JPS62148804A - Inspecting instrument for surface comparison - Google Patents

Inspecting instrument for surface comparison

Info

Publication number
JPS62148804A
JPS62148804A JP29111585A JP29111585A JPS62148804A JP S62148804 A JPS62148804 A JP S62148804A JP 29111585 A JP29111585 A JP 29111585A JP 29111585 A JP29111585 A JP 29111585A JP S62148804 A JPS62148804 A JP S62148804A
Authority
JP
Japan
Prior art keywords
inspection
light intensity
compared
sample
shape information
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP29111585A
Other languages
Japanese (ja)
Inventor
Takeshi Kinoshita
剛 木之下
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP29111585A priority Critical patent/JPS62148804A/en
Publication of JPS62148804A publication Critical patent/JPS62148804A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To eliminate to the need for stable real image information or a sensitivity adjusting function of the real image information to be compared by including a means to calculate a difference with surface shape information to be compared from interference light intensity and reflected light intensity. CONSTITUTION:A reflection mirror 12 is vibrated by a vibrator 13 according to the surface shape information to be compared on a data disk 14. The interference light intensity, a wavelength of light, the laser light intensity for inspection, the laser light intensity for reference, an optical path difference from the inspection surface, the reference surface and a beam splitter 7 are denoted as I, lambda, I1, I2 and X, respectively, 1 is equal to I1+I2+2X(I1.I2)<1/2>cos(4piX1//lambda). Here, since the reflection mirror 12 for reference is moved according to the surface shape information to be compared, in case a shape of the inspection surface on a sample 1 is equal to the comparison information, I is not changed. In case I is changed, it is detected that a defect exist there. Further, in case the reflectivity of the sample is changed according to a location, the correction can be performed by considering a change of I2 from a photomultiplier 5b.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は表面比較検査装置、特に、LSIウェハなどの
微細パターンの外観を自動的に標準パターンと比較検査
を行うことに適用しうる表面比較検査装置に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a surface comparison inspection device, and particularly to a surface comparison inspection device that can be applied to automatically inspect the appearance of fine patterns such as LSI wafers and compare them with standard patterns. Regarding inspection equipment.

〔従来の技術〕[Conventional technology]

従来の技術としては、例えば、特公昭59−17075
0号公報に示されているようにパターン比較検査装置が
ある。
As a conventional technique, for example, Japanese Patent Publication No. 59-17075
There is a pattern comparison inspection device as shown in Japanese Patent No. 0.

従来の表面比較検査装置は、試料上の一点を拡大する対
物レンズと、実像を走査するために光学系の中間に配し
た回転多面鏡または振動鏡と、実像を並列に電気信号に
変換する光ファイバとホトプル群と、各々のホトマルを
個々に感度調整する高圧゛電源とを含んで構成される。
Conventional surface comparison inspection equipment consists of an objective lens that magnifies a single point on a sample, a rotating polygon mirror or vibrating mirror placed in the middle of the optical system to scan the real image, and a light beam that converts the real image into an electrical signal in parallel. It consists of a fiber, a group of photopules, and a high-voltage power supply that individually adjusts the sensitivity of each photopul.

次に従来の表面比較検査装置について図面を参照して詳
細に説明する。
Next, a conventional surface comparison inspection device will be described in detail with reference to the drawings.

第3図(a) 、 (b)は従来の表面比較検査装置の
一例を示す。
FIGS. 3(a) and 3(b) show an example of a conventional surface comparison inspection device.

