JPS62181119A - Mold for high accuracy injection molding - Google Patents
Mold for high accuracy injection moldingInfo
- Publication number
- JPS62181119A JPS62181119A JP2470186A JP2470186A JPS62181119A JP S62181119 A JPS62181119 A JP S62181119A JP 2470186 A JP2470186 A JP 2470186A JP 2470186 A JP2470186 A JP 2470186A JP S62181119 A JPS62181119 A JP S62181119A
- Authority
- JP
- Japan
- Prior art keywords
- metal
- mold
- adhesive
- reinforcing material
- injection mold
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001746 injection moulding Methods 0.000 title abstract description 10
- 229920005989 resin Polymers 0.000 claims abstract description 15
- 239000011347 resin Substances 0.000 claims abstract description 15
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 9
- 239000007822 coupling agent Substances 0.000 claims abstract description 6
- 238000000465 moulding Methods 0.000 claims abstract description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical class [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000003054 catalyst Substances 0.000 claims abstract 2
- 239000002184 metal Substances 0.000 claims description 42
- 229910052751 metal Inorganic materials 0.000 claims description 42
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 27
- 239000000853 adhesive Substances 0.000 claims description 27
- 230000001070 adhesive effect Effects 0.000 claims description 27
- 239000010703 silicon Substances 0.000 claims description 26
- 229910052710 silicon Inorganic materials 0.000 claims description 26
- 238000002347 injection Methods 0.000 claims description 21
- 239000007924 injection Substances 0.000 claims description 21
- 239000012779 reinforcing material Substances 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 9
- 229920001187 thermosetting polymer Polymers 0.000 claims description 9
- 239000000843 powder Substances 0.000 claims description 5
- 230000002787 reinforcement Effects 0.000 claims description 3
- 239000006087 Silane Coupling Agent Substances 0.000 claims 1
- 239000002131 composite material Substances 0.000 claims 1
- 239000011256 inorganic filler Substances 0.000 claims 1
- 229910003475 inorganic filler Inorganic materials 0.000 claims 1
- 230000003014 reinforcing effect Effects 0.000 abstract description 8
- 239000003795 chemical substances by application Substances 0.000 abstract description 5
- 229910001220 stainless steel Inorganic materials 0.000 abstract description 5
- 238000000034 method Methods 0.000 abstract description 4
- 239000010935 stainless steel Substances 0.000 abstract description 4
- 239000007767 bonding agent Substances 0.000 abstract 5
- 238000004132 cross linking Methods 0.000 abstract 2
- 229920005992 thermoplastic resin Polymers 0.000 abstract 2
- 230000001737 promoting effect Effects 0.000 abstract 1
- 150000004756 silanes Chemical class 0.000 abstract 1
- 238000001723 curing Methods 0.000 description 9
- 239000003822 epoxy resin Substances 0.000 description 8
- 229920000647 polyepoxide Polymers 0.000 description 8
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 6
- 239000004033 plastic Substances 0.000 description 6
- 229920003023 plastic Polymers 0.000 description 6
- -1 aliphatic amines Chemical class 0.000 description 5
- 230000008878 coupling Effects 0.000 description 5
- 238000010168 coupling process Methods 0.000 description 5
- 238000005859 coupling reaction Methods 0.000 description 5
- 229910000077 silane Inorganic materials 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000011253 protective coating Substances 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Chemical compound CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 3
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- XFCMNSHQOZQILR-UHFFFAOYSA-N 2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOC(=O)C(C)=C XFCMNSHQOZQILR-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000012778 molding material Substances 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229920000768 polyamine Polymers 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- LTVUCOSIZFEASK-MPXCPUAZSA-N (3ar,4s,7r,7as)-3a-methyl-3a,4,7,7a-tetrahydro-4,7-methano-2-benzofuran-1,3-dione Chemical compound C([C@H]1C=C2)[C@H]2[C@H]2[C@]1(C)C(=O)OC2=O LTVUCOSIZFEASK-MPXCPUAZSA-N 0.000 description 1
