JPS62103073A - Method of purifying ethylene oxide - Google Patents

Method of purifying ethylene oxide

Info

Publication number
JPS62103073A
JPS62103073A JP61074357A JP7435786A JPS62103073A JP S62103073 A JPS62103073 A JP S62103073A JP 61074357 A JP61074357 A JP 61074357A JP 7435786 A JP7435786 A JP 7435786A JP S62103073 A JPS62103073 A JP S62103073A
Authority
JP
Japan
Prior art keywords
ethylene oxide
tower
column
conduit
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP61074357A
Other languages
Japanese (ja)
Inventor
Yukihiko Kakimoto
行彦 柿本
Masayuki Sawada
沢田 雅行
Nobuaki Kajimoto
梶本 宣明
Isamu Kiguchi
木口 勇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Shokubai Co Ltd
Original Assignee
Nippon Shokubai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Shokubai Co Ltd filed Critical Nippon Shokubai Co Ltd
Priority to DE8686108909T priority Critical patent/DE3678871D1/en
Priority to US06/880,734 priority patent/US4778567A/en
Priority to EP86108909A priority patent/EP0207490B1/en
Priority to CA000512894A priority patent/CA1284335C/en
Priority to CN86105706A priority patent/CN1014243B/en
Priority to KR1019860005394A priority patent/KR920001767B1/en
Publication of JPS62103073A publication Critical patent/JPS62103073A/en
Pending legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/10Process efficiency
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals

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  • Epoxy Compounds (AREA)

Abstract

PURPOSE:To purify EO in high energy efficiency, by using steam produced by heat energy of a stripped material of an EO stripping column and of a solution at the bottom of the stripping column recovered by a heat pump as a heating source for an EO fractionating column. CONSTITUTION:A solution at the bottom of an ethylene oxide(EO) absorbing column 2 is subjected to heat exchange by a heat exchanger 6 with a solution at the bottom of an EO stripping column 11, an inert gas is separated by a separator 8 and fed to the stripping column 11. An EO-containing stripped material from the stripped column 11 is fed to the heater 60 of an EO fractionating column 50, used as a heating source for the fractionating column 50, sent to a condenser 64, an uncondensed gas is fed through a dehydrating column 29 and a separating column 40 to the fractionating column 50 and a purified EO is recovered 57. The solution at the bottom of the stripping column 11 is subjected to heat exchange with a solution at the bottom of an absorbing solution by the heat exchanger 6, sent to a refrigerant evaporator 16 of a heat pump, further cooled 17 and refluxed as an absorbing solution to the absorbing column. The refrigerant evaporated by the evaporator 16 is compressed 70, sent to a refrigerant condenser 73, water circulating in it is heated to produce steam, which is fed to a heater 58 of the fractionating column 50 and used as a heating source.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、エチレンオキシドの精製方法間するものであ
る。エチレンを銀触媒の存在下、分子状酸素含有ガスと
接触気相酸化して生成したエチレンオキシドを含有する
反応生成ガスをエチレンオキシド吸収塔へ導入し吸収液
と向流接触させ、工チレンオキシド吸収塔頂部よりのガ
スはエチレン酸化反応工程へ循環し、エチレンオキシド
を含むエチレンオキシド吸収塔底液はエチレンオキシド
放散塔へ供給し、エチレンオキシド放散塔頂からエチレ
ンオキシドを放散せしめ、エチレンオキシドおよび水を
含む留出液を凝縮させ、脱水塔で水分を分離し、重質分
分離塔で重質分を分離し、ついでエチレンオキシド精留
塔でエチレンオキシドを精留する工程において、エチレ
ンオキシド放散塔の放散物の凝縮熱を利用し、またエチ
レンオキシド放散塔底液からヒートポンプを用いてエチ
レンオキシド放散塔底液の熱回収を行い熱回収により発
生した低圧蒸気をエチレンオキシド精留塔の熱源として
利用するエチレンオキシド精留塔の加熱エネルギーを低
減させるエチレンオキシドの精製方法に関するものであ
る。
DETAILED DESCRIPTION OF THE INVENTION (Industrial Field of Application) The present invention relates to a method for purifying ethylene oxide. A reaction product gas containing ethylene oxide produced by contact gas phase oxidation of ethylene with a molecular oxygen-containing gas in the presence of a silver catalyst is introduced into an ethylene oxide absorption tower, brought into countercurrent contact with the absorption liquid, and is removed from the top of the ethylene oxide absorption tower. The gas is circulated to the ethylene oxidation reaction step, the ethylene oxide absorption tower bottom liquid containing ethylene oxide is supplied to an ethylene oxide stripping tower, ethylene oxide is diffused from the top of the ethylene oxide stripping tower, and the distillate containing ethylene oxide and water is condensed. In the process of separating water in a dehydration tower, separating heavy fractions in a heavy fraction separation tower, and then rectifying ethylene oxide in an ethylene oxide rectification tower, the heat of condensation of the emissions from the ethylene oxide stripping tower is used. A method for purifying ethylene oxide that reduces the heating energy of an ethylene oxide rectification column, in which heat is recovered from the ethylene oxide stripping column bottom liquid using a heat pump, and the low-pressure steam generated by the heat recovery is used as a heat source for the ethylene oxide rectification column. It is related to.

(従来の技術) エチレンオキシドは一般につぎのようにして精製される
。エチレンと分子状酸素含有ガスとを銀触媒上で接触気
相酸化して生成するエチレンオキシドを含む反応生成ガ
スをエチレンオキシド吸収塔へ導びき水を主とする吸収
液と向流接触させエチレンオキシド水溶液として回収し
、ついでエチレンオキシド放散塔へ送りエチレンオキシ
ド放散塔底部を加熱蒸気で加熱することによってエチレ
ンオキシドを水溶液から放散させエチレンオキシド放散
塔底部より実質的にエチレンオキシドを含まない水溶液
は吸収液として循環使用し、エチレンオキシド放散塔頂
部より放散されるエチレンオキシド、水、二酸化炭素、
不活性ガス(窒素、アルゴン、メタン、エタン、)の他
ホルムアルデヒド等の低沸点不純物およびアセトアルデ
ヒド、酢酸等の高沸点不純物を含む放散物を脱水工程、
重質分分離工程および重質分分離工程の各々を経て精製
しエチレンオキシドを製造することができる。
(Prior Art) Ethylene oxide is generally purified as follows. The reaction product gas containing ethylene oxide produced by catalytic gas phase oxidation of ethylene and molecular oxygen-containing gas over a silver catalyst is led to an ethylene oxide absorption tower, brought into countercurrent contact with an absorption liquid mainly composed of water, and recovered as an ethylene oxide aqueous solution. Then, it is sent to an ethylene oxide stripping tower and the bottom of the ethylene oxide stripping tower is heated with heated steam to diffuse ethylene oxide from the aqueous solution.The aqueous solution that does not substantially contain ethylene oxide from the bottom of the ethylene oxide stripping tower is recycled as an absorption liquid and is then sent to the ethylene oxide stripping tower. Ethylene oxide, water, carbon dioxide released from the top,
In addition to inert gases (nitrogen, argon, methane, ethane), emissions containing low-boiling point impurities such as formaldehyde and high-boiling point impurities such as acetaldehyde and acetic acid are removed during the dehydration process.
Ethylene oxide can be produced by purification through a heavy fraction separation step and a heavy fraction separation step.

(発明が解決しようとする問題点) しかしながら、このようなエチレンオキシドの精製方法
は、エチレンオキシド放散塔頂蒸気の凝縮熱の回収やエ
チレンオキシド放散塔底部より抜き出された液が有する
熱エネルギーを回収する点については十分でなく、大量
の熱量が系外に廃棄されるという問題があった。従来の
方法は100〜130℃のエチレンオキシド放散塔底液
をエチレンオキシド吸収塔底液と熱交換させ、熱量の回
収をなった後、冷却してエチレンオキシド吸収塔の吸収
液としていた。また、エチレンオキシドの精製方法はエ
チレンオキシド精留塔における加熱蒸気量を釜石に消費
する問題があった。本発明はこれらのエチレンオキシド
精留工程における省エネルギーについて研究した結果、
エチレンオキシド放散塔底液の有するエネルギーとエチ
レンオキシド放散塔頂蒸気のエネルギーの有効利用に着
眼し本発明を完成した。
(Problems to be Solved by the Invention) However, such a method for purifying ethylene oxide requires recovery of the heat of condensation of the vapor at the top of the ethylene oxide dispersion column and recovery of thermal energy possessed by the liquid extracted from the bottom of the ethylene oxide dispersion column. There was a problem that the amount of heat was not sufficient and a large amount of heat was discarded outside the system. In the conventional method, the ethylene oxide stripping tower bottom liquid at 100 to 130°C is heat exchanged with the ethylene oxide absorption tower bottom liquid, and after recovering the heat amount, it is cooled and used as the absorption liquid of the ethylene oxide absorption tower. Furthermore, the method for purifying ethylene oxide has a problem in that the amount of heated steam in the ethylene oxide rectification column is consumed by Kamaishi. The present invention was developed as a result of research into energy saving in these ethylene oxide rectification processes.
The present invention was completed by focusing on the effective use of the energy of the ethylene oxide stripping tower bottom liquid and the energy of the ethylene oxide stripping tower top steam.

(問題点を解決するための手段) エチレンを銀触媒の存在下、分子状酸素含有ガスと接触
気相酸化して生成したエチレンオキシドを含有する反応
生成ガスをエチレンオキシド吸収塔へ導入し吸収液と向
流接触させ、エチレンオキシド吸収塔頂部よりのガスの
一部はエチレン酸化反応工程へ循環し、エチレンオキシ
ドを含むエチレンオキシド吸収塔底液はエチレンオキシ
ド放散塔へ供給し、エチレンオキシド放散塔頂からエチ
レンオキシドを放散せしめ、エチレンオキシドおよび水
を含む留出液を凝縮させ、脱水塔で水分を分離し、重質
分分離塔に導びき重質分を分離し、ついでエチレンオキ
シド精留塔に導ひきエチレンオキシドを精留する工程に
おいて、エチレンオキシド放散塔から放散される放散物
をエチレンオキシド精留塔の加熱源に使用し、エチレン
オキシド放散塔底部より抜き出した液はエチレンオキシ
ド吸収塔へ導き吸収液として循環使用し、残部は吸収液
に含まれるエチレングリコールを濃縮するため副生エチ
レングリコール濃縮塔へ送る工程において、エチレンオ
キシド放散塔底部より抜き出した液を熱交換器にてエチ
レンオキシド吸収塔底液と熱交換した後、ヒートポンプ
を用いて吸収液の持つ熱エネルギーを回収し水蒸気を発
生させ、工チレンオキシド精留塔の加熱源に使用し、ヒ
ートポンプにより冷却された吸収液をさらに冷却源にて
冷却した後、エチレンオキシド吸収塔の吸収液とするこ
とを特徴とするエチレンオキシドの精製方法に関すもの
である。
(Means for solving the problem) A reaction product gas containing ethylene oxide produced by catalytic gas-phase oxidation of ethylene with a molecular oxygen-containing gas in the presence of a silver catalyst is introduced into an ethylene oxide absorption tower and exchanged with the absorption liquid. A part of the gas from the top of the ethylene oxide absorption tower is circulated to the ethylene oxidation reaction process, and the ethylene oxide absorption tower bottom liquid containing ethylene oxide is supplied to the ethylene oxide stripping tower, where ethylene oxide is diffused from the top of the ethylene oxide stripping tower. and a step of condensing the distillate containing water, separating water in a dehydration tower, leading to a heavy fraction separation tower to separate the heavy fraction, and then leading to an ethylene oxide rectification tower to rectify ethylene oxide, The emitted material emitted from the ethylene oxide stripping tower is used as a heating source for the ethylene oxide rectification tower, and the liquid extracted from the bottom of the ethylene oxide stripping tower is guided to the ethylene oxide absorption tower and recycled as an absorption liquid.The remainder is used as the ethylene contained in the absorption liquid. In the process of sending the by-product ethylene glycol to the concentration tower to concentrate glycol, the liquid extracted from the bottom of the ethylene oxide diffusion tower is heat exchanged with the bottom liquid of the ethylene oxide absorption tower in a heat exchanger, and then a heat pump is used to extract the heat of the absorption liquid. Energy is recovered to generate water vapor, which is used as a heating source for the ethylene oxide rectification tower, and the absorption liquid cooled by the heat pump is further cooled by the cooling source, and then used as the absorption liquid for the ethylene oxide absorption tower. The present invention relates to a method for purifying ethylene oxide.

