JPS62174770A - Electrophotographic sensitive body - Google Patents
Electrophotographic sensitive bodyInfo
- Publication number
- JPS62174770A JPS62174770A JP1588786A JP1588786A JPS62174770A JP S62174770 A JPS62174770 A JP S62174770A JP 1588786 A JP1588786 A JP 1588786A JP 1588786 A JP1588786 A JP 1588786A JP S62174770 A JPS62174770 A JP S62174770A
- Authority
- JP
- Japan
- Prior art keywords
- photoreceptor
- protective layer
- moisture
- resistant protective
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 claims abstract description 14
- 239000010410 layer Substances 0.000 claims abstract description 14
- 239000011241 protective layer Substances 0.000 claims abstract description 13
- 239000000843 powder Substances 0.000 claims abstract description 10
- 239000011230 binding agent Substances 0.000 claims abstract description 9
- TZHYBRCGYCPGBQ-UHFFFAOYSA-N [B].[N] Chemical compound [B].[N] TZHYBRCGYCPGBQ-UHFFFAOYSA-N 0.000 claims abstract description 4
- HMDDXIMCDZRSNE-UHFFFAOYSA-N [C].[Si] Chemical compound [C].[Si] HMDDXIMCDZRSNE-UHFFFAOYSA-N 0.000 claims abstract description 4
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims abstract description 4
- UMVBXBACMIOFDO-UHFFFAOYSA-N [N].[Si] Chemical compound [N].[Si] UMVBXBACMIOFDO-UHFFFAOYSA-N 0.000 claims abstract description 3
- 108091008695 photoreceptors Proteins 0.000 claims description 34
- 230000035945 sensitivity Effects 0.000 abstract description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 8
- 239000001257 hydrogen Substances 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 150000002431 hydrogen Chemical class 0.000 description 5
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- UKWHYYKOEPRTIC-UHFFFAOYSA-N mercury(ii) oxide Chemical compound [Hg]=O UKWHYYKOEPRTIC-UHFFFAOYSA-N 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 239000011669 selenium Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- RHKSESDHCKYTHI-UHFFFAOYSA-N 12006-40-5 Chemical compound [Zn].[As]=[Zn].[As]=[Zn] RHKSESDHCKYTHI-UHFFFAOYSA-N 0.000 description 1
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- 241001391944 Commicarpus scandens Species 0.000 description 1
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 1
- 229910007991 Si-N Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910006294 Si—N Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- -1 arsenic selenide Chemical class 0.000 description 1
- CUGMJFZCCDSABL-UHFFFAOYSA-N arsenic(3+);trisulfide Chemical compound [S-2].[S-2].[S-2].[As+3].[As+3] CUGMJFZCCDSABL-UHFFFAOYSA-N 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- LJLWNMFUZWUGPO-UHFFFAOYSA-N calcium strontium disulfide Chemical compound [S--].[S--].[Ca++].[Sr++] LJLWNMFUZWUGPO-UHFFFAOYSA-N 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229940101209 mercuric oxide Drugs 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- GGYFMLJDMAMTAB-UHFFFAOYSA-N selanylidenelead Chemical compound [Pb]=[Se] GGYFMLJDMAMTAB-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- GKCNVZWZCYIBPR-UHFFFAOYSA-N sulfanylideneindium Chemical compound [In]=S GKCNVZWZCYIBPR-UHFFFAOYSA-N 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- POWFTOSLLWLEBN-UHFFFAOYSA-N tetrasodium;silicate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-][Si]([O-])([O-])[O-] POWFTOSLLWLEBN-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000001238 wet grinding Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/085—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and being incorporated in an inorganic bonding material, e.g. glass-like layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/14—Inert intermediate or cover layers for charge-receiving layers
- G03G5/147—Cover layers
- G03G5/14704—Cover layers comprising inorganic material
Abstract
Description
【発明の詳細な説明】
技術分野
本発明は乾式および湿式複写機用用いられる感光体、特
に無機光導電性粉末とガラス結着剤とからなる感光体に
関するもので複写機、プリンター等の記録用エンジンに
応用できるものである。DETAILED DESCRIPTION OF THE INVENTION Technical Field The present invention relates to a photoreceptor used in dry and wet copying machines, particularly a photoreceptor made of an inorganic photoconductive powder and a glass binder, and is used for recording in copying machines, printers, etc. This can be applied to engines.