- OGBWMWKMTUSNKE-UHFFFAOYSA-N 1-(2-methylprop-2-enoyloxy)hexyl 2-methylprop-2-enoate Chemical compound CCCCCC(OC(=O)C(C)=C)OC(=O)C(C)=C OGBWMWKMTUSNKE-UHFFFAOYSA-N 0.000 description 1
- WRIQURLBLGHVCP-UHFFFAOYSA-N 1-(2-methylprop-2-enoyloxy)propyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(CC)OC(=O)C(C)=C WRIQURLBLGHVCP-UHFFFAOYSA-N 0.000 description 1
- UALAKBZSBJIXBP-UHFFFAOYSA-N 1-phenylethane-1,1,2,2-tetrol Chemical compound OC(O)C(O)(O)C1=CC=CC=C1 UALAKBZSBJIXBP-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- JJBFVQSGPLGDNX-UHFFFAOYSA-N 2-(2-methylprop-2-enoyloxy)propyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)COC(=O)C(C)=C JJBFVQSGPLGDNX-UHFFFAOYSA-N 0.000 description 1
- HWSSEYVMGDIFMH-UHFFFAOYSA-N 2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOC(=O)C(C)=C HWSSEYVMGDIFMH-UHFFFAOYSA-N 0.000 description 1
- OWDBMKZHFCSOOL-UHFFFAOYSA-N 2-[2-[2-(2-methylprop-2-enoyloxy)propoxy]propoxy]propyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)COC(C)COC(C)COC(=O)C(C)=C OWDBMKZHFCSOOL-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- UPTHZKIDNHJFKQ-UHFFFAOYSA-N 2-methylprop-2-enoic acid;propane-1,2,3-triol Chemical compound CC(=C)C(O)=O.CC(=C)C(O)=O.OCC(O)CO UPTHZKIDNHJFKQ-UHFFFAOYSA-N 0.000 description 1
- HGFWTERYDVYMMD-UHFFFAOYSA-N 3,3-dichlorooxolane-2,5-dione Chemical compound ClC1(Cl)CC(=O)OC1=O HGFWTERYDVYMMD-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- YAXXOCZAXKLLCV-UHFFFAOYSA-N 3-dodecyloxolane-2,5-dione Chemical compound CCCCCCCCCCCCC1CC(=O)OC1=O YAXXOCZAXKLLCV-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- UITKHKNFVCYWNG-UHFFFAOYSA-N 4-(3,4-dicarboxybenzoyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 UITKHKNFVCYWNG-UHFFFAOYSA-N 0.000 description 1
- RIAHASMJDOMQER-UHFFFAOYSA-N 5-ethyl-2-methyl-1h-imidazole Chemical compound CCC1=CN=C(C)N1 RIAHASMJDOMQER-UHFFFAOYSA-N 0.000 description 1
- UBRPGRAGAZVZKQ-UHFFFAOYSA-N 8-(2-methylprop-2-enoyloxy)octyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCCCCCOC(=O)C(C)=C UBRPGRAGAZVZKQ-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- 229920003319 Araldite® Polymers 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- JAQDERIKCPRLSH-UHFFFAOYSA-N C(C(=C)C)(=O)O.C(C(=C)C)(=O)O.C(C(=C)C)(=O)O.C(O)CC(CO)(CO)CO Chemical compound C(C(=C)C)(=O)O.C(C(=C)C)(=O)O.C(C(=C)C)(=O)O.C(O)CC(CO)(CO)CO JAQDERIKCPRLSH-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
- ALQSHHUCVQOPAS-UHFFFAOYSA-N Pentane-1,5-diol Chemical compound OCCCCCO ALQSHHUCVQOPAS-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- GKXVJHDEWHKBFH-UHFFFAOYSA-N [2-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC=C1CN GKXVJHDEWHKBFH-UHFFFAOYSA-N 0.000 description 1
- JUDXBRVLWDGRBC-UHFFFAOYSA-N [2-(hydroxymethyl)-3-(2-methylprop-2-enoyloxy)-2-(2-methylprop-2-enoyloxymethyl)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)(COC(=O)C(C)=C)COC(=O)C(C)=C JUDXBRVLWDGRBC-UHFFFAOYSA-N 0.000 description 1
- FOVRCPBDDCLNIG-UHFFFAOYSA-N [3-(2-methylprop-2-enoyloxy)-2-(2-methylprop-2-enoyloxymethyl)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(COC(=O)C(C)=C)COC(=O)C(C)=C FOVRCPBDDCLNIG-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 150000001896 cresols Chemical class 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920006332 epoxy adhesive Polymers 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- QOHMWDJIBGVPIF-UHFFFAOYSA-N n',n'-diethylpropane-1,3-diamine Chemical compound CCN(CC)CCCN QOHMWDJIBGVPIF-UHFFFAOYSA-N 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- RFAXKLDJHPSXDX-UHFFFAOYSA-N n,n-dimethyl-1-phenylmethanamine;2,3,4-tris[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC=CC=C1.CN(C)CC1=CC=C(O)C(CN(C)C)=C1CN(C)C RFAXKLDJHPSXDX-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 230000007847 structural defect Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C45/00—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
- B29C45/17—Component parts, details or accessories; Auxiliary operations
- B29C45/26—Moulds
- B29C45/37—Mould cavity walls, i.e. the inner surface forming the mould cavity, e.g. linings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2883/00—Use of polymers having silicon, with or without sulfur, nitrogen, oxygen, or carbon only, in the main chain, as mould material
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
Abstract
Description
【発明の詳細な説明】
3、 1のiとかデ「
プラスチックレンズや光ディスクといった超高精度の品
質が要求される成形品も最近では射出成形によって簡単