本発明においてエチレンオキシド吸収塔へ供給される吸
収液の温度は5〜40℃、好ましくは10〜35℃であ
り、吸収液の組成はPHが5〜12、好ましくは6〜1
1、エチレングリコール濃度が1〜40重間%、好まし
くは5〜30重鑓%、消泡剤濃度がO;II)pm以上
、好ましくは1〜1100pl)、残り水の範囲に制御
される。吸収液中のエチレングリコール濃度を一定に保
持するために、エチレンオキシド吸収塔とエチレンオキ
シド放散塔とを循環する吸収液の一部をエチレンオキシ
ド放散塔底部から抜き出し副生エチレングリコール濃縮
塔へ送り、必要により新鮮な水が導入して制御される。
In the present invention, the temperature of the absorption liquid supplied to the ethylene oxide absorption tower is 5 to 40°C, preferably 10 to 35°C, and the composition of the absorption liquid has a pH of 5 to 12, preferably 6 to 1.
1. The ethylene glycol concentration is controlled within the range of 1 to 40% by weight, preferably 5 to 30% by weight, the antifoaming agent concentration is O; In order to keep the ethylene glycol concentration in the absorption liquid constant, a part of the absorption liquid that circulates between the ethylene oxide absorption tower and the ethylene oxide stripping tower is extracted from the bottom of the ethylene oxide stripping tower and sent to the by-product ethylene glycol concentration tower, where it is freshly recycled if necessary. water is introduced and controlled.

PHの調節は、たとえばカリウム、ナトリウムのような
アルカリ金属の水酸化物や炭酸塩等の吸収液に溶解する
化合物を添加することにより行うのが好ましく、添加剤
は具体的には水酸化カリウムまたは水酸化ナトリウムが
好ましい。
It is preferable to adjust the pH by adding a compound that dissolves in the absorption liquid, such as a hydroxide or carbonate of an alkali metal such as potassium or sodium. Specifically, the additive is potassium hydroxide or Sodium hydroxide is preferred.

消泡剤は、エチレンオキシド、副生エチレングリコール
等に不活性であり、吸収液の消泡効果を有するものであ
ればいかなる消泡剤でも使用でき、代表的な例としては
水溶性シリコンエマルションが吸収液への分散性、希釈
安定性、熱安定性が優れているので効果的である。
Any antifoaming agent can be used as long as it is inert to ethylene oxide, by-product ethylene glycol, etc. and has an antifoaming effect on the absorption liquid.A typical example is a water-soluble silicone emulsion. It is effective because it has excellent dispersibility in liquids, dilution stability, and thermal stability.

エチレンオキシド吸収塔の操作条件は、反応生成ガス中
のエチレンオキシド濃度が0.5〜5容量%、好ましく
は1.0〜4容台%であり、エチレンオキシド吸収塔の
操作圧は2〜40KO/ciG1好ましくは10〜30
Kq/ciGである。
The operating conditions for the ethylene oxide absorption tower are such that the ethylene oxide concentration in the reaction product gas is 0.5 to 5% by volume, preferably 1.0 to 4% by volume, and the operating pressure of the ethylene oxide absorption tower is preferably 2 to 40 KO/ciG1. is 10-30
Kq/ciG.

エチレンオキシド放散塔の操作条件は、エチレンオキシ
ド放散塔頂圧力0.1〜2.Oka/a+fG。
The operating conditions for the ethylene oxide stripping tower are an ethylene oxide stripping tower top pressure of 0.1 to 2. Oka/a+fG.

好ましくは0.3〜0.6kg/dG、エチレンオキシ
ド放散塔頂温度85〜120℃、エチレンオキシド放散
塔底温度100〜130℃、エチレンオキシド放散塔底
エチレンオキシド濃度は10ppm以下、好ましくは0
.5ppm以下である。
Preferably 0.3-0.6 kg/dG, ethylene oxide stripping tower top temperature 85-120°C, ethylene oxide stripping tower bottom temperature 100-130°C, ethylene oxide stripping tower bottom ethylene oxide concentration 10 ppm or less, preferably 0
.. It is 5 ppm or less.

本発明においてエチレンオキシド脱水塔へ供給される供
給蒸気の温度は5〜60℃、好ましくは10〜50℃で
あり、供給蒸気のエチレンオキシド濃度は80〜98重
量%の範囲である。
In the present invention, the temperature of the supplied steam supplied to the ethylene oxide dehydration tower is 5 to 60°C, preferably 10 to 50°C, and the ethylene oxide concentration of the supplied steam is in the range of 80 to 98% by weight.

エチレンオキシド脱水塔の操作条件は、脱水塔頂圧力O
〜2 k Q / ci G 、好ましくは0.3〜0
゜6kq/iG、脱水塔頂温度10〜40℃、脱水塔底
温度100〜130℃の範囲である。脱水塔底エチレン
オキシド濃度は1100pl)以下、好ましくは10p
pm以下の範囲である。
The operating conditions for the ethylene oxide dehydration tower are dehydration tower top pressure O
~2kQ/ciG, preferably 0.3-0
6 kq/iG, a dehydration tower top temperature of 10 to 40°C, and a dehydration tower bottom temperature of 100 to 130°C. The concentration of ethylene oxide at the bottom of the dehydration tower is 1100 pl) or less, preferably 10 pl.
The range is below pm.

本発明においてエチレンオキシド軽質分分離塔へ供給さ
れる供給液の温度は0〜50℃、好ましくは5〜30℃
であり、供給液の組成は大部分がエチレンオキシドで、
わずかのホルムアルデヒド等のアルデヒド類及び水を含
んでいる。
In the present invention, the temperature of the feed liquid supplied to the ethylene oxide light fraction separation column is 0 to 50°C, preferably 5 to 30°C.
The composition of the feed liquid is mostly ethylene oxide,
Contains a small amount of aldehydes such as formaldehyde and water.

エチレンオキシドの軽質分分離塔の操作条件は、軽質分
分離塔頂圧力1〜10kq/cIdG好ましくは3〜7
ka/dGの範囲である。
The operating conditions of the light fraction separation tower for ethylene oxide are a light fraction separation tower top pressure of 1 to 10 kq/cIdG, preferably 3 to 7
It is in the range of ka/dG.

軽質分分離塔頂温度30〜90℃、軽質分分離塔底温度
30〜90℃の範囲である。
The light fraction separation tower top temperature is in the range of 30 to 90°C, and the light fraction separation tower bottom temperature is in the range of 30 to 90°C.

軽質分分離塔底エチレンオキシド濃度は99.5重量%
以上、好ましくは99.95重量%以上の、範囲である
Light fraction separation column bottom ethylene oxide concentration is 99.5% by weight
The content is preferably 99.95% by weight or more.

本発明においてエチレンオキシド精留塔は棚段塔型式お
よび充填塔型式がある。゛ 棚段塔型式の蒸留塔の棚段としては種々あるがバブルキ
ャップトレイ、ユニフラックストレイ、ターボグリッド
トレイ、リップトレイ、フレキシトレイ、シーブトレイ
、バラストトレイ等が挙げられる。また、充填塔型式の
精留塔の充填物としては、ラシヒリング、ボールリング
、サドル型リング、スパイラルリング、マクマホンバッ
キング、インターロックスメタルバッキング、−理論段
数あたり2′〜3mmt−H)以下の圧力損失を有する
充填物、織物または編物構造の金網積層板等が挙げられ
る。
In the present invention, the ethylene oxide rectification column includes a tray column type and a packed column type. There are various types of trays in the tray column type distillation column, including bubble cap trays, uni-flux trays, turbo grid trays, lip trays, flexi trays, sieve trays, and ballast trays. Packing materials for packed column type rectification columns include Raschig rings, ball rings, saddle rings, spiral rings, McMahon backings, Interlocks metal backings, and pressure loss of 2' to 3 mmt-H per theoretical plate number. For example, a wire mesh laminate having a filling, a woven or knitted structure, and the like.

本発明においてエチレンオキシド精留塔へ供給される供
給液の温度は30〜90℃、好ましくは50〜70℃で
あり、供給液の組成はエチレンオキシド濃度が99.5
重分%以上、好ましくは99.95重量%以上の範囲に
制御される。
In the present invention, the temperature of the feed liquid supplied to the ethylene oxide rectification column is 30 to 90°C, preferably 50 to 70°C, and the composition of the feed liquid is such that the ethylene oxide concentration is 99.5°C.
The weight is controlled to be at least 99.95% by weight, preferably at least 99.95% by weight.

エチレンオキシドの精留塔の操作条件は、精留塔頂圧力
1.0〜8.0kcx/iG、好ましくは2.0〜5.
0kQ/dG、精留塔頂温度40〜65℃、精留塔頂圧
力45〜70℃、精留塔底エチレンオキシドa度は30
〜90重量%、好ましくは40〜80重硲%の範囲であ
る。
The operating conditions for the ethylene oxide rectification column are a rectification column top pressure of 1.0 to 8.0 kcx/iG, preferably 2.0 to 5.0 kcx/iG.
0 kQ/dG, rectification tower top temperature 40 to 65°C, rectification tower top pressure 45 to 70°C, rectification tower bottom ethylene oxide degree a is 30
The range is from 40 to 80% by weight, preferably from 40 to 80% by weight.

本発明において精留塔底液はアセトアルデヒド、水およ
び酢酸等の高沸点不純物からなる重質分である。
In the present invention, the rectification column bottom liquid is a heavy fraction consisting of high boiling point impurities such as acetaldehyde, water and acetic acid.

本発明の特徴は、エチレンを銀触媒の存在下、分子状酸
素含有ガスと接触気相酸化して生成したエチレンオキシ
ドを含有する反応生成ガスをエチレンオキシド吸収塔へ
導入し吸収液と向流接触させ、エチレンオキシド吸収塔
頂部よりのガス一部はエチレン酸化反応工程へ循環し、
エチレンオキシドを含むエチレンオキシド吸収塔底液は
エチレンオキシド放散塔へ供給し、エチレンオキシド放
散塔頂部からエチレンオキシドを放散せしめ、エチレン
オキシド放散塔底部より抜き出した液は熱交換器にてエ
チレンオキシド吸収塔底液と熱交換した後、冷却器にて
冷却した後、エチレンオキシド吸収塔へ導き吸収液とし
て循環使用し、残部はその液に含まれるエチレングリコ
ールを濃縮するため副生エチレングリコール濃縮塔へ送
る工程において、エチレンオキシド放散塔より放散する
蒸気が有する熱エネルギーを回収し、その回収熱エネル
ギーの有効利用を計ることである。その手段として、エ
チレンオキシド放散塔より放散する蒸気をエチレンオキ
シド精留塔の加熱器に送り、熱交換し放散物を液化し、
凝縮した液はエチレンオキシド放散塔へ遠流し、未凝縮
ガスは脱水塔へ供給する方法が採用される。さらにエチ
レンオキシド放散塔底部より抜き出した液は熱交換器に
てエチレンオキシド吸収塔底液と熱交換した後、ヒート
ポンプを用いて吸収液の持つ熱エネルギーを回収した後
、冷却器へ送られる。
A feature of the present invention is that a reaction product gas containing ethylene oxide produced by catalytic gas phase oxidation of ethylene with a molecular oxygen-containing gas in the presence of a silver catalyst is introduced into an ethylene oxide absorption tower and brought into countercurrent contact with an absorption liquid, A portion of the gas from the top of the ethylene oxide absorption tower is recycled to the ethylene oxidation reaction process.
The ethylene oxide absorption tower bottom liquid containing ethylene oxide is supplied to the ethylene oxide stripping tower, and the ethylene oxide is diffused from the top of the ethylene oxide stripping tower, and the liquid extracted from the bottom of the ethylene oxide stripping tower is heat exchanged with the ethylene oxide absorption tower bottom liquid in a heat exchanger. After being cooled in a cooler, it is led to an ethylene oxide absorption tower and recycled as an absorption liquid, and the remainder is dissipated from an ethylene oxide stripping tower in the process of sending it to a by-product ethylene glycol concentration tower to concentrate the ethylene glycol contained in the liquid. The aim is to recover the thermal energy possessed by the steam produced by the steam, and to make effective use of the recovered thermal energy. As a means of achieving this, the vapor emitted from the ethylene oxide stripping tower is sent to the heater of the ethylene oxide rectification tower, where heat is exchanged and the emitted material is liquefied.
A method is adopted in which the condensed liquid is far-flowed to an ethylene oxide stripping tower, and the uncondensed gas is supplied to a dehydration tower. Further, the liquid extracted from the bottom of the ethylene oxide stripping tower exchanges heat with the ethylene oxide absorption tower bottom liquid in a heat exchanger, and after recovering the thermal energy of the absorption liquid using a heat pump, it is sent to a cooler.

