JPS6213834A - Method of manufacturing pad improved in partial abrasion - Google Patents
Method of manufacturing pad improved in partial abrasionInfo
- Publication number
- JPS6213834A JPS6213834A JP15164885A JP15164885A JPS6213834A JP S6213834 A JPS6213834 A JP S6213834A JP 15164885 A JP15164885 A JP 15164885A JP 15164885 A JP15164885 A JP 15164885A JP S6213834 A JPS6213834 A JP S6213834A
- Authority
- JP
- Japan
- Prior art keywords
- wear
- rotor
- pad
- heat
- friction pad
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2995/00—Properties of moulding materials, reinforcements, fillers, preformed parts or moulds
- B29K2995/0037—Other properties
- B29K2995/0063—Density
- B29K2995/0064—Non-uniform density
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2031/00—Other particular articles
- B29L2031/16—Frictional elements, e.g. brake or clutch linings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2031/00—Other particular articles
- B29L2031/748—Machines or parts thereof not otherwise provided for
- B29L2031/7482—Brakes
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16D—COUPLINGS FOR TRANSMITTING ROTATION; CLUTCHES; BRAKES
- F16D69/00—Friction linings; Attachment thereof; Selection of coacting friction substances or surfaces
- F16D2069/002—Combination of different friction materials
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Casting Or Compression Moulding Of Plastics Or The Like (AREA)
- Braking Arrangements (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はディスクブレーキパッドの偏摩耗を防止するこ
とを目的とした偏摩耗改善パッドの製法に関するもので
ある。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for manufacturing a pad for improving uneven wear for the purpose of preventing uneven wear of disc brake pads.
〔従来技術および発明が解決すべき問題点〕ディスクブ
レーキの摩擦パッドの摩耗形態にはある一定のパターン
がある。例えばフローティングキャリパのアウタパッド
ではロータ外周側摺動部が多く摩耗するに対し、内周側
囲動部では摩耗量が少い。一方摩擦パッドの性質として
一般的に緻密な程摩耗し難くポーラスな程摩耗し易い傾
向がある。[Prior Art and Problems to be Solved by the Invention] There is a certain pattern of wear on the friction pads of disc brakes. For example, in the outer pad of a floating caliper, the sliding portion on the outer circumferential side of the rotor wears a lot, whereas the amount of wear on the surrounding circumferential portion on the inner circumferential side is small. On the other hand, the properties of a friction pad generally tend to be such that the denser it is, the more difficult it is to wear out, and the more porous it is, the more easily it wears out.
本発明はこのような問題に対処してディスクブレーキパ
ッドの偏摩耗を防止するためになされたものである。The present invention has been devised to address these problems and prevent uneven wear of disc brake pads.
従来においても摩擦材の密度をディスクロータの外周側
から内周側に向うに従って高くするように形成したもの
が実開昭５８−２４３２号公報に提案されているが、本
発明は上記のディスクロータ摺動部の内外周について言
えば従来のものとは逆のディスクロー夕の外周側から内
周側の向うに従ってポーラスに、即ち密度が低くなるよ
うにしたもので、従来の提案とは異った原理に基いてな
されたものである。Conventionally, a disk rotor in which the density of the friction material is increased from the outer circumferential side to the inner circumferential side has been proposed in Japanese Utility Model Application Publication No. 58-2432. Regarding the inner and outer peripheries of the sliding part, it is made more porous, that is, the density decreases from the outer periphery to the inner periphery of the disc roller, which is the opposite of the conventional proposal. It was based on the principle that
本発明の要旨とする所はディスクブレーキの摩擦パッド
の成型において、該摩擦パッドの熱プレス時または熱処
理時にパッドの耐摩耗を要する個所に偏荷重を加え、摩
擦パッドの摩耗量の多い個所を緻密組織に摩耗量の少い
個所をポーラス組織にすることを特徴とする偏摩耗改善
パッドの製法に係わるものである。The gist of the present invention is that when molding a friction pad for a disc brake, an uneven load is applied to the parts of the friction pad that require wear resistance during heat pressing or heat treatment of the friction pad, and the parts of the friction pad that are subject to a large amount of wear are densely molded. The present invention relates to a method for manufacturing an uneven wear improving pad, which is characterized by forming a porous structure in areas where the amount of wear is small.
以下本発明をフローティングキャリパのアウタパッドに
適用した場合について説明するが、本発明はこれのみに
制約されるものではない。A case will be described below in which the present invention is applied to an outer pad of a floating caliper, but the present invention is not limited to this.
