JPS62138675A - Suction drying method utilizing heat transfer by radiation - Google Patents

Suction drying method utilizing heat transfer by radiation

Info

Publication number
JPS62138675A
JPS62138675A JP27854785A JP27854785A JPS62138675A JP S62138675 A JPS62138675 A JP S62138675A JP 27854785 A JP27854785 A JP 27854785A JP 27854785 A JP27854785 A JP 27854785A JP S62138675 A JPS62138675 A JP S62138675A
Authority
JP
Japan
Prior art keywords
water vapor
heat transfer
vapor film
radiant heat
drying chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27854785A
Other languages
Japanese (ja)
Inventor
増田 正男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MASUDA SEISAKUSHO KK
Original Assignee
MASUDA SEISAKUSHO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MASUDA SEISAKUSHO KK filed Critical MASUDA SEISAKUSHO KK
Priority to JP27854785A priority Critical patent/JPS62138675A/en
Publication of JPS62138675A publication Critical patent/JPS62138675A/en
Pending legal-status Critical Current

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Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 「産業上の利用分野」 本発明は織物、編物、不織布、その他浸水性フィルム等
の浸水性処理物(以下単に処理物とする)を遠赤外線放
射ヒーター、赤外線ランプ、マイクロ波等の放射伝熱板
を介して乾燥するようにした放射伝熱を利用した吸引乾
燥方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION "Industrial Application Field" The present invention is directed to the use of far-infrared radiant heaters, infrared lamps, The present invention relates to a suction drying method using radiant heat transfer using a radiant heat transfer plate such as a microwave.

「従来の技術」 従来このような放射伝熱板の内マイクロ波を用いて真空
チャンバーの中でチーズ(綾巻糸)を真空乾燥させるチ
ーズのマイクロ波乾燥方法が知られている。また本出願
人は、すでに実願昭58−000856号で気圧差式脱
水装置を提案しており、その要旨は略真空域内のチャン
バーで不織布ロールを介して繊維品等の処理物(布地)
を脱水乾燥するものである0更には放射伝熱板の内達赤
外線放射ヒーター、赤外線ランプが色々のものの乾燥熱
源として利用されていることが知られている。
"Prior Art" Conventionally, a cheese microwave drying method is known in which cheese (twill yarn) is vacuum-dried in a vacuum chamber using microwaves in such a radiant heat transfer plate. In addition, the present applicant has already proposed a pressure difference type dehydrator in Utility Application No. 1983-000856, the gist of which is that processed materials such as textiles (fabric) are processed through a nonwoven fabric roll in a chamber within a substantially vacuum region.
Furthermore, it is known that infrared radiant heaters for radiant heat transfer plates and infrared lamps are used as heat sources for drying various things.

「発明が解決しようとする問題点」 ところで、これら放射伝熱板より放射される電磁波が直
接処理物に照射されることにより効率的な乾燥が達成さ
れるものである。しかるに処理物より蒸発した水蒸気が
処理物の周辺に拡散されて水蒸気膜が生成されると、電
磁波例えば遠赤外線(放射伝熱量)の水蒸気膜部分で吸
収される割合が多くなり、処理物に作用する放射伝熱量
が減少するため効率的な乾燥ができないこと。また水蒸
気膜内の相対湿度は相描高く、ことに処理物表面近くは
相対湿度が100%近くなり、水蒸気分圧の勾配が得ら
れなくなり蒸発速度が低下するため前述と同様に効率的
な乾燥ができないこと等の問題点があった。
"Problems to be Solved by the Invention" By the way, efficient drying is achieved by directly irradiating the electromagnetic waves emitted from these radiant heat exchanger plates onto the processed material. However, when the water vapor evaporated from the processed material is diffused around the processed material and a water vapor film is generated, a large proportion of electromagnetic waves, such as far infrared rays (radiant heat transfer), are absorbed by the vapor film, causing an effect on the processed material. Efficient drying is not possible due to a decrease in the amount of radiant heat transfer. In addition, the relative humidity within the water vapor film is extremely high, especially near the surface of the material to be treated, which approaches 100%, making it impossible to obtain a gradient of water vapor partial pressure and reducing the evaporation rate, resulting in efficient drying as described above. There were problems such as the inability to