本発明に用いるヒートポンプの作動流体としての冷媒は
、ヒートポンプのプロセスで蒸発、凝縮を繰り返して循
環使用されるためその選択に当っては熱力学的性質のほ
かに熱的及び化学的に安定であること及び取り扱い上か
らは臭気、毒性、および爆発性を有しないことが要求さ
れる。本発明で使用できる冷媒としてはR−11、R−
12、R−22、R−113及びR−114等のフッ化
炭化水素及びプロパン、ペンタン等の炭化水素類等が挙
げられるが、ヒートポンプ作動温度条件を考慮するとR
−12、R−114がもっとも適している。
The refrigerant used as the working fluid of the heat pump used in the present invention is used in circulation by repeating evaporation and condensation in the heat pump process, so in addition to its thermodynamic properties, the refrigerant must be thermally and chemically stable. In terms of safety and handling, it is required that the material be odorless, non-toxic, and non-explosive. Refrigerants that can be used in the present invention include R-11, R-
Examples include fluorinated hydrocarbons such as 12, R-22, R-113 and R-114, and hydrocarbons such as propane and pentane, but considering the heat pump operating temperature conditions, R
-12 and R-114 are most suitable.

本発明のヒートポンプの操作条件としてはエチレンオキ
シド放散塔底部から出てエチレンオキシド吸収塔底液と
熱交換器により熱回収されたエチレンオキシドを実質的
に含まないエチレンオキシド放散塔底液が50〜60℃
の温度で冷媒の蒸発器へ入り冷媒を蒸発させ、その結果
エチレンオキシド放散塔底液の温度が5〜20℃低下し
、冷媒蒸発器を出た後、冷却されエチレンオキシド吸収
液としてエチレンオキシド吸収塔に導入される。
The operating conditions for the heat pump of the present invention are such that the ethylene oxide stripping column bottom liquid, which comes out from the bottom of the ethylene oxide stripping column and which does not substantially contain ethylene oxide and whose heat is recovered by the ethylene oxide absorption column bottom liquid and the heat exchanger, is 50 to 60°C.
The refrigerant enters the refrigerant evaporator at a temperature of be done.

エチレンオキシド放散塔底液により冷媒蒸発器で蒸発し
た冷媒は遠心式又はスクリュウ式又は往復動式圧縮機に
より冷媒の飽和温度が80〜100℃を有する圧力に迄
圧縮される。昇圧された冷媒は下記の2つの方法により
熱を外部に与え凝縮してポンプにより冷媒蒸発器に送ら
れ循環使用される。
The refrigerant evaporated in the refrigerant evaporator using the ethylene oxide stripping column bottom liquid is compressed by a centrifugal, screw, or reciprocating compressor to a pressure at which the saturation temperature of the refrigerant is 80 to 100°C. The pressurized refrigerant is given heat to the outside by the following two methods, condensed, and sent to the refrigerant evaporator by a pump for circulation.

0) 他の精留塔例えばエチレンオキシド精留塔(塔底
温度50〜70℃)のりボイラーへ冷媒の蒸気を直接送
り凝縮させ、その凝縮熱を精密塔底液へ与える。
0) The refrigerant vapor is directly sent to another rectification column, such as an ethylene oxide rectification column (bottom temperature: 50 to 70°C) and a glue boiler, where it is condensed, and the heat of condensation is given to the precision column bottom liquid.

■ 冷媒凝縮器へ冷媒蒸気を送り、冷媒凝縮器内の流体
、たとえば水に凝縮潜熱を与え冷媒は凝縮する。
(2) Sending refrigerant vapor to the refrigerant condenser, giving latent heat of condensation to the fluid in the refrigerant condenser, such as water, and condensing the refrigerant.

この冷媒により熱量を与えられた流体例えば水は冷媒の
温度より5〜10℃低い温度に迄昇温されフラッシュに
より低圧水蒸気を発生させ、その蒸気を利用することが
できる。
A fluid, such as water, which has been given heat by the refrigerant, is heated to a temperature 5 to 10 degrees Celsius lower than the temperature of the refrigerant, and low-pressure steam is generated by flashing, which can be used.

本発明おいて、エチレンオキシド放散塔底部よりの高温
の液はエチレンオキシド吸収塔の底部からの低温の液と
熱交換し熱回収され、エチレンオキシド吸収塔へ供給さ
れる。
In the present invention, the high-temperature liquid from the bottom of the ethylene oxide stripping tower exchanges heat with the low-temperature liquid from the bottom of the ethylene oxide absorption tower, recovers heat, and is supplied to the ethylene oxide absorption tower.

一方、エチレンオキシド吸収塔底液はエチレンオキシド
放散塔底部よりの^温の液と熱交換された後、気液分離
タンクにて軽質分ガスを分離した後、エチレンオキシド
放散塔頂部へ供給されてエチレンオキシドは放散される
。本発明においてエチレンオキシド放散塔より放散され
るものは、大部分が水、エチレンオキシド、少部分が二
酸化炭素、微量の酸素、エチレン、不活性ガス(窒素、
アルゴン、メタン、エタン)、ホルムアルデヒド等の低
沸点不純物、アセトアルデヒドおよび酢酸等の高沸点不
純物からなる放散物である。
On the other hand, the ethylene oxide absorption tower bottom liquid undergoes heat exchange with the ^-temperature liquid from the bottom of the ethylene oxide stripping tower, and after separating the light component gas in a gas-liquid separation tank, it is supplied to the top of the ethylene oxide stripping tower where ethylene oxide is diffused. be done. In the present invention, what is emitted from the ethylene oxide stripping tower is mostly water and ethylene oxide, with a small amount of carbon dioxide, trace amounts of oxygen, ethylene, and inert gases (nitrogen,
It is an emissive product consisting of low-boiling point impurities such as argon, methane, ethane) and formaldehyde, and high-boiling point impurities such as acetaldehyde and acetic acid.

本発明をさらに詳しく述べるために図−1に基づいて説
明する。
In order to describe the present invention in more detail, the present invention will be explained based on FIG.

図−1においてエチレンを銀触媒の存在下、分子状酸素
含有ガスにより接触気相酸化して生成するエチレンオキ
シドを含む反応生成ガスを導管(1)を通して、充填塔
あるいは棚段塔形式のエチレンオキシド吸収塔(2)の
下部へ供給し、導管(3)よりエチレンオキシド吸収塔
(2)の上部へ、吸収液を導入し、反応生成ガスと向流
接触させ、反応生成ガス中のエチレンオキシドを吸収液
に吸収させる。ここで反応生成ガス中の99重量%以上
のエチレンオキシドが回収される。エチレンオキシド吸
収塔(2)の塔頂部より吸収しなかったエチレン、酸素
、二酸化炭素、不活性ガス(窒素、アルゴン、メタン、
エタン)、アルデヒド、酸性物質等のガスは導管(4)
を通して二酸化炭素吸収工程および/または酸化反応工
程へ循環される。この吸収工程においてエチレンオキシ
ドの他、エチレン、酸素、二酸化炭素、不活性ガス(窒
素、アルゴン、メタン、エタン、)ならびにエチレン酸
化反応工程で生成したホルムアルデヒド等の低沸点不純
物、アセトアルデヒド、酢酸等の高沸点不純物もその実
質量が同時に吸収される。
In Figure 1, the reaction product gas containing ethylene oxide produced by catalytic gas phase oxidation of ethylene with a molecular oxygen-containing gas in the presence of a silver catalyst is passed through a conduit (1) to an ethylene oxide absorption tower in the form of a packed column or tray column. (2), and the absorption liquid is introduced into the upper part of the ethylene oxide absorption tower (2) through the conduit (3), brought into countercurrent contact with the reaction product gas, and absorbs ethylene oxide in the reaction product gas into the absorption liquid. let At this point, 99% by weight or more of ethylene oxide in the reaction product gas is recovered. Ethylene, oxygen, carbon dioxide, and inert gases (nitrogen, argon, methane,
Gases such as ethane), aldehydes, and acidic substances are contained in the conduit (4).
is recycled to the carbon dioxide absorption step and/or oxidation reaction step. In this absorption process, in addition to ethylene oxide, ethylene, oxygen, carbon dioxide, inert gases (nitrogen, argon, methane, ethane, etc.), low-boiling point impurities such as formaldehyde generated in the ethylene oxidation reaction process, and high-boiling point impurities such as acetaldehyde and acetic acid are used. A substantial amount of impurities are also absorbed at the same time.

エチレンオキシド吸収塔(2)の塔底液を導管(5)を
通して熱交換器(6)へ送りエチレンオキシド放散塔底
液と熱交換し温度70〜110℃に高め、導管(7)に
より、気液分離タンク(8)へ送られ、一部エチレンオ
キシド、水を含む不活性ガスの軽質分ガスが導管(9)
により分離される。軽質分ガスをフラッシュした残部の
吸収液を導管(10)を通して圧力0.1〜2Kq/c
dG、温度85〜120℃のエチレンオキシド放散塔(
11)の上部へ供給し、エチレンオキシド放散塔(11
)の加熱器(12)へ導管(13)を通して水蒸気また
はダウサム(米国ダウ社熱媒体商品)等の加熱媒体を供
給するか、または直接エチレンオキシド放散塔(11)
の底部に水蒸気を導入する加熱方式により、エチレンオ
キシドの99重6%以上は放散される。エチレンオキシ
ド放散塔(11)の底部よりエチレンオキシドを実質的
に含まない温度100〜130℃のエチレンオキシド放
散塔底液の一部は導管(14)および導管(15)を通
して熱交換器(6)に導入しエチレンオキシド吸収塔(
2)の塔底液と熱交換される。
The bottom liquid of the ethylene oxide absorption tower (2) is sent through the conduit (5) to the heat exchanger (6), where it exchanges heat with the ethylene oxide dispersion column bottom liquid to raise the temperature to 70 to 110°C, and then is separated into gas and liquid through the conduit (7). The light gas, which is an inert gas containing some ethylene oxide and water, is sent to the tank (8), and the light gas is sent to the conduit (9).
separated by The remaining absorption liquid after flushing the light gas is passed through the conduit (10) at a pressure of 0.1 to 2 Kq/c.
dG, ethylene oxide stripping tower with a temperature of 85 to 120°C (
The ethylene oxide stripping tower (11) is supplied to the upper part of the ethylene oxide stripping tower (11).
) to the heater (12) through a conduit (13) to supply a heating medium such as steam or Dowsum (a heating medium product of Dow Co., Ltd. in the United States), or directly to the ethylene oxide stripping tower (11).
By using a heating method that introduces water vapor into the bottom of the tank, more than 6% of 99% of ethylene oxide is released. A portion of the ethylene oxide stripping column bottom liquid, which is substantially free of ethylene oxide and has a temperature of 100 to 130° C., is introduced from the bottom of the ethylene oxide stripping column (11) through the conduit (14) and the conduit (15) into the heat exchanger (6). Ethylene oxide absorption tower (
Heat is exchanged with the bottom liquid of 2).

