JPS62184456A - Photosensitive composition - Google Patents

Abstract

PURPOSE:To obtain a photosensitive composition good in adhesion to a support and high in printing resistance even in the case of using an alkaline dampening water by incorporating a diazo compound and a specified polymer in the photosensitive composition. CONSTITUTION:The photosensitive composition contains the diazo compound and polymer having the structural units represented by the formula shown on the right in which X is -O- or -NH-; each of R<1>-R<3> is H or alkyl; R<4> is alkyl or halogen; R<5> is hydroxyalkyl; each of l and n is an integer of 0-4; and m is an integer of 1-3. These units are contained usually in an amount of 1-100mol%, preferably, 10-95mol% in the polymer, and alkyl ethers, plasticizers, colorants, stabilizers, etc., can be added to the photosensitive composition in an amount of 0.5-30wt% of the total solids.

Description

Detailed Description of the Invention (Industrial Application Field) The present invention relates to a diazo photosensitive composition, and more specifically, a diazo photosensitive composition used for producing photosensitive lithographic printing plates, letterpress plates, intaglio plates, gravure plates, printed wiring boards, etc. This invention relates to negative photosensitive compositions that can be used.

(Prior art) A photosensitive plate obtained by coating a thin film of a photosensitive substance on a support is exposed to light through a transparent original to create a difference in solubility between the exposed and unexposed areas, and then applied to a suitable developer. Various techniques have been proposed for developing and forming a relief image on a photosensitive plate.

Conventionally, the combination of a diazo compound and a polymer compound is well known as a photosensitive composition used for this purpose, or in the case of a negative planographic printing plate. Further, as the polymer compound used in combination with the diazo compound, a polymer compound having a functional group such as a hydroxyl group, an amino group, a cyano group, or a urethane group in its molecule can be effectively used.

For example, as described in Japanese Patent Publication No. 57-43890, a compound consisting of a diazo compound and a polymer compound having an aromatic hydroxyl group in its polymer structure;
As described in Japanese Patent Publication No. 7364 and Japanese Patent Publication No. 55-34929, compounds consisting of a diazo compound and a polymer compound containing at least 50% by weight of structural units represented by the following general formula (1), and those represented by the following general formula (2) A polymer compound having a structural unit and a structural unit represented by the following general formula 〇, (in the general formula 〇, R1 represents a hydrogen atom or a methyl group, and R
2 represents a hydrogen atom, a methyl group, an ethyl group, or a chloromethyl group, and n represents an integer from 1 to 1O.) N (In the general formula (1), R3 represents a hydrogen atom or a methyl group.) For example, As described in Publication No. 51656, a compound consisting of a diazo compound and a polymer compound containing a structural unit represented by the following general formula Alkyl groups) are known.

[Problems to be Solved by the Invention] However, when used as a photosensitive layer for a lithographic printing plate, the method described in Japanese Patent Publication No. 52-7364, Japanese Patent Publication No. 55-34929, or Japanese Patent Publication No. 57-51656, A polymer compound containing a structural unit that accommodates alcoholic hydroxyl groups has relatively good sensitivity, but has poor adhesion to the support and poor printing durability.
The polymer compound having an aromatic hydroxyl group described in the publication has relatively excellent printing durability, but if alkaline dampening water is used during printing, the image area becomes weak and high Printing durability cannot be obtained.

(Means for Solving the Problems) As a result of extensive research, the present inventors have found that a polymer compound containing a structural unit having a hydroxyalkylphenyl group has improved the above-mentioned drawbacks and is capable of working as a support. The present invention was based on the discovery that the adhesive properties are good and the printing durability is high even when alkaline dampening water is used.

That is, 1. The gist of the present invention is a diazo compound and the following general formula [
A photosensitive composition characterized by containing a polymer compound having a structural unit represented by I].

(In the formula, represents an alkyl group such as a chloromethyl group, a halogenated alkyl group such as a chloroethyl group, or a halogen atom, R8 represents a hydroxyalkyl group such as a hydroxymethyl group or a hydroxyethyl group, i represents the number of O to 4, (m represents a number from 1 to 3, and n represents a number from O to 4.) Various known diazo compounds can be used as the diazo compound used in the present invention, and aromatic diazonium salts and active carbonyl-containing diazo compounds, for example, Organic solvent-soluble diazo resins having a molecular weight of about 500 to 10,000, represented by compounds, especially condensates with formaldehyde, are preferably used.