従来技術
ガラスバインダーを用いた無機感光体の特許はコールシ
ンのU S P 31519B2号で開示され、この感
光体は従来のセレン感光体より何倍も長い耐久性を有し
、感度も優れていることが知られているが、耐湿性がな
いために実用化されていない。PRIOR ART A patent for an inorganic photoreceptor using a glass binder is disclosed in Colesyn's USP 31519B2, and this photoreceptor has many times longer durability and superior sensitivity than conventional selenium photoreceptors. is known, but it has not been put into practical use because it lacks moisture resistance.
この欠点を改良するために特公昭45−24919号(
ピログラフカラス結着板の湿度安定性および耐摩耗性を
改善する方法)において、セレンを表面層に拡散させる
ことで耐湿性を改良することか提案されているかこの提
案も実用化されていない。In order to improve this drawback, Japanese Patent Publication No. 45-24919 (
In the method for improving the humidity stability and abrasion resistance of pyrograph glass binding plates), has it been proposed to improve the moisture resistance by diffusing selenium into the surface layer? This proposal has also not been put to practical use.
近年a−3i感光体が高感度、高耐久性ということで注
目されているが、感光層の厚さか20μ前後であるため
に電位コントラストが弱く、所定の画像濃度を得るため
に特殊な現像技術を必要としている。In recent years, the A-3I photoconductor has attracted attention for its high sensitivity and high durability, but because the thickness of the photosensitive layer is around 20μ, the potential contrast is weak, and special development technology is required to obtain the desired image density. need.
ところで、このa−3i悪感光で感光層を厚くできない
理由は、
a)厚さを40μ以上にすると感光層が割れ易くなり、
かつ、膜質特性が劣化する。By the way, the reason why the photosensitive layer cannot be made thicker with this a-3i exposure is that a) if the thickness is made more than 40μ, the photosensitive layer becomes easy to break;
In addition, film quality characteristics deteriorate.
b)厚さの大きい感光層を形成するには製造時間がかか
り、原価が上昇する。b) Forming a thick photosensitive layer requires manufacturing time and increases cost.
目 的
本発明は、従来技術の上記問題点を解決するために、
a)非光導電性、絶縁性ガラスエナメル結着剤中に微細
な光導電性粉末を混合した電子写真感光体の湿度に対す
る安定性を改善すること、
b)a−3i悪感光より低コストで、従来の現像技術で
現像可能な高感度、高耐久性感光体を提供すること、
C)乾式および湿式複写機に使用することができる感光
体を提供することを目的としている。Purpose The present invention solves the above-mentioned problems of the prior art. b) providing a highly sensitive, highly durable photoreceptor that is developable with conventional development techniques at a lower cost than the a-3i photoreceptor; c) for use in dry and wet copiers. The purpose is to provide a photoreceptor that can
構 成
上記目的を達成するための本発明の構成は、導電性支持
体上に無機光導電性粉末とガラス結着剤とからなる光導
電層上に耐湿性保護層を有する電子写真用感光体である
。Structure The structure of the present invention to achieve the above object is to provide an electrophotographic photoreceptor having a moisture-resistant protective layer on a photoconductive layer made of an inorganic photoconductive powder and a glass binder on a conductive support. It is.