熱交換器(6)を出た吸収液は冷媒蒸発器(16)を経
た後、冷却器(17)により冷却し、ついで吸収液中の
エチレングリコール濃度を調節するため新鮮な水を導管
(21)を通して導入し、必要により吸収液中のpHを
調節するため水酸化カリウム水溶液を添加し、吸収液中
の消泡剤濃度を調節するため消泡剤をエチレンオキシド
吸収塔(2)に導入することができる。
The absorption liquid leaving the heat exchanger (6) passes through a refrigerant evaporator (16) and then is cooled by a cooler (17), and fresh water is then passed through a conduit (21) to adjust the ethylene glycol concentration in the absorption liquid. ), and if necessary, add an aqueous potassium hydroxide solution to adjust the pH in the absorption liquid, and introduce the antifoaming agent into the ethylene oxide absorption tower (2) to adjust the antifoaming agent concentration in the absorption liquid. I can do it.

一方、エチレンを分子状酸素で酸化する酸化工程および
エチレンオキシド放散工程の間で吸収液中のエチレンオ
キシドと水との加水反応で生成する副生エチレングリコ
ールおよびホルムアルデヒド等の低沸点不純物、アセト
アルデヒドおよび酢酸等の高沸点不純物の増加を防ぐた
めエチレンオキシド放散塔(11)の塔底より導管(1
4)を通して抜き出した残部の吸収液は導管(22)を
通して副生エチレングリコール濃縮塔に送られる。
On the other hand, during the oxidation process in which ethylene is oxidized with molecular oxygen and the ethylene oxide diffusion process, low-boiling impurities such as by-product ethylene glycol and formaldehyde, acetaldehyde, acetic acid, etc., are produced by the hydrolysis reaction of ethylene oxide and water in the absorption liquid. In order to prevent an increase in high-boiling point impurities, a conduit (1
The remaining absorption liquid extracted through 4) is sent to the by-product ethylene glycol concentration column through the conduit (22).

冷媒蒸発器(16)でエチレンオキシド放散塔底部液と
熱交換し蒸発した冷媒は、導管(71)を通して圧縮機
(70)に送られ圧縮された後、導管(72)を通して
冷媒凝縮i?J (73)に送られ外部の流体に熱を与
え凝縮する。凝縮した冷媒は導管(74)を通して再度
冷媒蒸発器(16)へ送られる。
The refrigerant evaporated through heat exchange with the bottom liquid of the ethylene oxide stripping tower in the refrigerant evaporator (16) is sent to the compressor (70) through the conduit (71) and compressed, and is then condensed through the conduit (72). J (73), which gives heat to the external fluid and condenses it. The condensed refrigerant is sent again to the refrigerant evaporator (16) through the conduit (74).

冷媒凝縮器(73)に導管(76)、導管(77)およ
びタンク(75)に導管(78)より供給された水を循
環させることにより導管(59)により水蒸気を回収す
ることができる。
Water vapor can be recovered through the conduit (59) by circulating water supplied through the conduit (78) to the refrigerant condenser (73), the conduit (76), the conduit (77), and the tank (75).

この回収水蒸気はエチレンオキシド製造工程の加熱源に
有効に使用することができる。特にこの水蒸気はエチレ
ンオキシド精留塔(5o)の加熱源として使用すること
ができる。
This recovered steam can be effectively used as a heating source in the ethylene oxide manufacturing process. In particular, this steam can be used as a heating source for the ethylene oxide rectification column (5o).

一方、エチレンオキシド放散塔(11)の塔頂部より放
散されるエチレンオキシドを含む放散蒸気は導管(23
)を通して、エチレンオキシド精留塔(50)の加熱器
(60)へ送り加熱源とした後、凝縮液及び未凝縮蒸気
は導管(61)を通して導管(62)および導管(63
)に冷却水が通る凝縮器(64)へ送り、凝縮液は導管
(65)を通してエチレンオキシド放散塔(11)の塔
頂部へ還流し、未凝縮蒸気は導管(66)を通して脱水
塔(29)へ供給される。
On the other hand, the vapor containing ethylene oxide released from the top of the ethylene oxide stripping tower (11) is transferred to the conduit (23).
) to the heater (60) of the ethylene oxide rectification column (50) as a heating source, and then the condensed liquid and uncondensed vapor pass through the conduit (61) to the conduit (62) and the conduit (63).
), the condensed liquid is refluxed to the top of the ethylene oxide stripping tower (11) through the conduit (65), and the uncondensed vapor is sent to the dehydration tower (29) through the conduit (66). Supplied.

脱水塔(29)の加熱器(30)により水蒸気またはダ
ウサム(ダウ社商品)等の加熱媒体で導管(31)を通
して加熱するか、または直接脱水塔(29)の下部へ水
蒸気を導入する加熱方式により加熱し、脱水塔(29)
の塔底より導管(32)を通してエチレンオキシドを含
まない水が抜き出される。
A heating method in which the heater (30) of the dehydration tower (29) heats the water vapor or a heating medium such as Dow Sam (product of Dow Company) through the conduit (31), or directly introduces steam into the lower part of the dehydration tower (29). Heated with dehydration tower (29)
Ethylene oxide-free water is withdrawn from the bottom of the column through a conduit (32).

脱水塔(29)の塔頂部よりエチレンオキシドを含む蒸
気は導管(33)を通して、導管(35)および導管(
36)に冷却水が通る凝縮5(34)へ送り、凝縮液の
一部は導管(37)を通して脱水塔(29)の塔頂部へ
還流し、凝縮器(34)の未凝縮蒸気は導管(39)を
通して再エチレンオキシド吸収塔(図示してない)へ供
給される。
Steam containing ethylene oxide is passed from the top of the dehydration tower (29) through the conduit (33) to the conduit (35) and the conduit (
A part of the condensate is sent to the condenser 5 (34) through which cooling water passes through the conduit (36), and a part of the condensate is refluxed to the top of the dehydration tower (29) through the conduit (37). 39) to a re-ethylene oxide absorption tower (not shown).

凝縮液の他部は導管(38)を通して重質分分離塔(4
0)へ供給される。
The other part of the condensate passes through the conduit (38) to the heavy fraction separation column (4).
0).

重質分分離塔(40)の塔頂部より重質分ガスを含むエ
チレンオキシド蒸気は導管(43)を通して凝縮器(4
4)へ送り、凝縮液は導管(47)を通して重質分分離
塔(40)の塔頂部へ還流し、未凝縮蒸気は導管(48
)を通してエチレンオキシドを回収するため再エチレン
オキシド吸収塔(図示してない)へ供給される。
Ethylene oxide vapor containing heavy gas from the top of the heavy fraction separation column (40) passes through the conduit (43) to the condenser (4
4), the condensate is refluxed to the top of the heavy fraction separation column (40) through the conduit (47), and uncondensed vapor is sent to the conduit (48).
) is fed to a re-ethylene oxide absorption tower (not shown) for recovery of ethylene oxide.

重質分分離塔(40)の塔底液は導管(49)を通して
精留塔(50)へ供給される。
The bottom liquid of the heavy fraction separation column (40) is supplied to the rectification column (50) through a conduit (49).

精留塔(50)の加熱器(60)へエチレンオキシド放
散塔(11)の塔頂部からの放散物を供給し、精留塔(
50)の加熱器(58)にエチレンオキシド吸収液から
ヒートポンプを用いて熱回収され、タンク(75)から
発生された水蒸気を導管(59)を通して加熱する方式
により加熱し、エチレンオキシド精留塔(50)の塔底
温度35〜80℃、エチレンオキシド精密塔底圧力1.
1〜8.1ka/ajGで精留を行ない、エチレンオキ
シド精留塔頂より塔頂温度35〜75℃、塔頂部圧力1
〜8kQ/cdGのエチレンオキシド蒸気を導管(51
)を通して、エチレンオキシド凝縮器(52)へ送り、
エチレンオキシドを液化し、一部は導管(56)を通し
てエチレンオキシド精留塔(50)の塔頂部へ還流液と
して供給し、他部は導管(57)を通してエチレンオキ
シド製品として抜き出した。 エチレンオキシド精留塔
(50)の塔底液はアセトアルデヒドおよび酢酸等の高
沸点不純物の重質分分離のため必要により導管(67)
を通して抜き出される。
The emitted material from the top of the ethylene oxide stripping tower (11) is supplied to the heater (60) of the rectifying tower (50), and the rectifying tower (
Heat is recovered from the ethylene oxide absorption liquid using a heat pump in the heater (58) of the ethylene oxide absorption liquid, and the water vapor generated from the tank (75) is heated through the conduit (59). Bottom temperature of 35-80℃, ethylene oxide precision bottom pressure of 1.
Rectification is carried out at 1 to 8.1 ka/ajG, and the top temperature from the top of the ethylene oxide rectification column is 35 to 75°C, and the top pressure is 1.
~8kQ/cdG of ethylene oxide vapor is introduced into the conduit (51
) to an ethylene oxide condenser (52);
Ethylene oxide was liquefied, and a portion was supplied as a reflux liquid to the top of the ethylene oxide rectification column (50) through a conduit (56), and the other portion was extracted as an ethylene oxide product through a conduit (57). The bottom liquid of the ethylene oxide rectification column (50) is passed through a conduit (67) as necessary to separate heavy fractions of high-boiling point impurities such as acetaldehyde and acetic acid.
extracted through.

本発明をさらに詳しく述べるために従来公知のエチレン
オキシド精製方法を図−2に基づいて説明する。
In order to describe the present invention in more detail, a conventionally known method for purifying ethylene oxide will be explained based on FIG.