Specific examples of the diazo resin include organic solvent-soluble reaction products of a condensate of p-diazodiphenylamine and formaldehyde or acetaldehyde, hexafluorophosphate, tetrafluoroborate, and chlorine periodate. Certain diazo resin inorganic salts and U.S. Patent No. 3,300,3
The above condensate and sulfonic acids such as para-toluenesulfonic acid or a salt thereof, as described in No. 09, 1
- Naphthol-4-sulfonic acid or its salts; Phosphinic acids such as benzenephosphinic acid or its salts; Hydroxyl group-containing compounds such as 2,4-dihydroxybenzophenone, 2-hydroxy-4-methoxy-benzophenone-5-sulfonic acid or Examples include organic solvent-soluble diazo resin organic salts that are reaction products such as salts thereof.

In the photosensitive composition of the present invention, the content of the diazo compound is usually in the range of 1 to 50% by weight, preferably 5 to 20% by weight.

The polymer compound having a structural unit represented by the general formula [1] used in the present invention may be, for example, a homopolymer of a compound represented by the following general formula [■], or a homopolymer of a compound represented by the following general formula [■]. Copolymers of the compound and other addition-polymerizable unsaturated compounds are included.

(In the formula, X, R' to R'', n, m, and the sentence have the same meanings as in the case of general formula [II].) The compound represented by the above general formula [II] is, for example, (a) 2-13- 1 or 4-hydroxymethylphenyl (meth)acrylate, N-(2-13-1 or 4-hydroxymethylphenyl)(meth)acrylamide, 3
-Methyl-4-hydroxymethylphenyl (meth)acrylate, N-(3-methyl-4-hydroxymethylphenyl)(meth)acrylamide, 2-chloro-4-hydroxymethylphenyl (meth)acrylate, 2-1
3-1 or 4-hydroxymethylbenzyl (meth)acrylate, N-(2-13-1 or 4-hydroxymethylbenzyl)(meth)acrylamide, 2-hydroxymethyl-4-bromophenyl (meth)acrylate, 2
(meth)acrylic acid esters and (meth)acrylamides substituted with one hydroxymethyl group or benzene ring such as -hydroxymethyl-4-chloromethylphenyl (meth)acrylate, (b) 2,4-bis(hydroxy Methyl)phenyl (meth)acrylate, N-[2,4-bis(hydroxymethyl)phenyl] (meth)acrylamide, 3.4-
Bis(hydroxymethyl)phenyl(meth)acrylate, N-[3,4-bis(hydroxymethyl)phenyl](meth)acrylamide, 3,4-bis(hydroxymethyl)benzyl(meth)acrylate, N-[3,
(meth)acrylic acid esters and (meth)acrylamides in which two hydroxymethyl groups are substituted on the benzene ring, such as 4-bis(hydroxymethyl)penzylco (meth)acrylamide, (c) 2.3.4-) (Hydroxymethyl)phenyl (meth)acrylate, N-[2,3゜4-tris(hydroxymethyl)phenyl] (meth)acrylamide, 3,4.5-tris(hydroxymethyl)phenyl (meth)acrylate, N- [3,4,5-tris(hydroxymethyl)phenyl] (meth)acrylamide, 2,4,5-tris(hydroxymethyl)benzyl(meth)acrylate, etc. with 3 substitutions on the benzene ring (meth) ) acrylic esters and (meth)acrylamides.

Other addition polymerizable unsaturated compounds used as copolymers include, for example, acrylic acid.

Methacrylic acid, maleic anhydride, etc. α, β unsaturated carbonyl methyl acrylate, ethyl acrylate, propyl acrylate, methyl acrylate, amyl acrylate, hexyl acrylate, octyl acrylate, acrylic acid-
Alkyl acrylates such as 2-chloroethyl, glycidyl acrylate, N-dimethylaminoethyl acrylate; alkyls such as methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, amyl methacrylate, cyclohexyl methacrylate, glycidyl methacrylate, N-dimethylaminoethyl methacrylate, etc. Methacrylate; acrylamide, methacrylamide.

