JPS62151737U - - Google Patents
Info
- Publication number
- JPS62151737U JPS62151737U JP2549187U JP2549187U JPS62151737U JP S62151737 U JPS62151737 U JP S62151737U JP 2549187 U JP2549187 U JP 2549187U JP 2549187 U JP2549187 U JP 2549187U JP S62151737 U JPS62151737 U JP S62151737U
- Authority
- JP
- Japan
- Prior art keywords
- ray
- mask
- ray absorption
- low
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 2
- 238000010521 absorption reaction Methods 0.000 claims 3
- 239000010408 film Substances 0.000 claims 1
- 239000010409 thin film Substances 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2549187U JPS62151737U (fr) | 1987-02-25 | 1987-02-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2549187U JPS62151737U (fr) | 1987-02-25 | 1987-02-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62151737U true JPS62151737U (fr) | 1987-09-26 |
Family
ID=30825696
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2549187U Pending JPS62151737U (fr) | 1987-02-25 | 1987-02-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62151737U (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0252416A (ja) * | 1988-08-16 | 1990-02-22 | Agency Of Ind Science & Technol | 平行ｘ線用露光マスク |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5057778A (fr) * | 1973-09-17 | 1975-05-20 | ||
| JPS5312274A (en) * | 1976-07-21 | 1978-02-03 | Oki Electric Ind Co Ltd | Production of mask for x-ray exposure |
| JPS53134367A (en) * | 1977-04-28 | 1978-11-22 | Toppan Printing Co Ltd | Xxray mask |
-
1987
- 1987-02-25 JP JP2549187U patent/JPS62151737U/ja active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5057778A (fr) * | 1973-09-17 | 1975-05-20 | ||
| JPS5312274A (en) * | 1976-07-21 | 1978-02-03 | Oki Electric Ind Co Ltd | Production of mask for x-ray exposure |
| JPS53134367A (en) * | 1977-04-28 | 1978-11-22 | Toppan Printing Co Ltd | Xxray mask |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0252416A (ja) * | 1988-08-16 | 1990-02-22 | Agency Of Ind Science & Technol | 平行ｘ線用露光マスク |