図−2においてエチレンを銀触媒の存在下、分子状酸素
含有ガスにより接触気相酸化して生成するエチレンオキ
シドを含む反応生成ガスを導管(1)を通して、充填塔
あるいは棚段塔形式のエチレンオキシド吸収塔(2)の
下部へ供給し、導管(3)よりエチレンオキシド吸収塔
(2)の上部へ吸収液を導入し、反応生成ガスと向流接
触させ、反応生成ガス中の99重階%以上のエチレンオ
キシドを回収し、エチレンオキシド吸収塔(2)の塔頂
より吸収しなかったエチレン、酸素、二酸化炭素、不活
性ガス(窒素、アルゴン、メタン、エタン)、アルデヒ
ド、酸性物質等のガスは専管(4)を通して二酸化炭素
吸収工程および/または酸化反応工程へ循環される。こ
の吸収工程においてエチレンオキシドの他、エチレン、
酸素、二酸化炭素、不活性ガス(窒素、アルゴン、メタ
ン、エタン、)ならびにエチレン酸化反応工程で生成し
たホルムアルデヒド等の低沸点不純物、アセトアルデヒ
ド、酢酸等の高沸点不純物もその実質量が同時に吸収さ
れる。エチレンオキシド吸収塔(2)の塔底液を導管(
5)を通して熱交換器(6)へ送りエチレンオキシド放
散塔底液と熱交換して温度70〜110℃に高め、導管
(7)により気液分離タンク(8)へ送られ一部エチレ
ンオキシドを含む不活性ガスの軽質分ガスが導管(9)
により分離される。軽質分ガスをフラッシュした残部の
吸収液を導管(10)を通して塔頂圧力0.1〜2Kg
/cdGS′/M度85〜120℃のエチレンオキシド
放散塔(11)の上部へ供給し、エチレンオキシド放散
塔(11)の加熱器〈12)より水蒸気またはダウサム
(ダウ社、熱媒体商品)等の加熱媒体で導管(13)を
通して加熱するか、または直接エチレンオキシド放散塔
(11)の底部へ水蒸気を導入する加熱方式により加熱
し、吸収液中に含まれるエチレンオキシドの99重量%
以上を放散せしめ、エチレンオキシド放散塔(11)の
底部よりエチレンオキシドを実質的に含まない温度10
0〜130℃のエチレンオキシド放散塔底液の一部は導
管(14)および導管(15)を通して熱交換器(6)
でエチレンオキシド吸収塔(2)の塔底液と熱交換し、
導管(16)を通して、さらに導管(18)および導管
(19)に冷却水が通る冷却器(17)により冷却し、
ついで吸収液中のエチレングリコール濃度を調節するた
め新鮮な水を導管(21)を通して導入し、必要により
、吸収液中のI)Hを調節するため水酸化カリウム水溶
液を添加し、吸収液中の消泡剤Inを調節するため消泡
剤をエチレンオキシド吸収塔(2)へそれぞれ導入する
ことができる。エチレンを分子状酸素で酸化する酸化工
程およびエチレンオキシド放散工程の間で吸収液中にエ
チレンオキシドと水との加水反応で生成する副生エチレ
ングリコールおよびホルムアルデヒド等の低沸点不純物
、アセトアルデヒドおよび酢酸等の高沸点不純物の増加
を防ぐためエチレンオキシド放散塔(11)の塔底部よ
り導管(14)および(22)を通してエチレンオキシ
ド放散塔(11)の底液を抜き出し、副生エチレングリ
コール濃縮工程に送られる。
In Figure 2, the reaction product gas containing ethylene oxide produced by catalytic gas phase oxidation of ethylene with a molecular oxygen-containing gas in the presence of a silver catalyst is passed through a conduit (1) to an ethylene oxide absorption tower in the form of a packed column or tray column. (2), the absorption liquid is introduced into the upper part of the ethylene oxide absorption tower (2) through the conduit (3), and brought into countercurrent contact with the reaction product gas, so that 99% or more of ethylene oxide in the reaction product gas is removed. The gases such as ethylene, oxygen, carbon dioxide, inert gases (nitrogen, argon, methane, ethane), aldehydes, and acidic substances that were not absorbed from the top of the ethylene oxide absorption tower (2) are stored in a dedicated pipe (4). is recycled to the carbon dioxide absorption step and/or oxidation reaction step. In this absorption process, in addition to ethylene oxide, ethylene,
A substantial amount of oxygen, carbon dioxide, inert gases (nitrogen, argon, methane, ethane, etc.) as well as low-boiling point impurities such as formaldehyde produced in the ethylene oxidation reaction process and high-boiling point impurities such as acetaldehyde and acetic acid are also absorbed at the same time. The bottom liquid of the ethylene oxide absorption tower (2) is transferred to the conduit (
5) is sent to the heat exchanger (6) to exchange heat with the bottom liquid for ethylene oxide dispersion to raise the temperature to 70 to 110°C. The light component of the active gas is passed through the conduit (9)
separated by The remaining absorption liquid after flushing the light gas is passed through the conduit (10) to a tower top pressure of 0.1 to 2 kg.
/cdGS'/M is supplied to the upper part of the ethylene oxide stripping tower (11) at a temperature of 85 to 120°C, and heated by the heater (12) of the ethylene oxide stripping tower (11). By heating with a medium through the conduit (13) or by a heating method of directly introducing steam into the bottom of the ethylene oxide stripping tower (11), 99% by weight of the ethylene oxide contained in the absorption liquid is heated.
At a temperature of 10°C at which ethylene oxide is substantially free from the bottom of the ethylene oxide stripping tower (11),
A portion of the ethylene oxide stripping bottom liquid at 0 to 130°C passes through the conduit (14) and conduit (15) to the heat exchanger (6).
to exchange heat with the bottom liquid of the ethylene oxide absorption tower (2),
cooling by a cooler (17) through which cooling water passes through the conduit (16) and further into the conduit (18) and the conduit (19);
Then, fresh water is introduced through the conduit (21) to adjust the ethylene glycol concentration in the absorption liquid, and if necessary, an aqueous potassium hydroxide solution is added to adjust the I)H in the absorption liquid. In order to adjust the antifoam agent In, an antifoam agent can be introduced into the ethylene oxide absorption column (2) in each case. During the oxidation process in which ethylene is oxidized with molecular oxygen and the ethylene oxide diffusion process, low boiling point impurities such as by-product ethylene glycol and formaldehyde, which are produced by the hydrolysis reaction of ethylene oxide and water in the absorption liquid, and high boiling point impurities such as acetaldehyde and acetic acid. In order to prevent an increase in impurities, the bottom liquid of the ethylene oxide stripping column (11) is extracted from the bottom of the ethylene oxide stripping column (11) through conduits (14) and (22) and sent to a by-product ethylene glycol concentration step.

一方、エチレンオキシド放散塔(11)の塔頂部より放
散されるエチレンオキシドを含む放散蒸気は導管(23
)を通して、導管(25)および導管(26)に冷却水
が通る凝縮器(24)へ送り、凝縮液は導管(27)を
通してエチレンオキシド放散塔(11)の塔頂部へ還流
し、未凝縮蒸気は導管(28)を通して脱水塔(29)
へ供給される。
On the other hand, the vapor containing ethylene oxide released from the top of the ethylene oxide stripping tower (11) is transferred to the conduit (23).
) to the condenser (24) through which cooling water passes through the conduit (25) and conduit (26), the condensate is refluxed to the top of the ethylene oxide stripping tower (11) through the conduit (27), and uncondensed vapor is Dehydration tower (29) through conduit (28)
supplied to

脱水塔(29)の加熱器(30)により水蒸気またはダ
ウサム(ダウ社商品)等の加熱媒体で導管(31)を通
して加熱するか、または直接脱水塔(29)の下部へ水
蒸気を導入する加熱方式により加熱し、脱水塔(29)
の塔底より導管(32)を通してエチレンオキシドを含
まない水が抜き出される。
A heating method in which the heater (30) of the dehydration tower (29) heats the water vapor or a heating medium such as Dow Sam (product of Dow Company) through the conduit (31), or directly introduces steam into the lower part of the dehydration tower (29). Heated with dehydration tower (29)
Ethylene oxide-free water is withdrawn from the bottom of the column through a conduit (32).

脱水塔(29)の塔頂部よりエチレンオキシドを含む蒸
気は導管(33)を通して、導管(35)および導管(
36)に冷却水が通る凝縮器(34)へ送り、凝縮液の
一部は導管(37)を通して脱水塔(29)の塔頂部へ
還流し、凝縮器(34)の未凝縮蒸気は導管(39)を
通して再エチレンオキシド吸収塔(図示していない)へ
供給される。
Steam containing ethylene oxide is passed from the top of the dehydration tower (29) through the conduit (33) to the conduit (35) and the conduit (
A portion of the condensed liquid is returned to the top of the dehydration tower (29) through the conduit (37), and uncondensed vapor in the condenser (34) is sent to the condenser (34) through which cooling water passes through the conduit (36). 39) to a re-ethylene oxide absorption tower (not shown).

凝縮器(34)の凝縮液の他部は導管(38)を通して
軽質分分離塔(40)へ供給される。
The other part of the condensate from the condenser (34) is fed through a conduit (38) to a light fraction separation column (40).

軽質分分離塔(40)の加熱器(41)により水蒸気ま
たはダウサム(ダウ社商品)等の加熱媒体で導管(42
)を通して加熱する方式により加熱し、軽質分分離塔(
40)の塔頂部より軽質分を含むエチレンオキシド蒸気
は導管(43)を通して凝縮器(44)へ送り、凝縮液
は導管(47)を通して軽質分分離塔(40)の塔頂部
へ3!i!流し、未凝縮蒸気は導管(48)を通してエ
チレンオキシドを回収するため再エチレンオキシド吸収
塔(図示してない)へ供給される。
The heater (41) of the light fraction separation column (40) is used to heat the conduit (42) with a heating medium such as steam or Dow Sam (product of Dow Company).
), the light fraction separation column (
Ethylene oxide vapor containing light components is sent from the top of the column (40) to the condenser (44) through a conduit (43), and the condensate is sent to the top of the light fraction separation column (40) through a conduit (47). i! The uncondensed vapors are fed through conduit (48) to a re-ethylene oxide absorber (not shown) for recovery of ethylene oxide.

軽質分分離塔(40)の塔底より導管(49)を通して
エチレンオキシド精留塔(50)へ供給される。
It is supplied from the bottom of the light fraction separation column (40) to the ethylene oxide rectification column (50) through a conduit (49).

エチレンオキシド精留塔(50)の加熱器(51)へ導
管(52)より圧力0.5〜1.0ka/aiGの水蒸
気を供給し、エチレンオキシド精留塔(50)の塔底温
度62℃、エチレンオキシド精留塔底圧力3.7kQ/
CdGで精留を行ない、エチレンオキシド精留塔頂より
塔頂温度54℃、塔頂圧力3.5ka/aiGのエチレ
ンオキシド蒸気を導管(51)を通して、凝縮器(52
)へ送りエチレンオキシド蒸気は液化し、液化した一部
は導管(56)を通してエチレンオキシド精留塔(50
)の塔頂部へ還流液として導入し、液化した他部は導管
(57)を通してエチレンオキシド製品として抜き出さ
れる。
Steam at a pressure of 0.5 to 1.0 ka/aiG is supplied from the conduit (52) to the heater (51) of the ethylene oxide rectification column (50), and the bottom temperature of the ethylene oxide rectification column (50) is 62°C. Fractionation column bottom pressure 3.7kQ/
Rectification is performed using CdG, and ethylene oxide vapor at a top temperature of 54°C and a top pressure of 3.5 ka/aiG is passed from the top of the ethylene oxide rectification column to a condenser (52) through a conduit (51).
) The ethylene oxide vapor is liquefied, and the liquefied part is passed through the conduit (56) to the ethylene oxide rectification column (50
) is introduced as a reflux liquid to the top of the column, and the other liquefied portion is extracted as an ethylene oxide product through a conduit (57).

エチレンオキシド精留塔(50)の凝縮器(52)の未
凝縮蒸気は導管(55)を通してエチレンオキシドを回
収するため再エチレンオキシド吸収塔(図示してない)
へ供給される。
The uncondensed vapor in the condenser (52) of the ethylene oxide rectification column (50) passes through a conduit (55) to a re-ethylene oxide absorption column (not shown) to recover ethylene oxide.
supplied to

エチレンオキシド精留塔(50)の塔底液はアセトアル
デヒドおよび酢酸等の高沸点不純物の重質分分離のため
必要により導管(67)を通して抜き出される。
The bottom liquid of the ethylene oxide rectification column (50) is drawn out through a conduit (67) as necessary to separate heavy fractions of high-boiling point impurities such as acetaldehyde and acetic acid.

(作 用) 本発明の作用は、エチレンを銀触媒の存在下、分子状酸
素含有ガスにより接触気相酸化して生成したエチレンオ
キシドを含有する反応生成ガスをエチレンオキシド吸収
塔へ導入し吸収液と向流接触させ、エチレンオキシド吸
収塔頂部よりのガスの一部はエチレン酸化反応工程へ循
環し、エチレ ゛ンオキシドを含むエチレンオキシド吸
収塔底液はエチレンオキシド放散塔へ供給し、エチレン
オキシド放散塔頂部からエチレンオキシドを放散せしめ
、エチレンオキシド放散塔底部より抜き出した液は熱交
換器にて、エチレンオキシド吸収塔底液と熱交換した後
、冷却器にて冷却し、エチレンオキシド吸収塔へ導き、
吸収液として循環使用し、残部は吸収液に含まれるエチ
レングリコールを濃縮するため副生エチレングリコール
濃縮塔へ送る工程において、エチレンオキシド放散塔頂
部より放散する蒸気が有する熱エネルギーをエチレンオ
キシド精留塔の加熱源として回収し、ざらにエチレンオ
キシド放散塔底部より抜き出した液を熱交換器にてエチ
レンオキシド吸収塔底液と熱交換した後、ヒートポンプ
を用いて吸収液の持つ熱エネルギーを回収し水蒸気を発
生させエチレンオキシド精留塔の加熱源に使用し、ヒー
トポンプにより冷却された吸収液をさらに冷却器にて冷
却した後、エチレンオキシド吸収塔の吸収液とすること
ができるエチレンオキシドの精製方法である。
(Function) The function of the present invention is to introduce a reaction product gas containing ethylene oxide, which is produced by catalytic gas phase oxidation of ethylene with a molecular oxygen-containing gas in the presence of a silver catalyst, into an ethylene oxide absorption tower and exchange it with an absorption liquid. A part of the gas from the top of the ethylene oxide absorption tower is circulated to the ethylene oxidation reaction process, and the bottom liquid of the ethylene oxide absorption tower containing ethylene oxide is supplied to the ethylene oxide stripping tower, and ethylene oxide is diffused from the top of the ethylene oxide stripping tower. The liquid extracted from the bottom of the ethylene oxide stripping tower exchanges heat with the bottom liquid of the ethylene oxide absorption tower in a heat exchanger, and then is cooled in a cooler and guided to the ethylene oxide absorption tower.
In the process where the absorption liquid is recycled and used, and the remainder is sent to the by-product ethylene glycol concentration tower to concentrate the ethylene glycol contained in the absorption liquid, the thermal energy of the steam dissipated from the top of the ethylene oxide stripping tower is used to heat the ethylene oxide rectification tower. The liquid extracted from the bottom of the ethylene oxide diffusion tower is used to exchange heat with the bottom liquid of the ethylene oxide absorption tower in a heat exchanger, and then a heat pump is used to recover the thermal energy of the absorption liquid to generate water vapor and produce ethylene oxide. This is a method for purifying ethylene oxide, which is used as a heating source for a rectification column and can be used as an absorption liquid for an ethylene oxide absorption column after the absorption liquid is cooled by a heat pump and is further cooled in a cooler.

