JPS62183455A - Developing solution for silver halide photographic sensitive material - Google Patents
Developing solution for silver halide photographic sensitive materialInfo
- Publication number
- JPS62183455A JPS62183455A JP2521586A JP2521586A JPS62183455A JP S62183455 A JPS62183455 A JP S62183455A JP 2521586 A JP2521586 A JP 2521586A JP 2521586 A JP2521586 A JP 2521586A JP S62183455 A JPS62183455 A JP S62183455A
- Authority
- JP
- Japan
- Prior art keywords
- developer
- developing
- processing
- silver halide
- sensitive material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims abstract description 15
- -1 silver halide Chemical class 0.000 title claims description 11
- 229910052709 silver Inorganic materials 0.000 title claims description 9
- 239000004332 silver Substances 0.000 title claims description 9
- VVNCNSJFMMFHPL-UHFFFAOYSA-N penicillamine Chemical compound CC(C)(S)C(N)C(O)=O VVNCNSJFMMFHPL-UHFFFAOYSA-N 0.000 claims abstract description 3
- 238000011109 contamination Methods 0.000 abstract description 11
- 238000010186 staining Methods 0.000 abstract description 4
- 239000002253 acid Substances 0.000 abstract description 3
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 239000000126 substance Substances 0.000 description 12
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- 239000003755 preservative agent Substances 0.000 description 3
- 239000003109 Disodium ethylene diamine tetraacetate Substances 0.000 description 2
- ZGTMUACCHSMWAC-UHFFFAOYSA-L EDTA disodium salt (anhydrous) Chemical compound [Na+].[Na+].OC(=O)CN(CC([O-])=O)CCN(CC(O)=O)CC([O-])=O ZGTMUACCHSMWAC-UHFFFAOYSA-L 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical class OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 229940101006 anhydrous sodium sulfite Drugs 0.000 description 2
- 235000019301 disodium ethylene diamine tetraacetate Nutrition 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- GOJUJUVQIVIZAV-UHFFFAOYSA-N 2-amino-4,6-dichloropyrimidine-5-carbaldehyde Chemical group NC1=NC(Cl)=C(C=O)C(Cl)=N1 GOJUJUVQIVIZAV-UHFFFAOYSA-N 0.000 description 1
- MTMDLUFMACHNQR-UHFFFAOYSA-N 3-methyl-2-sulfanylbutanoic acid Chemical compound CC(C)C(S)C(O)=O MTMDLUFMACHNQR-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000002198 insoluble material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
- G03C5/26—Processes using silver-salt-containing photosensitive materials or agents therefor
- G03C5/29—Development processes or agents therefor
- G03C5/305—Additives other than developers
Abstract
Description
【発明の詳細な説明】
イ）産業上の利用分野
本発明はハロゲン化銀写真感光材料用現像液に関し、現
Ｒ液の性俺向上に関するもので、更に詳しくは現像液の
汚れを防止し、現像処理に使用する機材の汚れを防止す
る現像液に関するものである。DETAILED DESCRIPTION OF THE INVENTION A) Industrial Application Field The present invention relates to a developer for silver halide photographic light-sensitive materials, and relates to improving the properties of a developer R solution, and more specifically, to preventing staining of the developer, This invention relates to a developer that prevents staining of equipment used in development processing.
口）従来の技術
ハロゲン化銀写真感光材料の処理は、現像、定着、水洗
、乾燥処理が基本で、この他に各々の処理液を安定的に
使用するための処理工程、又写真画像の物理的強度を増
すための処理工程が付加される。Conventional technology Processing of silver halide photographic light-sensitive materials is basically development, fixing, washing, and drying. A processing step is added to increase the strength of the target.
近年、写真処理は迅速化されると同時に自動現像機によ
る処理が一般的となり、迅速処理に対応するため使用す
る現像液は濃い薬品濃度、高いアルカリ濃度のものとな
り合せて高い温度で処理が行われる。In recent years, photographic processing has become faster and at the same time processing using automatic processors has become commonplace.To support rapid processing, the developing solutions used have strong chemical and alkaline concentrations, and processing is carried out at high temperatures. be exposed.
高いアルカリ濃度、高い処理温度は現像液に対して大変
過酷な条件であるが、この様な過酷な条件に於てもなお
安定的に使用出来る現像液が望まれ、現像液の改良が加
えられている。High alkali concentrations and high processing temperatures are very harsh conditions for developers, but there is a need for a developer that can be used stably even under such harsh conditions, and improvements have been made to the developer. ing.