添付図面には摩擦パッドのロータ外周側摺動面を緻密に
、ロータ内周側摺動面をポーラスにすることにより偏摩
耗を改善した例が示されている。The accompanying drawings show an example in which uneven wear is improved by making the sliding surface of the friction pad on the outer circumferential side of the rotor dense and the sliding surface on the inner circumferential side of the rotor porous.
第１図はフローティングキャリパのアウタパッドを示し
、（１）はＦＪ際材、（２）は裏板であって摩擦材の摺
動面はロータ外周側（ａ ）では緻密に、ロータ内周側
（ｂ）ではポーラスに夫々形成される。Figure 1 shows the outer pad of a floating caliper, (1) is the FJ side material, (2) is the back plate, and the sliding surface of the friction material is dense on the rotor outer circumference side (a), and is dense on the rotor inner circumference side (a). In b), each layer is formed porous.
以＋： ＋、：、同一の摩擦材成形用材料を型内に均質
充填し、これを熱プレス成型する場合についてその製法
を例示する。The following is an example of a manufacturing method in which the same friction material molding material is homogeneously filled into a mold and hot press molded.
例１
第２図は摩擦パッドの熱処理時に偏荷重をかける例を示
す。Example 1 Figure 2 shows an example in which an unbalanced load is applied during heat treatment of a friction pad.
Ｌ方のプレス台（３）とその立上り部に仮着（４）され
たプレス板（５）との間に予備成型された摩擦パッドの
摩擦材（１）がプレス板（５）に対面するように挾むが
、その際、緻密にすべき外周側（ａ ）を少し持ち上げ
て仮着点（４）に近い位置に、ポーラスにすべき内周側
（ｂ）を仮着点（４）より遠い側に少し高さを低くして
位置させ、図示のように荷重（６）をかけてプレス板（
５）を押し下げていくと、摩擦材（１）は外周側［仮着
点（４）に近い側］に偏荷重がかかり、外周側（ａ ）
がより緻密に、内周側（ｂ ）がよりポーラスに成型さ
れる。The friction material (1) of the friction pad preformed between the L side press stand (3) and the press plate (5) temporarily attached (4) to the rising part thereof faces the press plate (5). At that time, slightly lift the outer circumferential side (a) that should be dense and place it close to the temporary attachment point (4), and place the inner circumference side (b) that should be porous at the temporary attachment point (4). Place the press plate (6) at a slightly lower height on the far side and apply a load (6) as shown.
5), an uneven load is applied to the outer circumferential side [the side closer to the temporary attachment point (4)] of the friction material (1), and the outer circumferential side (a)
is formed more densely, and the inner peripheral side (b) is more porous.
例２
第３図は摩擦材（１）の熱プレス時に偏荷重をかける例
を示す。Example 2 Figure 3 shows an example in which an uneven load is applied during hot pressing of the friction material (1).
下型（７）に予備成型された摩擦材（１）を図示のよう
に左側が高く、右側が低い傾斜状態に収容し、上型（８
）をプレスラム（９）で押圧すると摩擦材（１）の左側
に偏荷重がかかり、より緻密な組織となり、右側はより
ポーラス組織になる。The friction material (1) preformed in the lower mold (7) is housed in an inclined state where the left side is high and the right side is low as shown in the figure.
) is pressed by the press ram (9), an uneven load is applied to the left side of the friction material (1), resulting in a more dense structure, and a more porous structure on the right side.
本発明によれば摩擦パッドの耐摩耗を要する個所に熱プ
レス時および／または熱処理時に偏荷重をかけて緻密組
織とすることにより偏摩耗を防止したディスクブレーキ
を提供したもので、これによりペダルストロークの伸び
、引き摺り等を防止する効果があり、実用上の価値大な
るものがある。According to the present invention, a disc brake is provided that prevents uneven wear by applying an uneven load during heat pressing and/or heat treatment to the parts of the friction pad that require wear resistance to create a dense structure, which makes it possible to prevent uneven wear during the pedal stroke. It has the effect of preventing stretching, dragging, etc., and has great practical value.