(実 施 例) 以下、実施例により本発明をさらに詳細に説明する。し
かし本発明はこの実施例のみによって本発明の範囲を規
制するものでない。
(Examples) Hereinafter, the present invention will be explained in more detail with reference to Examples. However, the scope of the present invention is not limited only by this example.

実  施  例    1 図−1においてエチレンを銀触媒の存在下、分子状酸素
含有ガスにより接触気相酸化して生成するエチレンオキ
シドを含む反応生成ガスを導管(1)を通して、充填塔
あるいは棚段塔形式のエチレンオキシド吸収塔(2)の
下部へ供給し、導管(3)よりエチレンオキシド吸収塔
(2)の上部へ、温度40℃以下、pH=6以上、エチ
レングリコール濃度=1〜20重ω%、消泡剤(水溶性
シリコンエマルジョン)It度=1〜5oppmおよび
残部は水から成る吸収液を導入し、反応生成ガスと向流
接触させ、反応生成ガス中のエチレンオキシドを吸収液
に吸収させた。ここで反応生成ガス中の99重量%以上
のエチレンオキシドが回収された。エチレンオキシド吸
収塔(2)の塔頂より吸収しなかったエチレン、酸素、
二酸化炭素、不活性ガス(窒素、アルゴン、メタン、エ
タン)、アルデヒド、酸性物質等の不純物基のガスは導
管(3)を通して二酸化炭素吸収工程および/または酸
化反応工程へ循環した。
Example 1 In Figure 1, the reaction product gas containing ethylene oxide produced by catalytic gas phase oxidation of ethylene with a molecular oxygen-containing gas in the presence of a silver catalyst is passed through a conduit (1) into a packed column or tray column. The ethylene oxide absorption tower (2) is supplied to the lower part of the ethylene oxide absorption tower (2) through the conduit (3) at a temperature of 40° C. or less, a pH of 6 or more, an ethylene glycol concentration of 1 to 20 wt. An absorbing liquid consisting of a foaming agent (water-soluble silicone emulsion) with a concentration of 1 to 5 oppm and the remainder being water was introduced and brought into countercurrent contact with the reaction product gas, so that ethylene oxide in the reaction product gas was absorbed into the absorbent. At this point, more than 99% by weight of ethylene oxide in the reaction product gas was recovered. Ethylene and oxygen that were not absorbed from the top of the ethylene oxide absorption tower (2)
Gases of impurity groups such as carbon dioxide, inert gases (nitrogen, argon, methane, ethane), aldehydes, acidic substances, etc. were circulated through conduit (3) to the carbon dioxide absorption step and/or the oxidation reaction step.

この吸収工程においてエチレンオキシドの他、エチレン
、酸素、二酸化炭素、不活性ガス(窒素、アルゴン、メ
タン、エタン、)ならびにエチレン酸化反応工程で生成
したホルムアルデヒド等の低洲点不純物、アセトアルデ
ヒド、酢酸等の高沸点不純物もその実質量が同時に吸収
された。
In this absorption process, in addition to ethylene oxide, low-point impurities such as ethylene, oxygen, carbon dioxide, inert gases (nitrogen, argon, methane, ethane, etc.), formaldehyde generated in the ethylene oxidation reaction process, and high-temperature impurities such as acetaldehyde and acetic acid are added. A substantial amount of boiling point impurities were also absorbed at the same time.

エチレンオキシド吸収塔(2)の塔底液を導管(5)を
通して、熱交換器(6)へ送りエチレンオキシド放散塔
底液と熱交換し温度70〜110℃に高め、導管(7)
により、気液分離タンク(8)へ送られ、一部エチレン
オキシド、水を含む不活性ガスの軽質分ガスが導管(9
)により分離した。軽質分ガスをフラッシュした残部の
吸収液を導管(10)を通して圧力0.1〜2KO/c
ta G S4度85〜120℃のエチレンオキシド放
散塔(11)の上部へ供給し、エチレンオキシド放散塔
(11)の加熱器(12〉へ導管(13)を通して加熱
用水蒸気を供給する加熱方式によりエチレンオキシドは
放散した。エチレンオキシド放散塔(11)の底部より
エチレンオキシドを実質的に含まない温度100〜13
0℃のエチレンオキシド放散塔底液の一部は導管(14
)および導管(15)を通して熱交換器(6)に導入し
エチレンオキシド吸収塔塔底液と熱交換した。熱交換器
(6)を出た吸収液は冷媒蒸発器(16)を経た後、導
管(18)および導管(19)に冷却水が通る冷却器(
17)を通して、ついで吸収液中のエチレングリコール
濃度を調節するため新鮮な水を導管(21)を通してエ
チレンオキシド吸収塔(2)に導入した。
The bottom liquid of the ethylene oxide absorption tower (2) is sent to the heat exchanger (6) through the conduit (5) to exchange heat with the ethylene oxide dispersion tower bottom liquid to raise the temperature to 70 to 110°C, and then to the conduit (7).
is sent to the gas-liquid separation tank (8), and the light component of the inert gas containing some ethylene oxide and water is sent to the conduit (9).
). After flushing the light gas, the remaining absorption liquid is passed through the conduit (10) at a pressure of 0.1 to 2 KO/c.
ta G S4 degrees Ethylene oxide is supplied to the upper part of the ethylene oxide stripping tower (11) at 85 to 120 °C, and the heating steam is supplied through the conduit (13) to the heater (12) of the ethylene oxide stripping tower (11). The bottom of the ethylene oxide stripping tower (11) was heated to a temperature of 100 to 13, substantially free of ethylene oxide.
A portion of the ethylene oxide stripping tower bottom liquid at 0°C is transferred to the conduit (14
) and the conduit (15) to the heat exchanger (6) for heat exchange with the bottom liquid of the ethylene oxide absorption tower. The absorption liquid leaving the heat exchanger (6) passes through the refrigerant evaporator (16), and then passes through the conduit (18) and conduit (19) into the condenser (
17) and then fresh water was introduced into the ethylene oxide absorption column (2) through conduit (21) to adjust the ethylene glycol concentration in the absorption liquid.

一方、エチレンオキシド放散塔(11〉の塔底より導管
(14)を通して抜き出した残部の吸収液は導管(22
)を通して副生エチレングリコール濃縮塔に送った。
On the other hand, the remaining absorption liquid extracted from the bottom of the ethylene oxide stripping tower (11) through the conduit (14) is transferred to the conduit (22).
) was sent to the by-product ethylene glycol concentration column.

冷媒蒸発器(16)でエチレンオキシド放散塔底部液と
熱交換し蒸発して冷媒は、導管(71)を通して冷媒圧
縮機(70)に送られ圧縮された後、導管(72)を通
して冷媒凝縮器(73)に送られ外部の流体に熱を与え
凝縮させた。凝縮した冷媒は導管(74)を通して再α
冷媒蒸発器(16)へ送った。
The refrigerant is evaporated by exchanging heat with the bottom liquid of the ethylene oxide stripping tower in the refrigerant evaporator (16), and then sent to the refrigerant compressor (70) through the conduit (71) and compressed, and then passed through the conduit (72) to the refrigerant condenser ( 73) to give heat to the external fluid and cause it to condense. The condensed refrigerant is re-allocated through the conduit (74).
The refrigerant was sent to the evaporator (16).

冷媒凝縮器(73)に導管(76)、導管(77)およ
びタンク(75)に導管(78)より供給された水を循
環させることにより導管(59)により水蒸気を回収し
、エチレンオキシド精留塔(50)の加熱器(60)へ
送り加熱源とした。
By circulating the water supplied from the conduit (78) to the refrigerant condenser (73), the conduit (76), the conduit (77), and the tank (75), water vapor is recovered through the conduit (59), and the water vapor is collected in the ethylene oxide rectification column. (50) was sent to the heater (60) as a heating source.

表−1にこのプロセスの連続操作条件を一括して表示す
る。
Table 1 shows the continuous operating conditions for this process.

一方、エチレンオキシド放散塔(11)の塔頂部より放
散されるエチレンオキシドを含む放散蒸気は導管(23
)を通して、エチレンオキシド精留塔(50)の加熱器
(60)へ送り加熱源とした後、凝縮液及び未凝縮蒸気
は導管(61)を通して導管(62)および導管(63
)に冷却水が通る凝縮器(64)へ送り、凝縮液は導管
(65)を通してエチレンオキシド放散塔(11)の塔
頂部へ還流し、未凝縮蒸気は導管(66)を通して脱水
塔(29)へ供給される。
On the other hand, the vapor containing ethylene oxide released from the top of the ethylene oxide stripping tower (11) is transferred to the conduit (23).
) to the heater (60) of the ethylene oxide rectification column (50) as a heating source, and then the condensed liquid and uncondensed vapor pass through the conduit (61) to the conduit (62) and the conduit (63).
), the condensed liquid is refluxed to the top of the ethylene oxide stripping tower (11) through the conduit (65), and the uncondensed vapor is sent to the dehydration tower (29) through the conduit (66). Supplied.

脱水塔(29)の加熱!(30)により水蒸気またはダ
ウサム(ダウ社商品)等の加熱媒体で導管(31)を通
して加熱するか、または直接脱水塔(29)の下部へ水
蒸気を導入する加熱方式により加熱し、脱水塔(29)
の塔底より導管(32)を通してエチレンオキシドを含
まない水が抜き出される。
Heating the dehydration tower (29)! (30) by heating with a heating medium such as steam or Dow Sam (a product of Dow Company) through the conduit (31), or by a heating method that directly introduces steam into the lower part of the dehydration tower (29). )
Ethylene oxide-free water is withdrawn from the bottom of the column through a conduit (32).

脱水塔(29)の塔頂部よりエチレンオキシドを含む蒸
気は導管(33)を通して、導管(35)および導管(
36)に冷却水が通る凝縮器(34)へ送り、凝縮液の
一部は導管(37)を通して脱水塔(29)の塔頂部へ
還流し、凝縮器(34)の未凝縮蒸気は導管(39)を
通して再エチレンオキシド吸収塔(図示してない)へ供
給した。
Steam containing ethylene oxide is passed from the top of the dehydration tower (29) through the conduit (33) to the conduit (35) and the conduit (
A portion of the condensed liquid is returned to the top of the dehydration tower (29) through the conduit (37), and uncondensed vapor in the condenser (34) is sent to the condenser (34) through which cooling water passes through the conduit (36). 39) to a re-ethylene oxide absorption tower (not shown).