第3図に示す表面比較検査装置は、対物レンズ33と、
フィールドレンズ38と結1象レンズ39と回転多面鏡
34の光学系を有する光ファイバ35と一体のホトフル
群36と、照明光37と、電流電圧変換器42とアナロ
グ比較回路44とアンド回路45.46とカウンタ47
とDAコンバータ48とDC−DCコンバータ49とを
含んでいる。ここで、第3図(a)において、37a、
37bは対物レンズ33a、33bを通って試料31の
表面を照射する照明光である。試料上の検出点32a、
32bは対物レン、(33a、33bで拡大され、フィ
ールドレンズ38a、38b:結像レンズ39a、39
bを通シ、回転多面鏡34で走査して光ファイバ35a
、35b上に結像する。光ファイバ35a、35bを通
過した光はホトフル群36a、36bに達し、電気信号
に変る。
The surface comparison inspection device shown in FIG. 3 includes an objective lens 33,
A photoful group 36 integrated with an optical fiber 35 having an optical system of a field lens 38, a quadrature lens 39, and a rotating polygon mirror 34, an illumination light 37, a current-voltage converter 42, an analog comparison circuit 44, and an AND circuit 45. 46 and counter 47
, a DA converter 48 , and a DC-DC converter 49 . Here, in FIG. 3(a), 37a,
37b is illumination light that irradiates the surface of the sample 31 through objective lenses 33a and 33b. detection point 32a on the sample,
32b is an objective lens (33a, 33b is magnified, field lens 38a, 38b: imaging lens 39a, 39
b, and is scanned by the rotating polygon mirror 34 to connect the optical fiber 35a.
, 35b. The light that has passed through the optical fibers 35a and 35b reaches the photoful groups 36a and 36b, where it is converted into an electrical signal.

ホトフル群6a、6bは数十細膜けであるので試料上の
パターン情報は、ホトフル群によって並列に検出される
ことになる。例えば、対応するホトマル同志4(lと4
0bの信号を比較して一致しない場合には、試料上に欠
陥があると判定する。
Since the photofull groups 6a and 6b are several tens of thin films, pattern information on the sample is detected in parallel by the photofull groups. For example, the corresponding Hotomaru Comrade 4 (l and 4
If the signals of 0b are compared and they do not match, it is determined that there is a defect on the sample.

ホトマルの感度調整は、第3図(a)において、検出点
32a、32bがチップ内で最も反射率が高い場所にな
るように試料31を位置決めする。このときホトマル4
1の出力電流iは、電流電圧変換器42によりミ圧に変
換される。アナログ比較回路44で電流電圧変換42の
出力電圧eと一定電圧Ecとを比較し、eくEcのとき
にはアンド回路45に論理”1″を送j)、e:>Ec
のときkは、アンド回路46に論理″′1″を送る。ア
ンド回路45゜46で上記論理信号とクロックパルスと
アンドを取9、e(Ecのときはカウンタ47をカウン
トアツプし、e>ECのときには、カウントダウンする
。e=EcのときKはカウンタの内容を保持する。カウ
ンタ47の内容はDAコンバータ18によりアナログ信
号Eiに変換される。まだ、DC−DCコンバータによ
fiDAコンバータ48の出力EiK比例した高電圧E
Oに変換しホトマル41に印加する。これにより、ホト
マル感度調整が可能となシ、ホトマル感度変化を補正で
きる。。
To adjust the sensitivity of the photomultiplier, as shown in FIG. 3(a), the sample 31 is positioned so that the detection points 32a and 32b are located at the locations with the highest reflectance within the chip. At this time, Hotomaru 4
The output current i of 1 is converted into voltage by the current-voltage converter 42. The analog comparison circuit 44 compares the output voltage e of the current-voltage converter 42 with a constant voltage Ec, and when e exceeds Ec, a logic "1" is sent to the AND circuit 45, e:>Ec.
When , k sends a logic "'1" to the AND circuit 46. AND circuit 45.46 ANDs the logic signal and the clock pulse 9. When e (Ec, the counter 47 is counted up, and when e>EC, it is counted down. When e=Ec, K is the content of the counter. The content of the counter 47 is converted into an analog signal Ei by the DA converter 18.The DC-DC converter still outputs a high voltage E proportional to the output EiK of the fiDA converter 48.
It is converted into O and applied to the photomultiplier 41. This makes it possible to adjust the photomultisensitivity and correct changes in photosensitivity. .

