JPS62184734U - - Google Patents
Info
- Publication number
- JPS62184734U JPS62184734U JP7302586U JP7302586U JPS62184734U JP S62184734 U JPS62184734 U JP S62184734U JP 7302586 U JP7302586 U JP 7302586U JP 7302586 U JP7302586 U JP 7302586U JP S62184734 U JPS62184734 U JP S62184734U
- Authority
- JP
- Japan
- Prior art keywords
- lamps
- adjusted
- utility
- vapor phase
- reflecting plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001947 vapour-phase growth Methods 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Description
第１図ないし第３図は本考案の１実施例を示し
第１図は断面図、第２図はランプと反射板の平面
図、第３図は要部の断面図、第４図は本考案の他
の実施例における要部断面図、第５図および第６
図は異なる状態におけるランプの位置と反射板の
角度とによる光エネルギ分布を示す線図、第７図
は従来例の断面図である。
１１…石英ベルジヤ、１５，４４…サセプタ、
１７…ウエハ、２１…金属ベルジヤ、２２…ラン
プ、３３，４２…反射板。
Figures 1 to 3 show one embodiment of the present invention. Figure 1 is a sectional view, Figure 2 is a plan view of the lamp and reflector, Figure 3 is a sectional view of the main parts, and Figure 4 is the main part. Cross-sectional views of main parts in other embodiments of the invention, FIGS. 5 and 6
The figure is a diagram showing the light energy distribution depending on the position of the lamp and the angle of the reflector plate in different states, and FIG. 7 is a sectional view of the conventional example. 11...Quartz bell gear, 15,44...Susceptor,
17... Wafer, 21... Metal bell gear, 22... Lamp, 33, 42... Reflector plate.
Claims (1)
する気相成長装置において、それぞれの前記ラン
プに反射角度を調整可能にした反射板を設けた気
相成長装置。 (2) ランプを移動させることにより反射板との
相対位置を調整可能にしたことを特徴とする実用
新案登録請求の範囲第１項記載の気相成長装置。[Claims for Utility Model Registration] (1) A vapor phase growth apparatus having a plurality of lamps for heating a wafer, in which each of the lamps is provided with a reflecting plate whose reflection angle can be adjusted. (2) The vapor phase growth apparatus according to claim 1 of the utility model registration, characterized in that the relative position with respect to the reflecting plate can be adjusted by moving the lamp.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7302586U JPS62184734U (en) | 1986-05-15 | 1986-05-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7302586U JPS62184734U (en) | 1986-05-15 | 1986-05-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62184734U true JPS62184734U (en) | 1987-11-24 |
Family
ID=30916991
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7302586U Pending JPS62184734U (en) | 1986-05-15 | 1986-05-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62184734U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009164379A (en) * | 2008-01-08 | 2009-07-23 | Dainippon Screen Mfg Co Ltd | Heat treatment apparatus |
| JP2009272399A (en) * | 2008-05-02 | 2009-11-19 | Dainippon Screen Mfg Co Ltd | Heat treatment equipment |
-
1986
- 1986-05-15 JP JP7302586U patent/JPS62184734U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009164379A (en) * | 2008-01-08 | 2009-07-23 | Dainippon Screen Mfg Co Ltd | Heat treatment apparatus |
| JP2009272399A (en) * | 2008-05-02 | 2009-11-19 | Dainippon Screen Mfg Co Ltd | Heat treatment equipment |