JPS62148570U - - Google Patents

Info

Publication number
JPS62148570U
JPS62148570U JP3575686U JP3575686U JPS62148570U JP S62148570 U JPS62148570 U JP S62148570U JP 3575686 U JP3575686 U JP 3575686U JP 3575686 U JP3575686 U JP 3575686U JP S62148570 U JPS62148570 U JP S62148570U
Authority
JP
Japan
Prior art keywords
discharge electrode
plasma processing
chamber
sample
high frequency
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3575686U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3575686U priority Critical patent/JPS62148570U/ja
Publication of JPS62148570U publication Critical patent/JPS62148570U/ja
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP3575686U 1986-03-11 1986-03-11 Pending JPS62148570U (US06521211-20030218-C00004.png)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3575686U JPS62148570U (US06521211-20030218-C00004.png) 1986-03-11 1986-03-11

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3575686U JPS62148570U (US06521211-20030218-C00004.png) 1986-03-11 1986-03-11

Publications (1)

Publication Number Publication Date
JPS62148570U true JPS62148570U (US06521211-20030218-C00004.png) 1987-09-19

Family

ID=30845529

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3575686U Pending JPS62148570U (US06521211-20030218-C00004.png) 1986-03-11 1986-03-11

Country Status (1)

Country Link
JP (1) JPS62148570U (US06521211-20030218-C00004.png)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01218626A (ja) * 1988-02-29 1989-08-31 Hitachi Ltd 放電洗浄装置
JPH02270320A (ja) * 1989-04-11 1990-11-05 Hitachi Ltd 表面処理方法および装置
JPH03249191A (ja) * 1990-02-28 1991-11-07 Nippon Columbia Co Ltd スタンパ製造方法
JPH06244147A (ja) * 1993-02-16 1994-09-02 Tokyo Electron Ltd プラズマ処理装置
WO2019229784A1 (ja) * 2018-05-28 2019-12-05 株式会社日立ハイテクノロジーズ プラズマ処理装置

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01218626A (ja) * 1988-02-29 1989-08-31 Hitachi Ltd 放電洗浄装置
JPH02270320A (ja) * 1989-04-11 1990-11-05 Hitachi Ltd 表面処理方法および装置
JPH03249191A (ja) * 1990-02-28 1991-11-07 Nippon Columbia Co Ltd スタンパ製造方法
JPH06244147A (ja) * 1993-02-16 1994-09-02 Tokyo Electron Ltd プラズマ処理装置
WO2019229784A1 (ja) * 2018-05-28 2019-12-05 株式会社日立ハイテクノロジーズ プラズマ処理装置
KR20190137062A (ko) * 2018-05-28 2019-12-10 가부시키가이샤 히다치 하이테크놀로지즈 플라스마 처리 장치
JPWO2019229784A1 (ja) * 2018-05-28 2020-08-27 株式会社日立ハイテク プラズマ処理装置
TWI723406B (zh) * 2018-05-28 2021-04-01 日商日立全球先端科技股份有限公司 電漿處理裝置
US11424106B2 (en) 2018-05-28 2022-08-23 Hitachi High-Tech Corporation Plasma processing apparatus

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