Acrylamides, methacrylamides or ethyl vinyl ether such as N-ethyl acrylamide, N-hexylmethacrylamide, N-cyclohexylamide, N-phenylacrylamide, N-nitrophenyl acrylamide, N-ethyl-N-phenylacrylamide, 2-
Vinyl ethers such as chloroethyl vinyl ether, propyl vinyl ether, butyl vinyl ether, octyl vinyl ether, phenyl vinyl ether; vinyl esters such as vinyl acetate, vinyl chloroacetate, vinyl phthylate, vinyl benzoate; styrene, α
- Styrenes such as methylstyrene, methylstyrene, and chloromethylstyrene; Vinyl ketones such as methyl vinyl ketone, ethyl vinyl ketone, propyl vinyl ketone, and phenyl vinyl ketone; Olefins such as ethylene, propylene, isobutylene, butadiene, and isoprene, N
-vinylpyrrolidone, N-vinylcarbazole, 4-vinylpyridine, acrylonitrile, methacrylonitrile and the like.

The polymer compound of the present invention comprises the compound represented by the general formula [1] and the other addition-polymerizable unsaturated compounds, particularly,
From the viewpoint of developability, α and β of acrylic acid and methacrylic acid are used.
- A copolymer of an unsaturated carboxylic acid and acrylonitrile or methacrylonitrile is preferred from the viewpoint of rigidity resistance and solvent resistance.

The structural unit represented by the general formula [I] contained in the polymer compound of the present invention is usually 1 to 100 mOJL%, preferably 10 to 95 mOJL%.

The other addition-polymerizable unsaturated compounds mentioned above are used in an amount of 99 mofL% or less, preferably in the range of 5 to 90 mofL%, but when copolymerizing α, β-unionized carboxylic acids,
5 to 20 mo, preferably 11%, and when copolymerizing acrylonitrile or methacrylonitrile, 5 to 20 mo.
40 moi% is preferable.

The molecular weight of the polymer compound having the structural unit represented by the general formula [I] of the present invention is usually about 5,000 to about 200,000, but is not limited thereto.

The photosensitive composition of the present invention has good film-forming properties, excellent abrasion resistance, chemical resistance, and etching resistance, good adhesion to a support, and good storage stability. However, various additives can be added to further improve the performance of the photosensitive composition. That is, alkyl ethers (for example, ethyl cellulose, methyl cellulose) to improve coating properties, plasticizers to impart flexibility and abrasion resistance to the coating film (for example, butylphthalyl, polyethylene glycol, acrylic acid oligomers,
Methacrylic acid oligomer, tributyl citrate, diethyl phthalate, dibutyl phthalate, ugly dihexyl phthalate,
Dioctyl phthalate.

tricresyl phosphate, tributyl phosphate, trioctyl phosphate, tetrahydrofurfuryl oleate), acridine dye as a coloring substance to visualize images,
Pigments such as cyanine dyes, styryl dyes, triphenylmethane dyes and phthalocyanines, those whose phthalocyanine skeletons have been modified to be soluble in organic solvents, or metal complex salt dyes of monoazo compounds can be added. Examples include Victoria Pure Blue BOH, Crystal Violet, Methyl Violet, Oil Blue #603, Eisenspiron Blue GNH, Eisenspiron Violet RH Special, Orasol Violet 3B, Vialon Fast Lupine BL, and the like. As the coloring substance for visualizing the image, triphenylmethane dyes such as Victoria Pure Blue BOH and Oil Blue I603, and metal complex salt dyes of monoazo compounds such as Eisens Viron Violet RH Special are preferable.

In addition, so-called stabilizers for further improving storage stability include polyacrylic acid, tartaric acid, phosphoric acid, phosphorous acid, acrylic acid, oxalic acid, benzenesulfonic acid, 4-
methoxy-2-hydroxybenzene-5-sulfonic acid,
Naphthalene sulfonic acid etc. can be added.

These various additives vary depending on the intended use of the photosensitive composition, but are generally preferably added in an amount of 0.5 to 30% by weight based on the total solid content.

The photosensitive composition of the present invention can be dissolved in a suitable solvent and used in paper, plastic film, aluminum plate, zinc plate, steel plate, etc.
It is used by coating on a suitable support such as a bimetal plate or a trimetal plate.

It is desirable that the concentration of the photosensitive composition at the time of coating is in the range of 1 to 50% by weight. The coating solvent used is
Methyl cellosolve, ethyl cellosolve, methyl cellosolve acetate, acetone, methyl ethyl ketone, methanol, dimethyl foramide, dimethyl sulfoxide, or a mixed solvent thereof is suitable, and in some cases, a mixed solvent of the above solvents and other organic solvents may also be used. be done.

