JPS62162224U - - Google Patents
Info
- Publication number
- JPS62162224U JPS62162224U JP4157186U JP4157186U JPS62162224U JP S62162224 U JPS62162224 U JP S62162224U JP 4157186 U JP4157186 U JP 4157186U JP 4157186 U JP4157186 U JP 4157186U JP S62162224 U JPS62162224 U JP S62162224U
- Authority
- JP
- Japan
- Prior art keywords
- dyed fabric
- veil
- double
- base material
- edges
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004744 fabric Substances 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 5
- 239000003086 colorant Substances 0.000 claims 1
- 210000001624 hip Anatomy 0.000 claims 1
Landscapes
- Coloring (AREA)
- Decoration Of Textiles (AREA)
- Purses, Travelling Bags, Baskets, Or Suitcases (AREA)
Description
図面は本考案の実施例を示すものであつて、第
１図は一部省略正面見取図、第２図は同背面見取
図、第３図は横断面図、第４図は短縁部分の見取
図、第５図はその他の実施例を示す見取図である
。
１，２……染織物地、３……両端長縁、４，４
ａ……柄模様、５……両端短縁、６……帯状模様
部、７……縫合、Ａ……ベール基材。
The drawings show an embodiment of the present invention, in which Fig. 1 is a partially omitted front view, Fig. 2 is a rear view of the same, Fig. 3 is a cross-sectional view, and Fig. 4 is a sketch of a short edge portion. FIG. 5 is a sketch showing another embodiment. 1, 2...Dyed fabric, 3...Long edges on both ends, 4,4
a...Pattern pattern, 5...Short edges at both ends, 6...Striped pattern portion, 7...Sewing, A...Veil base material.
Claims (1)
模様４，４ａを現出させた広幅で少なくとも肩か
ら垂下させた際、両腰部付近に達する長さを備え
た二重の染織物地１，２より成るベール基材Ａで
あつて、該ベール基材Ａの両端短縁５に同一素材
による帯状模様部６を形成したことを特徴とする
染織物地によるベール。 A double-dyed fabric with double-dyed fabric having a wide width and a length that reaches near both waists when hanging from the shoulders at least, with both ends of the long edges 3 bag-stitched and with unique colors and patterns 4, 4a appearing on both sides. 1. A veil made of a dyed fabric, characterized in that the veil base material A is made of a dyed fabric material A and 2, and a strip pattern 6 made of the same material is formed on both short edges 5 of the veil base material A.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4157186U JPS62162224U (en) | 1986-03-20 | 1986-03-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4157186U JPS62162224U (en) | 1986-03-20 | 1986-03-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62162224U true JPS62162224U (en) | 1987-10-15 |
Family
ID=30856695
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4157186U Pending JPS62162224U (en) | 1986-03-20 | 1986-03-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62162224U (en) |
-
1986
- 1986-03-20 JP JP4157186U patent/JPS62162224U/ja active Pending