凝縮液の弛部は導管(38)を通して軽質分分離塔(4
0)へ供給される。軽質分分離塔(40)の塔頂部より
軽質分ガスを含むエチレンオキシド蒸気は導管(43)
を通して凝縮器(44)へ送り、凝縮液は導管(47)
を通して軽質分分離塔(40)の塔頂部へ運流し、未凝
縮蒸気は導管(48)を通してエチレンオキシドを回収
するため再エチレンオキシド吸収塔(図示してない)へ
供給した。軽質分分離塔(40)の塔底液は導管(49
)を通してエチレンオキシド精留塔(50)へ供給した
。エチレンオキシド精留塔(50)の加熱器(60)へ
、エチレンオキシド放散塔(11)の塔頂部からの放散
物を供給し、エチレンオキシド精留塔(50)の加熱器
(58)にエチレンオキシド吸収液からヒートポンプを
用いて熱回収され、タンク(75)から発生された水蒸
気を導管(59)を通して加熱する方式により加熱し、
エチレンオキシド精留塔(50)の塔底温度35〜80
℃、エチレンオキシド精留塔底圧力1、1〜8.1kg
/cjGで精留を行ない、エチレンオキシド精留塔頂よ
り塔頂温度35〜75℃、塔頂部圧力1〜8kQ/ca
!Gのエチレンオキシド蒸気を導管(51)を通して、
エチレンオキシド凝縮器(52)へ送り、エチレンオキ
シドを液化し、一部は導管(56)を通してエチレンオ
キシド精留塔(50)の塔頂部へ還流液として供給し、
他部は導管(57)を通してエチレンオキシド製品とし
て抜き出した。
The slack part of the condensate is passed through the conduit (38) to the light fraction separation column (4).
0). Ethylene oxide vapor containing light fraction gas is transferred from the top of the light fraction separation column (40) to a conduit (43).
The condensate is sent to the condenser (44) through the conduit (47).
The uncondensed vapor was fed through conduit (48) to a re-ethylene oxide absorption column (not shown) for recovery of ethylene oxide. The bottom liquid of the light fraction separation column (40) is passed through the conduit (49
) to the ethylene oxide rectification column (50). The emitted material from the top of the ethylene oxide stripping tower (11) is supplied to the heater (60) of the ethylene oxide rectification tower (50), and the emitted material from the ethylene oxide absorption liquid is supplied to the heater (58) of the ethylene oxide rectification tower (50). Heat is recovered using a heat pump and water vapor generated from a tank (75) is heated through a conduit (59),
Bottom temperature of ethylene oxide rectification column (50) 35-80
°C, ethylene oxide rectification column bottom pressure 1, 1-8.1 kg
/cjG, and from the top of the ethylene oxide rectification column, the top temperature is 35 to 75°C, and the top pressure is 1 to 8 kQ/ca.
! Passing the ethylene oxide vapor of G through the conduit (51),
The ethylene oxide is sent to an ethylene oxide condenser (52) to liquefy the ethylene oxide, and a portion is supplied as a reflux liquid to the top of the ethylene oxide rectification column (50) through a conduit (56).
The other part was extracted as an ethylene oxide product through a conduit (57).

エチレンオキシド凝縮器(52)の未凝縮蒸気は導管(
55)を通してエチレンオキシドを回収するため再エチ
レンオキシド吸収塔(図示してない)へ供給した。
Uncondensed vapor from the ethylene oxide condenser (52) is transferred to the conduit (
55) was fed to a re-ethylene oxide absorption tower (not shown) for recovery of ethylene oxide.

エチレンオキシド精留塔(50)の塔底液はアセトアル
デヒドおよび酢酸等の高沸点不純物の重質分分離のため
必要により導管(67)を通して抜き出された。
The bottom liquid of the ethylene oxide rectification column (50) was extracted through a conduit (67) as necessary to separate heavy fractions of high-boiling point impurities such as acetaldehyde and acetic acid.

表−1にこのプロセスの連続操作条件を一括して表示す
る。
Table 1 shows the continuous operating conditions for this process.

比  較  例    1 図−2においてエチレンを銀触媒の存在下、分子状酸素
含有ガスにより接触気相酸化して生成するエチレンオキ
シドを含む反応生成ガスを導管(1)を通して 充填塔
あるいは棚段塔形式のエチレンオキシド吸収塔(2)の
下部へ供給し、導管(3)よりエチレンオキシド吸収塔
(2)の上部へ吸収液を導入し、反応生成ガスと向流接
触させ、反応生成ガス中の99重量%以上のエチレンオ
キシドを回収し、エチレンオキシド吸収塔(2)の塔頂
より吸収しなかったエチレン、酸素、二酸化炭素、不活
性ガス(窒素、アルゴン、メタン、エタン)、アルデヒ
ド、酸性物質等のガスは導管(4)を通して二酸化炭素
吸収工程および/または酸化反応工程へ循環した。この
吸収工程においてエチレンオキシドの他、エチレン、酸
素、二酸化炭素、不活性ガス(窒素、アルゴン、メタン
、エタン、)ならびにエチレン酸化反応工程で生成した
ホルムアルデヒド等の低沸点不純物、アセトアルデヒド
、酢酸等の高沸点不純物もその実質量が同時に吸収され
る。エチレンオキシド吸収塔(2)の塔底液を導管(5
)を通して熱交換器(6)へ送りエチレンオキシド放散
塔底液と熱交換して温度70〜110℃に高め、導管(
7)により気液分離タンク(8)へ送られ一部エチレン
オキシドを含む不活性ガスの重質分ガスが導管(9)に
より分離した。重質分ガスをフラッシュした残部の吸収
液を導管(10)を通して塔頂圧力0.1〜2 K Q
 / ai G 、温度85〜120℃のエチレンオキ
シド放散塔(11)の上部へ供給し、エチレンオキシド
放散塔(11)の加熱器(12)より水蒸気により加熱
し、吸収液中に含まれるエチレンオキシドの99重量%
以上をt!!@セしめ、エチレンオキシド放散塔(11
)の底部よりエチレンオキシドを実質的に含まない温[
100〜130℃のエチレンオキシド放散塔底液の一部
は導管(14)および導管(15)を通して熱交換器(
6)でエチレンオキシド吸収塔(2)の塔底液と熱交換
し、導管(16)を通して、さらに導管(18)および
導管(1つ)に冷却水が通る冷却器(17)により冷却
し、ついで吸収液中のエチレングリコール濃度を調節す
るため新鮮な水を導管(21)を通して導入した。エチ
レンを分子状酸素で酸化する酸化工程およびエチレンオ
キシド放散工程の間で吸収液中にエチレンオキシドと水
との加水反応で生成する副生エチレングリコールおよび
ホルムアルデヒド等の低沸点不純物、アセトアルデヒド
および酢酸等の高沸点不純物の増加を防ぐためエチレン
オキシド放散塔(11)の塔底部より導管(14)およ
び(22)を通してエチレンオキシド放散塔(11)の
底液を抜き出し、副生エチレングリコール濃縮工程に送
った。
Comparison Example 1 In Figure 2, the reaction product gas containing ethylene oxide produced by catalytic gas phase oxidation of ethylene with molecular oxygen-containing gas in the presence of a silver catalyst is passed through conduit (1) into a packed column or tray column type. The absorption liquid is supplied to the lower part of the ethylene oxide absorption tower (2), and introduced into the upper part of the ethylene oxide absorption tower (2) through the conduit (3), and brought into countercurrent contact with the reaction product gas, so that the amount of the absorption liquid is 99% by weight or more in the reaction product gas. The gases such as ethylene, oxygen, carbon dioxide, inert gases (nitrogen, argon, methane, ethane), aldehydes, and acidic substances that were not absorbed from the top of the ethylene oxide absorption tower (2) are collected through the conduit ( 4) to the carbon dioxide absorption step and/or oxidation reaction step. In this absorption process, in addition to ethylene oxide, ethylene, oxygen, carbon dioxide, inert gases (nitrogen, argon, methane, ethane, etc.), low-boiling point impurities such as formaldehyde generated in the ethylene oxidation reaction process, and high-boiling point impurities such as acetaldehyde and acetic acid are used. A substantial amount of impurities are also absorbed at the same time. The bottom liquid of the ethylene oxide absorption tower (2) is transferred to the conduit (5
) to the heat exchanger (6) and exchange heat with the bottom liquid for ethylene oxide dispersion to raise the temperature to 70-110°C.
7) was sent to the gas-liquid separation tank (8), and the heavy portion of the inert gas containing a portion of ethylene oxide was separated through the conduit (9). The remaining absorption liquid after flushing the heavy gas is passed through the conduit (10) at a tower top pressure of 0.1 to 2 KQ.
/ ai G, is supplied to the upper part of the ethylene oxide stripping tower (11) at a temperature of 85 to 120°C, and heated by steam from the heater (12) of the ethylene oxide stripping tower (11), and the 99 weight of ethylene oxide contained in the absorption liquid is %
More than that! ! @Seshime, ethylene oxide stripping tower (11
) at a temperature substantially free of ethylene oxide [
A portion of the ethylene oxide stripping bottom liquid at 100 to 130°C passes through the conduit (14) and the conduit (15) to the heat exchanger (
6), the liquid is exchanged with the bottom liquid of the ethylene oxide absorption tower (2), cooled by a condenser (17) through which cooling water passes through the conduit (16), and then through the conduit (18) and the conduit (one conduit). Fresh water was introduced through conduit (21) to adjust the ethylene glycol concentration in the absorption liquid. During the oxidation process in which ethylene is oxidized with molecular oxygen and the ethylene oxide diffusion process, low boiling point impurities such as by-product ethylene glycol and formaldehyde, which are produced by the hydrolysis reaction of ethylene oxide and water in the absorption liquid, and high boiling point impurities such as acetaldehyde and acetic acid. In order to prevent an increase in impurities, the bottom liquid of the ethylene oxide stripping tower (11) was extracted from the bottom of the ethylene oxide stripping tower (11) through conduits (14) and (22) and sent to a by-product ethylene glycol concentration step.

一方、エチレンオキシド放散塔(11)の塔頂部より放
散されるエチレンオキシドを含む放散蒸気は導管(23
)を通して、導管(25)および導管(26)に冷部水
が通る凝縮器(24)へ送り、凝縮液は導管(27)を
通してエチレンオキシド放散塔(11)の塔頂部へ運流
し、未凝縮蒸気は導管(28〉をを通して脱水塔(29
)へ供給した。
On the other hand, the vapor containing ethylene oxide released from the top of the ethylene oxide stripping tower (11) is transferred to the conduit (23).
) to the condenser (24) through which cold water passes through the conduit (25) and conduit (26), and the condensate is transported to the top of the ethylene oxide stripping tower (11) through the conduit (27), where uncondensed vapor is is passed through the conduit (28) to the dehydration tower (29
).

脱水塔(29)の加熱器(30)により水蒸気またはダ
ウサム(ダウ社商品)等の加熱媒体で導管(31)を通
して加熱するか、または直接脱水塔(29)の下部へ水
蒸気を導入する加熱方式により加熱し、脱水塔(29)
の塔底より導管(32)を通してエチレンオキシドを含
まない水が抜き出された。
A heating method in which the heater (30) of the dehydration tower (29) heats the water vapor or a heating medium such as Dow Sam (product of Dow Company) through the conduit (31), or directly introduces steam into the lower part of the dehydration tower (29). Heated with dehydration tower (29)
Ethylene oxide-free water was extracted from the bottom of the column through a conduit (32).

脱水塔(29)の塔頂部よりエチレンオキシドを含む蒸
気は導管(33)を通して、導管(35)および導管(
36)に冷却水が通る凝縮器(34)へ送り、凝縮液の
一部は導管(37)を通して脱水塔(29)の塔頂部へ
還流し、凝縮器(34)の未凝縮蒸気は導管(39)を
通して再エチレンオキシド吸収塔(図示していない)へ
供給した。
Steam containing ethylene oxide is passed from the top of the dehydration tower (29) through the conduit (33) to the conduit (35) and the conduit (
A portion of the condensed liquid is returned to the top of the dehydration tower (29) through the conduit (37), and uncondensed vapor in the condenser (34) is sent to the condenser (34) through which cooling water passes through the conduit (36). 39) to a re-ethylene oxide absorption tower (not shown).