「問題点を解決するための手段」 上記に鑑み本発明は、放射伝熱板での加熱過程で、処理
物の表面より発生する水蒸気によυ、その表面近傍に生
成される水蒸気膜を積極的に除去するようにしたもので
、その要旨は、放射伝熱板を配設してなる略密閉式の乾
燥室を処理物が所定速度で通過していく過程において、
この処理物より蒸発した水蒸気が処理物の周辺に拡散さ
れて水蒸気膜が生成されたとき、この水蒸気膜を排気若
しくは吹出等の手段を介して積極的に前記乾燥室外に除
去し、さらにこの処理物を前進移行させる過程で前述と
同様に水蒸気膜が生成され九ときは、前述と同様に除去
していく等処理物の前進移行させる過程で前記の水蒸気
膜の生成及び除去を適宜繰p返すか、場合により前記の
除去を一回のみとする放射伝熱を利用した吸引乾燥方法
である。
"Means for Solving the Problems" In view of the above, the present invention actively reduces the water vapor film generated near the surface of the object by the water vapor generated from the surface of the object during the heating process with the radiant heat transfer plate. The gist is that in the process of the processed material passing at a predetermined speed through a nearly closed drying chamber equipped with a radiant heat transfer plate,
When the water vapor evaporated from the processed material is diffused around the processed material and a water vapor film is generated, this water vapor film is actively removed to the outside of the drying chamber through means such as exhaust or blowing. If a water vapor film is generated in the process of moving the material forward, it is removed in the same manner as described above, etc., and the generation and removal of the water vapor film is repeated as appropriate in the process of moving the material forward. Or, depending on the case, it is a suction drying method using radiant heat transfer in which the above-mentioned removal is performed only once.

「作用」 次に本発明の詳細な説明すると、放射伝熱板を配設して
なる略密閉式の乾燥室を処理物が所定速度で通過してい
く過程において、その処理物の表面に放射伝熱板の放射
伝熱等の電磁波が直接照射されていき、これが加熱され
ることによりその表面より水蒸気が蒸発拡散されて順次
乾燥されるのであるが、この水蒸気の蒸発拡散が処理物
の移行にともなって集積されていき、ついには水蒸気膜
となる。このように水蒸気が生成されると、この水蒸気
膜で放射伝熱量の大部分が吸収され処理物に作用する放
射伝熱量が減少する。したがってこのような状態を回避
するために、この水蒸気膜を排気若しくは吹出等の手段
を介して積極的に乾燥室外に除去する。
"Function" Next, to explain the present invention in detail, in the process of the processed material passing at a predetermined speed through a substantially closed type drying chamber provided with a radiant heat transfer plate, radiation is radiated onto the surface of the processed material. The heat transfer plate is directly irradiated with electromagnetic waves such as radiant heat transfer, and as it is heated, water vapor evaporates and diffuses from the surface and is sequentially dried.This evaporation and diffusion of water vapor causes the transfer of the processed material. As time passes, it accumulates and eventually forms a water vapor film. When water vapor is generated in this manner, most of the amount of radiant heat transfer is absorbed by this vapor film, and the amount of radiant heat transfer acting on the object to be treated is reduced. Therefore, in order to avoid such a situation, this water vapor film is actively removed to the outside of the drying chamber through means such as exhaust or blowing.

これにより処理物の周辺は最初の状態に戻シ、その表面
よpの水蒸気の蒸発拡散が促進される。
As a result, the area around the object to be treated is returned to its initial state, and the evaporation and diffusion of water vapor from the surface of the object is promoted.

そうして前述と同様にして水蒸気膜が生成されたときは
、前記手段を介して積極的に除去する0このような操作
を乾燥室内で繰り返し、場合により一回の操作だけで処
理物の乾燥処理をなすのである。
Then, when a water vapor film is generated in the same manner as described above, it is actively removed through the above-mentioned means.Such operations are repeated in the drying chamber, and in some cases, the material to be treated can be dried in just one operation. processing.