上記無機光導電性粉末について具体的に説明すると、特
公昭45−24919号に示されている硫化カルシウム
−ストロンチウム、硫化亜鉛、酸化亜鉛、砒化亜鉛、硫
化カドミウム、硫化砒素、−酸化鉛、セレン化ガリウム
、硫化インジウム、セレン化砒素、酸化第二水銀、二重
化チタン、チタン酸亜鉛等である。To specifically explain the above inorganic photoconductive powder, calcium strontium sulfide, zinc sulfide, zinc oxide, zinc arsenide, cadmium sulfide, arsenic sulfide, -lead oxide, and selenide are shown in Japanese Patent Publication No. 45-24919. These include gallium, indium sulfide, arsenic selenide, mercuric oxide, duplex titanium, and zinc titanate.
耐湿性保護層は、シリコン−炭素、シリコン−窒素、ボ
ロン−窒素を主体とする膜であって、例えばボロン−窒
素を主体とする膜というのは下記の構成を有しているも
のである。The moisture-resistant protective layer is a film mainly composed of silicon-carbon, silicon-nitrogen, or boron-nitrogen. For example, a film mainly composed of boron-nitrogen has the following structure.
一般式 %式% ただし、0<x<1、O≦y<0.5 Xは第3成分を表わす。general formula %formula% However, 0<x<1, O≦y<0.5 X represents the third component.
すなわち、実質上、窒素およびポロンから構成される場
合(y=Oの場合)とざらに第3成分を含む場合がおり
、第3成分Xとしては、水素、塩素、フッ素等がおる。That is, in some cases it is substantially composed of nitrogen and poron (in the case where y=O), and in some cases it may contain a third component, and the third component X includes hydrogen, chlorine, fluorine, etc.
水素、塩素、フッ素などはアモルファスポロン−窒素膜
のダンプリングボンドのターミネータ−となったり、あ
るいは−配位の水素、ハロゲン等により構造に柔軟性が
増して、欠陥密度が少ない良質の膜が形成できる。Hydrogen, chlorine, fluorine, etc. act as terminators for dumping bonds in the amorphous poron-nitrogen film, or -coordination hydrogen, halogen, etc. increase the flexibility of the structure and form a high-quality film with low defect density. can.
以下、実施例によって本発明を具体的に説明する。Hereinafter, the present invention will be specifically explained with reference to Examples.
実施例1
カラスバインダーフリットの組成
囲酸 20wt%閑化カルシウ
ム 13wt%酸化亜鉛
21W1%無水囲砂 28wt
%正珪酸ナトリウム 18wt%上記組成の
原料配合物200!IIをアルミナルツボに入れ、11
00℃に3時間加熱して熔融した。Example 1 Composition of glass binder frit Surrounding acid 20wt% calcium oxide 13wt% zinc oxide
21W1% anhydrous sand 28wt
% Sodium Orthosilicate 18wt% Raw material blend with the above composition 200! Put II into the aluminum pot, 11
The mixture was heated to 00° C. for 3 hours to melt.
これを脱イオン水中に流し込んでガラスフリットにした
。This was poured into deionized water to make a glass frit.
このガラスフリット50gを、よく洗浄した9cm径の
¥ta製ボールミルに入れ、脱イオン水30m lを加
えて86rpmで5時間湿式粉砕した。50 g of this glass frit was placed in a well-washed 9 cm diameter ball mill manufactured by JTA, and 30 ml of deionized water was added thereto, followed by wet milling at 86 rpm for 5 hours.
この粉砕物にCdS粉末(GE製、No。CdS powder (manufactured by GE, No.
118−8)12c+rを加えてホモミキサーで5分間
混合して粉末を分散させたものを厚ざO15m、mのよ
く洗浄された2枚の低炭素鋼板にスプレー塗布して光導
電層を形成した。118-8) 12c+r was added and mixed for 5 minutes using a homomixer to disperse the powder, which was spray coated onto two well-washed low carbon steel plates with a thickness of 15 m and 0.0 m to form a photoconductive layer. .