に成形、生産できるようになってきている。このような
成形品を製造するとき精度を向上させる最も重要な要素
は金型の精度、とくに表面精度であるといえる。このよ
うな目的に使用する金型の雄あるいは雌型は通常ステン
レス系の金属材料を使用して機緘切削、研磨、ラッピン
グといった工程で製作されろ、しかし高精度用金型鋼材
といっても合金鋼であるためときには表面の精度がオン
グストローム単位で要求されるような金型では微細な組
織欠陥が問題となって製作時の不良発生率がかなり高い
のが現状である。またステンレス鋼は難切削性(切削し
がたく、切削に長時間かかる)であるため金型製作費は
一般の金型に比へて同僚もの経費がかかるのが現状であ
るこれに対して本発明で使用する半導体用金属シリコン
は半導体として大量に使用されているのて平(反形状品
は表面凹凸精度が5〜10オングストロームの精度で新
暦することができる。また金属シリコン;よ研磨がしや
すく材料の組織欠陥が皆無てしかも安価に人手すること
ができるのが現状である。[Detailed Description of the Invention] 3. 1.I and D "Molded products that require ultra-high precision quality, such as plastic lenses and optical discs, can now be easily molded and produced by injection molding. When manufacturing such molded products, the most important factor for improving precision is the precision of the mold, especially the surface precision.The male or female mold used for this purpose is usually made of stainless steel. It is manufactured using metal materials through processes such as machine cutting, polishing, and lapping. However, even though it is called high-precision mold steel, it is an alloy steel, so sometimes surface precision is required in angstroms. The current situation is that microstructural defects are a problem with molds, resulting in a fairly high rate of defects during manufacturing.In addition, stainless steel is difficult to cut (difficult to cut and takes a long time to cut), so molds are difficult to cut. Currently, the manufacturing cost is higher than that of a general mold.In contrast, the metal silicon for semiconductors used in the present invention is used in large quantities as a semiconductor. Metallic silicon can be polished with an accuracy of 5 to 10 angstroms on the surface.Also, metal silicon is easy to polish, has no structural defects, and can be done manually at low cost.
金属シリコンの純度はよく知られているように99.9
9999999%程度までのものが生産できるので精密
金型部材として要求される精度をはるかに凌駕する特性
を有しているといえろ。As is well known, the purity of metallic silicon is 99.9.
Since it can be produced up to about 9999999%, it can be said that it has characteristics that far exceed the accuracy required for precision mold members.
このような部材がもし射出成形金型の成形部表面に用い
ることができたならば、いままでにない超高精度の表面
を有する射出成形金型が製作できかつ金型製作コストも
大幅に低減できることが可能であるといえる。If such a member could be used on the surface of the molding part of an injection mold, it would be possible to create an injection mold with an unprecedentedly high-precision surface and significantly reduce mold manufacturing costs. It can be said that what can be done is possible.
そこで本発明者は金属シリコンと補強材を接着を才で一
体化したものを射出成形用金型として使用したとき、ど
の程度高度な面精度を有する成形品が得られるかについ
て鋭意検討した結果9本発明金型では従来から実用され
ているステンレス系の金型に比べてはるかに優れた面精
度を有する射出成形品が得られることを発見し本発明を
完成するに至った。Therefore, the inventor of the present invention conducted a thorough study to find out how high a level of surface precision a molded product can be obtained when a metal silicone and reinforcing material are integrated with adhesive and used as an injection mold.9 The present invention was completed after discovering that the mold of the present invention can produce an injection molded product with much superior surface precision compared to the stainless steel molds that have been used in the past.
本発明に使用する金属シリコンは純度が高いものは光デ
ィスク等の超高精度製品用に、純度の低いものは汎用製
品用に使用できる。またその厚さは特に限定するもので
はないが、平板状成形品用には厚さが0.3〜2mmの
ものが、アール形状を有するレンズ型には1〜10mm
のものが好ましい、さらに分厚いブロック品も金型部材
として実用できる。The metallic silicon used in the present invention can be used for ultra-high precision products such as optical discs if it has high purity, and for general purpose products if it has low purity. The thickness is not particularly limited, but the thickness is 0.3 to 2 mm for flat molded products, and 1 to 10 mm for rounded lens molds.
Thick block products are preferred, and thicker block products can also be used as mold members.
熱硬化性の接着材としては常温硬化型、光硬化型、ある
いは加熱硬化のいずれの樹脂も使用できるが一般的にい
って低温成形できる射出成形材料には常温硬化型を、高
温射出成形材料用金型には加熱硬化型のエポキシ接着材
あるいはケルイミド等の高温硬化型耐熱性接着材が好ま
しい。As a thermosetting adhesive, any of the following types can be used: room-temperature-curing, photo-curing, or heat-curing resins, but in general, cold-curing resins are used for injection molding materials that can be molded at low temperatures, and cold-curing resins are used for high-temperature injection molding materials. For the mold, it is preferable to use a heat-curing epoxy adhesive or a high-temperature curing heat-resistant adhesive such as kelimide.