検査中はクロックパルスは遮断しておき、検査前の補正
時のみ入力する。
Clock pulses are cut off during inspection and input only when making corrections before inspection.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

上述した従来の表面比較検査装置は、欠陥検出法として
試料上の実像を拡大し比較するものとなっているので比
較する安定した実像情報あるいは、実像情報の感度調整
機能が必要であるという欠点があった。
The conventional surface comparison inspection equipment described above enlarges and compares the real image on the sample as a defect detection method, so it has the disadvantage that it requires stable real image information for comparison or a sensitivity adjustment function for the real image information. there were.

〔問題点を解決するための手段〕[Means for solving problems]

本発明の表面比較検査装置は、比較すべき表面形状情報
を蓄積するデータディスクと、検査表面を定める手段と
、接定められた検査表面をレーザの主走査、副走査方向
へ移動させるX−Yテーブルと、レーザを前記検査表面
と参照面へ分けて照射する手段と、該参照面を前記比較
すべき表面形状情報に従って振動させる手段を有する振
動子と、前記検査表面と前記参照面よりの反射光の強度
を測定する手段と、前記検査表面と前記参照面より反射
光を干渉させ該干渉光の強度を測定する手段と、該干渉
光強度と前記反射光強度より前記比較すべき表面形状情
報との差異を算出する手段とを含んで構成される。
The surface comparison inspection device of the present invention includes a data disk for storing surface shape information to be compared, a means for determining the inspection surface, and an X-Y direction for moving the determined inspection surface in the main scanning and sub-scanning directions of the laser. a table; a vibrator having means for separately irradiating the inspection surface and the reference surface with a laser beam; and means for vibrating the reference surface according to the surface shape information to be compared; means for measuring the intensity of light, means for interfering reflected light from the inspection surface and the reference surface and measuring the intensity of the interference light, and the surface shape information to be compared based on the interference light intensity and the reflected light intensity. and a means for calculating the difference between the two.

〔実施例〕〔Example〕

次に、本発明の実施例について、図面を参照して詳細に
説明する。
Next, embodiments of the present invention will be described in detail with reference to the drawings.

第1図は本発明の一実施例を示す斜視図である。FIG. 1 is a perspective view showing an embodiment of the present invention.

第1図に示す表面比較検査装置は、試料1をX−Y方向
へ移動させるX−Yテーブル2と、レーザー3からのレ
ーザー光を平行光にする□=コリメータ6とこの平行レ
ーザー光を参照用反射鏡12と試料lの方向へ分けるビ
ームスプリッタ7と、その光路上の1/4人板8と試料
1上の微小位置へレーザーを絞る対物レンズ10と、ハ
ーフミラ−9とホトフル4,5上へ結像するレンズ11
と、データディスク14の情報により振動する振動子1
3、とを含んで構成さnる。レーザー3からのレーザー
光は、コリメータ6で平行光とし、この平行光はビーム
スプリッタ7で反射鏡12の方向へ透過する参照用レー
ザー光と試料1の方向へ反射される検査用レーザー光に
分けられる。前記参照用レーザー光と検査用レーザー光
は1/4人板8で偏光面が反転される。前記検査用レー
ザー光は、対物レンズ10により試料1上の微小な検査
地域に絞られる。そして試料1上で反射する。この反射
した検査用レーザー光は、ノ1−7ミラー9bで一部は
反射されレンズ11Cを通してホトマル5bにより検査
用レーザー光強度が測定される。前記ハーフミt−9b
を透過した試料1で反射した検査用レーザー光は、ビー
ムスプリッタ7で、前記参照用レーザーが反射鏡12で
反射したレーザー光のうちノ・−7ミラー9aを透過し
た参照用レーザー光と重ね合わされ干渉を半面形状情報
に従って、撮動子13により振動している。干渉光の強
度を工、光の波長を人、検査用レーザー光強度を工1、
参照用レーザー光強度を’2、検査面と参照面とビーム
スプリッタからの光路差をXとすると I=I、+It+2βで131±2) λ である。ここで、参照用反射鏡12は、比較すべき表面
形状情報に従って動いているので試料1上の検査面の形
状が比較情報と等しい場合には、■の変化は生じない。
The surface comparison inspection device shown in Fig. 1 includes an X-Y table 2 that moves the sample 1 in the X-Y direction, a collimator 6 that converts the laser beam from the laser 3 into parallel light, and a collimator 6 that converts the laser beam from the laser 3 into parallel light. a beam splitter 7 that splits the beam in the direction of the mirror 12 and the sample 1, a quarter plate 8 on the optical path, an objective lens 10 that narrows the laser to a minute position on the sample 1, a half mirror 9, and photofuls 4 and 5. Lens 11 that focuses the image upward
and a vibrator 1 that vibrates based on the information on the data disk 14.
3. The laser beam from the laser 3 is collimated by a collimator 6, and this collimated beam is divided by a beam splitter 7 into a reference laser beam that is transmitted toward the reflecting mirror 12 and an inspection laser beam that is reflected toward the sample 1. It will be done. The polarization planes of the reference laser beam and the inspection laser beam are reversed by the quarter plate 8. The inspection laser beam is focused onto a minute inspection area on the sample 1 by the objective lens 10. Then, it is reflected on sample 1. A portion of the reflected inspection laser beam is reflected by the No. 1-7 mirror 9b, passes through the lens 11C, and the intensity of the inspection laser beam is measured by the photomultiplier 5b. Said half mi t-9b
The inspection laser beam that has passed through the sample 1 and reflected off the sample 1 is superimposed at the beam splitter 7 with the reference laser beam that has passed through the -7 mirror 9a among the laser beams that have been reflected by the reflector 12. The interference is vibrated by the camera element 13 according to the half-plane shape information. Adjust the intensity of the interference light, adjust the wavelength of the light, adjust the intensity of the inspection laser beam1,
When the reference laser light intensity is '2' and the optical path difference between the inspection surface, the reference surface, and the beam splitter is X, I=I, +It+2β, which is 131±2) λ. Here, since the reference reflecting mirror 12 moves according to the surface shape information to be compared, if the shape of the inspection surface on the sample 1 is equal to the comparison information, the change in ■ does not occur.