迅速な処理に対応するために、現像液は強力になり、こ
の目的を適えるために高いアルカリ度と多量の現像主薬
が使用される。高いアルカリ度の中では、この現像主薬
は空気により激しく酸化され、現像能力が著しく低下し
ていく、この酸化を防１卜するためには保恒剤が使用さ
れ、多量の現像主薬に対しては多量の保恒剤が使用され
る事となる。現像液に使用される最も一般的な保恒剤は
亜硫酸のアルカリ金属塩である。しかしこの亜硫酸のア
ルカリ金属塩はハロゲン化銀の溶解剤とじても知られて
いる。To accommodate rapid processing, developers have become more powerful, and high alkalinity and large amounts of developing agent are used to serve this purpose. In high alkalinity, this developing agent is violently oxidized by the air, and the developing ability is significantly reduced.To prevent this oxidation, preservatives are used, and a large amount of developing agent is A large amount of preservative will be used. The most common preservatives used in developer solutions are alkali metal salts of sulfite. However, this alkali metal salt of sulfite is also known as a silver halide solubilizer.
ハ）解決すべき問題点
この様に多量のハロゲン化銀溶解剤を含む現像液で現像
処理を行うと、現像作用の他にハロゲン化銀溶解作用も
同時に起り、溶解したハロゲン化銀は一旦は現像液中に
溶解するが、更に溶解が進むと不溶性物質に変化して現
像液中に蓄積する。C) Problems to be solved When developing with a developer containing a large amount of silver halide dissolving agent as described above, silver halide dissolving action occurs simultaneously in addition to the developing action, and the dissolved silver halide is It dissolves in the developer, but as the dissolution progresses further, it changes into an insoluble substance and accumulates in the developer.
一方、処理の方法は、多量の処理を迅速に行うため自動
現像機を使用して現像処理を行うが、ハロゲン化銀感光
材料の処理量が増加するに従って不溶性物質が現像液中
に多くなり、自動現像機内に蓄積し、特に搬送部に付着
したものは処理°された感光材料の汚染の原因となり、
出来上った写真の商品価値は低下する。汚染の原因を除
くためには自動現像機の清掃をしばしば行わなければな
らず、例えば毎日の処理の終りに清掃するなど大変な手
間となるため、不溶性物質の発生の無い現像液が望まれ
ている。On the other hand, the processing method uses an automatic processor to quickly process a large amount of material, but as the amount of silver halide photosensitive material processed increases, the amount of insoluble substances increases in the developer. Those that accumulate inside automatic processors, especially those that adhere to the conveyance section, can cause contamination of processed photosensitive materials.
The commercial value of the finished photo will decrease. In order to remove sources of contamination, automatic processors must be cleaned often, and cleaning at the end of each day's processing is a time-consuming task, so a developer that does not generate insoluble substances is desired. There is.
二）問題点を解決するための手段
従って本発明の目的は、現像処理に伴って発生する不溶
性物質の発生を防止する現像液に関するものである。更
に他の［］的は現像液中の不溶性物質により感光材料の
汚染を防止する現像液に関するものであり、更に他の目
的は自動現像機の汚染を防１１二する現像液に関するも
のであり、更に自動現像機の清掃の手間を軽減する現像
液に関するものである。2) Means for Solving the Problems Therefore, the object of the present invention is to provide a developer solution that prevents the generation of insoluble substances that occur during development processing. Still another object relates to a developer that prevents contamination of photosensitive materials by insoluble substances in the developer, and still another object relates to a developer that prevents contamination of automatic processing machines. Furthermore, the present invention relates to a developer that reduces the effort required to clean an automatic developing machine.
本発明者らは、現像液中の不溶性物質の発生を防１１−
シ、更に自動現像機の汚染を防止出来る現像液について
種々の検討を行った結果、２−アミノ−３−メルカプト
イソパレリックアシッドを現像液中に含有させる事で目
的を達成する事ができる７１９を見い出した。The present inventors have discovered that 11-
Furthermore, as a result of various studies on developing solutions that can prevent contamination of automatic processors, it was found that this objective could be achieved by incorporating 2-amino-3-mercaptoisoparelic acid into the developing solution719 I found out.
ホ）実施例
実施例により本発明の詳細な説明するが、これにより本
発明の実施の態様を限定されるものではない。E) Examples The present invention will be explained in detail with reference to Examples, but the embodiments of the present invention are not limited thereto.