「実施例」 図面は本発明の一実施例を模式的に示したもので、先ず
第1の発明について詳述すると略密閉式の乾燥室1内に
は遠赤外線放射ヒーター、赤外線ランプ、マイクロ波等
を放射する放射伝熱板2,3を配設し、この放射伝熱板
2,3間に処理物4を所定速度で通過させていき、その
表面に放射伝熱板2,3より放射される放射伝熱5を直
接照射して加熱すると、その処理物4表面が直接加熱さ
れ含有等する水分が水蒸気6となシその表面より蒸発拡
散されていく第2図(イ)の状態となる。この水蒸気6
の大部分は、この場合乾燥室1内の相対湿度が低いこと
から盛んに蒸発拡散され処理物4の周辺に滞留すること
はない。しかしながら水蒸気6の拡散と乾燥室1内の相
対湿度が上昇することと相俟って、蒸発拡散が少なくな
っていき時間の経過に伴い順次集積されていき同図(・
)〜(・→の如くなシ、ついには同図(=)の如く相対
湿度が最高に上昇し水蒸気膜7が生成される。このよう
にして水蒸気膜7が生成されると、この水蒸気膜7で放
射伝熱5の熱量の大部分が吸収され処理物4に作用する
放射伝熱量が減少するため、この水蒸気膜7を排気手段
8を介して積極的に乾燥室1外に除去して、処理物4の
周辺を最初の状態に戻す同図(ホ)の状態とする。そう
することにより処理物4の表面及び周辺の相対湿度が低
下して蒸発速度が大きくなると共に、蒸発潜熱によ)表
面温度が低下した処理物4と放射伝熱板2,3との間に
温度勾配が形成され伝熱量の伝播効率がよくなり、再び
盛んに蒸発拡散されていく同図(イ)の状態となる。そ
の後は前述の場合と同様に同図(口′)〜(−’)を経
由して(−′)の如く水蒸気膜7が生成されるので、同
様にこの水蒸気膜7を排気手段8を介して積極的に除去
し、処理物4の周辺を最初の状態に戻す同図(ホ′)の
状態となる。
``Embodiment'' The drawing schematically shows an embodiment of the present invention. First, to explain the first invention in detail, a substantially closed drying chamber 1 includes a far-infrared radiation heater, an infrared lamp, and a microwave. Radiant heat transfer plates 2 and 3 that radiate heat, etc. are arranged, and the processed material 4 is passed between the radiant heat transfer plates 2 and 3 at a predetermined speed, and the radiant heat transfer plates 2 and 3 emit radiation onto the surface of the material 4. When heated by direct irradiation with radiation heat transfer 5, the surface of the processed material 4 is directly heated, and the contained moisture becomes water vapor 6 and is evaporated and diffused from the surface, resulting in the state shown in Fig. 2 (a). Become. This water vapor 6
In this case, since the relative humidity in the drying chamber 1 is low, most of the drying material is actively evaporated and diffused and does not remain around the processed material 4. However, as the water vapor 6 diffuses and the relative humidity inside the drying chamber 1 increases, the evaporation and diffusion decreases, and as time passes, it gradually accumulates.
)~(・→), and finally the relative humidity rises to the maximum as shown in the same figure (=) and a water vapor film 7 is generated.When the water vapor film 7 is generated in this way, this water vapor film In step 7, most of the heat from the radiant heat transfer 5 is absorbed and the amount of radiant heat transferred acting on the processed material 4 is reduced, so this water vapor film 7 is actively removed to the outside of the drying chamber 1 via the exhaust means 8. , the surroundings of the object to be processed 4 are returned to the initial state as shown in the same figure (E). By doing so, the relative humidity on the surface and surroundings of the object to be processed 4 decreases, the evaporation rate increases, and the latent heat of evaporation increases. y) A temperature gradient is formed between the processed material 4 whose surface temperature has decreased and the radiant heat transfer plates 2 and 3, and the propagation efficiency of the amount of heat is improved, and the heat is actively evaporated and diffused again. state. After that, as in the case described above, a water vapor film 7 is generated as shown in (-') via (-') in the same figure, so this water vapor film 7 is similarly removed via the exhaust means 8. The state shown in FIG. 4(E') is reached, in which the processed material 4 is actively removed and the surroundings of the processed material 4 are returned to the initial state.

