JPS62109214A - Manufacture of thin film head - Google Patents

Abstract

PURPOSE:To realize high density recording while the azimuth of a head element is changed by applying cutting or polishing process in advance to a part of a lithography face to form a digged down face to the non-processing face and forming a head element to the said face thereby tiling the processing face to the non-processing face. CONSTITUTION:V grooves 81-86 are formed to the surface of a base 1 and photoengraving is applied to the tilt face of the V grooves 81-86 to form a head element 2. The base 1 is cut at cut lines 31, 32, 51-56 to form a slider 6. Since the head elements 2a, 2b of the slider 6 are formed respectively to the face titled in the downward gradient toward the outside, the mutual azimuth is reversed. Thus, for example, the azimuth of an even number track and an odd number track of a disc is changed to record a signal, the guard band between adjacent tracks is omitted to increase the number of tracks by the share and in adopting the recording system realizing the high density recording, it is coped with sufficiently.

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention provides a method for manufacturing a thin film head by applying lithography technology, and a method for easily manufacturing a slider having a plurality of head elements having different azimuths. The present invention relates to a method of manufacturing a thin film head that can be produced.

[Conventional technology]

3 and 4 show a conventional thin film head manufacturing method for manufacturing a large number of sliders having a plurality of head elements. In the figures, (1) is a substrate, and (2) is this substrate (1).
), a large number of head elements are formed in a predetermined arrangement by photoengraving, which is lithography, on the surface of
2), (33) are horizontal cutting lines cut into the substrate (1) to make the substrate (1) into individual heads, (4□),
(42) is these cutting lines (6□), (32), (33
), (5□), (52), (53
) is the longitudinal cutting line cut to obtain a slider (6) with two head elements (2a), (2b) from these arrays (4□), (4□), (7) is the slider (6) is a floating surface when used as a floating head of a magnetic disk device.

The conventional thin film head manufacturing method is configured as described above.
For example, on the surface of a substrate (1) made of titanium, alumina, or carbide, photolithography (lithography) is performed to form permalloy, which is the core of the head, by sputtering or plating, and an insulating layer is provided, followed by sputtering or plating. A coil is formed, and permalloy as a core is formed on the coil to form a head element (2). A thin film head is characterized in that a large number of head elements (2) can be manufactured simultaneously on a substrate (1) using lithography technology. Once 2) is formed, cut lines (3□), (32), and (33) are inserted to make individual heads to form an array (4 lines) and (42), and then cut lines (5□) are formed. ,(
52) and (53) to form head elements (2a) and (2b).
) A slider (6) is manufactured. In this case, since both head elements (2a) and (2b) are formed on the flat surface of the substrate (1), they have the same azimuth and protrude from the substrate (1) as shown in FIG. The situation is as follows.

[Problem that the invention seeks to solve]

In the conventional thin film head manufacturing method as described above, since the azimuths of both head elements (2a) and (2b) are the same, this does not pose a problem in the conventional recording method. When adopting a recording method that changes the
There was a problem that a thin film head compatible with this could not be obtained0.Also, even when using the conventional recording method, both head elements (
Since 2a) and 2b protrude from the surface of the substrate (1), there is also the problem that they are easily damaged during manufacturing or use.

The present invention has been made to solve these problems, and provides a thin film that can easily obtain a slider having a plurality of head elements with different azimuths and can also protect the head elements.

The purpose is to obtain a method for producing rad.

[Failure to solve the problem]

In the method for manufacturing a thin film head according to the present invention, a part of the lithography surface is cut or polished in advance to form a surface dug with respect to the unprocessed surface, and at least a part of the head element is formed on this surface. It was designed to do so.

[Effect]

In this invention, part of the lithographic surface.

A machined surface is formed that is dug into the non-processed surface, and at least some of the head elements are formed on this machined surface, so the azimuth of the head element is changed by tilting the machined surface with respect to the non-processed surface. By making the processed surface parallel to the non-processed surface, the azimuth cannot be changed, but the head element can be protected0 [Example] Figures 1 and 2 1 shows one embodiment of the present invention, and in the figure, the same reference numerals as in FIGS. 3 and 4 indicate the same or corresponding parts. (8,), (8□), (83).

(a,), (a,), and (s6) are ■grooves formed in advance by cutting or polishing the surface of the substrate (1), and the head element (2) is formed by each ■groove (8,). - (86) are formed by the same method as the conventional method.

In the method for manufacturing the thin film head configured as described above, first, the surface of the substrate (1) is cut or polished to form V grooves (8,) to (86), and then each V groove ( Photolithography is performed on the inclined surfaces of 8□) to (86) to form the head element (2). And this board (1),
The slider (6) is formed by cutting along the cutting lines (3,), (3□), and (5,) to (56). The head elements (2a) and (2b) of this slider (6) are each formed on a surface that slopes downward toward the outside, so that their azimuths are opposite to each other. For this reason, for example, when recording is performed by changing the azimuth of the even-numbered tracks and odd-numbered tracks of the disk, omitting the guard band between adjacent tracks and increasing the number of tracks by that amount, a recording method is adopted that achieves high-density recording. But I can handle this.

In addition, in the above embodiment, since photolithography is performed on an inclined surface, consideration must be given to this.
Even with the current device, the depth of the lens is approximately 10 μm, and the depth of the grooves (8□) to (86) may be approximately 1 μm, so this is sufficiently feasible.

Further, in the embodiment described above, both head elements (2a) are used.

(2b) is shown as being inclined with ■grooves (8□) to (86), but any shape may be used as long as the angles of both head elements (2a) and (2b) are different. □)〜(
The head elements (2a) and (2b) may be provided at locations other than 86) to provide three or more head elements.

Further, in the above embodiment, the head element (2a
), (2b), a square groove is formed and a head element (2a),
(2b) may also be formed. In this way, although the azimuth cannot be changed, the effect of protecting the thin film head can be obtained.

〔Effect of the invention〕

As explained above, in this invention, a part of the lithography surface is cut or polished in advance to form a surface dug with respect to the unprocessed surface, and at least a part of the head element is formed on this surface. Therefore, if the processed surface is inclined with respect to the non-processed surface, high-density recording can be realized by changing the azimuth of the head element, and a low-cost device can be realized by lowering the accuracy of the device. Furthermore, by making the processed surface parallel to the non-processed surface, the thin film head can be protected, although the azimuth of the head element cannot be changed.

[Brief explanation of drawings]

FIG. 1 is an explanatory diagram showing one embodiment of the present invention, FIG. 2 is a sectional view taken along line II-[1 in FIG. 1, and FIG. 3 is a diagram equivalent to FIG. Figure 4 is the same as Figure 6.
It is a sectional view taken along the line -■. (1) Two substrates (2), (2a), (2b): Head element (6)
Nislider (8□), (8□), (a3), (a,), (s5),
(a6): V groove In each figure, the same reference numerals indicate the same or corresponding parts.

Claims (3)

[Claims] (1) In a method of manufacturing a thin film head by applying lithography technology, a part of the lithography surface is cut or polished in advance to form a surface that is dug with respect to the unprocessed surface, and at least part of this surface is A method of manufacturing a thin film head, comprising forming a head element of. (2) Claim 1, characterized in that the surface dug with respect to the unprocessed surface is a surface inclined with respect to the non-processed surface.
A method for manufacturing a thin film head as described in Section 1. (3) The method for manufacturing a thin film head according to claim 1, wherein the surface dug into the non-processed surface is a surface parallel to the non-processed surface.