実施例１
小型自動現像機を使用して、市販の電算写植用印画紙を
処理した。使用した現像液及び処理条件は次の通りであ
る。Example 1 A commercially available computer phototypesetting paper was processed using a small automatic processor. The developer and processing conditions used are as follows.
現像液（１）
無水亜硫酸ナトリウム ５Ｑ、０ｇ１−
フェニル−３−ピラゾリドン ０．５ｇハイドロ
キノン ２０．０ｇベンゾトリア
ゾール ０．１ｇ臭化カリウム
２．０ｇエチレンジアミン四酢酸
二ナトリウム １．０ｇ無水炭酸カリウム
５０．０ ｇ水を加えて
１．０文処理条件： 現像時間２０秒、現像
温度３４℃現像液（１）１見当り前記電算写植用印画紙
を５ｍｌ処理した結果、現像液には不溶性物質の発生が
あり、５ｔｎ’処理後の感光材料には汚染が見られ、自
動現像機の汚染と共に搬送部には不溶性物質の付着が見
られた０次にこの自動現像機を十分に清掃して、現像液
（１）に本発明の２−アミノ−３−メルカプトイソバレ
リックアシッドをＩ！Ｌ当り０−１ｇ加え前記感光材料
を５ｍ’処理した結果、現像液には不溶性物質の発生は
無く、処理した感光材料の汚染もなく、同時に自動現像
機の汚染、搬送部への不溶性物質の付着もなかった。Developer (1) Anhydrous sodium sulfite 5Q, 0g1-
Phenyl-3-pyrazolidone 0.5g Hydroquinone 20.0g Benzotriazole 0.1g Potassium Bromide
2.0g disodium ethylenediaminetetraacetate 1.0g anhydrous potassium carbonate
Add 50.0 g water
1.0 Sentence Processing Conditions: Development time 20 seconds, development temperature 34°C Developer Solution (1) As a result of processing 5 ml of the above-mentioned photographic paper for computer typesetting per impression, insoluble substances were generated in the developer solution, and 5tn' processing was performed. Contamination was observed on the photosensitive materials that were produced, and in addition to contamination of the automatic processor, insoluble substances were also observed on the conveying section. Next, the automatic processor was thoroughly cleaned and the developer solution (1) I! 2-amino-3-mercaptoisovaleric acid of the invention! As a result of adding 0-1g per liter and processing the photosensitive material for 5 m', no insoluble substances were generated in the developer, and there was no contamination of the processed photosensitive material. There was no adhesion.
実施例２
小型自動現像機を使用して市販のマイクロフィルムを処
理した。使用した現像液及び処理条件は次の様である。Example 2 A commercially available microfilm was processed using a small automatic processor. The developer and processing conditions used are as follows.
現像液（２）
無水亜硫酸ナトリウム ８０．０ ｇｌ
−フェニル−３−ピラゾリドン ２．０ｇハイドロ
キノン ４０．０ｇ臭化カリウ
ム ５．０ｇエチレンジアミ
ン四酢酸二ナトリウム ２．０ｇ無水炭酸カリウム
２５．０ ｇ水を加えて
１．０文処理条件： 現像時間６０秒
、現像温度３０℃現像液（２）ＩｆＬ当り前記マイクロ
フィルム（３５■■）を５ｍ”処理した結果、現像液に
は不溶性物質の発生があり、この状態で一夜放鐙した折
、搬送部に不溶性物質の付着があり、次の日に処理した
フィルムには汚染が生じた０次にこの自動現像機を十分
に清掃して、現像液（２）に本発明の２−アミノ−３−
メルカプトイソバレリックアシッドを１文当り、０．２
ｇ加え前記感光材料を１５ｍ’処理した結果、現像液に
は不溶性物質の発生は無く、自動現像機の汚染もなかっ
た。Developer (2) Anhydrous sodium sulfite 80.0 g
-Phenyl-3-pyrazolidone 2.0g Hydroquinone 40.0g Potassium bromide 5.0g Disodium ethylenediaminetetraacetate 2.0g Anhydrous potassium carbonate
Add 25.0 g water
1.0 Processing conditions: Developing time: 60 seconds, developing temperature: 30°C Developer solution (2) As a result of processing 5 m of the microfilm (35 mm) per IfL, insoluble substances were generated in the developer solution. When left in stirrup mode overnight, there was insoluble material adhering to the transport section, and the film processed the next day was contaminated. Next, thoroughly clean this automatic processor and add developer (2) 2-amino-3- of the present invention
Mercaptoisovaleric acid per sentence 0.2
As a result of processing the light-sensitive material for 15 m' with addition of g, no insoluble substances were generated in the developer and there was no contamination of the automatic processor.