When using the photosensitive plate obtained by coating the photosensitive composition of the present invention on a support, a conventional method is applied, in which light is exposed through a transparent original having a line image halftone image, and then an aqueous developer is applied. By developing, a negative relief image is obtained from the original image. A suitable light source for exposure is
Carbon arc lamps, mercury lamps, xenon lamps, chemical lamps, metal halide lamps, strobes, etc. are used, and the aqueous solutions used for development include sodium hydroxide, potassium hydroxide, sodium carbonate, alkali metal silicates, and diphosphoric acid. An alkaline aqueous solution such as sodium or tertiary sodium phosphate can be used.

Further, for the purpose of accelerating alkaline development and eliminating uneven development, a small amount of a surfactant and an organic solvent miscible with water may be added.

The photosensitive composition of the present invention can provide a photosensitive lithographic printing plate with excellent performance, and the support may include paper, plastic film, or metal plates such as zinc plates, copper plates, steel plates, and aluminum plates. In particular, an aluminum plate is preferred. However, if an aluminum plate is used without treatment, the contact with the diazo photosensitive layer is extremely poor, and the diazo resin in contact with the aluminum decomposes and loses photosensitivity, making it unsuitable for use as a printing plate. Become something.

In order to avoid these drawbacks, many proposals have been made for the treatment of aluminum plates.

For example, (1) a method of applying silicate treatment after graining (US Patent No. 2,714,066), (2) a method of applying organic acid salt treatment (US Patent No. 2,714,066),
(:l) Method of treatment with phosphonic acid or its derivatives (
(4) A method of treatment with potassium hexafluorozirconate (U.S. Pat. No. 2,946,683), a method of anodizing, and a method of anodizing, and then alkali metal silicate. Examples include a method of treating with an aqueous salt solution (US Pat. No. 3,181,461).

The most suitable support for applying the photosensitive composition of the present invention is an aluminum plate whose surface has been grained, anodized, and then sealed. Methods for carrying out the above-mentioned graining treatment include the known brush polishing method, ball polishing method, chemical polishing method, electrolytic etching method, etc. after degreasing the aluminum surface. Anodic oxidation is performed using, for example, phosphoric acid,
Inorganic acids such as chromic acid, oxalic acid, and sulfuric acid, or organic acids such as oxalic acid and sulfamic acid, or two of these acids.
This is carried out by passing an electric current through an aluminum plate as an anode in an aqueous or non-aqueous solution containing a mixture of two or more species.

Further, the sealing treatment is performed by immersion in a hot aqueous solution of an alkaline total silicate solution, hot water, and some inorganic salts or organic salts, or by using a steam bath. The photosensitive lithographic printing plate obtained by coating the photosensitive composition of the present invention on the aluminum support treated in this way has good storage stability of the photosensitive layer and good adhesion with the support, and has a clear image after development. giving a relief image,
It is possible to provide printed matter with a clear image in an extremely long printing process.

(Examples) Next, the present invention will be described in detail with reference to Examples, but the embodiments of the present invention are not limited thereto.

(Example 1 and Comparative Example 1) 87 g of 2-hydroxymethylphenyl methacrylate,
4.5 g of methacrylic acid and 0.3 g of azobisisobutyronitrile were dissolved in 250 ml of dioxane and heated at 70°C for 10 hours while flowing nitrogen. After the reaction was completed, the reaction solution was poured into 3 cups of water with stirring, and the resulting precipitate was filtered and dried to obtain 178 g of a copolymer.

The composition of copolymer-1 is 2-hydroxymethylphenyl methacrylate:methacrylic acid=8T:13 (molar ratio)
Met.

Mix 200 mJL of a 5% diazo resin (zinc chloride, sulfate double salt of a condensate of p-diazodiphenylamine and paraformaldehyde) aqueous solution and 50 ml of a 20% ammonium hexafluorophosphate aqueous solution at room temperature, and immediately filter the resulting precipitate with suction. , and dried under reduced pressure at 30 to 40°C to obtain 11 g of diazo resin-1 (hexafluorophosphate).

An aluminum plate was immersed in a 20% sodium phosphate aqueous solution to degrease it, electrolytically etched, anodized in a sulfuric acid solution, and further sealed with a sodium metasilicate aqueous solution.
An aluminum plate-1 for use in a lithographic printing plate was prepared. The following photosensitive liquid A was coated on aluminum plate-1 using a spin coater to obtain a photosensitive planographic printing plate (A).