そこで、■の変化が生じた場合そこに欠陥が有ると検出
する。また、試料の反射率が場所により変化する場合は
、ホトマル5bからの工!の変化を考えることで補正で
きる。
Therefore, if a change of ■ occurs, it is detected that there is a defect. In addition, if the reflectance of the sample changes depending on the location, the process from Photomaru 5b! It can be corrected by considering changes in .

次に第2図は、ホトマル4,5よりのレーザー光強度よ
り光路差Xを算出するブロック図である。
Next, FIG. 2 is a block diagram for calculating the optical path difference X from the laser beam intensities from the photomuls 4 and 5.

ホトマル5aからの検査用レーザー光強度工、ホトマル
5bからの参照用レーザー光強度工、は加算器20で加
算される。ホトマル4からの干渉光強度■から前記加算
結果を減算器21で引くと光路差情報Δ工となる。この
光路差情報Δ工を検査用レーザー光強度工、と参照用レ
ーザー光強度工2とレーザー光波長λにより除算器22
を通すと光路差Xが得られる。この光路差Xは、検査面
や参照反射鏡からの反射光強度を含んでいるので検査面
の反射率の変化の影響を受けない。レーザーの□  照
射される検査位置をX−Yテーブルにより移動し、その
移動した位置の表面形状情報をデーターディスより検索
し振動子13により反射鏡12を振動させると、リアル
タイムで既知の表面形状と表面の反射率に影響されず比
較検査が可能となる。
The inspection laser light intensity value from the photomultiplex 5a and the reference laser light intensity value from the photomultiplex 5b are added by an adder 20. When the above-mentioned addition result is subtracted by the subtractor 21 from the interference light intensity (2) from the photomultiplier 4, optical path difference information Δ is obtained. This optical path difference information Δ is divided by the inspection laser light intensity, the reference laser light intensity 2, and the laser light wavelength λ.
When passing through, the optical path difference X is obtained. Since this optical path difference X includes the intensity of reflected light from the inspection surface and the reference reflecting mirror, it is not affected by changes in the reflectance of the inspection surface. By moving the inspection position to be irradiated by the laser using an X-Y table, searching for surface shape information at the moved position from the data disk, and vibrating the reflector 12 using the vibrator 13, the inspection position can be compared with the known surface shape in real time. Comparative inspection is possible without being affected by surface reflectance.

