JPS621402B2 - - Google Patents

Info

Publication number
JPS621402B2
JPS621402B2 JP54089169A JP8916979A JPS621402B2 JP S621402 B2 JPS621402 B2 JP S621402B2 JP 54089169 A JP54089169 A JP 54089169A JP 8916979 A JP8916979 A JP 8916979A JP S621402 B2 JPS621402 B2 JP S621402B2
Authority
JP
Japan
Prior art keywords
group
carbon atoms
light stabilizer
tetramethyl
composition according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54089169A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5523186A (en
Inventor
Beruneru Gotsutobin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of JPS5523186A publication Critical patent/JPS5523186A/ja
Publication of JPS621402B2 publication Critical patent/JPS621402B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D175/00Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
    • C09D175/04Polyurethanes
    • C09D175/14Polyurethanes having carbon-to-carbon unsaturated bonds
    • C09D175/16Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Hydrogenated Pyridines (AREA)
JP8916979A 1978-07-13 1979-07-13 Photoohardening composition Granted JPS5523186A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH762178 1978-07-13

Publications (2)

Publication Number Publication Date
JPS5523186A JPS5523186A (en) 1980-02-19
JPS621402B2 true JPS621402B2 (show.php) 1987-01-13

Family

ID=4327974

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8916979A Granted JPS5523186A (en) 1978-07-13 1979-07-13 Photoohardening composition

Country Status (4)

Country Link
US (1) US4279720A (show.php)
EP (1) EP0007059B1 (show.php)
JP (1) JPS5523186A (show.php)
DE (1) DE2960270D1 (show.php)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4318791A (en) * 1977-12-22 1982-03-09 Ciba-Geigy Corporation Use of aromatic-aliphatic ketones as photo sensitizers
US4393094A (en) * 1982-04-19 1983-07-12 Ford Motor Company Stabilization of electron beam curable compositions for improved exterior durability
DE3471595D1 (en) * 1983-01-20 1988-07-07 Ciba Geigy Ag Electron-beam curing method for coatings
JPS60142884U (ja) * 1984-03-01 1985-09-21 テイチク株式会社 記録媒体収納ケ−ス
IT1207505B (it) * 1985-10-09 1989-05-25 Eniricherche Sp A Composti stabilizzanti polimerici solidi e procedimento per la loro preparazione.
JPS62130940A (ja) * 1985-11-29 1987-06-13 Mita Ind Co Ltd シ−ト部材検出機構
EP0226538B1 (de) * 1985-12-06 1991-09-11 Ciba SC Holding AG Lichtstabilisierte Polymermikropartikel
IT1213077B (it) * 1986-06-05 1989-12-07 Eniricerche Spa Composti stabilizzanti polimerici e procedimento per la loro preparazione.
US4761435A (en) * 1986-10-03 1988-08-02 Desoto, Inc. Polyamine-polyene ultraviolet coatings
US4923915A (en) * 1988-05-18 1990-05-08 Corning Incorporated Thermally stabilized resin coatings for optical fibers
DE59107294D1 (de) * 1990-05-10 1996-03-07 Ciba Geigy Ag Strahlenhärtbare lichtstabilisierte Zusammensetzungen
US5527921A (en) * 1995-03-21 1996-06-18 Minnesota Mining And Manufacturing Company Peroxycarboxylic ester initiators derived from nitrogen heterocycles
DE19826712A1 (de) * 1998-06-16 1999-12-23 Basf Ag Strahlungshärtbare Massen, enthaltend Phenylglyoxylate
FR2782726B1 (fr) * 1998-08-28 2003-09-12 Basf Coatings Compositions de vernis acryliques photopolymerisables contenant un agent anti-oxydant de la famille des phenols encombres steriquement
DE19913353A1 (de) * 1999-03-24 2000-09-28 Basf Ag Verwendung von Phenylglyoxalsäureestern als Photoinitiatoren
EP1499645B1 (en) * 2002-04-26 2006-03-15 Ciba SC Holding AG Incorporable photoinitiator
US7309550B2 (en) * 2004-09-20 2007-12-18 Chemence, Inc. Photosensitive composition with low yellowing under UV-light and sunlight exposure
US20100022676A1 (en) * 2006-10-03 2010-01-28 Jonathan Rogers Photocurable compositions comprising a photoinitiator of the phenylglyoxylate type
KR101428432B1 (ko) 2008-07-28 2014-08-07 다이니치 세이카 고교 가부시키가이샤 고분자 분산제의 제조방법 및 수성 안료 분산액
JP2010053239A (ja) * 2008-08-28 2010-03-11 Dow Corning Toray Co Ltd 光硬化型プライマー組成物、該組成物からなるプライマー層を備えた構造体およびその製造方法
CN104136492B (zh) * 2012-03-01 2016-03-23 三菱瓦斯化学株式会社 光学材料用聚合性组合物

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3639321A (en) * 1967-05-06 1972-02-01 Bayer Ag Polyester moulding and coating materials which can be hardened by uv-irradiation
US3640928A (en) * 1968-06-12 1972-02-08 Sankyo Co Stabilization of synthetic polymers
US3684765A (en) * 1970-01-08 1972-08-15 Sankyo Co Stabilization of synthetic polymers
US4046737A (en) * 1971-11-30 1977-09-06 Ciba-Geigy Corporation Piperidine derivatives
JPS537950B2 (show.php) * 1973-02-05 1978-03-23
CH589056A5 (show.php) * 1973-12-10 1977-06-30 Ciba Geigy Ag
US4056507A (en) * 1973-12-28 1977-11-01 Ciba-Geigy Corporation Hindered piperidine carboxylic acids, metal salts thereof and stabilized compositions
US4038164A (en) * 1975-09-18 1977-07-26 Stauffer Chemical Company Photopolymerizable aryl and heterocyclic glyoxylate compositions and process
US4024297A (en) * 1976-02-02 1977-05-17 Ppg Industries, Inc. Actinic light polymerizable coating compositions
US4024296A (en) * 1976-02-02 1977-05-17 Ppg Industries, Inc. Photocatalyst system and pigmented actinic light polymerizable coating compositions containing the same
CH626109A5 (show.php) * 1976-05-11 1981-10-30 Ciba Geigy Ag
US4201642A (en) * 1978-09-19 1980-05-06 Celanese Corporation Radiation-curable coating composition having utility as a moisture barrier film

Also Published As

Publication number Publication date
DE2960270D1 (de) 1981-05-07
US4279720A (en) 1981-07-21
EP0007059A1 (de) 1980-01-23
JPS5523186A (en) 1980-02-19
EP0007059B1 (de) 1981-04-15

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