この塗布層を設けた炭素鋼板を温度550°Cの電気炉
に入れて5分間焼成した後に徐冷し、厚さ約10μの感
光層を有する感光体を得た。The carbon steel plate provided with this coating layer was placed in an electric furnace at a temperature of 550°C, fired for 5 minutes, and then slowly cooled to obtain a photoreceptor having a photosensitive layer with a thickness of about 10 μm.
それ等を感光体Aと感光体Bとした。These were designated as photoreceptor A and photoreceptor B.
感光体AをプラズマCVD装置にセットし、下記のシリ
コン−炭素膜(sr−c膜)形成条件て膜厚0.3μの
、5i−Cを主体とする膜を形成し、これを感光体Cと
した。Photoreceptor A was set in a plasma CVD apparatus, and a film mainly composed of 5i-C was formed with a thickness of 0.3 μm under the following silicon-carbon film (SRC film) formation conditions, and this was applied to photoreceptor C. And so.
5i−CPU形成条件
SiH4水素中の濃度10%の3i1−14CH4水素
中の濃度10%のCH4
圧力 3torr全流量(丁
otal flow) 10105sc高周波
入電力(RF Power) 35watts(13
,568H2)
感光体温度 250℃S;−C膜を有
する感光体Cと5i−C膜のない上記感光体Bを用いて
画像形成実験を行なった。5i-CPU formation conditions SiH4 concentration of 10% in hydrogen 3i1-14 CH4 concentration of 10% in hydrogen of CH4 Pressure 3 torr Total flow 10105sc Radio frequency input power (RF Power) 35 watts (13
, 568H2) Photoreceptor temperature: 250°C S; An image forming experiment was conducted using Photoreceptor C having a -C film and Photoreceptor B having no 5i-C film.
この実験の結果は、コロナ帯電器に一7kV印加して感
光体Bと感光体Cとを帯電させたところ、約700Vの
表面電位をもち、これは露光したらマグネットブラシ現
像で充分現像できる電位コントラストであった。しかし
、感光体Bは30℃、50%RHの雰囲気では画像がボ
ケる現像が見られた。これに対して感光体Cは上記条件
では勿論、更に30’C190%RHでも画像ボケは発
生しなかった。The results of this experiment showed that when photoconductors B and C were charged by applying 17kV to a corona charger, they had a surface potential of about 700V, which is a potential contrast that can be developed sufficiently by magnetic brush development after exposure. Met. However, in the case of photoreceptor B, in an atmosphere of 30° C. and 50% RH, development was observed in which the image became blurred. On the other hand, photoreceptor C did not exhibit image blurring under the above conditions, and even under 30'C190%RH.
実施例2
実施例1の5i−Cを主体とする膜の代りにシリコン−
窒素(Si−N>を主体とする膜をガラスバインダー光
導電体の表面に形成し、実施例1と同様な画像形成実験
をした。Example 2 Silicon-based film was used instead of the 5i-C film of Example 1.
A film mainly composed of nitrogen (Si-N>) was formed on the surface of a glass binder photoconductor, and an image forming experiment similar to that in Example 1 was conducted.
5i−N膜形成条件
3i1−14 水素中濃度10%の5iH4NHI
水素中濃度10%のN H3圧力
3tOrr仝流量
150CCM高周波入電力 200watts(1
3,56Htlz)感光体温度 25
0℃画像形成試験の結果は、実施例1と同様にs+−N
を主体にした膜すなわち耐湿性保護層を設けたものは3
0″C,90%RHの条件でも画像はボケずに良好な画
像が得られた。5i-N film formation conditions 3i1-14 5iH4NHI with a concentration of 10% in hydrogen
N H3 pressure at 10% concentration in hydrogen
3tOrr flow rate
150CCM high frequency input power 200watts (1
3,56Htlz) Photoreceptor temperature 25
The results of the 0°C image formation test were s+-N as in Example 1.
A film based on 3.
Even under the conditions of 0''C and 90% RH, a good image was obtained without blurring.