エポキシ樹脂としてはビスフェノールA型、ビスフェノ
ールF型、およびそのハロゲン化エポキシ物−レツルシ
ン型、テトラヒドロキシフェニールエタン型、脂環型、
フェノールノボラック型。Epoxy resins include bisphenol A type, bisphenol F type, and their halogenated epoxy products - retrusin type, tetrahydroxyphenylethane type, alicyclic type,
Phenol novolac type.
クレゾールノボラック型、エポキシ変性アクリレート型
およびこれらを基本としての変性エポキシ樹脂があげら
れる。Examples include cresol novolak type, epoxy modified acrylate type, and modified epoxy resins based on these.
硬化材としては脂肪族アミン、芳香族アミン。Hardening agents include aliphatic amines and aromatic amines.
及びこれらのポリアミン化合物、フェノールおよびクレ
ゾール類、アミンの錯化合物、有1酸、酸無水物9等が
使用でき、各々の硬化剤の1例を示すと次のよってある
。and polyamine compounds thereof, phenols and cresols, complex compounds of amines, monoacids, acid anhydrides 9, etc. can be used, and one example of each curing agent is as follows.
ジエチレントリアミン、トリエチレンテトラミン、ジエ
チルアミノプロピルアミン、N−7ミノエチールビペラ
ジン、ベンジルジメチールアミントリス(ジメチールア
ミノメチル)フェノール。Diethylenetriamine, triethylenetetramine, diethylaminopropylamine, N-7 minoethylbiperazine, benzyldimethylamine tris(dimethylaminomethyl)phenol.
DMP30−)す(2−エチルヘクソエート)。DMP30-)su(2-ethylhexoate).
ヌクフェニレンジアミン。ジアミノジフェニールメタン
、ジアミノジフェニールスルホン、・ポリアミド樹脂、
ジシアンジアミド、三フッカはう素モノメチールアミン
、メンタンシアミン、キシリレンジアミン、エチルメチ
ルイミダソール、無水フタル酸、無水ドデシールコハク
酸、無水I\キサヒドaフタル酸、無水メチルナジック
酸、無水ピロメリット酸、p!!、水ベンゾフェノンテ
トラカルボン酸、無水ヂクロルコハク酸、無水りロレン
ディツク酸等があげられる。Nucphenylenediamine. Diaminodiphenylmethane, diaminodiphenyl sulfone, polyamide resin,
Dicyandiamide, trifluoroborine monomethylamine, menthancyamine, xylylene diamine, ethylmethyl imidazole, phthalic anhydride, dodecyl succinic anhydride, I\xahido aphthalic anhydride, methylnadic anhydride, pyromellitic anhydride Acid, p! ! , aqueous benzophenonetetracarboxylic acid, dichlorosuccinic anhydride, dilorendicic anhydride, and the like.
これらのエポキシ樹脂及び硬化剤は接着材の要求性能9
例えば硬化温度、耐熱性、力学的性質等によって組合わ
される。These epoxy resins and curing agents meet the required performance of adhesives9.
For example, they are combined depending on curing temperature, heat resistance, mechanical properties, etc.
その他の接着材としては熱硬化性各種アクリレート樹脂
、たとえばエチレングリコールジメタクリレ−1・、ジ
エチレングリコールジメタクリレート、トリエチレング
リコールジメタクリレートテトリエチレングリコールジ
メタクリレート、ポリエチレングリコールジメタクリレ
ート、プロピレングリコールジメタクリレート、ジプロ
ピレングリコールジメタクリレート、トリプロピレング
リコールジメタクリレート、プロパンジオールジメタク
リレート、グリセリンジメタクリレート。Other adhesives include various thermosetting acrylate resins, such as ethylene glycol dimethacrylate-1, diethylene glycol dimethacrylate, triethylene glycol dimethacrylate, polyethylene glycol dimethacrylate, propylene glycol dimethacrylate, and dipropylene. Glycol dimethacrylate, tripropylene glycol dimethacrylate, propanediol dimethacrylate, glycerin dimethacrylate.
1.3ブタンジオールジメタクリレー)、1.4ブタン
ジオールメタジメタクリレート、1.5ペンタンジオー
ルジメタクリレー)、L、Sヘキサンジオールジメタク
リレート、ネオペンチルグリコールジメタクリレ−1−
,1,8オクタンジオールジメタクリレート、2.3ジ
ブロムネオペンチルグリコールジメタクリレート、ヒス
フェノールAジメタクリシー)、2.2−ビス(メタク
リロイルオキシポリエトキシフェニール)プロパン。1.3 butanediol dimethacrylate), 1.4 butanediol dimethacrylate, 1.5 pentanediol dimethacrylate), L, S hexanediol dimethacrylate, neopentyl glycol dimethacrylate-1-
, 1,8 octanediol dimethacrylate, 2.3 dibromneopentyl glycol dimethacrylate, hisphenol A dimethacrylate), 2,2-bis(methacryloyloxypolyethoxyphenyl)propane.