Photosensitive Liquid A Note that Jurimer AC20L is an approximately 40% aqueous solution of a copolymer mainly composed of acrylic acid.

The obtained photosensitive lithographic printing plate (A) was heated with a metal halide lamp idle fin 2000 (manufactured by Iwasaki Denkisensha) for 8
Image exposure was carried out for 30 seconds from a distance of 0 cm, and the plate was developed with the developer-1 shown below to obtain a lithographic printing plate (A).

Developer Solution-1 In the same manner, a photosensitive lithographic printing plate (B) was obtained from the following comparative photosensitive solution B, and exposed and developed to obtain a lithographic printing plate (B).

Photosensitive liquid B Improve printing durability with sheet-fed offset printing machine Hamada Star Dx9
00 (manufactured by Hamada Seisakusho ■) and printed on high-quality paper. As a result, the planographic printing plate (A) could print 10,000 sheets, while the planographic printing plate (B) could print 20,000 sheets.

(Example 2 and Comparative Examples 2 and 3) 27 g of N-(4-hydroxymethylphenyl)methacrylamide, 18 g of acrylonitrile, 45 g of ethyl acrylate, 10 g of methacrylic acid, and 0.4 g of azobisisobutyronitrile were added to 300 ml of methyl cellosolve. and heated at 65°C for 20 hours while flowing nitrogen. After the reaction was completed, the reaction solution was poured into 5 cups of water with stirring, and the resulting precipitate was filtered and dried to obtain 270 g of a copolymer.

The composition of copolymer-2 was N-(4-hydroxyphenyl)methacrylamide:acrylonitrile:ethyl acrylate:methacrylic acid=15:30245:10 (molar ratio).

The following photosensitive liquid C was applied to the aluminum plate-1 used in Example 1.
Using a rotary coating machine, the dry coating weight is 2.0g/m2.
It was coated and dried at a temperature of 80° C. for 3 minutes to obtain a photosensitive planographic printing plate (C).

Photosensitive liquid C In addition, the above-mentioned Julimar-ACIOL is made of polyacrylic acid of approx.
It is a 0% aqueous solution.

The resulting photosensitive lithographic printing plate (C) was exposed imagewise for 1 minute through a negative film from a distance of 80 cm using a 30 ampere carbon arc lamp.

Next, after being immersed for 1 minute at room temperature in a 4-fold dilution of negative PS plate developer 5DN-21 (manufactured by Konishiroku Photo Industries),
The surface was lightly rubbed with absorbent cotton to remove the unexposed areas to obtain a lithographic printing plate (C).

In the same manner, photosensitive planographic printing plates (D) and (E) were obtained from the following comparative photosensitive solution and E, and exposed and developed to obtain planographic printing plates (D) and (E).

Photosensitive liquid Photosensitive liquid E To compare printing durability, it was installed on a Heidelberg GTO printing machine, and printed using PH cool preparation NT liquid S as dampening water and DTS New Champion G set red ink. When I did this, the lithographic printing plate (C) was 20
Although it was possible to print more than 10,000 sheets, lithographic printing plates (D) and (
E) was 100,000 sheets and 200,000 sheets or more, respectively.

Next, in order to compare the suitability for printing with an alkaline dampening solution, printing was performed by replacing the dampening solution with a 400-fold dilution of the DICDL etch solution. However, the lithographic printing plate (E) was able to print 120,000 sheets.

(Examples 3 to 7) 50 g of 2-hydroxymethylphenyl methacrylate,
Acrylonitrile 5g, methyl methacrylate 20g1
5g of methacrylic acid and 0 azobisisobutyronitrile
．． 3g in methanol 200ml and acetone 200mJL
The mixture was dissolved in a mixed solvent of and heated at 65°C for 8 hours while flowing nitrogen. After the reaction was completed, the reaction solution was poured into 5 cups of water with stirring, and the resulting precipitate was removed and dried to obtain copolymer-37.
Obtained 0g.

The composition of copolymer-3 was 2-hydroxymethylphenyl methacrylate:acrylonitrile:methyl methacrylate:methacrylic acid=40:15:35:to (molar ratio).

465 g of copolymer-3 was obtained in the same manner as in the synthesis of copolymer-3, except that 60 g of 3,4-bis(human oxymethyl)benzyl methacrylate was used instead of 50 g of 2-hydroxymethylphenyl methacrylate.