〔発明の効果〕〔Effect of the invention〕

本発明の表面比較検査装置は、試料面の拡大実像間の比
較をする代シに、2光線干渉法において、比較する表面
形状に従って参照用反射鏡を振動させ干渉光の変化より
欠陥を検出でき、検査用光強度と参照用光強度のモニタ
を設けることで検査面の反射率の変化具なった試料の検
査もできるという効果がある。
The surface comparison inspection device of the present invention vibrates a reference reflector according to the surface shape to be compared in two-beam interferometry, instead of comparing enlarged real images of the sample surface, and can detect defects from changes in interference light. By providing a monitor for the inspection light intensity and the reference light intensity, it is possible to inspect a sample whose reflectance on the inspection surface varies.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例を示す斜視図、第2図は第1
図に示すホトマル4.5より光路差を算出するブロック
図、第3図(a)は、従来の一例を示す斜視図、第3図
(b)は、第3図(a)のホトマル40の感度調整方法
を示すブロック図である。 1・・・・・・試料、2・・・・・・X−Yテーブル、
3・・・・・・レ−f−14・・・・・・ホトマル、5
・・・・・・ホトマル、6・・・・・・コリメータ、7
・・・・・・ビームスプリフタ、8・・・・・・1/4
λ板、9・・・・・・ハーフミラ−110・・・・・・
対物レンズ、11・・・・・・レンズ、12・・・・・
・反射鏡、13・・・・・・振動子、14・・・・・・
データディスク、20・・・・・・加算器、21・・・
・・・減算器、22・・・・・・除算器、■・・・・−
・干渉光強度、■、・・・・・・検査用レーザー光強度
、■、・・・・・・参照用レーザー光強度、Δ■・・・
・・・光路差情報、X・・・・・・光路差、31・・・
・・・試料、32・・・・・・検査点、33・・・・・
・対物レンズ、34・・・・・・回転多面鏡、35・・
・・・・光ファイバ、36.40・・・・・・ホトマル
、37・・・・・・照明光、38・・・・・・フィール
ドレンズ、39・・・・・・結像レンズ、41・・・・
・・ホトマル、42・・・・・・電流電圧変換器、44
・・・・・・アナログ比較回路、45゜46・・・・・
・アンド回路、47・・・・・・カウンタ、49・・・
・・・DC−DCコンバータ。 i・・・・・・ホトマル出力電流、e・・・・・・出力
電圧、Ec・・・・・・一定電圧、Ei・・・・・・D
Aコンバータ出力、E。 I4子″−夕干イスク 第1図 シ 外 82 図
FIG. 1 is a perspective view showing one embodiment of the present invention, and FIG. 2 is a perspective view showing one embodiment of the present invention.
3(a) is a perspective view showing a conventional example, and FIG. 3(b) is a block diagram of calculating the optical path difference from the photomul 4.5 shown in FIG. 3(a). FIG. 2 is a block diagram showing a sensitivity adjustment method. 1... Sample, 2... X-Y table,
3...Le-f-14...Hotomal, 5
...Photomaru, 6...Collimator, 7
...Beam splitter, 8...1/4
λ plate, 9...Half mirror-110...
Objective lens, 11... Lens, 12...
・Reflector, 13... Vibrator, 14...
Data disk, 20... Adder, 21...
...Subtractor, 22...Divider, ■...-
・Interference light intensity, ■, ... Laser light intensity for inspection, ■, ... Laser light intensity for reference, Δ■...
...Optical path difference information, X...Optical path difference, 31...
...Sample, 32...Test point, 33...
・Objective lens, 34...Rotating polygon mirror, 35...
...Optical fiber, 36.40...Photomultiple, 37...Illumination light, 38...Field lens, 39...Imaging lens, 41・・・・・・
...Photomaru, 42...Current voltage converter, 44
...Analog comparison circuit, 45°46...
・AND circuit, 47... Counter, 49...
...DC-DC converter. i...Photomal output current, e...Output voltage, Ec...Constant voltage, Ei...D
A converter output, E. I4 child'' - Yuboshi Isk Figure 1 outside Figure 82