第１図（イ） （ロ）（ハ）はＩ！！ｔａバッドの正面
図、平面図、側面図であり、第２図および第３図は本発
明の摩擦パッドの偏荷重をかける態様を示した各例示図
である。
１・・・・・・摩擦材
３・・・・・・プレス台
５・・・・・・プレス板
６・・・・・・荷 重
７・・・・・・下 型
８・・・・・・上 型
９・・・・・・プレスラム
第１図
（イ）
藪
（ロ） （ハ）
第２図Figure 1 (a) (b) (c) is I! ! FIG. 2 is a front view, a plan view, and a side view of the ta pad, and FIGS. 2 and 3 are exemplary views showing a mode in which an uneven load is applied to the friction pad of the present invention. 1...Friction material 3...Press stand 5...Press plate 6...Load 7...Lower Mold 8... ...Top mold 9...Press ram Figure 1 (A) Bush (B) (C)
Figure 2
Claims (1)
ドの耐摩耗を要する個所に偏荷重を加え、摩擦パッドの
摩耗量の多い個所を緻密組織に摩耗量の少い個所をポー
ラス組織にすることを特徴とする偏摩耗改善パッドの製
法。[Scope of Claims] In molding a friction pad for a disc brake, an uneven load is applied to the parts of the friction pad that require wear resistance during heat pressing or heat treatment of the friction pad, and parts of the friction pad that are subject to a large amount of wear are made into a dense structure. A manufacturing method for a pad that improves uneven wear, which is characterized by creating a porous structure in areas with little wear.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15164885A JPS6213834A (en) | 1985-07-10 | 1985-07-10 | Method of manufacturing pad improved in partial abrasion |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15164885A JPS6213834A (en) | 1985-07-10 | 1985-07-10 | Method of manufacturing pad improved in partial abrasion |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6213834A true JPS6213834A (en) | 1987-01-22 |
Family
ID=15523157
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15164885A Pending JPS6213834A (en) | 1985-07-10 | 1985-07-10 | Method of manufacturing pad improved in partial abrasion |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6213834A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6251184B1 (en) | 1997-02-13 | 2001-06-26 | Samsung Electronics Co., Ltd. | Insulating-containing ring-shaped heat shields for czochralski pullers |
| US6340392B1 (en) | 1997-10-24 | 2002-01-22 | Samsung Electronics Co., Ltd. | Pulling methods for manufacturing monocrystalline silicone ingots by controlling temperature at the center and edge of an ingot-melt interface |
| US6485807B1 (en) | 1997-02-13 | 2002-11-26 | Samsung Electronics Co., Ltd. | Silicon wafers having controlled distribution of defects, and methods of preparing the same |
| US6503594B2 (en) | 1997-02-13 | 2003-01-07 | Samsung Electronics Co., Ltd. | Silicon wafers having controlled distribution of defects and slip |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS582432B2 (en) * | 1975-07-01 | 1983-01-17 | 富士通株式会社 | Jiki Bubble Souchino Kenshiyutsu Cairo |
-
1985
- 1985-07-10 JP JP15164885A patent/JPS6213834A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS582432B2 (en) * | 1975-07-01 | 1983-01-17 | 富士通株式会社 | Jiki Bubble Souchino Kenshiyutsu Cairo |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6251184B1 (en) | 1997-02-13 | 2001-06-26 | Samsung Electronics Co., Ltd. | Insulating-containing ring-shaped heat shields for czochralski pullers |
| US6409833B2 (en) | 1997-02-13 | 2002-06-25 | Samsung Electronics Co., Ltd. | Insulating-containing ring-shaped heat shields and support members for Czochralski pullers |
| US6472040B1 (en) | 1997-02-13 | 2002-10-29 | Samsung Electronics Co., Ltd. | Semi-pure and pure monocrystalline silicon ingots and wafers |
| US6485807B1 (en) | 1997-02-13 | 2002-11-26 | Samsung Electronics Co., Ltd. | Silicon wafers having controlled distribution of defects, and methods of preparing the same |
| US6503594B2 (en) | 1997-02-13 | 2003-01-07 | Samsung Electronics Co., Ltd. | Silicon wafers having controlled distribution of defects and slip |
| US6676753B2 (en) | 1997-02-13 | 2004-01-13 | Samsung Electronics Co., Ltd. | Czochralski pullers for manufacturing monocrystalline silicon ingots, including heat shield having sloped portions |
| US6780238B2 (en) | 1997-02-13 | 2004-08-24 | Samsung Electronics Co., Ltd. | Argon/ammonia rapid thermal annealing for silicon wafers |
| US6340392B1 (en) | 1997-10-24 | 2002-01-22 | Samsung Electronics Co., Ltd. | Pulling methods for manufacturing monocrystalline silicone ingots by controlling temperature at the center and edge of an ingot-melt interface |
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