JPS62166261U - - Google Patents
Info
- Publication number
- JPS62166261U JPS62166261U JP5504086U JP5504086U JPS62166261U JP S62166261 U JPS62166261 U JP S62166261U JP 5504086 U JP5504086 U JP 5504086U JP 5504086 U JP5504086 U JP 5504086U JP S62166261 U JPS62166261 U JP S62166261U
- Authority
- JP
- Japan
- Prior art keywords
- strip
- plating
- passing direction
- anode
- insoluble
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007747 plating Methods 0.000 claims description 8
- 238000009713 electroplating Methods 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 238000012790 confirmation Methods 0.000 description 1
Description
第1図は本考案の一実施例に係るメツキ装置の
要部を示す側面図、第2図は同上メツキ装置の要
部正面図、第3図イ〜ホは本考案に基づく遮へい
板について他の具体例を示す部分正面図、第4図
は従来のメツキ装置を示す側面図、第5図は従来
のメツキ装置における極間流速度分布を示す説明
図、第6図は本考案の実施効果確認のために行つ
た実験の結果を示す流速分布図である。
図中、1:メツキ槽、2:電極、3:噴流ノズ
ル、4:遮へい板。
FIG. 1 is a side view showing the main parts of a plating device according to an embodiment of the present invention, FIG. 2 is a front view of the main parts of the same plating device, and FIGS. Fig. 4 is a side view showing a conventional plating device, Fig. 5 is an explanatory diagram showing the flow velocity distribution between poles in the conventional plating device, and Fig. 6 shows the effect of implementing the present invention. It is a flow velocity distribution diagram showing the results of an experiment conducted for confirmation. In the figure, 1: plating tank, 2: electrode, 3: jet nozzle, 4: shielding plate.
Claims (1)
で対向配置された一対の不溶性陽極2,2間にス
トリツプ通板方向に対し向流または順流で噴流ノ
ズル3からメツキ液を吹込むメツキ装置において
、前記不溶性陽極2に、その陽極間間隙dのスト
リツプ通板方向左右両側の開口を可及的に閉塞す
る遮へい板4,4を設けたことを特徴とする電気
メツキ装置。 In a plating device, a plating liquid is blown from a jet nozzle 3 in a countercurrent or forward flow with respect to the strip passing direction between a pair of insoluble anodes 2, 2, which are disposed opposite to each other across a strip S passing line in a plating tank 1. An electroplating device characterized in that the insoluble anode 2 is provided with shield plates 4, 4 for closing the openings on both the left and right sides of the anode gap d in the strip passing direction as much as possible.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5504086U JPS62166261U (en) | 1986-04-11 | 1986-04-11 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5504086U JPS62166261U (en) | 1986-04-11 | 1986-04-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62166261U true JPS62166261U (en) | 1987-10-22 |
Family
ID=30882584
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5504086U Pending JPS62166261U (en) | 1986-04-11 | 1986-04-11 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62166261U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002220690A (en) * | 2001-01-29 | 2002-08-09 | Dowa Mining Co Ltd | Electroplating method and electroplating apparatus |
-
1986
- 1986-04-11 JP JP5504086U patent/JPS62166261U/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002220690A (en) * | 2001-01-29 | 2002-08-09 | Dowa Mining Co Ltd | Electroplating method and electroplating apparatus |
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