Claims (1)

【特許請求の範囲】[Claims] 比較すべき表面形状情報を蓄積するデータディスクと、
検査表面を定める手段と、該定められた検査表面をレー
ザーの主走査、副走査方向へ移動させるX−Yテーブル
と、レーザーを前記検査表面と参照面へ分けて照射する
手段と、該参照面を前記比較すべき表面形状情報に従っ
て振動させる手段を有する振動子と、前記検査表面と前
記参照面よりの反射光の強度を測定する手段と、前記検
査表面と前記参照面よりの反射光を干渉させ該干渉光の
強度を測定する手段と、該干渉光強度と前記反射光強度
より前記比較すべき表面形状情報との差異を算出する手
段とを含むことを特徴とする表面比較検査装置。
a data disk that stores surface shape information to be compared;
means for determining an inspection surface; an X-Y table for moving the determined inspection surface in the main scanning and sub-scanning directions of the laser; means for separately irradiating the inspection surface and the reference surface with the laser; and the reference surface. a vibrator having means for vibrating according to the surface shape information to be compared; a means for measuring the intensity of reflected light from the inspection surface and the reference surface; and a vibrator that interferes with the reflected light from the inspection surface and the reference surface. A surface comparison inspection apparatus comprising: means for measuring the intensity of the interference light; and means for calculating a difference between the surface shape information to be compared from the interference light intensity and the reflected light intensity.
JP29111585A 1985-12-23 1985-12-23 Inspecting instrument for surface comparison Pending JPS62148804A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29111585A JPS62148804A (en) 1985-12-23 1985-12-23 Inspecting instrument for surface comparison

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29111585A JPS62148804A (en) 1985-12-23 1985-12-23 Inspecting instrument for surface comparison

Publications (1)

Publication Number Publication Date
JPS62148804A true JPS62148804A (en) 1987-07-02

Family

ID=17764650

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29111585A Pending JPS62148804A (en) 1985-12-23 1985-12-23 Inspecting instrument for surface comparison

Country Status (1)

Country Link
JP (1) JPS62148804A (en)

Similar Documents

Publication Publication Date Title
US7253887B2 (en) Metrology system with spectroscopic ellipsometer and photoacoustic measurements
US5202748A (en) In situ process control system for steppers
TWI671501B (en) Method and white light interferometer for characterizing a sample, method for processing white light interferometric data from a sample with a patterned structure, and white light interferometer for measuring a sample with a patterned structure
JP2003177006A (en) Optical test system including interferometer with micromirror and piezoelectric translator for controlling test path mirror
JPH08505952A (en) Inspection interferometer with scanning function
JP3938785B2 (en) Defect inspection method and apparatus
US7095507B1 (en) Method and apparatus using microscopic and interferometric based detection
US11162897B2 (en) Optical metrology device using numerical aperture reduction
JP4188515B2 (en) Optical shape measuring device
CN110702614A (en) Ellipsometer device and detection method thereof
KR101036455B1 (en) Ellipsometer using Half Mirror
JPH059723B2 (en)
JPH05277075A (en) Eye axis length measuring aparatus
JPH10253892A (en) Phase interference microscope
JPS62148804A (en) Inspecting instrument for surface comparison
JP2002202108A (en) Plate thickness measuring device
KR100416497B1 (en) Pattern Inspection System
JPH10268200A (en) Interference microscope device
JPH11260689A (en) Uniform optical system, pattern tester and pattern testing method therefor
JP3232340B2 (en) Interferometry for large diameter planes
JP3255589B2 (en) Lens evaluation device
JPH0224539A (en) Optical pattern checking method
KR100270365B1 (en) High Speed Scanning Interferometer System
JP2870455B2 (en) Exposure apparatus alignment method and mechanism
JP2023177950A (en) Calculation method, imaging method, and imaging apparatus