実施例3
実施例1の5i−Cを主体とする膜の代りにポロン−窒
素(B−N>を主体とする膜を下記条件で形成して実施
例1と同様な画像形成実験をした。Example 3 An image forming experiment similar to that in Example 1 was conducted by forming a film mainly composed of poron-nitrogen (B-N>) in place of the film mainly composed of 5i-C in Example 1 under the following conditions.
B−N膜形成条件
B2 H6水素中濃度0.3%の82 HGNH3水素
中濃度 2%のNHI
圧力 1 torr全流量
150CCH高周波入電力 2
00watts(13,56MHz)感光体温度
250℃画像形成実談の結果は、実施例2
と同様に、B−N膜である耐湿性保護層を有するものは
30’C190%RHの条件でも画像はボケずに良好な
画像が得られた。B-N film formation conditions B2 H6 concentration in hydrogen 0.3% 82 HGNH3 concentration in hydrogen 2% NHI Pressure 1 torr Total flow rate
150CCH high frequency input power 2
00watts (13,56MHz) Photoreceptor temperature
The results of the 250°C image formation are shown in Example 2.
Similarly, in the case of the one having a moisture-resistant protective layer which is a BN film, a good image was obtained without blurring even under the conditions of 30'C190%RH.
実施例4
実施例1のガラスフリットの代りに日本フェロ−製のガ
ラスフリット(N o、 At−80)を用いて下記の
光導電層形成液をつくった。Example 4 The following photoconductive layer forming solution was prepared using a glass frit manufactured by Nippon Ferro Co., Ltd. (No, At-80) in place of the glass frit used in Example 1.
光導電層形成液の組成
ガラスフリット(AL−80) 50gr浮遊
剤(AL−30J ) 6gr脱イオ
ン水 19m1硫化カドミウム粉末
(GE−118−8−2)33.3gr
この液を、よく脱脂された厚さ0.5mmのアルミニウ
ム板に流延塗布し、自然乾燥してから538℃±4℃に
保った電気炉に徐々に入れ、6分間焼成し、徐冷しなか
ら炉から取り出した。Composition of photoconductive layer forming liquid Glass frit (AL-80) 50 gr floating agent (AL-30J) 6 gr deionized water 19 ml Cadmium sulfide powder (GE-118-8-2) 33.3 gr This liquid was thoroughly degreased. The mixture was cast onto an aluminum plate with a thickness of 0.5 mm, air-dried, and then gradually placed in an electric furnace maintained at 538° C.±4° C., fired for 6 minutes, and then slowly cooled before being taken out from the furnace.
こうして製作した感光体をミリオン化学■製グランダク
リーナーM X 70001の7%水溶液の温度約70
℃の液中に10分間浸漬した後、充分に水洗、乾燥し、
感光体りとした。この感光体の光導電層の膜厚は61μ
であった。The thus produced photoreceptor was heated to a temperature of approximately 70% in a 7% aqueous solution of Granda Cleaner M
After immersing in a solution at ℃ for 10 minutes, thoroughly washing with water and drying,
It was like a photoreceptor. The film thickness of the photoconductive layer of this photoreceptor is 61μ
Met.
上記感光体りと同じ構成の感光体に実施例1の51−C
膜形成条件と同じ条件で、時間のみを変えて種々の厚さ
の5r−c膜を形成した感光体(E−L)をつくり、こ
れに温度、湿度を変えた環境で画像テストを行なった。51-C of Example 1 was added to the photoreceptor having the same structure as the above photoreceptor.
Photoreceptors (E-L) were made with 5R-C films of various thicknesses formed under the same conditions as the film formation conditions, but only for different times, and image tests were conducted on these in environments with different temperature and humidity. .
その結果を下記第1表に示す。The results are shown in Table 1 below.