トリメチロールプロパントリアクリレート、トリメチロ
ールメタントリメタクリレート、テトラメチロールエタ
ントリメタクリレート、テトメチロールメタントリメタ
クリレート、テトラメチロールメタンテトラメタクリレ
−)、N N−((22、・1−トリメチルへキサメ
チレン)ビス(2−(アミノカルボキシ)プロパン−1
,3−ジオール)テトラメタクリレート、等が使用でき
ろ。Trimethylolpropane triacrylate, trimethylolmethane trimethacrylate, tetramethylolethane trimethacrylate, tetramethylolmethane trimethacrylate, tetramethylolmethanetetramethacrylate), N N-((22,.1-trimethylhexamethylene)bis(2 -(aminocarboxy)propane-1
, 3-diol) tetramethacrylate, etc. can be used.
さらに前記接着材は無機質粉状充填材、繊維状補強材、
金属粉末組み合わせて使用する二ともある。Furthermore, the adhesive material may include an inorganic powder filler, a fibrous reinforcing material,
Both are used in combination with metal powder.
金属補強材としてはとくに限定するものではないが、W
J格、加工性、精度等の観点から鉄系鋼材ステンレス系
鋼材が最も実用的である。The metal reinforcing material is not particularly limited, but W
From the viewpoints of J grade, workability, precision, etc., iron-based steels and stainless steels are the most practical.
金属シリコンと接着材の接着性改善には各種カップリン
グによる表面処理が有効である。活性な金属シリコン表
面には各種カップリン剤9例えばビニルトリメトキシシ
ラン、ビニルトリエトキシシラン、ビニルトリス(2−
メトキシエト・キシ)シラン、N−(2−アミノエチル
)3−アミノプロピルメチルジメトキシシラン、N−(
2−7ミノエチル)3−7ミノブロビルメチルジメトキ
シシラン、N−(2−アミノエチル)3−アミノプロピ
ルトリメトキシシラン、3アミノプロピルトリエトキシ
シラン、3−グリシドキシプロピルメチルジメトキシシ
ラン、3−グリシドキシプロピルメチルジメトキシシラ
ン、2− (3,4−エポキシシクロヘキシル)エチル
トリメトキシシラン3−クロロプロピルメチルジメトキ
シシラン、3−クロロプロピルトリメトキシシラン、3
−メタクリロキシプロピルトリメトキシシラン、3−メ
ルカプトプロピルトリメトキシシラン等が1史用できる
。その池かにもチタン系カップリング剤や各種フッソモ
ノマやオリゴマーも効果がある。Surface treatments using various types of couplings are effective in improving the adhesion between metallic silicon and adhesives. Various coupling agents 9 such as vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris(2-
methoxyethoxy)silane, N-(2-aminoethyl)3-aminopropylmethyldimethoxysilane, N-(
2-7minoethyl) 3-7minobrobylmethyldimethoxysilane, N-(2-aminoethyl)3-aminopropyltrimethoxysilane, 3aminopropyltriethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3- Glycidoxypropylmethyldimethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3
-Methacryloxypropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane, etc. can be used. Titanium-based coupling agents and various fluoromonomers and oligomers are also effective.
金属シリコンの他の接着性改善策として金属メッキ法や
金属スパッタリング法がある。接着材の種類によっては
金属シリコンと接着材との接着力が低い場合、たとえば
金属すずメッキや黄銅メッキを行うか、あるいはニッケ
ル、クロムあるいはそれらの合金をスパッタリング法に
よって薄膜蒸着すると著しくその接着性を改善する二と
もできる。Other measures for improving the adhesion of metallic silicon include metal plating and metal sputtering. Depending on the type of adhesive, if the adhesive strength between metal silicon and the adhesive is low, for example, metal tin plating or brass plating, or thin film deposition of nickel, chromium, or their alloys by sputtering may significantly reduce the adhesive strength. You can do both to improve.
上記材料を使用してのシリコンウェハを表面に装着する
技術的課題および射出成形の実用における耐久性等を十
分に検討した結果1.従来金型がかかえているすべての
・問題が解決されることを実証でき、結果として本発明
を完成するに至った。以下本発明を実施例に沿ってより
詳しくその構成及び効果について説明する。As a result of a thorough study of the technical issues of attaching a silicon wafer to the surface using the above materials and the durability in practical injection molding, 1. We were able to demonstrate that all the problems faced by conventional molds were solved, and as a result, we completed the present invention. EMBODIMENT OF THE INVENTION The structure and effect of this invention will be explained in detail below along with an Example.
