelism
- circuit board
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 claims 1
Landscapes
- Length Measuring Devices By Optical Means (AREA)
Description
第１図は、本考案における焼付光の平行度測定
装置の正面図である。第２図は、本考案の平面図
である。第３図は、露光状態を示す断面図である
。第４図は、従来の焼付光の平行度測定装置の平
面図である。
符号の説明、１；露光光源、４；反射鏡、５；
マスクフイルム、６；スリツトパターン、８；リ
ニアセンサー。
FIG. 1 is a front view of a printing light parallelism measuring device according to the present invention. FIG. 2 is a plan view of the present invention. FIG. 3 is a cross-sectional view showing the exposure state. FIG. 4 is a plan view of a conventional printing light parallelism measuring device. Explanation of symbols, 1; Exposure light source, 4; Reflector, 5;
Mask film, 6; slit pattern, 8; linear sensor.
Claims (1)
ーンを露光光源によつて焼付けるプリント基板の
露光装置に於ける前記露光光源の焼付光の平行度
測定装置であつて、真円形状のスリツトパターン
を形成したマスクフイルムと、多数の光画素を長
手方向に沿つて並列設して形成された帯形状で、
前記マスクフイルムの前記露光光源による照射側
とは反対側の近傍位置に、前記真円形状のスリツ
トパターンの仮想される直径線にほぼ沿つて配置
されるリニアセンサーとから成る焼付光の平行度
測定装置。 A device for measuring the parallelism of printing light from an exposure light source in a printed circuit board exposure device that prints a pattern of a mask film on the surface of a printed circuit board using an exposure light source, which forms a perfectly circular slit pattern. A strip-shaped mask film and a large number of optical pixels arranged in parallel along the longitudinal direction.
parallelism of the printing light, which is comprised of a linear sensor disposed approximately along the hypothetical diameter line of the perfectly circular slit pattern at a position near the side opposite to the side irradiated by the exposure light source of the mask film; measuring device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7888786U JPS62192237U (en) | 1986-05-27 | 1986-05-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7888786U JPS62192237U (en) | 1986-05-27 | 1986-05-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62192237U true JPS62192237U (en) | 1987-12-07 |
Family
ID=30928246
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7888786U Pending JPS62192237U (en) | 1986-05-27 | 1986-05-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62192237U (en) |
-
1986
- 1986-05-27 JP JP7888786U patent/JPS62192237U/ja active Pending
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