このような操作を順次繰シ返し、場合によりー回の操作
のみにより処理物4を乾燥した後乾燥室1より外部に導
くのである。尚排気手段8としては処理物4の両側に排
気ノズル8aを対役し、この排気ノズル8aに乾燥室1
外に導かれたホース8bを接続する構造が理悲である。
Such operations are repeated one after another, and in some cases, the processed material 4 is dried by only one operation, and then introduced from the drying chamber 1 to the outside. As the exhaust means 8, exhaust nozzles 8a are used on both sides of the processed material 4, and the drying chamber 1 is connected to the exhaust nozzles 8a.
The ideal structure is to connect the hose 8b led outside.

次に第2の発明について詳述すると略密閉式の乾燥室1
内には放射伝熱板2,3全配設し、この放射伝熱板2.
3間に処理物4を所定速度で通過させていき、その表面
に放射伝熱板2゜3よす放射される放射伝熱5を直接照
射して加熱すると、その処理物4表面が直接加熱され含
有等する水分が水蒸気6となシその表面よυ蒸発拡散さ
れていく第6図(デ)の状態となる。この水蒸気6の大
部分は、この場合乾燥室1内の相対湿度が低いことから
盛んに蒸発拡散され処理物4の周辺に滞留することはな
い。しかしながら水蒸気6の拡散と乾燥室1内の相対湿
度が上昇することと相俟って、蒸発拡散が少なくなって
いき時間の経過に伴い順次集積されていき同°図(す)
〜(ヌ)の如くなり、ついには同図(ル)の如く相対湿
度が最高に上昇し水蒸気@7が生成される。
Next, to explain the second invention in detail, a substantially closed type drying chamber 1
All radiant heat exchanger plates 2 and 3 are arranged inside the radiant heat exchanger plate 2.
When the object 4 to be processed is passed through the object 4 at a predetermined speed during 3, and the surface of the object 4 is directly irradiated with the radiant heat 5 radiated from the radiant heat transfer plate 2 to heat it, the surface of the object 4 to be processed is directly heated. The state shown in FIG. 6 (D) is reached in which the contained moisture becomes water vapor 6 and is evaporated and diffused from the surface. In this case, since the relative humidity in the drying chamber 1 is low, most of this water vapor 6 actively evaporates and diffuses and does not stay around the object 4 to be treated. However, as water vapor 6 diffuses and the relative humidity inside the drying chamber 1 increases, evaporation and diffusion decrease, and as time passes, the water vapor gradually accumulates.
~(nu), and finally, as shown in (l) of the same figure, the relative humidity rises to the maximum and water vapor @7 is generated.