友m
厚さ1mm、直tM130mmて面精度が5〜lOオン
グメトロームに研磨されたシリコンウェハの片面に旧防
止のためプラスチック保護被膜を塗装する。露出した片
面にシランカップリング材を塗付し、110で1時間熱
処理する。シランカップリング処理表面(C表面)を図
1に示す金属補強材の接着面とが接合される形でエポキ
シ樹脂接着材(XD911.チバガイギー社製)て圧接
しその状態で150℃で5時間熱硬化させ、シリコンウ
ェハと金属補強材とを一体的に接合した。A plastic protective coating is applied to one side of a silicon wafer, which has a thickness of 1 mm, a direct diameter of 130 mm, and is polished to a surface accuracy of 5 to 10 angstroms to prevent deterioration. A silane coupling material is applied to one exposed side and heat treated at 110 for 1 hour. The silane coupling treated surface (C surface) is pressed with the adhesive surface of the metal reinforcing material shown in Figure 1 using an epoxy resin adhesive (XD911, manufactured by Ciba Geigy), and then heated at 150°C for 5 hours. After curing, the silicon wafer and metal reinforcing material were integrally bonded.
この型部品を図2にしめずモールドベースの固定側及び
移動側に組込み射出成形金型とした支毀肚l
厚さ1mm、直径130mmで面精度が5〜10オング
ストロームに研磨されたシリコンウェハの片面に傷防止
のためプラスチック保護被膜を塗装する。露出した片面
にシランカップリング材を塗付し、110で1時間熱処
理する。This mold part was assembled into the fixed side and moving side of the mold base as shown in Figure 2, and was used as an injection mold. Paint a plastic protective coating on one side to prevent scratches. A silane coupling material is applied to one exposed side and heat treated at 110 for 1 hour.
シリコンウェハの露出面に多官能性アクリル樹脂として
ペンタエリスリトールトリアクリート20g、紫外線硬
化剤としてベンゾフェノン0.2gおよびシリカ粉末8
0g、促進剤として第3級アミン0.1gを配合して調
製された光硬化型接着剤を0.5mmの厚さで塗布し、
紫外線を30秒照射して該光硬化性樹脂を硬化させた。20 g of pentaerythritol triacrylate as a polyfunctional acrylic resin, 0.2 g of benzophenone as an ultraviolet curing agent, and 8 silica powder on the exposed surface of the silicon wafer.
0g, and a photocurable adhesive prepared by blending 0.1g of tertiary amine as an accelerator was applied to a thickness of 0.5mm,
The photocurable resin was cured by irradiating it with ultraviolet rays for 30 seconds.
つぎに該硬化層と金属補強材を常温硬化性エポキシ樹脂
(ビスフェノールA型樹脂とポリアミンの組み合わせ)
で接着し、シリコンウェハと補強金属材を一体化し、こ
のものを図2に示すモールド・′\−スにはめこんで射
出成形金型どした。この金型ではすべての工程が常温で
てきるため得られた金型;よいかなる変形も認められな
かった。Next, the cured layer and metal reinforcing material are made of room temperature curable epoxy resin (a combination of bisphenol A type resin and polyamine).
The silicon wafer and reinforcing metal material were bonded together, and this was fitted into the mold space shown in FIG. 2 to form an injection mold. Since all processes in this mold were carried out at room temperature, no deformation was observed in the mold obtained.
実JU舛」−
厚さ1mm、直径130mmで面精度が5〜lOオング
ストロームに研摩されたシリコンウェハの片面に傷防止
のためプラスチック保護被膜を塗装する。露出した片面
にシランカップリング(Aを塗けし、110て1時間熱
処理する。A plastic protective coating is applied to one side of a silicon wafer, which is 1 mm thick, 130 mm in diameter, and polished to a surface accuracy of 5 to 10 angstroms, to prevent scratches. Apply silane coupling (A) to one exposed side and heat treat at 110°C for 1 hour.