The composition of copolymer-4 is 3,4-bis(hydroxymethyl)benzyl methacrylate: acrylonitrile: methyl methacrylate: methacrylic acid = 40:15:35:
10 (molar ratio).

572 g of copolymer-3 was obtained in the same manner as in the synthesis of copolymer-3, except that 58 g of 2-hydroxymethyl-4-methylphenyl methacrylate was used instead of 50 g of 2-hydroxymethylphenyl methacrylate.

The composition of copolymer-5 is 2-hydroxymethyl-4-methylphenyl methacrylate: acrylonitrile: methyl methacrylate: methacrylic acid = 40:15:35:
10 (molar ratio).

690 g of copolymer-3 was obtained in the same manner as in the synthesis of copolymer-3, except that 72 g of 2-hydroxymethyl-4-bromophenyl methacrylate was used instead of 50 g of 2-hydroxymethylphenyl methacrylate.

The composition of copolymer-6 is 2-hydroxymethyl-4-bromophenyl methacrylate: acrylonitrile: methyl methacrylate: methacrylic acid = 40: 15:35
: to (molar ratio).

788 g of copolymer-3 was obtained in the same manner as in the synthesis of copolymer-3, except that 64 g of 2-hydroxymethyl-4-chloromethylphenyl methacrylate was used instead of 50 g of 2-hydroxymethylphenyl methacrylate.

The composition of copolymer-7 is 2-hydroxymethyl-4-chloromethylphenyl methacrylate: acrylonitrile: methyl methacrylate: methacrylic acid = 40: 15
:35:10 (molar ratio).

(Synthesis of Diazo Resin-2) 14.5 g (50 mmol) of p-diazodiphenylamine sulfate was dissolved in 40.9 g of concentrated sulfuric acid under water cooling. To this reaction solution, 1.05 g (35 mmol) of rose formaldehyde was slowly added dropwise. At this time, the reaction temperature is i
The mixture was added so as not to exceed o''c. Thereafter, stirring was continued for 2 hours under water cooling.

This reaction mixture was added dropwise to 500 ml of ethanol under water cooling, and the resulting precipitate was filtered. After washing with ethanol, dissolve this precipitate in pure water with a diameter of 100 m, and add 6 ml to this solution.
．． A cold concentrated aqueous solution of 8 g of zinc chloride was added. The resulting precipitate was filtered and washed with ethanol.
It was dissolved in 0 mfL of pure water. To this liquid was added a cold concentrated aqueous solution in which 8 g of ammonium hexafluorophosphate was dissolved. The resulting precipitate was collected by filtration, washed with water, and then dried at 30° C. for 1 day and night to obtain diazo resin-2.

The following photosensitive solutions F to J were coated on the aluminum plate-1 used in Example 1 using a spin coating machine, with a dry coating weight of 1.8 g.
/m'' and dried for 1 minute at a temperature of io0°C to obtain photosensitive lithographic printing plates (F) to (J).

Photosensitive liquid (F) ~ (J) *High molecular compounds are shown in the table below.

The obtained photosensitive planographic printing plates (F) to (J) were heated at 3KW.
Images were exposed through the negative film for 1 minute from a distance of 80 cm using an ultra-high pressure mercury lamp. Next, development was performed using the following developer-2 to obtain lithographic printing plates (F) to (J).

(Developer-2) The obtained planographic printing plates (F) to (J) were printed in the same manner as in Example 2. It has good printing durability, and even when printing was done using alkaline dampening water, it had a printing durability of over 200,000 sheets.

〔Effect of the invention〕

As explained above, the use of the photosensitive composition of the present invention brings about the remarkable effect that a photosensitive layer having excellent printing durability can be obtained.

Claims (1)

[Scope of Claims] A photosensitive composition comprising a diazo compound and a polymer compound having a structural unit represented by the following general formula [I]. ▲There are mathematical formulas, chemical formulas, tables, etc.▼...[I] (In the formula, X represents -O- or -NH-, R^1, R^
2 and R^3 represent a hydrogen atom or an alkyl group, R^
4 represents an alkyl group, a halogenated alkyl group, or a halogen atom, R^5 represents a hydroxyalkyl group, l represents a number from 0 to 4, m represents a number from 1 to 3, and n represents a number from 0 to 4.
Indicates the number of )