第1表
注1、Q;画像ボケなし、
△;一部画像画像ボケ、
X;仝面画像ボケあり、
注2.20’C130%RHの環境で繰り返し使用した
時には地汚れ発生、
上記テストの結果から保護膜の厚さは0.05〜5μの
範囲が好ましいことかわかった。Table 1 Note 1, Q: No image blur, △: Some images are blurred, The results show that the thickness of the protective film is preferably in the range of 0.05 to 5 μm.
5i−N系を主体とする保護膜、B−N系を主体とする
保護膜について同じテストを実施した結果も同様でおっ
た。Similar results were obtained when the same test was conducted on a protective film mainly composed of 5i-N system and a protective film mainly composed of BN system.
また、上記各実施例ではプラズマCVDによって保護膜
を形成したが、光CVD法でも同様な結果か得られた。Further, in each of the above Examples, the protective film was formed by plasma CVD, but similar results were obtained by photo-CVD.
発明の詳細
な説明したように、本発明によれば、非光導電性絶縁性
ガラスエナメル結着剤中に微細な光導電性粉末を混合し
た電子写真感光体の高湿度環境における安定性を改善す
ることができる。DETAILED DESCRIPTION OF THE INVENTION According to the present invention, the stability of an electrophotographic photoreceptor in which a fine photoconductive powder is mixed in a non-photoconductive insulating glass enamel binder in a high humidity environment is improved. can do.
図面は本発明の電子写真用感光体の構成の説明図である
。
1・・・導電性支持体、2・・・光導電層、3・・・耐
湿性保護層。The drawing is an explanatory view of the structure of the electrophotographic photoreceptor of the present invention. DESCRIPTION OF SYMBOLS 1... Conductive support body, 2... Photoconductive layer, 3... Moisture-resistant protective layer.
Claims (5)
剤とからなる光導電層上に耐湿性保護層を有する電子写
真用感光体。(1) An electrophotographic photoreceptor having a moisture-resistant protective layer on a photoconductive layer consisting of an inorganic photoconductive powder and a glass binder on a conductive support.
シリコン−窒素を主体とする膜、ボロン−窒素を主体と
する膜のうちのいずれかである、特許請求の範囲(1)
項に記載の感光体。(2) a film in which the moisture-resistant protective layer is mainly composed of silicon-carbon;
Claim (1) which is either a film mainly composed of silicon-nitrogen or a film mainly composed of boron-nitrogen.
The photoreceptor described in section.
求の範囲(2)項に記載の感光体。(3) The photoreceptor according to claim (2), wherein the moisture-resistant protective layer has a thickness of 0.05 to 5 μm.
特許請求の範囲(1)〜(3)の何れかの感光体。(4) the moisture-resistant protective layer is formed by plasma CVD;
A photoreceptor according to any one of claims (1) to (3).
求の範囲(1)〜(3)項の何れかの感光体。(5) The photoreceptor according to any one of claims (1) to (3), wherein the moisture-resistant protective layer is formed by photo-CVD.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1588786A JPS62174770A (en) | 1986-01-29 | 1986-01-29 | Electrophotographic sensitive body |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1588786A JPS62174770A (en) | 1986-01-29 | 1986-01-29 | Electrophotographic sensitive body |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62174770A true JPS62174770A (en) | 1987-07-31 |
Family
ID=11901298
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1588786A Pending JPS62174770A (en) | 1986-01-29 | 1986-01-29 | Electrophotographic sensitive body |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62174770A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009086579A (en) * | 2007-10-03 | 2009-04-23 | Fuji Xerox Co Ltd | Electrophotographic photoreceptor, process cartridge and image forming apparatus |
-
1986
- 1986-01-29 JP JP1588786A patent/JPS62174770A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009086579A (en) * | 2007-10-03 | 2009-04-23 | Fuji Xerox Co Ltd | Electrophotographic photoreceptor, process cartridge and image forming apparatus |
US8158316B2 (en) | 2007-10-03 | 2012-04-17 | Fuji Xerox Co., Ltd. | Electrophotographic photoreceptor, process cartridge and image forming apparatus |
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