本発明の２−アミ／−３−メルカプトイソバレリックア
シッドは現像液１１当り、０．０５ｇから０．５ｇを加
えて処理するのがよい。The 2-amino/-3-mercaptoisovaleric acid of the present invention is preferably added in an amount of 0.05 to 0.5 g per 11 parts of the developer.
へ）発明の効果
上記の如く本発明によれば、現像液に不溶性物質の発生
を防止でき、自動現像機に付着しないのでフィルム汚染
が生じることなく製品価値を保持できると共に自動現像
機等の清掃が省ける等実用効果大である。f) Effects of the Invention As described above, according to the present invention, it is possible to prevent the generation of insoluble substances in the developing solution, and since they do not adhere to the automatic developing machine, product value can be maintained without film contamination, and it is also possible to clean the automatic developing machine, etc. This has great practical effects, such as saving time.
Claims (1)
カプトイソバレリックアシッドを含有することを特徴と
するハロゲン化銀写真感光材料用現像液。A developer for a silver halide photographic light-sensitive material, characterized in that the developer for processing the photographic light-sensitive material contains 2-amino-3-mercaptoisovaleric acid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2521586A JPS62183455A (en) | 1986-02-07 | 1986-02-07 | Developing solution for silver halide photographic sensitive material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2521586A JPS62183455A (en) | 1986-02-07 | 1986-02-07 | Developing solution for silver halide photographic sensitive material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62183455A true JPS62183455A (en) | 1987-08-11 |
Family
ID=12159736
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2521586A Pending JPS62183455A (en) | 1986-02-07 | 1986-02-07 | Developing solution for silver halide photographic sensitive material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62183455A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5821040A (en) * | 1995-06-21 | 1998-10-13 | Fuji Photo Film Co., Ltd. | Method for developing silver haide photographic material |
| US5821041A (en) * | 1996-03-05 | 1998-10-13 | Fuji Photo Film Co., Ltd. | Liquid developer for photographic silver halide photosensitive material and development method |
| EP1061413A1 (en) * | 1999-06-14 | 2000-12-20 | AGFA-GEVAERT naamloze vennootschap | Processing method of light-sensitive silver halide photographic materials showing less tendency to sludge formation. |
| EP1061414A1 (en) * | 1999-06-14 | 2000-12-20 | Agfa-Gevaert N.V. | Developer composition for use in the processing of light-sensitive silver halide photographic materials |
| US6238854B1 (en) | 1999-06-14 | 2001-05-29 | Agfa-Gevaert | Developer composition for use in the processing of light-sensitive silver halide photographic materials |
| US6238853B1 (en) | 1999-06-14 | 2001-05-29 | Agfa-Gevaert | Processing method of light-sensitive silver halide photographic materials showing less tendency to sludge formation |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5726848A (en) * | 1980-07-24 | 1982-02-13 | Fuji Photo Film Co Ltd | Developing method for photosensitive silver halide material |
-
1986
- 1986-02-07 JP JP2521586A patent/JPS62183455A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5726848A (en) * | 1980-07-24 | 1982-02-13 | Fuji Photo Film Co Ltd | Developing method for photosensitive silver halide material |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5821040A (en) * | 1995-06-21 | 1998-10-13 | Fuji Photo Film Co., Ltd. | Method for developing silver haide photographic material |
| US5821041A (en) * | 1996-03-05 | 1998-10-13 | Fuji Photo Film Co., Ltd. | Liquid developer for photographic silver halide photosensitive material and development method |
| EP1061413A1 (en) * | 1999-06-14 | 2000-12-20 | AGFA-GEVAERT naamloze vennootschap | Processing method of light-sensitive silver halide photographic materials showing less tendency to sludge formation. |
| EP1061414A1 (en) * | 1999-06-14 | 2000-12-20 | Agfa-Gevaert N.V. | Developer composition for use in the processing of light-sensitive silver halide photographic materials |
| US6238854B1 (en) | 1999-06-14 | 2001-05-29 | Agfa-Gevaert | Developer composition for use in the processing of light-sensitive silver halide photographic materials |
| US6238853B1 (en) | 1999-06-14 | 2001-05-29 | Agfa-Gevaert | Processing method of light-sensitive silver halide photographic materials showing less tendency to sludge formation |
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