このようにして水蒸気膜7が生成されると、この水蒸気
膜゛7で放射伝熱5の熱量の大部分が吸収され処理物4
に作用する放射伝熱量が減少するので、この水蒸気膜7
を吹出手段10を介して乾燥室1内に拡散せしめると同
時に、乾燥室1に配備する排気手段11を介して拡散さ
れた水蒸気6を乾燥室1内の空気とともに乾燥室1外に
積極的に除去して、処理物4の周辺を最初の状態に戻す
同図(オ)の状態とする。そうすることばより処理物4
の表面及び周辺の相対湿度が低下して蒸発速度が大きく
なると共に、吹出手段10による空気の吹出し及び蒸発
潜熱により表面温度が低下した処理物4と放射伝熱板2
゜3との間に温度勾配が形成され伝熱量の伝播効率がよ
くなり、再び盛んに蒸発拡散されていく同図(チ′)の
状態となる。その後は前述の場合と同様に同図(υ′)
〜(ヌ′)を経由して(ル′)の如く水蒸気膜7が生成
されるので、同様にこの水蒸気膜7を吹出手段10によ
る拡散と、排気手段11による吸引を介して積極的に除
去して、処理物4の表面温度を低下させると共に、その
周辺を最初の状態に戻す同図(オ′)の状態となる。こ
のような操作を順次繰シ返し、場合により一回の操作の
みにより処理物4を乾燥した後乾燥室1より外部に導く
のである。尚吹出手段10及び排気手段11としては、
第3図の例の如く、ホース10bに接続された吹出ノズ
ル10aを吹出手段10とし、この吹出ノズル10aに
対設された排気ノズルllaを排気手段11とする構成
、または第4,5図の例の如く、ホース10bに接続さ
れた吹出ノズル10aを吹出手段10としく第3図と同
じ)、乾燥室1の外壁に開設する排気ノズル11bを排
気手段11とする構成等が望ましい。更に第5図の例の
如く吹出ノズル10aに対設して透気性のガイド板13
を設けるようにすると処理物4のふれがなくなると思わ
れる。
When the water vapor film 7 is generated in this way, most of the heat of the radiant heat transfer 5 is absorbed by this water vapor film 7, and the processed material 4
Since the amount of radiant heat transfer acting on the water vapor film 7 decreases,
is diffused into the drying chamber 1 through the blowing means 10, and at the same time, the water vapor 6 diffused through the exhaust means 11 provided in the drying chamber 1 is actively pumped out of the drying chamber 1 together with the air inside the drying chamber 1. After removal, the periphery of the object 4 to be treated is returned to its initial state as shown in FIG. 4(E). Things to be processed from words like that 4
The surface and surrounding relative humidity of the processed material 4 and the radiant heat exchanger plate 2 are reduced, the evaporation rate increases, and the surface temperature of the processed material 4 and the radiant heat exchanger plate 2 is reduced due to the air blowing by the blowing means 10 and the latent heat of evaporation.
A temperature gradient is formed between the temperature and the temperature of 3°C, the efficiency of heat transfer improves, and the state shown in the figure (h') is reached where the heat is actively evaporated and diffused again. After that, the same figure (υ′) as in the previous case
Since a water vapor film 7 is generated as shown in (R') through ~(NU'), this water vapor film 7 is similarly actively removed through diffusion by the blowing means 10 and suction by the exhaust means 11. As a result, the surface temperature of the object 4 to be treated is lowered and the surrounding area is returned to the initial state as shown in FIG. Such operations are repeated one after another, and in some cases, the processed material 4 is dried by only one operation and then guided to the outside from the drying chamber 1. The blowing means 10 and the exhaust means 11 are as follows:
As in the example shown in FIG. 3, the blow-off nozzle 10a connected to the hose 10b is used as the blow-off means 10, and the exhaust nozzle lla installed opposite to this blow-off nozzle 10a is used as the exhaust means 11, or as shown in FIGS. As in the example, it is preferable that the blow-off nozzle 10a connected to the hose 10b is used as the blow-off means 10 (same as in FIG. 3), and the exhaust nozzle 11b provided on the outer wall of the drying chamber 1 is used as the exhaust means 11. Furthermore, as in the example shown in FIG.
It is thought that if this is provided, wobbling of the processed material 4 will be eliminated.

「発明の効果」 本発明は以上詳述したように、放射伝熱板での加熱途中
に、処理物表面に生成される水蒸気膜を排気若しくは吹
出等の手段を介して除去する方法であるので、放射伝熱
量の大部分が処理物に直接照射されることになり乾燥効
率が著しく改善される。また処理物表面及び周辺の相対
湿度を低下させて水蒸気分圧の勾配を大きくすることが
でき、もって蒸発速度が大きく処理物乾燥のスピード化
が達成される。更に排気若しくは吹出等の手段を介して
吸引排気する故、処理物自体の温度は吸引直前に比して
低下するが、放射伝熱板の温度はそれほど変化がない。
"Effects of the Invention" As detailed above, the present invention is a method for removing the water vapor film generated on the surface of the object during heating with a radiant heat exchanger plate through means such as exhaust or blowing. Most of the radiant heat transfer is directly irradiated onto the processed material, resulting in a marked improvement in drying efficiency. Furthermore, the relative humidity on and around the surface of the workpiece can be lowered to increase the gradient of water vapor partial pressure, thereby increasing the evaporation rate and speeding up the drying of the workpiece. Furthermore, since the material is suctioned and exhausted through means such as evacuation or blowing, the temperature of the material to be treated is lower than that immediately before suction, but the temperature of the radiant heat exchanger plate does not change much.

そのため両者の間に大きな温度差が生じて放射伝熱量が
多くなp1結果的に乾燥速度が大きくなるものである。
Therefore, a large temperature difference occurs between the two, resulting in a large amount of radiant heat transfer (p1), and as a result, the drying rate increases.

