JPS62180939U - - Google Patents
Info
- Publication number
- JPS62180939U JPS62180939U JP6895186U JP6895186U JPS62180939U JP S62180939 U JPS62180939 U JP S62180939U JP 6895186 U JP6895186 U JP 6895186U JP 6895186 U JP6895186 U JP 6895186U JP S62180939 U JPS62180939 U JP S62180939U
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- electrode
- circular hole
- ion source
- etching chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005530 etching Methods 0.000 claims description 7
- 238000010884 ion-beam technique Methods 0.000 claims description 4
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6895186U JPS62180939U (fi) | 1986-05-08 | 1986-05-08 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6895186U JPS62180939U (fi) | 1986-05-08 | 1986-05-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62180939U true JPS62180939U (fi) | 1987-11-17 |
Family
ID=30909237
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6895186U Pending JPS62180939U (fi) | 1986-05-08 | 1986-05-08 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62180939U (fi) |
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1986
- 1986-05-08 JP JP6895186U patent/JPS62180939U/ja active Pending