凝縮器(34)の凝縮液の他部は導管(38)を通して
重質分分離塔(40)へ供給された。
The other part of the condensate from the condenser (34) was fed to the heavy fraction separation column (40) through a conduit (38).

重質分分離塔(40)の加熱器(41)により水蒸気を
導管(42)通して加熱する方式により加熱し、重質分
分離塔(40)の塔頂部より重質分を含むエチレンオキ
シド蒸気は導管(43)を通して凝縮器(44)へ送り
、凝縮液の一部は導管(47)を通して重質分分離塔(
40)の塔頂部へ還流し、未凝縮蒸気は導管(48)を
通してエチレンオキシドを回収するため再エチレンオキ
シド吸収塔(図示してない)へ供給された。
Steam is heated by the heater (41) of the heavy fraction separation column (40) through a conduit (42), and ethylene oxide vapor containing heavy fraction is released from the top of the heavy fraction separation column (40). The condensed liquid is sent to the condenser (44) through the conduit (43), and a part of the condensate is sent to the heavy fraction separation column (47) through the conduit (47).
40) and the uncondensed vapors were fed through conduit (48) to a re-ethylene oxide absorption column (not shown) for recovery of ethylene oxide.

重質分分離塔(40)の塔底より導管(49)を通して
エチレンオキシド精留塔(50)へ供給された。
It was supplied from the bottom of the heavy fraction separation column (40) to the ethylene oxide rectification column (50) through a conduit (49).

エチレンオキシド精留塔(50)の加熱器(58)によ
り水蒸気を導管(5つ)を通して加熱する方式により加
熱し、エチレンオキシド精留塔(50)の加熱器(58
)へ導管(59)より圧力0 、5〜1 、0 k Q
/cjGの水蒸気を供給し、エチレンオキシド精留塔(
50)の塔底温度62℃、エチレンオキシド精留塔底圧
力3.7ko/cri Gで精留を行ない、エチレンオ
キシド精留塔頂より塔頂温度54℃、塔頂圧力3.5k
QlcdGのエチレンオキシド蒸気を導管(51)を通
して、凝縮器(52)へ送りエチレンオキシド蒸気は液
化し、液化した一部は導管(56)を通してエチレンオ
キシド精留塔(50)の塔頂部へ還流液として導入し、
液化した他部は導管(57)を通してエチレンオキシド
製品として抜き出された。
The water vapor is heated by the heater (58) of the ethylene oxide rectification column (50) by heating it through the conduits (5).
) from the conduit (59) to pressure 0, 5 to 1, 0 k Q
/cjG steam is supplied to the ethylene oxide rectification column (
50), the bottom temperature of the ethylene oxide rectification column was 62°C and the bottom pressure of the ethylene oxide rectification column was 3.7 ko/cri G.
The ethylene oxide vapor of QlcdG is sent to the condenser (52) through the conduit (51), and the ethylene oxide vapor is liquefied, and a part of the liquefied product is introduced as a reflux liquid to the top of the ethylene oxide rectification column (50) through the conduit (56). ,
The other liquefied portion was extracted as an ethylene oxide product through a conduit (57).

エチレンオキシド精留塔(50)の凝縮器(52)の未
凝縮蒸気は導管(55)を通してエチレンオキシドを回
収するため再エチレンオキシド吸収塔(図示してない)
へ供給された。
The uncondensed vapor in the condenser (52) of the ethylene oxide rectification column (50) passes through a conduit (55) to a re-ethylene oxide absorption column (not shown) to recover ethylene oxide.
was supplied to.

エチレンオキシド精留塔(50)の塔底液はアセトアル
デヒドおよび酢M等の高沸点不純物の重質分分離のため
必要により導管(67)を通して抜き出された。
The bottom liquid of the ethylene oxide rectification column (50) was drawn out through a conduit (67) as necessary to separate heavy fractions of high-boiling point impurities such as acetaldehyde and vinegar M.

表−2にこのプロセスの連続操作条件を一括して表示す
る。
Table 2 summarizes the continuous operating conditions for this process.

(発明の効果) 本発明の方法によれば、エチレンオキシド放散塔での塔
頂部から放散される蒸気の熱エネルギーをエチレンオキ
シド精留塔リボイラーに導入し、さらにエチレンオキシ
ド放散塔底部より抜き出した液を熱交換器にてエチレン
オキシド吸収塔底液と熱交換した後、ヒートポンプを用
いて吸収液の持つ熱エネルギーを回収し水蒸気を発生さ
せ、エチレンオキシド精留塔リボイラーに導入すること
により、エチレンオキシド精留塔を加熱するに要する外
部からの加熱熱囚を大幅に減少することが可能となる効
果を発揮するものである。さらにこの方法を実施するこ
とによってエチレンオキシドの精留塔頂部で発生した蒸
気相を冷却する冷却水の熱負荷が低減される効果を有す
るものである。
(Effects of the Invention) According to the method of the present invention, the thermal energy of the steam dissipated from the top of the ethylene oxide stripping column is introduced into the ethylene oxide rectification column reboiler, and the liquid extracted from the bottom of the ethylene oxide stripping column is heat-exchanged. After exchanging heat with the bottom liquid of the ethylene oxide absorption tower using a heat pump, the thermal energy of the absorption liquid is recovered using a heat pump to generate steam, which is introduced into the ethylene oxide rectification tower reboiler to heat the ethylene oxide rectification tower. This exhibits the effect of making it possible to significantly reduce the amount of external heating heat trapped. Furthermore, implementing this method has the effect of reducing the thermal load of the cooling water that cools the vapor phase generated at the top of the ethylene oxide rectification column.

【図面の簡単な説明】[Brief explanation of drawings]

図−1は、本発明のエチレンオキシド精製方法の好まし
い具体例を示す一例である。 図−2は、本発明に関連する公知のエチレンキシド精製
方法を示す一例である。 (2)  エチレンオキシド吸収塔 (6)  熱交換器 (8)  気液分離タンク (11)エチレンオキシド放散塔 (12)エチレンオキシド放散塔加熱器(16)冷媒蒸
発器 (17)冷却器 (24)エチレンオキシド放散塔凝縮器(29)脱水塔 (30)脱水塔加熱器 (34)脱水塔凝縮器 (40)重質分分離塔 (41)  重質分分離塔加熱器 (44)重質分分離塔凝縮器 (50)エチレンオキシド精留塔 (52)  エチレンオキシド精留塔凝縮器(58)エ
チレンオキシド精留塔加熱器(60)  エチレンオキ
シド精留塔加熱器(64)  エチレンオキシド放散塔
凝縮器(70)冷媒圧縮機 (73)冷媒凝縮器 (75)  フラッシュタンク
FIG. 1 is an example showing a preferred specific example of the ethylene oxide purification method of the present invention. FIG. 2 is an example showing a known ethylene oxide purification method related to the present invention. (2) Ethylene oxide absorption tower (6) Heat exchanger (8) Gas-liquid separation tank (11) Ethylene oxide stripping tower (12) Ethylene oxide stripping tower heater (16) Refrigerant evaporator (17) Cooler (24) Ethylene oxide stripping tower Condenser (29) Dehydration tower (30) Dehydration tower heater (34) Dehydration tower condenser (40) Heavy fraction separation tower (41) Heavy fraction separation tower heater (44) Heavy fraction separation tower condenser ( 50) Ethylene oxide rectification column (52) Ethylene oxide rectification column condenser (58) Ethylene oxide rectification column heater (60) Ethylene oxide rectification column heater (64) Ethylene oxide stripping column condenser (70) Refrigerant compressor (73) Refrigerant condenser (75) Flash tank

Claims (1)

【特許請求の範囲】[Claims] (1)エチレンを銀触媒の存在下、分子状酸素含有ガス
と接触気相酸化して生成したエチレンオキシドを含有す
る反応生成ガスをエチレンオキシド吸収塔へ導入し吸収
液と向流接触させ、エチレンオキシド吸収塔頂部よりの
ガスの一部はエチレン酸化反応工程へ循環し、エチレン
オキシドを含むエチレンオキシド吸収塔底液はエチレン
オキシド放散塔へ供給し、エチレンオキシド放散塔頂か
らエチレンオキシドを放散せしめ、エチレンオキシドお
よび水を含む留出を凝縮させ、脱水塔で水分を分離し、
軽質分分離塔で軽質分を分離し、ついでエチレンオキシ
ド精留塔でエチレンオキシドを精留する工程において、
エチレンオキシド放散塔から放散される放散物をエチレ
ンオキシド精留塔の加熱源に使用し、エチレンオキシド
放散塔底部より抜き出した液はエチレンオキシド吸収塔
へ導き吸収液として循環使用し、残部は吸収液に含まれ
るエチレングリコールを濃縮するため副生エチレングリ
コール濃縮塔へ送り、エチレンオキシド放散塔底部より
抜き出した液を熱交換器にてエチレンオキシド吸収塔底
液と熱交換した後、ヒートポンプを用いて吸収液の持つ
熱エネルギーを回収し水蒸気を発生させエチレンオキシ
ド精留塔の加熱源に使用し、ヒートポンプにより冷却さ
れた吸収液をさらに冷却器にて冷却した後、エチレンオ
キシド吸収塔の吸収液とすることを特徴とするエチレン
オキシドの精製方法。
(1) A reaction product gas containing ethylene oxide produced by contact vapor phase oxidation of ethylene with a molecular oxygen-containing gas in the presence of a silver catalyst is introduced into an ethylene oxide absorption tower, brought into countercurrent contact with the absorption liquid, and the ethylene oxide absorption tower A part of the gas from the top is circulated to the ethylene oxidation reaction process, and the ethylene oxide absorption column bottom liquid containing ethylene oxide is supplied to the ethylene oxide stripping column, where ethylene oxide is dissipated from the top of the ethylene oxide stripping column, and a distillate containing ethylene oxide and water is produced. It is condensed and the water is separated in a dehydration tower.
In the process of separating light fractions in a light fraction separation column and then rectifying ethylene oxide in an ethylene oxide rectification column,
The emitted material emitted from the ethylene oxide stripping tower is used as a heating source for the ethylene oxide rectification tower, and the liquid extracted from the bottom of the ethylene oxide stripping tower is guided to the ethylene oxide absorption tower and recycled as an absorption liquid.The remainder is used as the ethylene contained in the absorption liquid. In order to concentrate the glycol, the by-product ethylene glycol is sent to the concentration tower, and the liquid extracted from the bottom of the ethylene oxide diffusion tower is heat exchanged with the bottom liquid of the ethylene oxide absorption tower in a heat exchanger, and then the thermal energy of the absorption liquid is transferred using a heat pump. Purification of ethylene oxide, characterized in that the collected water vapor is generated and used as a heating source for an ethylene oxide rectification tower, and the absorption liquid cooled by a heat pump is further cooled in a cooler and then used as the absorption liquid for the ethylene oxide absorption tower. Method.
JP61074357A 1985-07-03 1986-04-02 Method of purifying ethylene oxide Pending JPS62103073A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
DE8686108909T DE3678871D1 (en) 1985-07-03 1986-07-01 METHOD FOR PURIFYING ETHYLENE OXIDE.
US06/880,734 US4778567A (en) 1985-07-03 1986-07-01 Method for purification of ethylene oxide and recovery of heat thereof
EP86108909A EP0207490B1 (en) 1985-07-03 1986-07-01 Method for purification of ethylene oxide
CA000512894A CA1284335C (en) 1985-07-03 1986-07-02 Method for purification of ethylene oxide
CN86105706A CN1014243B (en) 1985-07-03 1986-07-03 Method for purification ethylene oxide
KR1019860005394A KR920001767B1 (en) 1985-07-03 1986-07-03 Method for purification of ethylene oxide

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP60-144642 1985-07-03
JP14464285 1985-07-03

Publications (1)

Publication Number Publication Date
JPS62103073A true JPS62103073A (en) 1987-05-13

Family

ID=15366809

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61074357A Pending JPS62103073A (en) 1985-07-03 1986-04-02 Method of purifying ethylene oxide

Country Status (1)

Country Link
JP (1) JPS62103073A (en)

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