シリコンウェハの露出面に多官能性アクリル樹脂として
ペンタエリスリトールトリアクリート15g、ベンゾイ
ルパーオキサイド0.15g シリカ粉末85gを混
合し、これにジメチルアニリン0.1gを混合して素早
<0.5mmの厚さに塗布する。このものを実施例2と
同様に常温硬化性のエポキシ樹脂で接着し、射出成形金
型とした爽息肚主
厚さ1mm、直径130mmで面積度が5〜IOオング
ストロームに研磨されたシリコンウェハの片面に傷防止
のためプラスチック渫護被膜を塗装する1次に露出面に
電気鍍金によって金属スズを1ミクロンの厚さて形成し
、同様に金属補強材接着面も金属スズメッキを5ミクロ
ンの厚さて行った。つぎにメッキ金属面を190℃で熱
処理し酸化した。この両メッキ層をエポキシ樹脂接着材
(アラルダイトAW、チバガイギー製)で接着し得られ
た金型部品を実施例1と同様にして射出成形金型とした
。この金型では金属シリコンと金属補強材の間の接着性
が著しく向上した。Mix 15 g of pentaerythritol triacrylate, 0.15 g of benzoyl peroxide, and 85 g of silica powder as a polyfunctional acrylic resin on the exposed surface of the silicon wafer, and mix this with 0.1 g of dimethylaniline to quickly form a thickness of <0.5 mm. Apply to. This material was adhered with room temperature curable epoxy resin in the same manner as in Example 2, and molded into an injection mold made of a silicon wafer polished to a thickness of 1 mm, a diameter of 130 mm, and an area of 5 to IO angstroms. A plastic protection film is applied to one side to prevent scratches.First, metal tin is electroplated to a thickness of 1 micron on the exposed surface, and the surface to which the metal reinforcing material is attached is similarly plated with metal tin to a thickness of 5 microns. Ta. Next, the plated metal surface was heat treated at 190° C. to oxidize it. Both plated layers were bonded together using an epoxy resin adhesive (Araldite AW, manufactured by Ciba Geigy), and the resulting mold component was made into an injection mold in the same manner as in Example 1. In this mold, the adhesion between the metal silicon and the metal reinforcement was significantly improved.
L1匠1
厚さ1mm、直径130mmで面精度が5〜10オング
ストロームに研摩されたシリコンウェハの片面に傷防止
のためプラスチック保護被膜を塗装する。つぎに露出面
にメタノールに10%で溶解したアクリルシラン(KB
M 503.l言越化学■製)を薄く塗布し、110
’Cて2時間熱処理し、この面と金属補強材面を実施例
4て用いたエポキシ樹脂で接着し、得られた金型部品を
実施例1と同様にして射出成形金型とした。L1 Takumi 1 A plastic protective coating is applied to one side of a silicon wafer, which is 1 mm thick, 130 mm in diameter, and polished to a surface precision of 5 to 10 angstroms, to prevent scratches. Next, apply acrylic silane (KB) dissolved in methanol at 10% to the exposed surface.
M503. Apply a thin layer of 110
This surface and the metal reinforcing material surface were bonded with the epoxy resin used in Example 4, and the resulting mold part was made into an injection mold in the same manner as in Example 1.
見立に1
表面が研磨されていない金属シリコンを(直径130m
m、厚さ3mm)を鉄鋼材にエポキシ樹脂(アラルダイ
)AW、チバガイギー社製)で接着し、こののち金属シ
リコンの表面を研摩、ラッピングにより鏡面とした。こ
の金型部品を所定形状に汁上げたのち、実施例1と同様
に射出成形金型とした。1 Metallic silicon with an unpolished surface (130 m in diameter)
m, thickness 3 mm) was adhered to a steel material with an epoxy resin (Araldai AW, manufactured by Ciba Geigy), and then the surface of the metal silicon was polished and wrapped to a mirror surface. After this mold part was molded into a predetermined shape, it was made into an injection molding mold in the same manner as in Example 1.
実施例1〜6で得られたすべての射出成形金型を射出成
形機に取り付け、ポリカーボネーI・を用いて下記条件
で射出成形を行った。All the injection molds obtained in Examples 1 to 6 were attached to an injection molding machine, and injection molding was performed using polycarbonate I under the following conditions.
成形条件
材料温度 300°C
金型温度 80°C
射出圧力 1000kg/c1112 ・成形品形状
直径130開、厚さ2mm得られた成形品の面積度は
ほとんど金型と同等であり、かつ長時間の成形にも本発
明の金型は耐久性を示した。Molding conditions Material temperature: 300°C Mold temperature: 80°C Injection pressure: 1000 kg/c 1112 - Molded product shape Diameter: 130 mm, thickness: 2 mm The mold of the present invention also showed durability during molding.
4、ヌ か千〇
第1図はモールドベースにはめ込む金属シリコンと補強
用金属を熱硬化性樹脂ではりつけた金型部品の断面図、
第2図は金型部品がはめ込まれた射出成形金型横断面図
をしめす。4.Nuka〇Figure 1 is a cross-sectional view of a mold part in which metal silicone and reinforcing metal are glued with thermosetting resin to be fitted into the mold base.
FIG. 2 shows a cross-sectional view of the injection mold into which the mold parts are fitted.
1、金属シリコン 2.熱硬化性樹脂接着材3、補強
用金属部材 4.孔部
5、スプル 6.スプルロックピン7、エジェ
クタビン 8.エジェクタ孔9、リターンビン 10.
ガイドピン
11、ロケーティングリング
12、成形品1. Metallic silicon 2. Thermosetting resin adhesive 3, reinforcing metal member 4. Hole 5, sprue 6. Sprue lock pin 7, ejector pin 8. Ejector hole 9, return bin 10.