【図面の簡単な説明】[Brief explanation of drawings]

図面は本発明の一実施例を模式的に示したもので、第1
図は第1の発明の正面図、第2図は同上水蒸気の動きを
示す図、第3図は第2の発明の要部正面図、第4,5図
は第2の発明のその他の一例をそれぞれ示す正面図、第
6図は第2の発明の水蒸気の動きを示す図である。
The drawing schematically shows one embodiment of the present invention.
The figure is a front view of the first invention, Figure 2 is a diagram showing the movement of water vapor, Figure 3 is a front view of the main part of the second invention, and Figures 4 and 5 are other examples of the second invention. FIG. 6 is a front view showing the movement of water vapor in the second invention.

Claims (2)

【特許請求の範囲】[Claims] (1)放射伝熱板を配設してなる略密閉式の乾燥室を織
物、編物、不織布、その他浸水性フィルム等の浸水性処
理物が所定速度で通過していく過程において、この処理
物より蒸発した水蒸気が処理物の周辺に拡散されて水蒸
気膜が生成されたとき、この水蒸気膜を排気手段を介し
て積極的に前記乾燥室外に除去し、さらにこの処理物を
前進移行させる過程で前述と同様に水蒸気膜が生成され
たときは、前述と同様に除去していく等処理物の前進移
行させる過程で前記の水蒸気膜の生成及び除去を適宜繰
り返すことを特徴とする放射伝熱を利用した吸引乾燥方
法。
(1) In the process in which water-permeable processed materials such as woven fabrics, knitted fabrics, non-woven fabrics, and other water-permeable films pass through a substantially closed-type drying chamber equipped with a radiant heat transfer plate at a predetermined speed, this processed material When more evaporated water vapor is diffused around the material to be treated and a water vapor film is generated, this water vapor film is actively removed to the outside of the drying chamber via the exhaust means, and in the process of moving the material forward. When a water vapor film is generated in the same manner as described above, it is removed in the same manner as described above, and the generation and removal of the water vapor film is appropriately repeated in the process of moving the material to be treated forward. Suction drying method used.
(2)放射伝熱板を配設してなる略密閉式の乾燥室を織
物、編物、不織布、その他浸水性フィルム等の浸水性処
理物が所定速度で通過していく過程において、この処理
物より蒸発した水蒸気が処理物の周辺に拡散されて水蒸
気膜が生成されたとき、この水蒸気膜を吹出手段を介し
て前記乾燥室内に拡散して水蒸気となし、この拡散され
た水蒸気を排気手段を介して積極的に前記乾燥室外に除
去し、さらにこの処理物を前進移行させる過程で前述と
同様に水蒸気膜が生成されたときは、前述と同様に拡散
除去していく等処理物の前進移行させる過程で前記の水
蒸気膜の生成及び拡散除去を適宜繰り返すことを特徴と
する放射伝熱を利用した吸引乾燥方法。
(2) In the process in which water-permeable processed materials such as woven fabrics, knitted fabrics, non-woven fabrics, and other water-permeable films pass through a substantially closed-type drying chamber equipped with a radiant heat transfer plate, this processed material is When the more evaporated water vapor is diffused around the object to be treated and a water vapor film is generated, this water vapor film is diffused into the drying chamber through the blowing means and turned into water vapor, and the diffused water vapor is passed through the exhaust means. If a water vapor film is generated as described above in the process of moving the treated material forward, it is diffused and removed in the same way as described above. A suction drying method using radiant heat transfer, characterized in that the generation and diffusion removal of the water vapor film are repeated as appropriate during the process of drying.
JP27854785A 1985-12-11 1985-12-11 Suction drying method utilizing heat transfer by radiation Pending JPS62138675A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27854785A JPS62138675A (en) 1985-12-11 1985-12-11 Suction drying method utilizing heat transfer by radiation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27854785A JPS62138675A (en) 1985-12-11 1985-12-11 Suction drying method utilizing heat transfer by radiation

Publications (1)

Publication Number Publication Date
JPS62138675A true JPS62138675A (en) 1987-06-22

Family

ID=17598775

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27854785A Pending JPS62138675A (en) 1985-12-11 1985-12-11 Suction drying method utilizing heat transfer by radiation

Country Status (1)

Country Link
JP (1) JPS62138675A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5375565A (en) * 1976-12-15 1978-07-05 Matsushita Electric Works Ltd Drying equipment

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5375565A (en) * 1976-12-15 1978-07-05 Matsushita Electric Works Ltd Drying equipment

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