Guide pin 11, locating ring 12, molded product
Claims (1)
雌型の最外面(成形樹脂と接触する面)が純度99.9
99%以上で、適切な精度で研磨された金属シリコンに
よって形成され、この金属シリコンは金属製補強材と接
着材によって一体的に接合されている。この雄型あるい
は雌型を金型にはめこんで組み立てた射出成形用金型。 2、金属シリコンと金属補強材の接着材は熱硬化性樹脂
であることを特長とする特許請求範囲第1項記載の射出
成形用金型。 3、金属シリコンと金属補強材の接着材は熱によって架
橋硬化することを特長とする特許請求範囲第1項記載の
射出成形用金型。 4、金属シリコンと金属補強材の接着材は光によって常
温で架橋硬化したものを第一層とし、さらにこれを他の
接着材で補強材と一体化することを特徴とする特許請求
範囲第1項記載の射出成形金型。 5、金属シリコンと金属補強材の接着材は触媒促進剤に
より常温で架橋硬化することを特徴とする特許請求範囲
第1項記載の射出成形用金型。 6、接着用熱硬化性樹脂は、無機質充填材、金属粉末ま
たは繊維状補強材を添加して複合系としたことを特徴と
する特許請求範囲第1項記載の射出成形用金型。 7、金属シリコンの接着面(接着材を介して金属補強材
と接着する面)および金属補強材の接着面は接着適性の
ある金属鍍金あるいは金属の蒸着をおこなって接着強度
を向上させた形で熱硬化性樹脂によって金属補強材と一
体的に接合された特許請求範囲第1項記載の射出成形金
型。 8、金属シリコンの接着面(接着材を介して金属補強材
と接着する面)は熱硬化性樹脂との接着性改善のために
シラン系カップリング材、チタネート系カップリング剤
、その他有機系のプライマを下塗りして接着強度を向上
させた形で熱硬化性樹脂によって金属補強材と一体的に
接合された特許請求範囲第1項記載の射出成形金型。[Claims] 1. The outermost surfaces of the male and female molds (the surfaces that come into contact with the molding resin) constituting the cavity part of the injection mold have a purity of 99.9.
More than 99% of the material is made of silicon metal, which has been polished to an appropriate precision and is integrally bonded to metal reinforcements and adhesives. An injection mold is assembled by fitting this male or female mold into a mold. 2. The injection mold according to claim 1, wherein the adhesive between the metal silicone and the metal reinforcing material is a thermosetting resin. 3. The injection mold according to claim 1, wherein the adhesive between the metal silicon and the metal reinforcing material is cross-linked and cured by heat. 4. The first layer of the adhesive between the metal silicon and the metal reinforcing material is one that is cross-linked and cured by light at room temperature, and is further integrated with the reinforcing material using another adhesive. Injection mold as described in section. 5. The injection mold according to claim 1, wherein the adhesive between the metal silicon and the metal reinforcing material is crosslinked and cured at room temperature by a catalyst promoter. 6. The injection mold according to claim 1, wherein the adhesive thermosetting resin is made into a composite system by adding an inorganic filler, metal powder, or fibrous reinforcing material. 7. The adhesion surface of the metal silicon (the surface that adheres to the metal reinforcing material through the adhesive) and the adhesion surface of the metal reinforcement material are plated with metal or vapor-deposited with a metal suitable for adhesion to improve adhesive strength. An injection mold according to claim 1, which is integrally joined to a metal reinforcing material by a thermosetting resin. 8. The adhesive surface of metal silicon (the surface that is bonded to the metal reinforcing material via adhesive) is coated with a silane coupling agent, titanate coupling agent, or other organic coupling agent to improve adhesion with the thermosetting resin. The injection mold according to claim 1, which is integrally joined to a metal reinforcing material by a thermosetting resin with a primer coated thereon to improve adhesive strength.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2470186A JPS62181119A (en) | 1986-02-06 | 1986-02-06 | Mold for high accuracy injection molding |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2470186A JPS62181119A (en) | 1986-02-06 | 1986-02-06 | Mold for high accuracy injection molding |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62181119A true JPS62181119A (en) | 1987-08-08 |
Family
ID=12145479
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2470186A Pending JPS62181119A (en) | 1986-02-06 | 1986-02-06 | Mold for high accuracy injection molding |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62181119A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2021246154A1 (en) * | 2020-06-05 | 2021-12-09 | 出光興産株式会社 | Curable composition, mold for injection molding, and injection molding method for thermosetting composition |
-
1986
- 1986-02-06 JP JP2470186A patent/JPS62181119A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2021246154A1 (en) * | 2020-06-05 | 2021-12-09 | 出光興産株式会社 | Curable composition, mold for injection molding, and injection molding method for thermosetting composition |
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